FR2028331A1 - - Google Patents
Info
- Publication number
- FR2028331A1 FR2028331A1 FR6941864A FR6941864A FR2028331A1 FR 2028331 A1 FR2028331 A1 FR 2028331A1 FR 6941864 A FR6941864 A FR 6941864A FR 6941864 A FR6941864 A FR 6941864A FR 2028331 A1 FR2028331 A1 FR 2028331A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
- H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
- H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US79121469A | 1969-01-15 | 1969-01-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2028331A1 true FR2028331A1 (enExample) | 1970-10-09 |
| FR2028331B1 FR2028331B1 (enExample) | 1974-03-01 |
Family
ID=25153001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR696941864A Expired FR2028331B1 (enExample) | 1969-01-15 | 1969-12-04 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3586554A (enExample) |
| DE (1) | DE2001339A1 (enExample) |
| FR (1) | FR2028331B1 (enExample) |
| GB (1) | GB1276286A (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3831432A (en) * | 1972-09-05 | 1974-08-27 | Texas Instruments Inc | Environment monitoring device and system |
| JPS5218098B2 (enExample) * | 1973-05-04 | 1977-05-19 | ||
| GB1513368A (en) * | 1974-07-08 | 1978-06-07 | Vickers Ltd | Processing of radiation-sensitive members |
| US4075367A (en) * | 1976-03-18 | 1978-02-21 | Ncr Corporation | Semiconductor processing of silicon nitride |
| US4173683A (en) * | 1977-06-13 | 1979-11-06 | Rca Corporation | Chemically treating the overcoat of a semiconductor device |
| US4209356A (en) * | 1978-10-18 | 1980-06-24 | General Electric Company | Selective etching of polymeric materials embodying silicones via reactor plasmas |
| DE3027941A1 (de) * | 1980-07-23 | 1982-02-25 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von reliefstrukturen aus doppellackschichten fuer integrierte halbleiterschaltungen, wobei zur strukturierung hochenergetische strahlung verwendet wird |
| CA1184321A (en) * | 1981-06-30 | 1985-03-19 | John C. Marinace | Adhesion of a photoresist to a substrate |
| JPS60147729A (ja) * | 1984-01-12 | 1985-08-03 | Toshiba Corp | ホトレジスト組成物 |
| JPS61248035A (ja) * | 1985-04-26 | 1986-11-05 | Nippon Zeon Co Ltd | 密着性の改良されたホトレジスト組成物 |
| AU4283196A (en) * | 1994-11-22 | 1996-06-17 | Complex Fluid Systems, Inc. | Non-aminic photoresist adhesion promoters for microelectronic applications |
| US5641541A (en) * | 1995-09-29 | 1997-06-24 | Taiwan Semiconductor Manufacturing Company | Process to apply photoresist printer to a wafer |
-
1969
- 1969-01-15 US US791214A patent/US3586554A/en not_active Expired - Lifetime
- 1969-12-04 FR FR696941864A patent/FR2028331B1/fr not_active Expired
-
1970
- 1970-01-01 GB GB033/70A patent/GB1276286A/en not_active Expired
- 1970-01-13 DE DE19702001339 patent/DE2001339A1/de active Pending
Non-Patent Citations (1)
| Title |
|---|
| NEANT * |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1276286A (en) | 1972-06-01 |
| US3586554A (en) | 1971-06-22 |
| DE2001339A1 (de) | 1970-07-23 |
| FR2028331B1 (enExample) | 1974-03-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |