FR2027429A1 - - Google Patents
Info
- Publication number
- FR2027429A1 FR2027429A1 FR6944145A FR6944145A FR2027429A1 FR 2027429 A1 FR2027429 A1 FR 2027429A1 FR 6944145 A FR6944145 A FR 6944145A FR 6944145 A FR6944145 A FR 6944145A FR 2027429 A1 FR2027429 A1 FR 2027429A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30608—Anisotropic liquid etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Element Separation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78817768A | 1968-12-31 | 1968-12-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2027429A1 true FR2027429A1 (fr) | 1970-09-25 |
FR2027429B1 FR2027429B1 (fr) | 1973-08-10 |
Family
ID=25143680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR6944145A Expired FR2027429B1 (fr) | 1968-12-31 | 1969-12-19 |
Country Status (4)
Country | Link |
---|---|
DE (1) | DE1965408C3 (fr) |
FR (1) | FR2027429B1 (fr) |
GB (1) | GB1288278A (fr) |
NL (1) | NL6918388A (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0317445A2 (fr) * | 1987-11-20 | 1989-05-24 | Fujitsu Limited | Méthode pour fabriquer un substrat en carbure en carbure de silicium |
EP0485719A2 (fr) * | 1990-11-16 | 1992-05-20 | Shin-Etsu Handotai Company Limited | Substrat avec isolation diélectrique et procédé de sa fabrication |
EP0485720A2 (fr) * | 1990-11-16 | 1992-05-20 | Shin-Etsu Handotai Company Limited | Substrat avec isolation diélectrique et procédé de sa fabrication |
LT5166B (lt) | 2002-12-19 | 2004-10-25 | Akcionernoje obščestvo zakrytogo tipa "LITEKS" | Gaminių žymėjimo būdas ženklų rinkiniu ir žymėjimo ženklas |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3579057A (en) * | 1969-08-18 | 1971-05-18 | Rca Corp | Method of making a semiconductor article and the article produced thereby |
GB1439351A (en) * | 1972-06-02 | 1976-06-16 | Texas Instruments Inc | Capacitor |
US4238275A (en) * | 1978-12-29 | 1980-12-09 | International Business Machines Corporation | Pyrocatechol-amine-water solution for the determination of defects |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1498752A (fr) * | 1965-10-24 | 1967-10-20 | Texas Instruments Inc | Procédé de fabrication de dépôts épitaxiaux |
FR1548079A (fr) * | 1966-12-20 | 1968-11-29 |
-
1969
- 1969-11-20 GB GB5686169A patent/GB1288278A/en not_active Expired
- 1969-12-08 NL NL6918388A patent/NL6918388A/xx unknown
- 1969-12-19 FR FR6944145A patent/FR2027429B1/fr not_active Expired
- 1969-12-30 DE DE19691965408 patent/DE1965408C3/de not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1498752A (fr) * | 1965-10-24 | 1967-10-20 | Texas Instruments Inc | Procédé de fabrication de dépôts épitaxiaux |
FR1548079A (fr) * | 1966-12-20 | 1968-11-29 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0317445A2 (fr) * | 1987-11-20 | 1989-05-24 | Fujitsu Limited | Méthode pour fabriquer un substrat en carbure en carbure de silicium |
EP0317445A3 (en) * | 1987-11-20 | 1990-01-10 | Fujitsu Limited | Method for fabricating a silicon carbide substrate |
US4983538A (en) * | 1987-11-20 | 1991-01-08 | Fujitsu Limited | Method for fabricating a silicon carbide substrate |
EP0485719A2 (fr) * | 1990-11-16 | 1992-05-20 | Shin-Etsu Handotai Company Limited | Substrat avec isolation diélectrique et procédé de sa fabrication |
EP0485720A2 (fr) * | 1990-11-16 | 1992-05-20 | Shin-Etsu Handotai Company Limited | Substrat avec isolation diélectrique et procédé de sa fabrication |
EP0485719A3 (en) * | 1990-11-16 | 1995-12-27 | Shinetsu Handotai Kk | Dielectrically isolated substrate and a process for producing the same |
EP0485720A3 (en) * | 1990-11-16 | 1995-12-27 | Shinetsu Handotai Kk | Dielectrically isolated substrate and a process for producing the same |
LT5166B (lt) | 2002-12-19 | 2004-10-25 | Akcionernoje obščestvo zakrytogo tipa "LITEKS" | Gaminių žymėjimo būdas ženklų rinkiniu ir žymėjimo ženklas |
Also Published As
Publication number | Publication date |
---|---|
DE1965408B2 (de) | 1978-02-16 |
FR2027429B1 (fr) | 1973-08-10 |
DE1965408C3 (de) | 1979-01-25 |
GB1288278A (fr) | 1972-09-06 |
DE1965408A1 (de) | 1970-07-16 |
NL6918388A (fr) | 1970-07-02 |