FR2014839A6 - Lithographic plate - Google Patents

Lithographic plate

Info

Publication number
FR2014839A6
FR2014839A6 FR6925293A FR6925293A FR2014839A6 FR 2014839 A6 FR2014839 A6 FR 2014839A6 FR 6925293 A FR6925293 A FR 6925293A FR 6925293 A FR6925293 A FR 6925293A FR 2014839 A6 FR2014839 A6 FR 2014839A6
Authority
FR
France
Prior art keywords
sensitive layer
selenide
halide
lithographic plate
radiation sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR6925293A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teeg Research Inc
Original Assignee
Teeg Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teeg Research Inc filed Critical Teeg Research Inc
Application granted granted Critical
Publication of FR2014839A6 publication Critical patent/FR2014839A6/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107—Using laser light

Abstract

Lithographic plate comprises a substrate carrying a radiation sensitive layer which can be exposed to provide discrete areas having different affinities to oil or water. The sensitive layer is deposited onto the substrate from the vapour phase, or in liquid, or powder form and may comprises a chalcogenide or the sulphide, halide or selenide of a metal. Materials used can be sulphides of As, Sb, Cd, Bi, or Cr, halides of Pb Cu or Hg, selenide of As As-S halide cpds. or mixtures of As-S-Sb mixed oxides or oxide mixtures. The deposition of the radiation sensitive layer involves the usual techniques.
FR6925293A 1968-08-01 1969-07-24 Lithographic plate Expired FR2014839A6 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75670968A 1968-08-01 1968-08-01

Publications (1)

Publication Number Publication Date
FR2014839A6 true FR2014839A6 (en) 1970-04-24

Family

ID=25044712

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6925293A Expired FR2014839A6 (en) 1968-08-01 1969-07-24 Lithographic plate

Country Status (7)

Country Link
BE (1) BE736528A (en)
CH (1) CH512086A (en)
DE (1) DE1914762A1 (en)
ES (1) ES365378A1 (en)
FR (1) FR2014839A6 (en)
NL (1) NL6911728A (en)
ZA (1) ZA695525B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3678852A (en) * 1970-04-10 1972-07-25 Energy Conversion Devices Inc Printing and copying employing materials with surface variations
GB1397566A (en) * 1971-05-17 1975-06-11 Energy Conversion Devices Inc Method for producing relief images
IL39732A (en) * 1971-07-19 1975-07-28 Energy Conversion Devices Inc Method for imaging and for recording information
DE29514668U1 (en) * 1995-09-13 1995-11-02 Schuetz Kurt Flechtatelier Seating

Also Published As

Publication number Publication date
BE736528A (en) 1969-12-31
DE1914762A1 (en) 1970-06-04
CH512086A (en) 1971-08-31
ES365378A1 (en) 1971-03-16
NL6911728A (en) 1970-02-03
ZA695525B (en) 1971-03-31

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