FR2001819A1 - Procede et appareil pour la fabrication de dispositifs semi-conducteurs - Google Patents

Procede et appareil pour la fabrication de dispositifs semi-conducteurs

Info

Publication number
FR2001819A1
FR2001819A1 FR6903432A FR6903432A FR2001819A1 FR 2001819 A1 FR2001819 A1 FR 2001819A1 FR 6903432 A FR6903432 A FR 6903432A FR 6903432 A FR6903432 A FR 6903432A FR 2001819 A1 FR2001819 A1 FR 2001819A1
Authority
FR
France
Prior art keywords
aluminium
oxide
leads
semi
feb
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6903432A
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from NL6802060A external-priority patent/NL6802060A/xx
Priority claimed from NL6802061A external-priority patent/NL6802061A/xx
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2001819A1 publication Critical patent/FR2001819A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • H10P95/00—
    • H10W20/40—
    • H10W72/07236—
    • H10W72/5524—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Die Bonding (AREA)
FR6903432A 1968-02-13 1969-02-13 Procede et appareil pour la fabrication de dispositifs semi-conducteurs Withdrawn FR2001819A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL6802060A NL6802060A (cg-RX-API-DMAC10.html) 1968-02-13 1968-02-13
NL6802061A NL6802061A (cg-RX-API-DMAC10.html) 1968-02-13 1968-02-13

Publications (1)

Publication Number Publication Date
FR2001819A1 true FR2001819A1 (fr) 1969-10-03

Family

ID=26644295

Family Applications (2)

Application Number Title Priority Date Filing Date
FR6903433A Withdrawn FR2001820A1 (fr) 1968-02-13 1969-02-13 Dispositif electronique comportant au moins un corps semi-conducteur et des conducteurs rigides faisant saillie lateralement par rapport audit corps
FR6903432A Withdrawn FR2001819A1 (fr) 1968-02-13 1969-02-13 Procede et appareil pour la fabrication de dispositifs semi-conducteurs

Family Applications Before (1)

Application Number Title Priority Date Filing Date
FR6903433A Withdrawn FR2001820A1 (fr) 1968-02-13 1969-02-13 Dispositif electronique comportant au moins un corps semi-conducteur et des conducteurs rigides faisant saillie lateralement par rapport audit corps

Country Status (5)

Country Link
BE (2) BE728375A (cg-RX-API-DMAC10.html)
CH (2) CH496815A (cg-RX-API-DMAC10.html)
DE (2) DE1906727A1 (cg-RX-API-DMAC10.html)
FR (2) FR2001820A1 (cg-RX-API-DMAC10.html)
GB (2) GB1251757A (cg-RX-API-DMAC10.html)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2482329A (en) * 1946-05-27 1949-09-20 Rca Corp Apparatus for selective vapor coating
GB834408A (en) * 1955-06-28 1960-05-11 Nat Presto Ind Thermostatic control means for an electrically heated device
GB839081A (en) * 1957-12-13 1960-06-29 Westinghouse Electric Corp Improvements in or relating to evaporation processes for the deposition of metals, particularly for use in the making of semi-conductor devices
FR1497294A (fr) * 1965-10-22 1967-10-06 Motorola Inc Procédé pour la métallisation des semi-conducteurs et semi-conducteurs formes par ce procédé
FR1536321A (fr) * 1966-06-30 1968-08-10 Texas Instruments Inc Contacts ohmiques pour des dispositifs à semi-conducteurs

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2482329A (en) * 1946-05-27 1949-09-20 Rca Corp Apparatus for selective vapor coating
GB834408A (en) * 1955-06-28 1960-05-11 Nat Presto Ind Thermostatic control means for an electrically heated device
GB839081A (en) * 1957-12-13 1960-06-29 Westinghouse Electric Corp Improvements in or relating to evaporation processes for the deposition of metals, particularly for use in the making of semi-conductor devices
FR1497294A (fr) * 1965-10-22 1967-10-06 Motorola Inc Procédé pour la métallisation des semi-conducteurs et semi-conducteurs formes par ce procédé
FR1536321A (fr) * 1966-06-30 1968-08-10 Texas Instruments Inc Contacts ohmiques pour des dispositifs à semi-conducteurs

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
(REVUE AMERICAINE ELECTRONIC ENGINEERING *
REVUE AMERICAINE THE REVIEW OF SCIENTIFIC INSTRUMENTS) *

Also Published As

Publication number Publication date
BE728375A (cg-RX-API-DMAC10.html) 1969-08-13
CH491499A (de) 1970-05-31
DE1906726A1 (de) 1969-09-18
GB1251757A (cg-RX-API-DMAC10.html) 1971-10-27
DE1906727A1 (de) 1969-09-25
CH496815A (de) 1970-09-30
FR2001820A1 (fr) 1969-10-03
GB1258942A (cg-RX-API-DMAC10.html) 1971-12-30
BE728374A (cg-RX-API-DMAC10.html) 1969-08-13

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Legal Events

Date Code Title Description
ST Notification of lapse