FR1486984A - Antistatic compositions and antistatic photographic agents - Google Patents

Antistatic compositions and antistatic photographic agents

Info

Publication number
FR1486984A
FR1486984A FR69861A FR69861A FR1486984A FR 1486984 A FR1486984 A FR 1486984A FR 69861 A FR69861 A FR 69861A FR 69861 A FR69861 A FR 69861A FR 1486984 A FR1486984 A FR 1486984A
Authority
FR
France
Prior art keywords
antistatic
compositions
photographic agents
agents
photographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR69861A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of FR1486984A publication Critical patent/FR1486984A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
    • G03C1/93—Macromolecular substances therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/02—Homopolymers or copolymers of unsaturated alcohols
    • C09D129/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G03C1/7954—Polyesters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/853—Inorganic compounds, e.g. metals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/95—Photosensitive materials characterised by the base or auxiliary layers rendered opaque or writable, e.g. with inert particulate additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/22—Mixtures comprising a continuous polymer matrix in which are dispersed crosslinked particles of another polymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C08L33/12—Homopolymers or copolymers of methyl methacrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Laminated Bodies (AREA)
FR69861A 1965-07-26 1966-07-19 Antistatic compositions and antistatic photographic agents Expired FR1486984A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US47463265A 1965-07-26 1965-07-26

Publications (1)

Publication Number Publication Date
FR1486984A true FR1486984A (en) 1967-06-30

Family

ID=23884379

Family Applications (1)

Application Number Title Priority Date Filing Date
FR69861A Expired FR1486984A (en) 1965-07-26 1966-07-19 Antistatic compositions and antistatic photographic agents

Country Status (3)

Country Link
US (1) US3437484A (en)
FR (1) FR1486984A (en)
GB (1) GB1138382A (en)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1621988C3 (en) * 1967-09-25 1974-07-11 Kalle Ag, 6202 Wiesbaden-Biebrich Transparent drawing material
GB1235715A (en) * 1968-10-03 1971-06-16 Ilford Ltd Anti-static coatings
BE757569A (en) * 1969-10-16 1971-03-16 Eastman Kodak Co PROCESS FOR PREPARING A PHOTOGRAPHIC SUPPORT AND PRODUCT OBTAINED
BE757878A (en) * 1969-10-24 1971-04-01 Eastman Kodak Co SHEETS WITH ANTISTATIC PROPERTIES AND THEIR APPLICATION AS PHOTOGRAPHIC SUPPORTS
US3753765A (en) * 1971-09-20 1973-08-21 Du Pont Conductive carbon antistatic backing for photographic film
US4113918A (en) * 1972-03-03 1978-09-12 Konishiroku Photo Industry Co., Ltd. Undercoat-applied plastic films
GB1427391A (en) * 1973-04-02 1976-03-10 Ici Ltd Coated polyesters films
GB1464051A (en) * 1974-04-30 1977-02-09 Fuji Photo Film Co Ltd Photographic recording elements
US4196001A (en) * 1974-07-24 1980-04-01 Eastman Kodak Company Antistatic layer for photographic elements
US4209584A (en) * 1979-06-15 1980-06-24 Eastman Kodak Company Manufacture of photographic elements having anticurl and antistatic layers
US4335201A (en) * 1980-11-24 1982-06-15 Eastman Kodak Company Antistatic compositions and elements containing same
US4415626A (en) * 1982-01-08 1983-11-15 Eastman Kodak Company Antistatic composition and elements and processes utilizing same
EP0360616B1 (en) * 1988-09-22 1995-02-01 Konica Corporation Light-sensitive silver halide photographic material causing less curvature and feasible for rapid processing
US4942115A (en) * 1989-04-24 1990-07-17 Eastman Kodak Company Thermally processable imaging element comprising an overcoat layer
JPH0468343A (en) * 1990-07-10 1992-03-04 Konica Corp Antistatic plastic film
JPH04117436A (en) * 1990-09-05 1992-04-17 Konica Corp Production of antistatic polyester film
US5221598A (en) * 1992-11-23 1993-06-22 Eastman Kodak Company Photographic support material comprising an antistatic layer and a heat-thickening barrier layer
US5360706A (en) * 1993-11-23 1994-11-01 Eastman Kodak Company Imaging element
EP0782045B1 (en) 1995-12-27 2001-10-24 Agfa-Gevaert N.V. Silver halide colour photographic film element having a thermoplastic support capable of being marked by means of a laser
US5723273A (en) * 1996-09-11 1998-03-03 Eastman Kodak Company Protective overcoat for antistatic layer
US6025111A (en) * 1996-10-23 2000-02-15 Eastman Kodak Company Stable matte formulation for imaging elements
US5700623A (en) * 1997-01-21 1997-12-23 Eastman Kodak Company Thermally stable photographic bar code label containing an antistatic layer
US5747232A (en) * 1997-02-27 1998-05-05 Eastman Kodak Company Motion imaging film comprising a carbon black-containing backing and a process surviving conductive subbing layer
US6048679A (en) * 1998-12-28 2000-04-11 Eastman Kodak Company Antistatic layer coating compositions
US7033743B2 (en) * 2002-12-19 2006-04-25 Agfa Gevaert Barrier layers for use in substantially light-insensitive thermographic recording materials
DE602004015104D1 (en) * 2003-06-18 2008-08-28 Fujifilm Mfg Europe Bv INK JET RECORDING MEDIUM
DE602004011627T2 (en) * 2003-10-03 2009-05-07 Fujifilm Manufacturing Europe B.V. RECORDING MEDIUM
WO2005032837A1 (en) * 2003-10-03 2005-04-14 Fuji Photo Film B.V. Recording medium
WO2013146355A1 (en) 2012-03-29 2013-10-03 富士フイルム株式会社 Heat-ray-shielding material and laminated structure
CN104087034A (en) * 2014-07-18 2014-10-08 关锦池 Inorganic high-temperature resistant and anti-electrostatic coating material

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1570062A (en) * 1921-10-12 1926-01-19 Du Pont Process of making nonstatic film
US2322037A (en) * 1939-07-07 1943-06-15 Eastman Kodak Co Photographic film
US2647836A (en) * 1952-04-09 1953-08-04 Du Pont Photographic film elements
US2725297A (en) * 1952-10-08 1955-11-29 Eastman Kodak Co Antistatic photographic film
BE582190A (en) * 1958-09-25
US3143421A (en) * 1960-03-17 1964-08-04 Eastman Kodak Co Adhering photographic subbing layers to polyester film
US3220841A (en) * 1962-01-12 1965-11-30 Eastman Kodak Co Photographic film
US3300313A (en) * 1963-08-12 1967-01-24 Gevaert Photo Prod Nv Non-curling multilayer material

Also Published As

Publication number Publication date
DE1547714B2 (en) 1976-03-25
DE1547714A1 (en) 1969-11-20
US3437484A (en) 1969-04-08
GB1138382A (en) 1969-01-01

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