FR1458962A - Transistor à effet d'avalanche - Google Patents
Transistor à effet d'avalancheInfo
- Publication number
- FR1458962A FR1458962A FR20376A FR20376A FR1458962A FR 1458962 A FR1458962 A FR 1458962A FR 20376 A FR20376 A FR 20376A FR 20376 A FR20376 A FR 20376A FR 1458962 A FR1458962 A FR 1458962A
- Authority
- FR
- France
- Prior art keywords
- effect transistor
- avalanche effect
- avalanche
- transistor
- effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/24—Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M1/00—Details of apparatus for conversion
- H02M1/08—Circuits specially adapted for the generation of control voltages for semiconductor devices incorporated in static converters
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US374501A US3339086A (en) | 1964-06-11 | 1964-06-11 | Surface controlled avalanche transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1458962A true FR1458962A (fr) | 1966-11-18 |
Family
ID=23477115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR20376A Expired FR1458962A (fr) | 1964-06-11 | 1965-06-11 | Transistor à effet d'avalanche |
Country Status (7)
Country | Link |
---|---|
US (1) | US3339086A (fr) |
BE (1) | BE669076A (fr) |
DE (1) | DE1514017B2 (fr) |
FR (1) | FR1458962A (fr) |
GB (1) | GB1060208A (fr) |
NL (1) | NL6507538A (fr) |
SE (1) | SE316237B (fr) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3412297A (en) * | 1965-12-16 | 1968-11-19 | United Aircraft Corp | Mos field-effect transistor with a onemicron vertical channel |
US3426253A (en) * | 1966-05-26 | 1969-02-04 | Us Army | Solid state device with reduced leakage current at n-p junctions over which electrodes pass |
US3518509A (en) * | 1966-06-17 | 1970-06-30 | Int Standard Electric Corp | Complementary field-effect transistors on common substrate by multiple epitaxy techniques |
US3423606A (en) * | 1966-07-21 | 1969-01-21 | Gen Instrument Corp | Diode with sharp reverse-bias breakdown characteristic |
US3553498A (en) * | 1968-02-12 | 1971-01-05 | Sony Corp | Magnetoresistance element |
DE1764759C3 (de) * | 1968-07-31 | 1983-11-10 | Telefunken Patentverwertungsgesellschaft Mbh, 6000 Frankfurt | Verfahren zum Kontaktieren einer Halbleiterzone einer Diode |
JPS5514531B1 (fr) * | 1969-06-18 | 1980-04-17 | ||
US3660819A (en) * | 1970-06-15 | 1972-05-02 | Intel Corp | Floating gate transistor and method for charging and discharging same |
US3755721A (en) * | 1970-06-15 | 1973-08-28 | Intel Corp | Floating gate solid state storage device and method for charging and discharging same |
DE2531846C2 (de) * | 1974-07-16 | 1989-12-14 | Nippon Electric Co., Ltd., Tokyo | Schutzschaltungsanordnung für einen Isolierschicht-Feldeffekttransistor |
JPS5754370A (en) * | 1980-09-19 | 1982-03-31 | Nippon Telegr & Teleph Corp <Ntt> | Insulating gate type transistor |
US4751560A (en) * | 1986-02-24 | 1988-06-14 | Santa Barbara Research Center | Infrared photodiode array |
TW454251B (en) * | 1998-11-30 | 2001-09-11 | Winbond Electronics Corp | Diode structure used in silicide process |
US20090283824A1 (en) * | 2007-10-30 | 2009-11-19 | Northrop Grumman Systems Corporation | Cool impact-ionization transistor and method for making same |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3045129A (en) * | 1960-12-08 | 1962-07-17 | Bell Telephone Labor Inc | Semiconductor tunnel device |
NL274830A (fr) * | 1961-04-12 | |||
BE643857A (fr) * | 1963-02-14 | |||
US3202840A (en) * | 1963-03-19 | 1965-08-24 | Rca Corp | Frequency doubler employing two push-pull pulsed internal field effect devices |
-
1964
- 1964-06-11 US US374501A patent/US3339086A/en not_active Expired - Lifetime
-
1965
- 1965-06-04 GB GB23890/65A patent/GB1060208A/en not_active Expired
- 1965-06-08 SE SE7437/65A patent/SE316237B/xx unknown
- 1965-06-10 DE DE19651514017 patent/DE1514017B2/de active Pending
- 1965-06-11 FR FR20376A patent/FR1458962A/fr not_active Expired
- 1965-06-11 NL NL6507538A patent/NL6507538A/xx unknown
- 1965-09-02 BE BE669076D patent/BE669076A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
NL6507538A (fr) | 1965-12-13 |
DE1514017A1 (de) | 1969-06-26 |
US3339086A (en) | 1967-08-29 |
GB1060208A (en) | 1967-03-01 |
SE316237B (fr) | 1969-10-20 |
DE1514017B2 (de) | 1971-11-11 |
BE669076A (fr) | 1966-03-02 |
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