FR1402020A - Perfectionnements aux sources d'ions - Google Patents

Perfectionnements aux sources d'ions

Info

Publication number
FR1402020A
FR1402020A FR972401A FR972401A FR1402020A FR 1402020 A FR1402020 A FR 1402020A FR 972401 A FR972401 A FR 972401A FR 972401 A FR972401 A FR 972401A FR 1402020 A FR1402020 A FR 1402020A
Authority
FR
France
Prior art keywords
ion sources
sources
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR972401A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
CSF Compagnie Generale de Telegraphie sans Fil SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CSF Compagnie Generale de Telegraphie sans Fil SA filed Critical CSF Compagnie Generale de Telegraphie sans Fil SA
Priority to FR972401A priority Critical patent/FR1402020A/fr
Priority to US447792A priority patent/US3355615A/en
Priority to GB16692/65A priority patent/GB1033447A/en
Priority to DEC35700A priority patent/DE1261605B/de
Application granted granted Critical
Publication of FR1402020A publication Critical patent/FR1402020A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
FR972401A 1964-04-27 1964-04-27 Perfectionnements aux sources d'ions Expired FR1402020A (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR972401A FR1402020A (fr) 1964-04-27 1964-04-27 Perfectionnements aux sources d'ions
US447792A US3355615A (en) 1964-04-27 1965-04-13 Ion source having critically dimensioned extraction means
GB16692/65A GB1033447A (en) 1964-04-27 1965-04-21 Ion sources
DEC35700A DE1261605B (de) 1964-04-27 1965-04-27 Thermische Ionenquelle mit Oberflaechenionisation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR972401A FR1402020A (fr) 1964-04-27 1964-04-27 Perfectionnements aux sources d'ions

Publications (1)

Publication Number Publication Date
FR1402020A true FR1402020A (fr) 1965-06-11

Family

ID=8828750

Family Applications (1)

Application Number Title Priority Date Filing Date
FR972401A Expired FR1402020A (fr) 1964-04-27 1964-04-27 Perfectionnements aux sources d'ions

Country Status (4)

Country Link
US (1) US3355615A (fr)
DE (1) DE1261605B (fr)
FR (1) FR1402020A (fr)
GB (1) GB1033447A (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3864575A (en) * 1970-07-25 1975-02-04 Nujeeb Hashmi Contact ionization ion source
US3660715A (en) * 1970-08-18 1972-05-02 Atomic Energy Commission Ion source with mosaic ion extraction means
US3930163A (en) * 1974-03-22 1975-12-30 Varian Associates Ion beam apparatus with separately replaceable elements
FR2279093A1 (fr) * 1974-06-28 1976-02-13 Anvar Procede et dispositif d'analyse chimique locale des solides
US3955091A (en) * 1974-11-11 1976-05-04 Accelerators, Inc. Method and apparatus for extracting well-formed, high current ion beams from a plasma source
DE2805273C3 (de) * 1978-02-08 1982-03-18 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Einrichtung zum Erzeugen eines Strahles beschleunigter Ionen durch Kontaktionisation
US4259145A (en) * 1979-06-29 1981-03-31 International Business Machines Corporation Ion source for reactive ion etching
US4833319A (en) * 1987-02-27 1989-05-23 Hughes Aircraft Company Carrier gas cluster source for thermally conditioned clusters
JP3268180B2 (ja) * 1994-11-18 2002-03-25 株式会社東芝 イオン発生装置、イオン照射装置、及び半導体装置の製造方法
US7220937B2 (en) 2000-03-17 2007-05-22 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
US7141757B2 (en) 2000-03-17 2006-11-28 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent
US6894245B2 (en) 2000-03-17 2005-05-17 Applied Materials, Inc. Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
US7196283B2 (en) * 2000-03-17 2007-03-27 Applied Materials, Inc. Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
US7030335B2 (en) * 2000-03-17 2006-04-18 Applied Materials, Inc. Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
US8048806B2 (en) 2000-03-17 2011-11-01 Applied Materials, Inc. Methods to avoid unstable plasma states during a process transition
US8617351B2 (en) 2002-07-09 2013-12-31 Applied Materials, Inc. Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
US6586886B1 (en) 2001-12-19 2003-07-01 Applied Materials, Inc. Gas distribution plate electrode for a plasma reactor
TWI283899B (en) 2002-07-09 2007-07-11 Applied Materials Inc Capacitively coupled plasma reactor with magnetic plasma control
US7470626B2 (en) 2003-05-16 2008-12-30 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7901952B2 (en) 2003-05-16 2011-03-08 Applied Materials, Inc. Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
US7910013B2 (en) 2003-05-16 2011-03-22 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7795153B2 (en) 2003-05-16 2010-09-14 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
US7452824B2 (en) 2003-05-16 2008-11-18 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
US7247218B2 (en) 2003-05-16 2007-07-24 Applied Materials, Inc. Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
US7359177B2 (en) 2005-05-10 2008-04-15 Applied Materials, Inc. Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
USD978226S1 (en) * 2020-11-10 2023-02-14 Emart International Inc Collapsible screen

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3263415A (en) * 1961-03-06 1966-08-02 Aerojet General Co Ion propulsion device
FR1327142A (fr) * 1961-04-10 1963-05-17 Du Pont Procédé de polymérisation des composés éthyléniquement non saturés et catalyseur pour ce procédé
US3185849A (en) * 1962-11-30 1965-05-25 Exxon Production Research Co Pulsed neutron source utilizing an accelerator tube

Also Published As

Publication number Publication date
GB1033447A (en) 1966-06-22
DE1261605B (de) 1968-02-22
US3355615A (en) 1967-11-28

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