FR1299243A - Procédé de détermination de l'épaisseur d'une couche épitaxiale - Google Patents

Procédé de détermination de l'épaisseur d'une couche épitaxiale

Info

Publication number
FR1299243A
FR1299243A FR871769A FR871769A FR1299243A FR 1299243 A FR1299243 A FR 1299243A FR 871769 A FR871769 A FR 871769A FR 871769 A FR871769 A FR 871769A FR 1299243 A FR1299243 A FR 1299243A
Authority
FR
France
Prior art keywords
determining
thickness
epitaxial layer
epitaxial
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR871769A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US54872A external-priority patent/US3099579A/en
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Priority to FR871769A priority Critical patent/FR1299243A/fr
Application granted granted Critical
Publication of FR1299243A publication Critical patent/FR1299243A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/16—Controlling or regulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
FR871769A 1960-09-09 1961-08-28 Procédé de détermination de l'épaisseur d'une couche épitaxiale Expired FR1299243A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR871769A FR1299243A (fr) 1960-09-09 1961-08-28 Procédé de détermination de l'épaisseur d'une couche épitaxiale

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US54872A US3099579A (en) 1960-09-09 1960-09-09 Growing and determining epitaxial layer thickness
FR871769A FR1299243A (fr) 1960-09-09 1961-08-28 Procédé de détermination de l'épaisseur d'une couche épitaxiale

Publications (1)

Publication Number Publication Date
FR1299243A true FR1299243A (fr) 1962-07-20

Family

ID=26192052

Family Applications (1)

Application Number Title Priority Date Filing Date
FR871769A Expired FR1299243A (fr) 1960-09-09 1961-08-28 Procédé de détermination de l'épaisseur d'une couche épitaxiale

Country Status (1)

Country Link
FR (1) FR1299243A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118129621A (zh) * 2024-05-08 2024-06-04 浙江求是半导体设备有限公司 晶圆外延层厚度测算方法、装置、计算机设备及存储介质

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118129621A (zh) * 2024-05-08 2024-06-04 浙江求是半导体设备有限公司 晶圆外延层厚度测算方法、装置、计算机设备及存储介质

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