FR1289687A - Matière semi-conductrice et son procédé de fabrication - Google Patents

Matière semi-conductrice et son procédé de fabrication

Info

Publication number
FR1289687A
FR1289687A FR857391A FR857391A FR1289687A FR 1289687 A FR1289687 A FR 1289687A FR 857391 A FR857391 A FR 857391A FR 857391 A FR857391 A FR 857391A FR 1289687 A FR1289687 A FR 1289687A
Authority
FR
France
Prior art keywords
manufacturing process
semiconductor material
semiconductor
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR857391A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck and Co Inc
Original Assignee
Merck and Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck and Co Inc filed Critical Merck and Co Inc
Priority to FR857391A priority Critical patent/FR1289687A/fr
Application granted granted Critical
Publication of FR1289687A publication Critical patent/FR1289687A/fr
Priority claimed from US365925A external-priority patent/US3226269A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • H01L29/045Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0688Integrated circuits having a three-dimensional layout
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
FR857391A 1960-03-31 1961-03-30 Matière semi-conductrice et son procédé de fabrication Expired FR1289687A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR857391A FR1289687A (fr) 1960-03-31 1961-03-30 Matière semi-conductrice et son procédé de fabrication

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US1905460A 1960-03-31 1960-03-31
US5357560A 1960-08-24 1960-08-24
FR857391A FR1289687A (fr) 1960-03-31 1961-03-30 Matière semi-conductrice et son procédé de fabrication
US365925A US3226269A (en) 1960-03-31 1964-05-12 Monocrystalline elongate polyhedral semiconductor material

Publications (1)

Publication Number Publication Date
FR1289687A true FR1289687A (fr) 1962-04-06

Family

ID=27445291

Family Applications (1)

Application Number Title Priority Date Filing Date
FR857391A Expired FR1289687A (fr) 1960-03-31 1961-03-30 Matière semi-conductrice et son procédé de fabrication

Country Status (1)

Country Link
FR (1) FR1289687A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1211723B (de) * 1962-11-27 1966-03-03 Siemens Ag Verfahren zur Herstellung von Halbleiterbauelementen
DE1229648B (de) * 1961-06-27 1966-12-01 Siemens Ag Als Halbleiter-Festkoerperschaltkreis ausgebildete integrierte Graetz-Gleichrichteranordnung

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1229648B (de) * 1961-06-27 1966-12-01 Siemens Ag Als Halbleiter-Festkoerperschaltkreis ausgebildete integrierte Graetz-Gleichrichteranordnung
DE1211723B (de) * 1962-11-27 1966-03-03 Siemens Ag Verfahren zur Herstellung von Halbleiterbauelementen
DE1211723C2 (de) * 1962-11-27 1966-09-08 Siemens Ag Verfahren zur Herstellung von Halbleiterbauelementen

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