FR1159952A - Nouveau polymère photosensible et ses applications industrielles - Google Patents
Nouveau polymère photosensible et ses applications industriellesInfo
- Publication number
- FR1159952A FR1159952A FR1159952DA FR1159952A FR 1159952 A FR1159952 A FR 1159952A FR 1159952D A FR1159952D A FR 1159952DA FR 1159952 A FR1159952 A FR 1159952A
- Authority
- FR
- France
- Prior art keywords
- vinyl
- acid
- copolymers
- cinnamic
- cinnamate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/283—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing one or more carboxylic moiety in the chain, e.g. acetoacetoxyethyl(meth)acrylate
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Medical Uses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US525367A US2861058A (en) | 1955-07-29 | 1955-07-29 | Light-sensitive polymers for making printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1159952A true FR1159952A (fr) | 1958-07-04 |
Family
ID=24092954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1159952D Expired FR1159952A (fr) | 1955-07-29 | 1956-07-27 | Nouveau polymère photosensible et ses applications industrielles |
Country Status (5)
Country | Link |
---|---|
US (1) | US2861058A (fr) |
BE (1) | BE549816A (fr) |
DE (1) | DE1080403B (fr) |
FR (1) | FR1159952A (fr) |
GB (2) | GB843543A (fr) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3072485A (en) * | 1960-08-24 | 1963-01-08 | Eastman Kodak Co | Optically sensitized azido polymers for photomechanical resist compositions |
US3147116A (en) * | 1961-11-28 | 1964-09-01 | Gen Aniline & Film Corp | Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate |
BE627820A (fr) * | 1962-02-01 | |||
US3357831A (en) * | 1965-06-21 | 1967-12-12 | Harris Intertype Corp | Photopolymer |
US4480080A (en) * | 1983-01-31 | 1984-10-30 | Eastman Kodak Company | Vinyl-ester polymeric timing layer for color transfer assemblages |
DE3404366A1 (de) * | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
US4734476A (en) * | 1985-06-18 | 1988-03-29 | Chisso Corporation | Photo-setting resin composition |
JPH0678461B2 (ja) * | 1986-01-08 | 1994-10-05 | 日本ペイント株式会社 | 塗料用アクリル樹脂組成物 |
US5597677A (en) * | 1994-11-02 | 1997-01-28 | Minnesota Mining And Manufacturing Company | Photoimageable elements |
US5563023A (en) * | 1994-11-02 | 1996-10-08 | Minnesota Mining And Manufacturing Co. | Photoimageable elements |
WO1996034316A1 (fr) * | 1995-04-27 | 1996-10-31 | Minnesota Mining And Manufacturing Company | Plaques d'impression sans traitement ulterieur, agissant comme un negatif |
US5925497A (en) * | 1995-04-27 | 1999-07-20 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
EP0778292A3 (fr) * | 1995-12-04 | 1998-11-04 | Bayer Corporation | Méthode pour préparer des acétals polyvinyliques modifiés par des anhydrides utilisables dans des compositions photosensibles |
US6596456B2 (en) | 2001-05-29 | 2003-07-22 | Kodak Polychrome Graphics Llc | Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates |
US6517988B1 (en) | 2001-07-12 | 2003-02-11 | Kodak Polychrome Graphics Llc | Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
CN102608867B (zh) * | 2012-03-27 | 2014-04-02 | 惠州联大电子材料有限公司 | 感光水显影抗蚀组合物及感光水显影抗蚀干膜 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2484431A (en) * | 1948-07-17 | 1949-10-11 | Eastman Kodak Co | Method of making hydrolyzed cellulose acetate printing plates |
US2732297A (en) * | 1948-11-03 | 1956-01-24 | Decorating ceramic objects | |
US2611763A (en) * | 1948-12-23 | 1952-09-23 | Gen Aniline & Film Corp | Amphoteric vinyl interpolymers |
US2725372A (en) * | 1951-01-20 | 1955-11-29 | Eastman Kodak Co | Light sensitive unsaturated esters of polyvinyl alcohol |
US2670287A (en) * | 1951-01-20 | 1954-02-23 | Eastman Kodak Co | Photosensitization of polymeric cinnamic acid esters |
US2732301A (en) * | 1952-10-15 | 1956-01-24 | Chxcxch | |
NL92615C (fr) * | 1953-05-28 | |||
US2697039A (en) * | 1953-10-26 | 1954-12-14 | Eastman Kodak Co | Preparation of lithographic printing plates |
-
0
- BE BE549816D patent/BE549816A/xx unknown
-
1955
- 1955-07-29 US US525367A patent/US2861058A/en not_active Expired - Lifetime
-
1956
- 1956-07-25 DE DEE12724A patent/DE1080403B/de active Pending
- 1956-07-27 FR FR1159952D patent/FR1159952A/fr not_active Expired
- 1956-07-30 GB GB23399/56A patent/GB843543A/en not_active Expired
- 1956-07-30 GB GB1208/60A patent/GB843545A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US2861058A (en) | 1958-11-18 |
DE1080403B (de) | 1960-04-21 |
BE549816A (fr) | |
GB843543A (en) | 1960-08-04 |
GB843545A (en) | 1960-08-04 |
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