FR1103208A - Procédé photomécanique et produits obtenus - Google Patents

Procédé photomécanique et produits obtenus

Info

Publication number
FR1103208A
FR1103208A FR1103208DA FR1103208A FR 1103208 A FR1103208 A FR 1103208A FR 1103208D A FR1103208D A FR 1103208DA FR 1103208 A FR1103208 A FR 1103208A
Authority
FR
France
Prior art keywords
products obtained
photomechanical process
photomechanical
products
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Inventor
Hans Horner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Freundorfer K G
Original Assignee
Freundorfer K G
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Freundorfer K G filed Critical Freundorfer K G
Application granted granted Critical
Publication of FR1103208A publication Critical patent/FR1103208A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyamides (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR1103208D 1953-06-26 1954-06-26 Procédé photomécanique et produits obtenus Expired FR1103208A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE330160X 1953-06-26

Publications (1)

Publication Number Publication Date
FR1103208A true FR1103208A (fr) 1955-10-31

Family

ID=6188609

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1103208D Expired FR1103208A (fr) 1953-06-26 1954-06-26 Procédé photomécanique et produits obtenus

Country Status (4)

Country Link
US (1) US3060027A (fr)
CH (1) CH330160A (fr)
FR (1) FR1103208A (fr)
GB (1) GB769441A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1262775B (de) * 1956-04-12 1968-03-07 Du Pont Photopolymerisierbare Masse zur Herstellung von Druckklischees

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1244581B (de) * 1959-04-06 1967-07-13 Basf Ag Verfahren zur fotomechanischen Herstellung von Druckformen und Oberflaechenreliefs aus Hochpolymeren
US3271150A (en) * 1963-04-01 1966-09-06 Eastman Kodak Co Photographic printing plate
US3271149A (en) * 1964-11-27 1966-09-06 Eastman Kodak Co Relief printing plate
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE734457C (de) * 1939-02-26 1943-04-16 Ig Farbenindustrie Ag Verfahren zum Herstellen von lichtempfindlichem Material
NL56638C (fr) * 1939-09-25
US2388880A (en) * 1941-08-14 1945-11-13 United States Gypsum Co Method of manufacturing surface ornamented acoustical tile
US2484529A (en) * 1944-09-27 1949-10-11 Du Pont Process for altering the properties of solid polymers of ethylene
NL101499C (fr) * 1951-08-20
US2772160A (en) * 1952-03-21 1956-11-27 Eastman Kodak Co Light-detached resists or reliefs for printing plates
US2892712A (en) * 1954-04-23 1959-06-30 Du Pont Process for preparing relief images
US2951305A (en) * 1956-11-28 1960-09-06 Gen Tire & Rubber Co Method of dulling a polyethylene terephthalate film surface
US2997391A (en) * 1957-04-22 1961-08-22 Time Inc Photosensitive polyamide resins containing stilbene units in the molecule

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1262775B (de) * 1956-04-12 1968-03-07 Du Pont Photopolymerisierbare Masse zur Herstellung von Druckklischees

Also Published As

Publication number Publication date
US3060027A (en) 1962-10-23
CH330160A (de) 1958-05-31
GB769441A (en) 1957-03-06

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