FI920475A0 - A method of doping a base material with a doping material to produce a chemical compound or alloy using a sputtering cathode and apparatus for carrying out the method - Google Patents
A method of doping a base material with a doping material to produce a chemical compound or alloy using a sputtering cathode and apparatus for carrying out the methodInfo
- Publication number
- FI920475A0 FI920475A0 FI920475A FI920475A FI920475A0 FI 920475 A0 FI920475 A0 FI 920475A0 FI 920475 A FI920475 A FI 920475A FI 920475 A FI920475 A FI 920475A FI 920475 A0 FI920475 A0 FI 920475A0
- Authority
- FI
- Finland
- Prior art keywords
- doping
- alloy
- carrying
- produce
- chemical compound
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4107711 | 1991-03-09 | ||
DE19914107711 DE4107711C2 (en) | 1991-03-09 | 1991-03-09 | Method and device for depositing doped layers or chemical compounds or alloys using a magnetron cathode |
Publications (4)
Publication Number | Publication Date |
---|---|
FI920475A0 true FI920475A0 (en) | 1992-02-04 |
FI920475A FI920475A (en) | 1992-09-10 |
FI99029B FI99029B (en) | 1997-06-13 |
FI99029C FI99029C (en) | 1997-09-25 |
Family
ID=6426953
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI920475A FI99029C (en) | 1991-03-09 | 1992-02-04 | Process for doping basic material with doping material for preparing a chemical compound or alloy by means of a sputtering cathode and device for carrying out the process |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH0578837A (en) |
BE (1) | BE1004534A3 (en) |
CH (1) | CH684950A5 (en) |
DE (1) | DE4107711C2 (en) |
FI (1) | FI99029C (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19813075A1 (en) * | 1998-03-25 | 1999-09-30 | Leybold Ag | Device for coating a substrate |
CN101401190B (en) * | 2005-10-26 | 2011-10-05 | 夏普株式会社 | Process for producing film using atmospheric pressure hydrogen plasma, and method and apparatus for producing purification film |
JP4750619B2 (en) * | 2006-05-09 | 2011-08-17 | 株式会社昭和真空 | Magnetron cathode and sputtering equipment equipped with it |
JP7045177B2 (en) * | 2017-12-12 | 2022-03-31 | 株式会社アルバック | Spattering equipment |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU491734A1 (en) * | 1971-11-18 | 1975-11-15 | ||
US4166018A (en) * | 1974-01-31 | 1979-08-28 | Airco, Inc. | Sputtering process and apparatus |
DD118304A1 (en) * | 1975-04-08 | 1976-02-20 | ||
SU620513A1 (en) * | 1976-12-30 | 1978-07-12 | Предприятие П/Я В-2763 | Cathode assembly |
DE3248121A1 (en) * | 1982-12-24 | 1984-06-28 | Leybold-Heraeus GmbH, 5000 Köln | HIGH-PERFORMANCE CATODE ARRANGEMENT FOR THE PRODUCTION OF MULTIPLE LAYERS |
US4486287A (en) * | 1984-02-06 | 1984-12-04 | Fournier Paul R | Cross-field diode sputtering target assembly |
EP0246765A3 (en) * | 1986-05-15 | 1988-12-14 | Varian Associates, Inc. | Apparatus and method for manufacturing planarized aluminium films |
JP2566137B2 (en) * | 1986-12-25 | 1996-12-25 | ティーディーケイ株式会社 | Thin film manufacturing method |
US4865710A (en) * | 1988-03-31 | 1989-09-12 | Wisconsin Alumni Research Foundation | Magnetron with flux switching cathode and method of operation |
DE3812379A1 (en) * | 1988-04-14 | 1989-10-26 | Leybold Ag | SPRAYING CATHODE ACCORDING TO THE MAGNETRON PRINCIPLE |
JPH02179871A (en) * | 1988-12-28 | 1990-07-12 | Matsushita Electric Ind Co Ltd | Formation of thin film and magnetron sputtering device |
DE3929695C2 (en) * | 1989-09-07 | 1996-12-19 | Leybold Ag | Device for coating a substrate |
-
1991
- 1991-03-09 DE DE19914107711 patent/DE4107711C2/en not_active Expired - Fee Related
- 1991-11-20 CH CH339191A patent/CH684950A5/en not_active IP Right Cessation
-
1992
- 1992-01-15 BE BE9200036A patent/BE1004534A3/en not_active IP Right Cessation
- 1992-02-04 FI FI920475A patent/FI99029C/en active
- 1992-03-09 JP JP5035392A patent/JPH0578837A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CH684950A5 (en) | 1995-02-15 |
DE4107711A1 (en) | 1992-09-10 |
FI920475A (en) | 1992-09-10 |
DE4107711C2 (en) | 1999-11-11 |
FI99029B (en) | 1997-06-13 |
JPH0578837A (en) | 1993-03-30 |
BE1004534A3 (en) | 1992-12-08 |
FI99029C (en) | 1997-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BB | Publication of examined application |