DD118304A1 - - Google Patents
Info
- Publication number
- DD118304A1 DD118304A1 DD18529275A DD18529275A DD118304A1 DD 118304 A1 DD118304 A1 DD 118304A1 DD 18529275 A DD18529275 A DD 18529275A DD 18529275 A DD18529275 A DD 18529275A DD 118304 A1 DD118304 A1 DD 118304A1
- Authority
- DD
- German Democratic Republic
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD18529275A DD118304A1 (en) | 1975-04-08 | 1975-04-08 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD18529275A DD118304A1 (en) | 1975-04-08 | 1975-04-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
DD118304A1 true DD118304A1 (en) | 1976-02-20 |
Family
ID=5499841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DD18529275A DD118304A1 (en) | 1975-04-08 | 1975-04-08 |
Country Status (1)
Country | Link |
---|---|
DD (1) | DD118304A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4107711A1 (en) * | 1991-03-09 | 1992-09-10 | Leybold Ag | Material doping by magnetron sputtering - using separate plasmas for different target portions |
-
1975
- 1975-04-08 DD DD18529275A patent/DD118304A1/xx unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4107711A1 (en) * | 1991-03-09 | 1992-09-10 | Leybold Ag | Material doping by magnetron sputtering - using separate plasmas for different target portions |
DE4107711C2 (en) * | 1991-03-09 | 1999-11-11 | Leybold Ag | Method and device for depositing doped layers or chemical compounds or alloys using a magnetron cathode |