FI823010A7 - Menetelmä metallittomien kaistojen valmistamiseksi metalloitaessa eristysnauhaa ja laite menetelmän suorisuorittamiseksi. - Google Patents

Menetelmä metallittomien kaistojen valmistamiseksi metalloitaessa eristysnauhaa ja laite menetelmän suorisuorittamiseksi. Download PDF

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Publication number
FI823010A7
FI823010A7 FI823010A FI823010A FI823010A7 FI 823010 A7 FI823010 A7 FI 823010A7 FI 823010 A FI823010 A FI 823010A FI 823010 A FI823010 A FI 823010A FI 823010 A7 FI823010 A7 FI 823010A7
Authority
FI
Finland
Prior art keywords
insulating tape
producing metal
directly performing
free strips
metallizing
Prior art date
Application number
FI823010A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Other versions
FI823010A0 (fi
FI823010L (fi
Inventor
Anselm Neuwald
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of FI823010A0 publication Critical patent/FI823010A0/fi
Publication of FI823010L publication Critical patent/FI823010L/fi
Publication of FI823010A7 publication Critical patent/FI823010A7/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Physical Vapour Deposition (AREA)
FI823010A 1981-09-01 1982-08-31 Menetelmä metallittomien kaistojen valmistamiseksi metalloitaessa eristysnauhaa ja laite menetelmän suorisuorittamiseksi. FI823010A7 (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3134589 1981-09-01
DE19823224234 DE3224234A1 (de) 1981-09-01 1982-06-29 Verfahren zur herstellung von metallfreien streifen bei der metallbedampfung eines isolierstoffbandes und vorrichtung zur durchfuehrung des verfahrens

Publications (3)

Publication Number Publication Date
FI823010A0 FI823010A0 (fi) 1982-08-31
FI823010L FI823010L (fi) 1983-03-02
FI823010A7 true FI823010A7 (fi) 1983-03-02

Family

ID=25795689

Family Applications (1)

Application Number Title Priority Date Filing Date
FI823010A FI823010A7 (fi) 1981-09-01 1982-08-31 Menetelmä metallittomien kaistojen valmistamiseksi metalloitaessa eristysnauhaa ja laite menetelmän suorisuorittamiseksi.

Country Status (5)

Country Link
US (1) US4478878A (https=)
EP (1) EP0073949A3 (https=)
DE (1) DE3224234A1 (https=)
ES (1) ES8305841A1 (https=)
FI (1) FI823010A7 (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4681780A (en) * 1983-12-01 1987-07-21 Polaroid Corporation Continuously cleaned rotary coating mask
JPS6173875A (ja) * 1984-09-17 1986-04-16 Mitsubishi Heavy Ind Ltd 流路幅調整板付き真空蒸着装置
US4682565A (en) * 1984-11-19 1987-07-28 Sfe Technologies Vapor nozzle with gas barrier bars
DE3514824A1 (de) * 1985-04-24 1986-11-06 Siemens Ag Verfahren zur bildung von schmalen, metallfreien streifen in der metallschicht von kunststoffolien
DE3922187A1 (de) * 1989-07-06 1991-01-17 Leybold Ag Vorrichtung zum herstellen von metallfreien streifen bei im vakuum beschichteten folienbahnen, insbesondere fuer kondensatoren
EP0488535A3 (en) * 1990-11-08 1992-09-23 Bmc Technology Corporation Method and apparatus for manufacturing electrodes for multilayer ceramic capacitors
DE4310085A1 (de) * 1993-03-27 1994-09-29 Leybold Ag Verfahren und Vorrichtung zur Erzeugung von Mustern auf Substraten
US5512315A (en) * 1994-06-01 1996-04-30 Roederstein Electronics, Inc. Capacitor manufacturing technique
DE19527604A1 (de) * 1995-07-28 1997-01-30 Leybold Ag Verfahren und Vorrichtung zur Herstellung von metallfreien Streifen bei der Metallbedampfung
DE19912707B4 (de) * 1999-03-20 2010-01-21 Applied Materials Gmbh & Co. Kg Behandlungsanlage für flache Substrate
DE10008097A1 (de) * 2000-02-22 2001-09-20 Forschungszentrum Juelich Gmbh Markierungseinrichtung sowie Verfahren zum Auslesen einer solchen Markierungseinrichtung
EP1917842B1 (en) * 2005-08-26 2015-03-11 FUJIFILM Manufacturing Europe B.V. Method and arrangement for generating and controlling a discharge plasma
DE05425831T1 (de) 2005-11-23 2007-01-04 Galileo Vacuum Systems S.P.A. Kammer zur Metallisierung unter Vakuum mit Vorrichtungen zur partiellen Beschichtung
JP2009538989A (ja) * 2006-05-30 2009-11-12 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． パルス化大気圧グロー放電を使用する堆積の方法及び装置
EP2032738A1 (en) * 2006-06-16 2009-03-11 Fuji Film Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
US8338307B2 (en) * 2007-02-13 2012-12-25 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
EP1975272A1 (en) 2007-03-27 2008-10-01 Galileo Vacuum Systems S.p.A. Device for vacuum deposition of a coating on a continuous material, with liquid applicator
DE102007027435A1 (de) * 2007-06-14 2008-12-18 X-Fab Semiconductor Foundries Ag Verfahren und Vorrichtung zur strukturierten Schichtabscheidung auf prozessierten Mikrosystemtechnikwafern
DE102007031457A1 (de) 2007-07-05 2009-01-08 Leybold Optics Gmbh Verfahren und Vorrichtung zur Aufbringung einer Schicht eines Trennmittels auf ein Substrat
EP2235735B1 (en) * 2008-02-01 2015-09-30 Fujifilm Manufacturing Europe B.V. Method and apparatus for plasma surface treatment of a moving substrate
US8445897B2 (en) * 2008-02-08 2013-05-21 Fujifilm Manufacturing Europe B.V. Method for manufacturing a multi-layer stack structure with improved WVTR barrier property

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB836991A (en) * 1955-12-05 1960-06-09 Telephone Mfg Co Ltd Improvements in and relating to coating extended supports
DE1262732B (de) * 1962-07-04 1968-03-07 Siemens Ag Vorrichtung zum gleichzeitigen Aufdampfen von mehreren parallelen Streifen aus fluessigen oder fettartigen Stoffen mit niedrigem Dampfdruck auf insbesondere fuer die Herstellung elektrischer Kondensatoren bestimmten Baendern als Abdeckmittel fuer eine nachfolgende Metallbedampfung
DE1521588A1 (de) * 1966-12-05 1969-09-18 Lokomotivbau Elektrotech Einrichtung zum Schutz gegen Bedampfung in Vakuumschmelz- und-verdampfungsanlagen
DE2112405A1 (de) * 1971-03-15 1972-09-21 Siemens Ag Vorrichtung zum Erzeugen metallisierter Laengsstreifen auf Folien
DE2652438B2 (de) * 1976-11-17 1978-08-31 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung von metallfreien Streifen bei der Metallbedampfung eines Isolierstoffbandes und Vorrichtung zu dessen Durchführung

Also Published As

Publication number Publication date
DE3224234A1 (de) 1983-03-10
ES515390A0 (es) 1983-05-01
EP0073949A2 (de) 1983-03-16
FI823010A0 (fi) 1982-08-31
FI823010L (fi) 1983-03-02
US4478878A (en) 1984-10-23
ES8305841A1 (es) 1983-05-01
DE3224234C2 (https=) 1988-01-14
EP0073949A3 (de) 1984-01-11

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Legal Events

Date Code Title Description
FA Application withdrawn [patent]

Owner name: SIEMENS AKTIENGESELLSCHAFT