FI44760B - - Google Patents

Info

Publication number
FI44760B
FI44760B FI2820/66A FI282066A FI44760B FI 44760 B FI44760 B FI 44760B FI 2820/66 A FI2820/66 A FI 2820/66A FI 282066 A FI282066 A FI 282066A FI 44760 B FI44760 B FI 44760B
Authority
FI
Finland
Application number
FI2820/66A
Other languages
Finnish (fi)
Other versions
FI44760C (fi
Inventor
H Rauhut
R Moraw
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of FI44760B publication Critical patent/FI44760B/fi
Application granted granted Critical
Publication of FI44760C publication Critical patent/FI44760C/fi

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/06Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/61Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155Organic compounds therefor
FI662820A 1965-10-27 1966-10-25 Menetelmä loivan sävyasteikon omaavien jäljennöksien valmistamiseksi. FI44760C (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK57503A DE1286897B (de) 1965-10-27 1965-10-27 Zweikomponentendiazotypiematerial

Publications (2)

Publication Number Publication Date
FI44760B true FI44760B (xx) 1971-08-31
FI44760C FI44760C (fi) 1971-12-10

Family

ID=7228277

Family Applications (1)

Application Number Title Priority Date Filing Date
FI662820A FI44760C (fi) 1965-10-27 1966-10-25 Menetelmä loivan sävyasteikon omaavien jäljennöksien valmistamiseksi.

Country Status (13)

Country Link
US (1) US3498791A (xx)
AT (1) AT272829B (xx)
BE (1) BE688795A (xx)
CH (1) CH472696A (xx)
DE (1) DE1286897B (xx)
DK (1) DK115165B (xx)
ES (1) ES332784A1 (xx)
FI (1) FI44760C (xx)
FR (1) FR1499551A (xx)
GB (1) GB1151368A (xx)
NL (1) NL150921B (xx)
SE (1) SE349154B (xx)
YU (1) YU32918B (xx)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3998812A (en) * 1968-04-19 1976-12-21 Hoechst Aktiengesellschaft Styryl-pyrazoline compounds
US4306007A (en) * 1978-03-13 1981-12-15 Am International, Inc. Process of making and using fade-resistant diazo microfilm
DE3127668A1 (de) * 1981-07-13 1983-01-20 Hoechst Ag, 6000 Frankfurt Verfahren und loesung zum konservieren von flachdruckformen
DE3307364A1 (de) * 1983-03-02 1984-09-06 Hoechst Ag, 6230 Frankfurt Zweikomponenten-diazontypiematerial
DE3830914A1 (de) * 1988-09-10 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von kopien

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2432549A (en) * 1945-12-12 1947-12-16 Gen Aniline & Film Corp Diazotype layers containing thiourea derivatives of hydroxy benzene
GB643042A (en) * 1946-12-28 1950-09-15 Gen Aniline & Film Corp Method of producing diazotype images and improved diazotype materials therefor
GB669590A (en) * 1949-06-03 1952-04-02 Ilford Ltd Improvements in or relating to a process for improving the whiteness of colour materials
BE579138A (xx) * 1958-07-10
NL261878A (xx) * 1960-03-02
BE625148A (xx) * 1961-11-22
NL290832A (xx) * 1962-03-31
US3365296A (en) * 1964-05-18 1968-01-23 Gen Aniline & Film Corp Light-sensitive ultraviolet absorbing compounds and diazotype materials containing the same

Also Published As

Publication number Publication date
NL6614573A (xx) 1967-04-28
AT272829B (de) 1969-07-25
CH472696A (de) 1969-05-15
US3498791A (en) 1970-03-03
DE1286897B (de) 1969-01-09
ES332784A1 (es) 1967-07-16
NL150921B (nl) 1976-09-15
FI44760C (fi) 1971-12-10
YU32918B (en) 1975-12-31
YU200666A (en) 1975-06-30
GB1151368A (en) 1969-05-07
DK115165B (da) 1969-09-08
SE349154B (xx) 1972-09-18
FR1499551A (fr) 1967-10-27
BE688795A (xx) 1967-04-24

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