FI20155675A - Menetelmä ja laitteisto pinnan korkeuden mittaamiseksi - Google Patents
Menetelmä ja laitteisto pinnan korkeuden mittaamiseksiInfo
- Publication number
- FI20155675A FI20155675A FI20155675A FI20155675A FI20155675A FI 20155675 A FI20155675 A FI 20155675A FI 20155675 A FI20155675 A FI 20155675A FI 20155675 A FI20155675 A FI 20155675A FI 20155675 A FI20155675 A FI 20155675A
- Authority
- FI
- Finland
- Prior art keywords
- measuring surface
- surface elevation
- elevation
- measuring
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/22—Measuring arrangements characterised by the use of optical techniques for measuring depth
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20155675A FI127908B (fi) | 2015-09-22 | 2015-09-22 | Menetelmä ja laitteisto pinnan korkeuden mittaamiseksi |
PCT/FI2016/050657 WO2017051074A1 (en) | 2015-09-22 | 2016-09-21 | Method and apparatus for measuring the height of a surface |
EP16774698.1A EP3353489B1 (en) | 2015-09-22 | 2016-09-21 | Method and apparatus for measuring the height of a surface |
US15/760,796 US11047674B2 (en) | 2015-09-22 | 2016-09-21 | Method and apparatus for measuring the height of a surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20155675A FI127908B (fi) | 2015-09-22 | 2015-09-22 | Menetelmä ja laitteisto pinnan korkeuden mittaamiseksi |
Publications (2)
Publication Number | Publication Date |
---|---|
FI20155675A true FI20155675A (fi) | 2017-03-23 |
FI127908B FI127908B (fi) | 2019-05-15 |
Family
ID=57042901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20155675A FI127908B (fi) | 2015-09-22 | 2015-09-22 | Menetelmä ja laitteisto pinnan korkeuden mittaamiseksi |
Country Status (4)
Country | Link |
---|---|
US (1) | US11047674B2 (fi) |
EP (1) | EP3353489B1 (fi) |
FI (1) | FI127908B (fi) |
WO (1) | WO2017051074A1 (fi) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114160961A (zh) * | 2021-12-14 | 2022-03-11 | 深圳快造科技有限公司 | 用于标定激光加工参数的系统和方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112832958B (zh) * | 2021-02-20 | 2024-03-08 | 中国华能集团清洁能源技术研究院有限公司 | 一种基于光色散的风机塔筒倾斜监测装置及方法 |
CN116385437B (zh) * | 2023-06-05 | 2023-08-25 | 山东中清智能科技股份有限公司 | 一种多视角的多图像融合方法及装置 |
Family Cites Families (44)
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JPH0762913B2 (ja) * | 1984-08-17 | 1995-07-05 | 株式会社日立製作所 | 自動焦点制御方法 |
DE3435033A1 (de) * | 1984-09-24 | 1986-04-03 | Guido-Georg 8013 Haar Reinert | Lichtschnittverfahren zur optischen oder optoelektronischen abstands- bzw. tiefenmessung und oberflaechenpruefung |
CH671828A5 (fi) * | 1987-06-26 | 1989-09-29 | Battelle Memorial Institute | |
US5581345A (en) * | 1990-12-03 | 1996-12-03 | Nikon Corporation | Confocal laser scanning mode interference contrast microscope, and method of measuring minute step height and apparatus with said microscope |
NL9100205A (nl) * | 1991-02-06 | 1992-09-01 | Philips Nv | Inrichting voor het optisch meten van de hoogte van een oppervlak. |
US5696589A (en) * | 1996-05-20 | 1997-12-09 | Lockheed Martin Energy Systems, Inc. | Optical caliper with compensation for specimen deflection and method |
US6208465B1 (en) | 1997-04-25 | 2001-03-27 | Galore Scantec Ltd. | Method and apparatus for imaging an object by diffractive autofocus |
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US7061601B2 (en) * | 1999-07-02 | 2006-06-13 | Kla-Tencor Technologies Corporation | System and method for double sided optical inspection of thin film disks or wafers |
KR100406843B1 (ko) * | 2001-04-06 | 2003-11-21 | (주) 인텍플러스 | 색정보를 이용한 실시간 3차원 표면형상 측정방법 및 장치 |
JP4153433B2 (ja) * | 2002-03-28 | 2008-09-24 | 株式会社高井製作所 | 物体のゲル状態またはゾル−ゲル状態変化の評価方法および装置 |
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WO2005121700A1 (de) * | 2004-06-08 | 2005-12-22 | Micro-Epsilon Messtechnik Gmbh & Co. Kg | Vorrichtung und verfahren zum prüfen von oberflächen im inneren von löchern |
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DE102005023351A1 (de) * | 2005-05-17 | 2006-11-30 | Micro-Epsilon Messtechnik Gmbh & Co Kg | Vorrichtung und Verfahren zum Vermessen von Oberflächen |
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RU2013125754A (ru) * | 2010-11-05 | 2014-12-10 | Фридом Медитек, Инк. | Усовершенствованный алгоритм для обнаружения диабета |
WO2012076216A1 (en) * | 2010-12-06 | 2012-06-14 | Asml Netherlands B.V. | Methods and apparatus for inspection of articles, euv lithography reticles, lithography apparatus and method of manufacturing devices |
JP2012137350A (ja) | 2010-12-27 | 2012-07-19 | Hitachi High-Technologies Corp | 欠陥検査方法および欠陥検査装置 |
US9164247B2 (en) * | 2011-07-28 | 2015-10-20 | Source Photonics, Inc. | Apparatuses for reducing the sensitivity of an optical signal to polarization and methods of making and using the same |
CA2877407C (en) * | 2012-06-21 | 2017-08-08 | Huawei Technologies Co., Ltd. | Tunable optical filter, tunable optical component, and multi-wavelength passive optical network system |
FI125408B (fi) * | 2012-09-17 | 2015-09-30 | Focalspec Oy | Menetelmä ja mittalaite pinnan etäisyyden, kohteen paksuuden ja optisten ominaisuuksien mittaamiseksi |
US20140268146A1 (en) * | 2013-03-15 | 2014-09-18 | Michele Hinnrichs | Lenslet array with integral tuned optical bandpass filter and polarization |
US9673908B2 (en) * | 2013-06-19 | 2017-06-06 | The University Of Sydney | Device and a method for generating an electrical signal with a suppressed frequency band |
DE102013113265B4 (de) * | 2013-11-29 | 2019-03-07 | Grintech Gmbh | Vorrichtung zur berührungslosen optischen Abstandsmessung |
US9675430B2 (en) * | 2014-08-15 | 2017-06-13 | Align Technology, Inc. | Confocal imaging apparatus with curved focal surface |
US10504386B2 (en) * | 2015-01-27 | 2019-12-10 | Align Technology, Inc. | Training method and system for oral-cavity-imaging-and-modeling equipment |
US10507087B2 (en) * | 2016-07-27 | 2019-12-17 | Align Technology, Inc. | Methods and apparatuses for forming a three-dimensional volumetric model of a subject's teeth |
-
2015
- 2015-09-22 FI FI20155675A patent/FI127908B/fi active IP Right Grant
-
2016
- 2016-09-21 US US15/760,796 patent/US11047674B2/en active Active
- 2016-09-21 EP EP16774698.1A patent/EP3353489B1/en active Active
- 2016-09-21 WO PCT/FI2016/050657 patent/WO2017051074A1/en active Application Filing
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114160961A (zh) * | 2021-12-14 | 2022-03-11 | 深圳快造科技有限公司 | 用于标定激光加工参数的系统和方法 |
CN114160961B (zh) * | 2021-12-14 | 2023-10-13 | 深圳快造科技有限公司 | 用于标定激光加工参数的系统和方法 |
Also Published As
Publication number | Publication date |
---|---|
US11047674B2 (en) | 2021-06-29 |
EP3353489B1 (en) | 2021-03-03 |
FI127908B (fi) | 2019-05-15 |
WO2017051074A1 (en) | 2017-03-30 |
EP3353489A1 (en) | 2018-08-01 |
US20180252516A1 (en) | 2018-09-06 |
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