FI20145433A - Menetelmä ja mittalaite Abben luvun jatkuvaksi mittaamiseksi - Google Patents

Menetelmä ja mittalaite Abben luvun jatkuvaksi mittaamiseksi

Info

Publication number
FI20145433A
FI20145433A FI20145433A FI20145433A FI20145433A FI 20145433 A FI20145433 A FI 20145433A FI 20145433 A FI20145433 A FI 20145433A FI 20145433 A FI20145433 A FI 20145433A FI 20145433 A FI20145433 A FI 20145433A
Authority
FI
Finland
Prior art keywords
abbetal
procedure
measuring device
continuous measurement
measurement
Prior art date
Application number
FI20145433A
Other languages
English (en)
Swedish (sv)
Other versions
FI127243B (fi
Inventor
Esko Kamrat
Original Assignee
Janesko Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Janesko Oy filed Critical Janesko Oy
Priority to FI20145433A priority Critical patent/FI127243B/fi
Priority to US14/702,364 priority patent/US9632025B2/en
Publication of FI20145433A publication Critical patent/FI20145433A/fi
Application granted granted Critical
Publication of FI127243B publication Critical patent/FI127243B/fi

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/43—Refractivity; Phase-affecting properties, e.g. optical path length by measuring critical angle
    • G01N21/431—Dip refractometers, e.g. using optical fibres
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/43—Refractivity; Phase-affecting properties, e.g. optical path length by measuring critical angle
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/43—Refractivity; Phase-affecting properties, e.g. optical path length by measuring critical angle
    • G01N2021/434—Dipping block in contact with sample, e.g. prism
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
FI20145433A 2014-05-13 2014-05-13 Menetelmä ja mittalaite Abben luvun jatkuvaksi mittaamiseksi FI127243B (fi)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FI20145433A FI127243B (fi) 2014-05-13 2014-05-13 Menetelmä ja mittalaite Abben luvun jatkuvaksi mittaamiseksi
US14/702,364 US9632025B2 (en) 2014-05-13 2015-05-01 Method and measuring device for continuously measuring the abbe number

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20145433A FI127243B (fi) 2014-05-13 2014-05-13 Menetelmä ja mittalaite Abben luvun jatkuvaksi mittaamiseksi

Publications (2)

Publication Number Publication Date
FI20145433A true FI20145433A (fi) 2015-11-14
FI127243B FI127243B (fi) 2018-02-15

Family

ID=54538279

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20145433A FI127243B (fi) 2014-05-13 2014-05-13 Menetelmä ja mittalaite Abben luvun jatkuvaksi mittaamiseksi

Country Status (2)

Country Link
US (1) US9632025B2 (fi)
FI (1) FI127243B (fi)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI20185566A1 (fi) 2018-06-21 2019-12-22 Janesko Oy Valaistusjärjestely optista laitetta varten refraktioindeksin mittaamiseksi, ja refraktiometri
DE102019108561A1 (de) * 2019-04-02 2020-10-08 Endress+Hauser Process Solutions (Deutschland) GmbH Refraktometer und Verfahren zur Bestimmung des Brechungsindex eines Prozessmediums mit einem Refraktometer

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2536537A1 (fr) 1982-11-22 1984-05-25 Alexandre Laugier Procede et refractometre pour mesurer l'indice de refraction d'un liquide et application a la mesure du titre alcoometrique en puissance d'un mout
EP0133607B1 (fr) * 1983-08-03 1988-11-23 Stanley Electric Co., Ltd. Réfractomètre pour mesurer l'indice de réfraction d'un liquide
US4699511A (en) 1985-04-03 1987-10-13 Seaver George A Refraction sensor
US4844608A (en) * 1987-03-23 1989-07-04 American Telephone And Telegraph Company At&T Bell Laboratories Solution monitoring procedure
DE3831346A1 (de) 1988-09-15 1990-04-05 Zeiss Carl Fa Refraktometer mit brechzahlabhaengiger aperturteilung
FI933830A0 (fi) * 1993-09-01 1993-09-01 Janesko Oy Foerfarande vid refraktometermaetning
US5502560A (en) * 1994-07-22 1996-03-26 University Of Washington Analytical sensor using grating light reflection spectroscopy
US5870185A (en) * 1996-10-21 1999-02-09 C.F.C. Technology, Inc. Apparatus and method for fluid analysis
FI108259B (fi) * 1998-01-30 2001-12-14 Janesko Oy Refraktometri
DE10025789A1 (de) 2000-05-19 2001-11-22 Schmidt & Haensch Gmbh & Co Op Refraktometer
US6396576B1 (en) * 2001-02-27 2002-05-28 Leica Microsystems Inc. Method for determining shadowline location on a photosensitive array and critical angle refractometer employing the method
US6717663B2 (en) * 2002-03-08 2004-04-06 Reichert, Inc. Optical configuration and method for differential refractive index measurements
DE20307675U1 (de) 2003-05-14 2003-10-09 Yilmaz Suekrue Mehrwellenlängen-Refraktometer
FI118864B (fi) * 2005-08-12 2008-04-15 Janesko Oy Refraktometri
US8184276B2 (en) * 2008-12-08 2012-05-22 Carl Embry Continuous index of refraction compensation method for measurements in a medium
US8687204B2 (en) * 2011-03-24 2014-04-01 Canon Kabushiki Kaisha Method and apparatus for measuring refractive index based on a ratio between a number of second fringes divided by a difference of the number of second fringes minus a number of first fringes
US9024252B2 (en) * 2012-02-21 2015-05-05 Entegris-Jetalon Solutions, Inc. Optical sensor apparatus to detect light based on the refractive index of a sample
US9194799B2 (en) * 2012-03-13 2015-11-24 Ut-Battelle, Llc Imaging based refractometers
FI20135064L (fi) * 2013-01-23 2014-07-24 Janesko Oy Menetelmä taitekertoimen mittaamiseksi ja refraktometri
GB2531726A (en) * 2014-10-27 2016-05-04 Qioptiq Ltd Compact multispectral wide angle refractive optical system

Also Published As

Publication number Publication date
US9632025B2 (en) 2017-04-25
US20150330896A1 (en) 2015-11-19
FI127243B (fi) 2018-02-15

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