FI20031653A0 - Menetelmä ja puolijohdesubstraatti kuvion siirtämiseksi vaihemaskista substraatille - Google Patents
Menetelmä ja puolijohdesubstraatti kuvion siirtämiseksi vaihemaskista substraatilleInfo
- Publication number
- FI20031653A0 FI20031653A0 FI20031653A FI20031653A FI20031653A0 FI 20031653 A0 FI20031653 A0 FI 20031653A0 FI 20031653 A FI20031653 A FI 20031653A FI 20031653 A FI20031653 A FI 20031653A FI 20031653 A0 FI20031653 A0 FI 20031653A0
- Authority
- FI
- Finland
- Prior art keywords
- substrate
- pattern
- moving
- phase mask
- semiconductor substrate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20031653A FI20031653A (fi) | 2003-11-13 | 2003-11-13 | Menetelmä ja puolijohdesubstraatti kuvion siirtämiseksi vaihemaskista substraatille |
| PCT/FI2004/000677 WO2005048338A1 (en) | 2003-11-13 | 2004-11-12 | A method and a semiconductor substrate for transferring a pattern from a phase mask to a substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20031653A FI20031653A (fi) | 2003-11-13 | 2003-11-13 | Menetelmä ja puolijohdesubstraatti kuvion siirtämiseksi vaihemaskista substraatille |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FI20031653A0 true FI20031653A0 (fi) | 2003-11-13 |
| FI20031653A FI20031653A (fi) | 2005-05-14 |
Family
ID=29558624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI20031653A FI20031653A (fi) | 2003-11-13 | 2003-11-13 | Menetelmä ja puolijohdesubstraatti kuvion siirtämiseksi vaihemaskista substraatille |
Country Status (2)
| Country | Link |
|---|---|
| FI (1) | FI20031653A (fi) |
| WO (1) | WO2005048338A1 (fi) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102445158B (zh) * | 2011-09-23 | 2013-11-27 | 清华大学 | 一种制作高温散斑的方法 |
| CN103837919B (zh) * | 2014-03-06 | 2016-03-09 | 成都贝思达光电科技有限公司 | 一种基于双层胶纳米压印的光栅结构彩色滤光膜加工方法 |
| CN111509073B (zh) * | 2019-05-30 | 2022-09-20 | 中国科学院长春光学精密机械与物理研究所 | 一种柔性光电探测器件的制备方法及柔性光电探测器件 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6380067B1 (en) * | 2000-05-31 | 2002-04-30 | Advanced Micro Devices, Inc. | Method for creating partially UV transparent anti-reflective coating for semiconductors |
| US20020139771A1 (en) * | 2001-02-22 | 2002-10-03 | Ping Jiang | Gas switching during an etch process to modulate the characteristics of the etch |
-
2003
- 2003-11-13 FI FI20031653A patent/FI20031653A/fi not_active IP Right Cessation
-
2004
- 2004-11-12 WO PCT/FI2004/000677 patent/WO2005048338A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| FI20031653A (fi) | 2005-05-14 |
| WO2005048338A1 (en) | 2005-05-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MA | Patent expired |