FI128453B - Apparatus for Processing a Surface of a Substrate - Google Patents

Apparatus for Processing a Surface of a Substrate Download PDF

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Publication number
FI128453B
FI128453B FI20175920A FI20175920A FI128453B FI 128453 B FI128453 B FI 128453B FI 20175920 A FI20175920 A FI 20175920A FI 20175920 A FI20175920 A FI 20175920A FI 128453 B FI128453 B FI 128453B
Authority
FI
Finland
Prior art keywords
nozzle head
bearing
support
nozzle
supporting structure
Prior art date
Application number
FI20175920A
Other languages
Finnish (fi)
Swedish (sv)
Other versions
FI20175920A1 (en
Inventor
Pekka Soininen
Mika Jauhiainen
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20175920A priority Critical patent/FI128453B/en
Priority to PCT/FI2018/050758 priority patent/WO2019077206A1/en
Publication of FI20175920A1 publication Critical patent/FI20175920A1/en
Application granted granted Critical
Publication of FI128453B publication Critical patent/FI128453B/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45517—Confinement of gases to vicinity of substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
    • C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45574—Nozzles for more than one gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The invention relates to an apparatus comprising a nozzle head (20) having a first end (21), a second end (22), a first side end (23), a second side end (24) and an output face (25) formed as a curved output face having a curvature axis (C). The nozzle head (20) comprises two or more precursor nozzles (26), a supporting structure (31, 32) and a fixing arrangement (51, 52). The fixing arrangement (51, 52) comprises one first fixing part (51) arranged between the first end (21) of the nozzle head (20) and the supporting structure (31, 32) and one second fixing part (52) arranged between the second end (22) of the nozzle head (20) and the supporting structure (31, 32), the one first fixing part (51) and the one second fixing part (52) are arranged on a support axis (S) parallel to the curvature axis (C).

Description

APPARATUS FOR PROCESSING A SURFACE OF A SUBSTRATE
FIELD OF THE INVENTION The present invention relates to an apparatus for processing a surface of a substrate by subjecting the surface of the substrate to successive surface reactions of at least two precursors according to the principles of atomic layer deposition (ALD), and more particularly to an apparatus according to the preamble of claim 1.
BACKGROUND OF THE INVENTION In ALD applications, a surface of a substrate is typically subjected successively to at least two gaseous precursors. The gaseous precursors effectively react with the substrate surface, resulting in deposition of a single atomic layer. The precursor stages are typically followed or separated by a purge stage that eliminates the excess precursor from the surface of the substrate prior to the separate introduction of the other precursor. Therefore, an ALD process requires alternating in sequence the flux of precursors to the surface of the substrate. This repeated sequence of alternating surface reactions and purge stages between is a typical ALD deposition cycle. Prior art ALD apparatuses usually comprise a nozzle head having one or more precursor nozzles for subjecting the surface of the substrate to precursors. The nozzle head is moved in relation to the substrate over the surface of the substrate and it will produce growth layers according to the principles of ALD method. The nozzle head is usually supported in relation to the surface of the substrate such that there is a predetermined distance between the nozzle head and the surface of the substrate. The substrate is supported to a substrate support such N 25 that the mentioned predetermined distance is formed. As only one atomic layer is N produced on the surface of the substrate during one ALD-cycle, the nozzle head O may comprise several precursor nozzles such that a single scan with the nozzle N head over the surface of the substrate forms several atomic layers on the surface = of the substrate. The single scan with the nozzle head may be done by moving > 30 either the nozzle head or the substrate such that the nozzle head and the substrate S are moved in relation to each other. The predetermined distance between the S nozzle head and the surface of the substrate is formed as small as possible such N that the supply of the precursor materials on the surface of the substrate may be efficiently controlled and precursor materials do not escape to surroundings of the nozzle head and a good coating may be formed on the surface of the substrate. Thepredetermined distance, or process gap, between the nozzle head and the surface of substrate may be for example 0.3-2 mm, preferably 0.5-1,0 mm. In prior art ALD applications the process temperature is usually between 70°C and 150°C. The nozzle head and the other parts of the apparatus undergo thermal expansion due to the elevated process temperature. Usually several materials are used for constructing the ALD apparatus and different parts of the apparatus may be at different temperature during processing and especially during heating and cooling stages of the apparatus. Therefore, the process gap between the nozzle head and the surface of the substrate may change causing uncontrollable increase or decrease of the process gap. Excessive increase of the process gap leads to operational problems of the apparatus when it is used for coating a substrate. The decrease of the process gap may lead to a contact between nozzle head and the surface of the substrate preventing the operation of the apparatus. When cylindrical substrate support is used the thermal expansion in radial direction may be 1 to 4 mm with a cylinder having radius 0,6m - 1,2 m. This means that the thermal expansion may be larger than the height of the process gap. One of the problems associated with the prior art is that when the process temperature is increased above 150°C there will occur operational problems because of thermal expansion of the apparatus which the thermal — expansion can be different in different parts of the apparatus. The increase in the process temperature will lead to transformations and deformations of the apparatus because of forces that will twist the apparatus and because there will be temperature differences due to geometrical and size factors.
BRIEF DESCRIPTION OF THE INVENTION The objects of the invention are achieved by an apparatus which is N characterized by what is stated in the independent claim 1. The preferred N embodiments of the invention are disclosed in the dependent claims. > The invention is based on the idea of providing a connection between N the nozzle head and a supporting structure that supports the nozzle head in a E 30 reaction chamber such that the thermal expansion of the apparatus is controlled so o that operational problems caused by the increased process temperature can be & prevented. = An apparatus according to the invention comprises a nozzle head, a N supporting structure and a fixing arrangement. The nozzle head has a first end and asecond end on opposing side of the nozzle head, a first side end and a second sideend on opposing side of the nozzle head. The nozzle head further has an output face via which the at least one precursor is supplied. The output face is formed as a curved output face having a curvature axis extending parallel to the output face between the first end and the second end. The term curved output face having the curvature axis comprises also an embodiment in which the curved output face is formed from a slightly angular bending such that the output face is substantially curved. In other words, the output face is the surface of the nozzle head which is towards the substrate to be coated. The nozzle head further comprises two or more precursor nozzles provided in connection with the output face and extending between the first end and the second end for subjecting the surface of the substrate to at least one precursor.
The nozzle head is in a preferred embodiment of the invention arranged in connection with a transport cylinder which guides the substrate to be coated. The curved output face of the nozzle head is formed to conform at least a portion ofa cylindrical outer surface of a transport cylinder. The nozzle head is supported by a supporting structure.
The apparatus comprises a fixing arrangement for connecting the supporting structure and the nozzle head. The fixing arrangement comprises one first fixing part arranged between the first end of the nozzle head and the — supporting structure and one second fixing part arranged between the second end of the nozzle head and the supporting structure. The one first fixing part and the one second fixing part are arranged on a support axis parallel to the curvature axis of the nozzle head.
The one first fixing part in the first end of the nozzle head and the one second fixing part in the second end of the nozzle head means that there is one o single fixing part connecting the first end of the nozzle head to the supporting S structure and one single fixing part connecting the second end of the nozzle head = to the supporting structure in a direction transverse to the direction of the support 7 axis. In other words, it means that the ends of the nozzle head comprise only one N 30 fixing point for connecting the nozzle head to the supporting structure but there E may be multiple fixing parts in the direction of the support axis, i.e. successively, o such that there successive first fixing parts and successive second fixing parts but 2 they are arranged on the same support axis. S In a preferred embodiment of the invention the one first fixing part is N 35 connected to the first end of the nozzle head halfway between the first side end and the second side end and the one second fixing part is connected to the second endof the nozzle head halfway between the first side end and the second side end on the opposing side of the nozzle head such that the support axis divides the nozzle head into two halves.
In one preferred embodiment of the invention the nozzle head is arranged to be movable in relation to the supporting structure, furthermore the nozzle head is arranged to be moved in an oscillating swing movement between a first end position and a second end position around the curvature axis of the curved output face.
The nozzle head is arranged to be moved in a direction transverse to the curvature axis of the output face of the nozzle head.
The apparatus therefore comprises a moving mechanism for moving the nozzle head in the oscillating swing movement.
As the nozzle head is movable in relation to the supporting structure the apparatus further comprises at least one bearing arrangement arranged between the nozzle head and the supporting structure for allowing the nozzle head to move in relation to the supporting structure.
The bearing arrangement comprises a support bearing part connected to the supporting structure and a nozzle bearing part connected to the nozzle head.
The support bearing part of the supporting structure and the nozzle bearing part of the nozzle head connect the nozzle head and the supporting structure together forming a bearing connection.
When the apparatus comprises the bearing arrangement the one first fixing part is arranged between the first end of the nozzle head and the bearing arrangement and the one second fixing part is arranged between the second end of the nozzle head and the bearing arrangement.
The at least one bearing arrangement comprises a support bearing part and a nozzle bearing part.
The support bearing part is connected to the supporting structure and said nozzle bearing part is connected to the nozzle head through the o fixing arrangement.
O The apparatus comprises a first bearing arrangement arranged 2 between the first end of the nozzle head and the supporting structure, and a second 7 bearing arrangement arranged between the second end of the nozzle head and the N 30 supporting structure.
The bearing arrangement can be a roller bearing E arrangement in which the support bearing part comprises bearing rollers and the o nozzle bearing part comprises a bearingrail; or the support bearing part comprises 2 a bearing rail and the nozzle bearing part comprises bearing rollers.
Alternatively, S the bearing arrangement can be a plain bearing arrangement in which the support N 35 bearing part comprises a first bearing surface and the nozzle bearing part comprises a second bearing surface.
The support bearing part and/or the nozzlebearing part preferably have the same curvature axis as the output face of the nozzle head In a preferable embodiment of the invention the first fixing part and/or the second fixing part comprises at least one thermal insulation borehole.
The 5 apparatus further comprises a reaction chamber in which at least the nozzle head, the supporting structure and the fixing arrangement are arranged, said reaction chamber comprises at least one side wall and a bottom.
The supporting structure comprises a first support part and a second support part.
The first support part and/or the second support part is provided in the atleast one side wall; or the first support part and/or the second support part is provided in the bottom of the reaction chamber; or the first support part is provided in the at least one side wall and the second support part is provided in the bottom of the reaction chamber.
Alternatively, the supporting structure comprises a first support part and a second support part, the at least one side wall is arranged to form the first support part and/or the second support part; or the bottom of the reaction chamber is arranged to form the first support part and/or the second support part; or the at least one side wall and the bottom of the reaction chamber are arranged to form the first support part and the second support part.
A first nozzle bearing part, the first fixing part, the nozzle head, the — second fixing part and a second nozzle bearing part are arranged successively along the support axis.
Along the support axis from the first nozzle bearing part to the second nozzle bearing part there is always only one material when the apparatus is examined in the direction perpendicular to the support axis so that the thermal expansion can occur in the direction perpendicular to the support axis, i.e.transverse in relation to the support axis. o The apparatus further comprises a transport cylinder having a S cylindrical outer surface and a central axis.
The output face of the nozzle head is = arranged to face toward the cylindrical outer surface of the transport cylinder. 7 The apparatus according to the invention is operable in ALD N 30 applications in which the process temperature is above 150°C and even above E 250°C or even 350°C. o An advantage of the invention is that when the nozzle head is operated & in high temperatures such as temperatures between 200°C and 400°C the thermal = expansion occurs in the direction of the support axis in which the thermal N 35 expansion of the apparatus is controllable without affecting to the ALD application process.
In addition to the thermal expansion also thermal contraction occurswhich has an effect to the tensions in the apparatus such that the size or the shape of different part may not remain the same. Le. the changes in temperature of the apparatus expand or contract the materials such that when the apparatus is heated to the process temperature different parts possibly having different materials expand and when the apparatus is cooled down the parts contract. As the nozzle head is connected to the supporting structure through a fixing arrangement which comprises one fixing part on one side of the nozzle head and another fixing part on the opposite side of the nozzle head and the fixing parts are arranged on a support axis which is parallel to the curvature axis of the output face of the nozzle head, then the nozzle head is supported only through one support axis which means that the nozzle head can expand due to high temperatures freely and symmetrically to both transverse directions away from the support axis.
BRIEF DESCRIPTION OF THE DRAWINGS The invention is described in detail by means of specific embodiments with reference to the enclosed drawings, in which Figure 1 shows the apparatus according to the invention from a top perspective; Figure 2 shows the apparatus according to the invention from side; and Figure 3 shows the apparatus according to the invention from another — side.
DETAILED DESCRIPTION OF THE INVENTION Figure 1 shows the apparatus according to the invention shown from a top perspective such that the output face 25 of the nozzle head 20 is shown. The nozzle head 20 comprises a first end 21, a second end 22, a first side end 23,a N 25 second side end 24 and an output face 25 via which the at least one precursor is N supplied. The nozzle head 20 isarranged inside a reaction chamber 1 and such that O the output face 25 is toward a top of the reaction chamber 1. The apparatus further N comprises a transport cylinder (not shown in figure 1 for the sake of clarity) for = transporting a substrate along a transport path. Precursors are supplied to the a S 30 substrate in an area between an outer surface of the transport cylinder and the N output face 25 of the nozzle head 20. As the transport cylinder, either being a whole S cylinder or just a cut-out of a cylinder, comprises a cylindrical outer surface, the N output face 25 of the nozzle head 20 preferably has the same curvature as the transport cylinder so that a gap between the output face 25 of the nozzle head 20 and the transport surface of the transport cylinder or the surface of the substratehas the same size throughout the area of the output face 25. Therefore a curvature axis C of the output face 25 is preferably the same as the axis of the transport cylinder. The nozzle head 20 comprises two or more precursor nozzles 26 provided in connection with the output face 25 and extending between the first end 21 and the second end 22 for subjecting the surface of the substrate to at least one precursor. As can be seen from the figure 1 the first end 21 and the second end 22 are opposite to each other and the precursor nozzles 26 extend in a longitudinal direction between said first and second ends 21, 22. The nozzle head 20 is arranged to move in a direction which is transverse to the axis S shown in figure 1.
The apparatus further comprises a supporting structure 31, 32 for supporting the nozzle head 20 and at least one bearing arrangement 41, 42, 43, 44 arranged between the nozzle head 20 and the supporting structure 31, 32 for allowing the nozzle head 20 to move in relation to the supporting structure 31, 32.
A fixing arrangement 51, 52 for connecting a bearing arrangement 41, 42, 43, 44 to the nozzle head 20 comprises one first fixing part 51 arranged between the first end 21 of the nozzle head 20 and the bearing arrangement 41, 43 and one second fixing part 52 arranged between the second end 22 of the nozzle head 20 and the bearing arrangement 42, 44. The first fixing part 51 and the second fixing part 52 are arranged on a support axis S parallel to the curvature axis C (not shown in figure 1) of the nozzle head 20. Figure 1 further shows that the first fixing part 51 is connected to the first end 21 of the nozzle head 20 halfway between the first side end 23 and the second side end 24 and the second fixing part 52 is connected to the second end 22 of the nozzle head 20 halfway between the first side end 23 and the second side end 24 on the opposing side of the nozzle head 20 such that the support axis S divides the nozzle head 20 into two halves.
o The bearing arrangement 41, 42, 43, 44 allows the nozzle head 20 to S move in relation to the supporting structure 31, 32. The apparatus further = comprises a moving mechanism for allowing the nozzle head to move. The 7 movement of the nozzle head is a swinging or a pendulum movement in the N 30 — direction transverse to the support axis S. The moving mechanism 70 can be for E example a belt type moving mechanism as shown in figure 2 or a pendulum type o moving mechanism. & The bearing arrangement 41, 42, 43, 44 comprises a support bearing = part 41, 42 and a nozzle bearing part 43, 44. The support bearing part 41, 42 is N 35 connected to the supporting structure 31, 32 and the nozzle bearing part 43, 44 is connected to the nozzle head 20 through the fixing arrangement 51, 52. Thesupport bearing part 41, 42 of the supporting structure 31, 32 and the nozzle bearing part 43, 44 of the nozzle head 20 connect the nozzle head 20 and the supporting structure 31, 32 together forming a bearing connection. In other words, the nozzle head 20 comprises the fixing arrangement 51, 52 and at least one nozzle bearing part 41. In a preferred embodiment of the invention the nozzle head 20 comprises a first fixing part 51, a second fixing part 52 and two nozzle bearing parts 41 such that one nozzle bearing part 41 is connected to the first end 21 of the nozzle head 20 through the first fixing part 51 and another nozzle bearing part 41 is connected to the second end 22 of the nozzle head 20 through the second fixing part 52 in the opposite side of the nozzle head 20. In this kind of embodiment, the supporting structure 31, 32 also comprises two support bearing parts 42. In the embodiment of the invention shown in figure 1 the bearing arrangement 41,42 is a roller bearing arrangement in which the nozzle bearing part 43, 44 is a bearing rail and the support bearing part 41, 42 comprises bearing rollers. The bearing rail and the bearing rollers can be arranged also such that the support bearing part 41, 42 comprises the bearing rail and the nozzle bearing part comprises the bearing rollers. The bearing arrangement 41, 42, 43, 44 can also be a plain bearing arrangement in which the support bearing part 41, 42 comprises a first bearing surface and the nozzle bearing part 43, 44 comprises a second bearing surface.
The supporting structure 31, 32 shown in figure 1 comprises a first support part 31 and a second support part 32, and the first support part 31 is connected to a side wall 2 of the reaction chamber 1 and the second support part 32 is connected to a bottom 3 of the reaction chamber 1. The reaction chamber 1 can form a vacuum chamber. The apparatus may comprise a vacuum pump or another vacuum device connected to the reaction chamber 1 for providing vacuum o inside the reaction chamber 1.
S As can be seen from figure 1 the first nozzle bearing part 43, the first = fixing part 51, the nozzle head 20, the second fixing part 52 and a second nozzle 7 bearing part 44 are arranged successively along the support axis S. The nozzle head N 30 20 of the invention is operable in a process temperature above 150°C and even E above 250°C or even 350°C and thermal expansion plays an important role in high o temperatures, the nozzle head 20 comprising the first nozzle bearing part 43, the & first fixing part 51, the nozzle head 20, the second fixing part 52 and the second = nozzle bearing part 44 comprises only one material in the direction perpendicular N 35 tothe support axis S along the support axis S from the first nozzle bearing part 43 to the second nozzle bearing part 44.
Figure 2 shows the apparatus according to the invention as seen from side of the apparatus. In this figure, the transport cylinder 10 is also shown. The transport cylinder 10 has a cylindrical outer surface 11 and a central axis C. The output face 25 of the nozzle head 20 is arranged to face toward the cylindrical outer surface 11 of the transport cylinder 10. The transport cylinder 10 has a circular or cylindrical outer surface 11 and the transport cylinder 10 may be stationary or alternatively it may rotate around the central axis C of the transport cylinder 10. A substrate 15 is transported along a transport path such that the substrate 15 is transported along at least a part of the outer surface 11 of the transport cylinder
10. In figure 2 the substrate 15 is supplied from a first substrate roll 16 to the transport cylinder 10 and further to a second substrate roll 17. The first and second substrate roll 16, 17 may also be replaced by some other kind of receptacle for supplying, receiving and storing elongated substrate 15. The apparatus can alternatively be one part of a production line. The first and second substrate roll 16, 17 are preferably rotated around their central axels, respectively, for transporting the elongated substrate 15 from the first substrate roll 16 to the second substrate roll 17 via the transport cylinder 10. The outer surface 11 of the transport cylinder 10 forms a substrate support surface on which the substrate 15 is supported during processing. The output face 25 of the nozzle head 20 and the — outer surface 11 of the transport cylinder 10 preferably have substantially same shape. The nozzle head 20 is positioned such that there is gap between the output face 25 of the nozzle head 20 and the outer surface 11 of the transport cylinder 10, or the surface of the substrate 15. The elongated substrate 15 is arranged to be transported in this gap between the output face 25 and the outer surface 11, such that a predetermined process gap or distance is formed between the nozzle head o 20, or the output face 25, and the surface of the substrate 15. The output face 25 of S the nozzle head 20 is positioned at a substantially constant distance from the outer = surface 11 of the transport cylinder 10, or the surface of the substrate 15 on the ? outer surface 11 of the transport cylinder 10. This is achieved such that the N 30 transport cylinder 10 has a first radius and the output face 25 of the nozzle head E 20 has a second radius larger than the first radius, and they have a common central o axis C, which is named as a curvature axis C. Thus, the output face 25 of the nozzle & head 20 and the outer surface 11 of the transport cylinder 10 are arranged = coaxially for providing a substantially constant predetermined distance between N 35 — the outer surface 11 and the output face 25. In other words, the output face 25 is formed as a curved output face having a curvature axis C extending parallel to theoutput face 25 between the first end 21 and the second end 22.
Figure 2 shows that the nozzle head 20 is provided with a moving mechanism 70 which can be a belt type moving mechanism providing a pendulum movement to the nozzle head 20. The nozzle head 20 is supported by the supporting structure 32 which comprises a first support part 31 (not shown in the figure) and a second support part 32. The nozzle head 20 shown in figure 2 is shown such that the second end 22 of the nozzle head 20 is shown. The second support part 32 is provided in the bottom 3 of the reaction chamber 1 and the first support part 31 which is not shown in figure 2 can be provided in the side wall 2 or in the bottom 3 of the reaction chamber 1 or the side wall 2 may form the first support part 31 such that the bearing arrangement is provided to the side wall 2 of the reaction chamber 1.
The bearing connection between the nozzle head 20 and the supporting structure 31, 32 is formed by a first bearing arrangement 41, 42, 43, 44 arranged between the first end 21 of the nozzle head 20 and the supporting structure 31, 32, and a second bearing arrangement 41, 42, 43, 44 arranged between the second end 22 of the nozzle head 20 and the supporting structure 31, 32. The figure 2 shows the second bearing arrangement which is arranged between the second end 22 of the nozzle head and the supporting structure 32. The bearing arrangement is a roller bearing arrangement in which the support bearing part 41, 42 comprises bearing rollers and the nozzle bearing part 43, 44 comprises a bearing rail. The nozzle bearing part 43, 44 being the bearing rail preferably has the same curvature axis C as the output face 25 of the nozzle head 20. The apparatus may further comprise a heating device 80 for heating the nozzle bearing part 43, 44 so that the thermal conditions can be better controlled when the nozzle head is operated for o example in temperature such as 300°C or 350°C. The heating device 80 can be S arranged in connection with the supporting structure.
= Figure 3 shows the apparatus according to the invention as seen from ? the second side end 24 of the nozzle head 20. The first support part 31 is the side N 30 wall 2 of the reaction chamber 1 and the second support part 32 is provided in the E bottom 3 of the reaction chamber 1. The nozzle head 20 is connected to the o supporting structure 31, 32 through the bearing arrangement 40 forming the & bearing connection. The bearing connection is formed by the first support bearing = part 41 and the first nozzle bearing part 43 in the side of the first end 21 of the N 35 nozzle head 20 and by the second support bearing part 42 and the second nozzle bearing part 44 in the side of the second end 22 of the nozzle head 20. The firstnozzle bearing part 43 and the second nozzle bearing part 44 are connected to the nozzle head through the fixing arrangement 51, 52 such that the first nozzle bearing part 43 is connected to the first fixing part 51 which is connected to the first side 21 of the nozzle head 20 and the second nozzle bearing part 44 is connected to the second fixing part 52 which is connected to the second side 22 of the nozzle head 20. The first fixing part 51 and the second fixing part 52 are arranged on the same axis called the support axis S such that fixing parts 51, 52 are provided on the side ends 21, 22 of the nozzle head 20 in the middle of the side ends 21, 22 between the first side end 23 and the second side end 24. The first fixing part 51 and/or the second fixing part 52 preferably comprises at least one thermal insulation borehole or other insulation. The support axis S is in the direction parallel with the curvature axis C which are in a substantially horizontal direction as showed in figure 3. The invention has been described above with reference to the examples shown in the figures. However, the invention is in no way restricted to the above examples but may vary within the scope of the claims. o
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Claims (16)

1. An apparatus for processing a surface of a substrate by subjecting the surface of the substrate to successive surface reactions of at least two precursors according to the principles of atomic layer deposition (ALD), the apparatus comprising: a nozzle head (20) having a first end (21), a second end (22), a first side end (23), a second side end (24) and an output face (25) via which the at least one precursor is supplied, said output face (25) is formed as a curved output face having a curvature axis (C) extending parallel to the output face (25) between the firstend (21) and the second end (22), the nozzle head (20) further comprises two or more precursor nozzles (26) provided in connection with the output face (25) and extending between the first end (21) and the second end (22) for subjecting the surface of the substrate to at least one precursor; a supporting structure (31, 32) for supporting the nozzle head (20); and characterized in that the apparatus further comprises a fixing arrangement (51, 52) for connecting the supporting structure (31, 32) and the nozzle head (20), the fixing arrangement (51, 52) comprises one first fixing part (51) arranged between the first end (21) of the nozzle head (20) and the supporting structure (31, 32) and one second fixing part (52) arranged between the second end (22) of the nozzle head (20) and the supporting structure (31, 32), the one first fixing part (51) and the one second fixing part (52) are arranged on a support axis (S) parallel to the curvature axis (C) of the nozzle head (20).
2. An apparatus according to claim 1,characterized in thatthe apparatus further comprises at least one bearing arrangement (41, 42, 43, 44) o arranged between the nozzle head (20) and the supporting structure (31, 32) for O allowing the nozzle head (20) to move in relation to the supporting structure (31, - 32).
7
3. An apparatus according to claim 2, characterized in thatthe N 30 — one first fixing part (51) is arranged between the first end (21) of the nozzle head E (20) and the bearing arrangement (41, 42, 43, 44) and the one second fixing part S (52) is arranged between the second end (22) of the nozzle head (20) and the 3 bearing arrangement (41, 42, 43, 44).
S
4. An apparatus according to any previous claim,characterized in that the one first fixing part (51) is connected to the first end (21) of the nozzlehead (20) halfway between the first side end (23) and the second side end (24) and the one second fixing part (52) is connected to the second end (22) of the nozzle head (20) halfway between the first side end (23) and the second side end (24) on the opposing side of the nozzle head (20) such that the support axis (S) divides the nozzle head (20) into two halves.
5. An apparatus according to any of claims 2-4, characterized in that the at least one bearing arrangement (41, 42, 43, 44) comprises a support bearing part (41, 42) and a nozzle bearing part (43, 44), said support bearing part (41,42) is connected to the supporting structure (31, 32) and said nozzle bearing part (43, 44) is connected to the nozzle head (20) through the fixing arrangement (51, 52).
6. An apparatus according to any previous claim,characterized in that the apparatus comprises a first bearing arrangement (41, 43) arranged between the first end (21) of the nozzle head (20) and the supporting structure (31, 32), and a second bearing arrangement (42, 44) arranged between the second end (22) of the nozzle head (20) and the supporting structure (31, 32).
7. An apparatus according to claim 5or6, characterized inthat the bearing arrangement (41, 42, 43, 44) is a roller bearing arrangement in which the support bearing part (41, 42) comprises bearing rollers and the nozzle bearing part (43, 44) comprises a bearing rail; or the support bearing part (41, 42) comprises a bearing rail and the nozzle bearing part (43, 44) comprises bearing rollers.
N 8. An apparatus according to claim 5or6,characterized inthat = the bearing arrangement (41, 42, 43, 44) isa plain bearing arrangementin which 7 the support bearing part (41, 42) comprises a first bearing surface and N 30 — the nozzle bearing part (43, 44) comprises a second bearing surface.
E Q 9. An apparatus according to any of claims 5-8, characterized 23 in that the support bearing part (41, 42) and/or the nozzle bearing part (43, 44) = having the same curvature axis (C) as the output face (24) of the nozzle head (20). N 35
10. An apparatus according to any previous claim,
characterized in thatthe first fixing part (51) and/or the second fixing part (52) comprises at least one thermal insulation borehole.
11. An apparatus according to any previous claim, characterized inthatthe apparatus further comprises a reaction chamber (1) in which at least the nozzle head (20), the supporting structure (31, 32) and the fixing arrangement (51, 52) are arranged, said reaction chamber (1) comprises at least one side wall and a bottom.
12. An apparatus according to claim 11, characterized in that the supporting structure (31, 32) comprises a first support part (31) and a second support part (32), the first support part (31) and/or the second support part (32) is provided in the at least one side wall (2); or the first support part (31) and/or the second support part (32) is provided in the bottom (3) of the reaction chamber (1); or the first support part (31) is provided in the at least one side wall (2) and the second support part (32) is provided in the bottom (3) of the reaction chamber (1).
13. An apparatus according to claim 11, characterized in that the supporting structure (31, 32) comprises a first support part (31) and a second support part (32), the at least one side wall (2) is arranged to form the first support part (31) and/or the second support part (32); or o the bottom (3) of the reaction chamber (1) is arranged to form the first O support part (31) and/or the second support part (32); or 2 the atleast one side wall (2) and the bottom (3) of the reaction chamber ? (1) are arranged to form the first support part (31) and the second support part N 30 (32). x a S
14. An apparatus according to any of claims 3 - 13, 23 characterized in that a first nozzle bearing part (43), the first fixing part = (51), the nozzle head (20), the second fixing part (52) and a second nozzle bearing N 35 — part (44) are arranged successively along the support axis (S).
15. An apparatus according to claim 14, characterized in that along the support axis (S) from the first nozzle bearing part (43) to the second nozzle bearing part (44) there is only one material in the direction perpendicular to the support axis (S).
16. An apparatus according to any previous claim, characterized in thatthe apparatus further comprises a transport cylinder (10) having a cylindrical outer surface (11) and a central axis (C), the output face (24) of the nozzle head (20) is arranged to face toward the cylindrical outer surface (11) of the transport cylinder (10). o
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FI20175920A 2017-10-18 2017-10-18 Apparatus for Processing a Surface of a Substrate FI128453B (en)

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CN116479412A (en) * 2023-04-24 2023-07-25 江苏微导纳米科技股份有限公司 Winding type processing equipment and processing method

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US11136667B2 (en) * 2007-01-08 2021-10-05 Eastman Kodak Company Deposition system and method using a delivery head separated from a substrate by gas pressure
US20110076421A1 (en) * 2009-09-30 2011-03-31 Synos Technology, Inc. Vapor deposition reactor for forming thin film on curved surface
KR20130142869A (en) * 2012-06-20 2013-12-30 주식회사 엠티에스나노테크 Apparatus and method for atomic layer deposition
FI124298B (en) * 2012-06-25 2014-06-13 Beneq Oy Apparatus for treating surface of substrate and nozzle head
FI126043B (en) * 2013-06-27 2016-06-15 Beneq Oy Method and apparatus for coating the surface of a substrate
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