ES8703942A3 - Control of plasma generation in vapour deposition - Google Patents
Control of plasma generation in vapour depositionInfo
- Publication number
- ES8703942A3 ES8703942A3 ES541032A ES541032A ES8703942A3 ES 8703942 A3 ES8703942 A3 ES 8703942A3 ES 541032 A ES541032 A ES 541032A ES 541032 A ES541032 A ES 541032A ES 8703942 A3 ES8703942 A3 ES 8703942A3
- Authority
- ES
- Spain
- Prior art keywords
- electrode
- plasma
- magnetic field
- generated
- vapour deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Vapour deposition coating can be performed in equipment in which a plasma of the coating material is generated from the surface of an electrode. The surface area of the electrode from which the plasma is generated can be selectively adjusted by exposing the plasma generating surface of the electrode to the effect of a magnetic field and adjusting the strength of the magnetic field to spread the plasma over the evaporation surface of the electrode in order to permit more efficient use of the electrode. Preferably the electrode is in the form of a flat disc of metal (e.g. titanium) and the magnetic field is generated by a permanent magnet or an electromagnetic coil which substantially surrounds or is coaxial with the electrode, the electrode or an associated element acting as the core of the coil. (Figure 1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ES541032A ES8703942A3 (en) | 1985-03-07 | 1985-03-07 | Control of plasma generation in vapour deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ES541032A ES8703942A3 (en) | 1985-03-07 | 1985-03-07 | Control of plasma generation in vapour deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES541032A0 ES541032A0 (en) | 1987-03-01 |
| ES8703942A3 true ES8703942A3 (en) | 1987-03-01 |
Family
ID=8488811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES541032A Expired ES8703942A3 (en) | 1985-03-07 | 1985-03-07 | Control of plasma generation in vapour deposition |
Country Status (1)
| Country | Link |
|---|---|
| ES (1) | ES8703942A3 (en) |
-
1985
- 1985-03-07 ES ES541032A patent/ES8703942A3/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| ES541032A0 (en) | 1987-03-01 |
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