ES8703818A1 - Un proceso de deposicion de fase de vapor mejorado - Google Patents
Un proceso de deposicion de fase de vapor mejoradoInfo
- Publication number
- ES8703818A1 ES8703818A1 ES545474A ES545474A ES8703818A1 ES 8703818 A1 ES8703818 A1 ES 8703818A1 ES 545474 A ES545474 A ES 545474A ES 545474 A ES545474 A ES 545474A ES 8703818 A1 ES8703818 A1 ES 8703818A1
- Authority
- ES
- Spain
- Prior art keywords
- oxidation reaction
- optical fibre
- fibre manufacture
- reactant material
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/15—Nonoxygen containing chalogenides
- Y10S65/16—Optical filament or fiber treatment with fluorine or incorporating fluorine in final product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PROCESO DE DEPOSICION DE FASE DE VAPOR MODIFICADO. COMPRENDE UNA REACCION DE PRODUCCION DE VIDRIO PARA LA FORMACION DE UN VIDRIO DOPADO A PARTIR DE UN MATERIAL REACTANTE, INCLUYENDOSE UN PASO PARA IMPEDIR QUE SE PRODUZCA LA REACCION DE FORMADO DEL VIDRIO ANTES DE QUE EL MATERIAL REACTANTE HAYA SIDO CALENTADO A UNA TEMPERATURA MAYOR QUE LA REQUERIDA PARA LA REACCION DE FORMADO DEL VIDRIO, CON LO QUE SE OBTIENE LA PRODUCCION DE UN VIDRIO DOPADO DE UNA COMPOSICION IMPOSIBLE DE OBTENER, POR CONSIDERACIONES TERMODINAMICAS, CON UNAS TEMPERATURAS MAS BAJAS; EMPLEANDOSE COMO MATERIAL REACTANTE TRICLOROFLUORURO DE SILICIO (SICL3F), QUE ES CALENTADO A UNA TEMPERATURA EN LA QUE SE TIENE LA REACCION DE CAMBIO ENTRE ALGUNOS DE LOS TETRACLORUROS DE SILICIO Y EL REACTANTE QUE INCLUYE EL DOPANTE. TIENE APLICACION EN LA FABRICACION DE FIBRAS OPTICAS.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08418912A GB2162168B (en) | 1984-07-25 | 1984-07-25 | Optical fibre manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
ES8703818A1 true ES8703818A1 (es) | 1987-02-16 |
ES545474A0 ES545474A0 (es) | 1987-02-16 |
Family
ID=10564411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES545474A Expired ES8703818A1 (es) | 1984-07-25 | 1985-07-23 | Un proceso de deposicion de fase de vapor mejorado |
Country Status (9)
Country | Link |
---|---|
US (1) | US4735648A (es) |
JP (1) | JPS6140835A (es) |
AU (1) | AU576600B2 (es) |
DE (1) | DE3526436C2 (es) |
ES (1) | ES8703818A1 (es) |
FR (1) | FR2568242B1 (es) |
GB (1) | GB2162168B (es) |
IN (1) | IN165303B (es) |
ZA (1) | ZA855166B (es) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5305254A (en) * | 1987-12-15 | 1994-04-19 | Sharp Kabushiki Kaisha | Magneto-optic memory device |
US6121164A (en) * | 1997-10-24 | 2000-09-19 | Applied Materials, Inc. | Method for forming low compressive stress fluorinated ozone/TEOS oxide film |
NL1019371C2 (nl) * | 2001-11-15 | 2003-05-16 | Draka Fibre Technology Bv | Werkwijze voor het bereiden van zeer zuiver siliciumchloride en/of germaniumchloride. |
US7793612B2 (en) * | 2003-08-01 | 2010-09-14 | Silica Tech, Llc | Ring plasma jet method and apparatus for making an optical fiber preform |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US30883A (en) * | 1860-12-11 | Improvement in corn-planters | ||
CH620181A5 (en) * | 1975-08-16 | 1980-11-14 | Heraeus Schott Quarzschmelze | Process for the preparation of synthetic quartz glass, apparatus to carry out the process, and the use of the synthetic quartz glass |
JPS5430852A (en) * | 1977-08-11 | 1979-03-07 | Nippon Telegr & Teleph Corp <Ntt> | Production of glass fiber for optical communication |
GB1603949A (en) * | 1978-05-30 | 1981-12-02 | Standard Telephones Cables Ltd | Plasma deposit |
CA1128739A (en) * | 1978-06-08 | 1982-08-03 | Corning Glass Works | Method of making large diameter optical waveguide preforms |
FR2432478B1 (es) * | 1978-07-31 | 1982-03-12 | Quartz & Silice | |
US4235616A (en) * | 1979-05-14 | 1980-11-25 | Corning Glass Works | Optical waveguide manufacturing process and article |
DE3037491C2 (de) * | 1979-10-04 | 1983-10-27 | Nippon Telegraph & Telephone Public Corp., Tokyo | Verfahren zur Herstellung einer Glasvorform für optische Fasern |
US4292063A (en) * | 1980-05-05 | 1981-09-29 | Northern Telecom Limited | Manufacture of an optical fiber preform with micro-wave plasma activated deposition in a tube |
US4378987A (en) * | 1981-10-15 | 1983-04-05 | Corning Glass Works | Low temperature method for making optical fibers |
US4440558A (en) * | 1982-06-14 | 1984-04-03 | International Telephone And Telegraph Corporation | Fabrication of optical preforms by axial chemical vapor deposition |
JPS6054939A (ja) * | 1983-09-02 | 1985-03-29 | Showa Electric Wire & Cable Co Ltd | シングルモ−ドファイバ用プリフォ−ムロッドの製造方法 |
US4586943A (en) * | 1983-10-20 | 1986-05-06 | Sumitomo Electric Industries, Ltd. | Method for the production of glass preform for optical fibers |
-
1984
- 1984-07-25 GB GB08418912A patent/GB2162168B/en not_active Expired
-
1985
- 1985-07-09 ZA ZA855166A patent/ZA855166B/xx unknown
- 1985-07-15 AU AU45003/85A patent/AU576600B2/en not_active Ceased
- 1985-07-18 IN IN556/MAS/86A patent/IN165303B/en unknown
- 1985-07-23 ES ES545474A patent/ES8703818A1/es not_active Expired
- 1985-07-23 FR FR858511243A patent/FR2568242B1/fr not_active Expired - Lifetime
- 1985-07-24 DE DE3526436A patent/DE3526436C2/de not_active Expired - Fee Related
- 1985-07-25 JP JP16499585A patent/JPS6140835A/ja active Granted
-
1986
- 1986-12-11 US US06/940,232 patent/US4735648A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
GB2162168A (en) | 1986-01-29 |
DE3526436A1 (de) | 1986-01-30 |
AU576600B2 (en) | 1988-09-01 |
GB2162168B (en) | 1988-06-29 |
DE3526436C2 (de) | 1995-05-24 |
AU4500385A (en) | 1986-01-30 |
US4735648A (en) | 1988-04-05 |
GB8418912D0 (en) | 1984-08-30 |
IN165303B (es) | 1989-09-16 |
FR2568242A1 (fr) | 1986-01-31 |
JPS6140835A (ja) | 1986-02-27 |
ZA855166B (en) | 1986-09-24 |
JPH053416B2 (es) | 1993-01-14 |
FR2568242B1 (fr) | 1992-04-30 |
ES545474A0 (es) | 1987-02-16 |
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