ES8701996A1 - Un procedimiento para la fabricacion de una forma de impre- sion planografica - Google Patents

Un procedimiento para la fabricacion de una forma de impre- sion planografica

Info

Publication number
ES8701996A1
ES8701996A1 ES546982A ES546982A ES8701996A1 ES 8701996 A1 ES8701996 A1 ES 8701996A1 ES 546982 A ES546982 A ES 546982A ES 546982 A ES546982 A ES 546982A ES 8701996 A1 ES8701996 A1 ES 8701996A1
Authority
ES
Spain
Prior art keywords
carbon atoms
light
aromatic
group
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES546982A
Other languages
English (en)
Other versions
ES546982A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of ES546982A0 publication Critical patent/ES546982A0/es
Publication of ES8701996A1 publication Critical patent/ES8701996A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Materials For Photolithography (AREA)

Abstract

PROCEDIMIENTO PARA LA FABRICACION DE UNA FORMA DE IMPRESION PLANOGRAFICA. COMPRENDE LAS SIGUIENTES OPERACIONES: PRIMERA, SE REVISTE UN SOPORTE QUE ES ADECUADO PARA IMPRESION PLANOGRAFICA CON UNA SOLUCION DE REVESTIMIENTO SENSIBLE A LA LUZ, LA CUAL CONTIENE, COMO COMPUESTO SENSIBLE A LA LUZ, UN PRODUCTO DE CONDENSACION QUE COMPRENDE UNIDADES REPETIDAS DE A-N2X Y B, QUE SE UNEN POR MIEMBROS INTERMEDIOS DIVALENTES DERIVADOS DE UN COMPUESTO CARBONILICO QUE ES CAPAZ DE CONDENSARSE; SEGUNDA, SE REVISTE LA CAPA SENSIBLE A LA LUZ OBTENIDA CON UNA CAPA CUBRIDORA QUE CONTIENE UN POLIMERO INSOLUBLE EN AGUA; Y POR ULTIMO, SE EXPONE EN IMAGENES EL MATERIAL SENSIBLE A LA LUZ ASI PRODUCIDO Y SE SEPARAN POR LAVADO LAS AREAS DE LA CAPA NO EXPUESTAS CON UNA SOLUCION REVELADORA. DE APLICACION EN LA FABRICACION DE PLACAS DE IMPRESION PLANOGRAFICAS.
ES546982A 1984-09-15 1985-09-13 Un procedimiento para la fabricacion de una forma de impre- sion planografica Expired ES8701996A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843433911 DE3433911A1 (de) 1984-09-15 1984-09-15 Lichtempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung

Publications (2)

Publication Number Publication Date
ES546982A0 ES546982A0 (es) 1986-12-01
ES8701996A1 true ES8701996A1 (es) 1986-12-01

Family

ID=6245476

Family Applications (1)

Application Number Title Priority Date Filing Date
ES546982A Expired ES8701996A1 (es) 1984-09-15 1985-09-13 Un procedimiento para la fabricacion de una forma de impre- sion planografica

Country Status (7)

Country Link
EP (1) EP0175244B1 (es)
JP (1) JPS6177845A (es)
BR (1) BR8504423A (es)
CA (1) CA1284912C (es)
DE (2) DE3433911A1 (es)
ES (1) ES8701996A1 (es)
ZA (1) ZA857031B (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5326674A (en) * 1991-04-30 1994-07-05 Fuji Photo Film Co., Ltd. Method for processing photosensitive copying materials
DE4308122A1 (de) * 1993-03-15 1994-09-22 Basf Lacke & Farben Photostrukturierbares mehrschichtiges Element, Verfahren zu dessen Herstellung sowie daraus hergestellte Druck- und Prägeform
US5997993A (en) * 1996-11-20 1999-12-07 Polaroid Corporation Protective overcoat useful for enhancing an article resistance to ambient humidity

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE620097A (es) * 1958-11-26
NL270834A (es) * 1960-10-31
NL7007827A (es) * 1970-05-29 1971-12-01
JPS50152803A (es) * 1974-05-29 1975-12-09
DE2834059A1 (de) * 1978-08-03 1980-02-14 Hoechst Ag Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
DE3516387A1 (de) * 1984-05-07 1985-11-07 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa Lichtempfindliche zusammensetzungen und aufzeichnungsmaterialien
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer

Also Published As

Publication number Publication date
EP0175244A2 (de) 1986-03-26
ES546982A0 (es) 1986-12-01
BR8504423A (pt) 1986-07-15
EP0175244A3 (en) 1987-01-14
EP0175244B1 (de) 1990-04-11
DE3433911A1 (de) 1986-03-27
JPS6177845A (ja) 1986-04-21
CA1284912C (en) 1991-06-18
DE3577146D1 (de) 1990-05-17
ZA857031B (en) 1986-04-30

Similar Documents

Publication Publication Date Title
GB1416848A (en) N-3-hydroxyaryl-propyl-imides
GB1321694A (en) Benzoate monomers and the use of polymers thereof in the stabili zation of organic material
GB1390006A (en) Monoacetals of aromatic 1,2-diketones
ATE158800T1 (de) Verfahren zur herstellung eines hochmolekularen olefinpolymers
GB1399239A (en) Piperidine derivatives
FR2629088B1 (fr) Polyamide-imides aromatiques fonctionnalises par des groupes maleimido, un procede pour leur preparation et leur emploi pour notamment preparer des polymeres reticules
GB1159930A (en) Production of Polymer Coatings by Eectrodeposition
ES8701996A1 (es) Un procedimiento para la fabricacion de una forma de impre- sion planografica
GB1414760A (en) Esterified isopropanolamines and their use as stabilizers
GB1171241A (en) Polyamide-Diamine Derivatives and Polymers produced therefrom
US4851577A (en) New substituted derivatives of N-ethyl(meth)acrylamide and a method for the preparation thereof
GB1490093A (en) Silicone elastomers
EP0316027A3 (en) Photocurable resin composition
ATE47709T1 (de) Verfahren zur herstellung von aldehyden.
KR850005849A (ko) 에틸렌기를 가진 불포화 화합물의 풀리머 제조방법
EP0301725A3 (en) Organo metallic compounds of ruthenium iron or cobalt and their use
AU588426B2 (en) Improvements in or relating to radiation sensitive material
GB1535625A (en) Hydantoin diacrylate compounds
JPS6466214A (en) Production of alpha-olefin polymer
KR880008084A (ko) 디아조늄염 중축합 생성물을 기본으로하는 감광성 조성물 및 이 조성물로부터 제조된 감광성 기록물질
GB1528799A (en) Dialkylphosphonopropionic acid amide derivatives process for their manufacture and their use
GB1435860A (en) N,n-bis-phosphonomethyl-acrylamides
GB1422530A (es)
GB1225274A (es)
GB1499608A (en) Polybenzoxazoles

Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19970303