ZA857031B - Light-sensitive recording material and process for the production of the material - Google Patents

Light-sensitive recording material and process for the production of the material

Info

Publication number
ZA857031B
ZA857031B ZA857031A ZA857031A ZA857031B ZA 857031 B ZA857031 B ZA 857031B ZA 857031 A ZA857031 A ZA 857031A ZA 857031 A ZA857031 A ZA 857031A ZA 857031 B ZA857031 B ZA 857031B
Authority
ZA
South Africa
Prior art keywords
production
light
sensitive recording
recording material
sensitive
Prior art date
Application number
ZA857031A
Inventor
Manfred Michel
Gerhard Sprintschnik
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA857031B publication Critical patent/ZA857031B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Materials For Photolithography (AREA)
ZA857031A 1984-09-15 1985-09-13 Light-sensitive recording material and process for the production of the material ZA857031B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843433911 DE3433911A1 (en) 1984-09-15 1984-09-15 LIGHT-SENSITIVE RECORDING MATERIAL AND METHOD FOR THE PRODUCTION THEREOF

Publications (1)

Publication Number Publication Date
ZA857031B true ZA857031B (en) 1986-04-30

Family

ID=6245476

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA857031A ZA857031B (en) 1984-09-15 1985-09-13 Light-sensitive recording material and process for the production of the material

Country Status (7)

Country Link
EP (1) EP0175244B1 (en)
JP (1) JPS6177845A (en)
BR (1) BR8504423A (en)
CA (1) CA1284912C (en)
DE (2) DE3433911A1 (en)
ES (1) ES8701996A1 (en)
ZA (1) ZA857031B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5326674A (en) * 1991-04-30 1994-07-05 Fuji Photo Film Co., Ltd. Method for processing photosensitive copying materials
DE4308122A1 (en) * 1993-03-15 1994-09-22 Basf Lacke & Farben Photostructurable multilayer element, process for its production and printing and embossing mold made therefrom
EP0883835B9 (en) * 1996-11-20 2004-01-28 Latran Technologies LLC Protective overcoat useful for enhancing the resistance of a printing plate precursor to ambient humidity

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL280795A (en) * 1958-11-26
NL270834A (en) * 1960-10-31
NL7007827A (en) * 1970-05-29 1971-12-01
JPS50152803A (en) * 1974-05-29 1975-12-09
DE2834059A1 (en) * 1978-08-03 1980-02-14 Hoechst Ag LIGHT SENSITIVE COPY MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
DE3516387A1 (en) * 1984-05-07 1985-11-07 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa Light-sensitive compositions and recording materials
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer

Also Published As

Publication number Publication date
JPS6177845A (en) 1986-04-21
DE3433911A1 (en) 1986-03-27
EP0175244B1 (en) 1990-04-11
BR8504423A (en) 1986-07-15
DE3577146D1 (en) 1990-05-17
EP0175244A3 (en) 1987-01-14
EP0175244A2 (en) 1986-03-26
CA1284912C (en) 1991-06-18
ES546982A0 (en) 1986-12-01
ES8701996A1 (en) 1986-12-01

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