ES8304222A1 - Un procedimiento para la preparacion de un sustrato con un deposito de metal de paladio. - Google Patents

Un procedimiento para la preparacion de un sustrato con un deposito de metal de paladio.

Info

Publication number
ES8304222A1
ES8304222A1 ES508037A ES508037A ES8304222A1 ES 8304222 A1 ES8304222 A1 ES 8304222A1 ES 508037 A ES508037 A ES 508037A ES 508037 A ES508037 A ES 508037A ES 8304222 A1 ES8304222 A1 ES 8304222A1
Authority
ES
Spain
Prior art keywords
deposit
white light
light reflectivity
deposits
palladium metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES508037A
Other languages
English (en)
Other versions
ES508037A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Occidental Chemical Corp
Original Assignee
Hooker Chemicals and Plastics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hooker Chemicals and Plastics Corp filed Critical Hooker Chemicals and Plastics Corp
Publication of ES8304222A1 publication Critical patent/ES8304222A1/es
Publication of ES508037A0 publication Critical patent/ES508037A0/es
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PROCEDIMIENTO PARA LA OBTENCION DE DEPOSITOS DE PALADIO METALICO SOBRE SUSTRATOS. CONSISTE EN SOMETER EL SUSTRATO A UNA OPERACION DE GALVANIZADO EN UN BAÑO QUE CONTIENE UN COMPUESTO DE PALADIO SOLUBLE EN EL BAÑO, UNA SAL AMONICA CONDUCTORA, SOLUBLE EN EL BAÑO, HIDROXIDO AMONICO EN CANTIDAD NECESARIA PARA AJUSTAR EL PH ENTRE 5 Y 10, TAMPONES, IONES CLORURO Y UN ABRILLANTADOR, A UNA TEMPERATURA ENTRE LA AMBIENTE Y 62,3 C A UNA DENSIDAD DE CORRIENTE ENTRE 0,01 Y 5 A/DM 2 HASTA CONSEGUIR UN ESPESOR DEL DEPOSITO DE PALADIO DE 0,01 A 1,0 MICRAS. ESTOS ELECTRODEPOSITOS TIENEN APLICACIONES EN LA INDUSTRIA DE ARTES DECORATIVAS.
ES508037A 1980-12-17 1981-12-16 Un procedimiento para la preparacion de un sustrato con un deposito de metal de paladio. Granted ES508037A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21731780A 1980-12-17 1980-12-17

Publications (2)

Publication Number Publication Date
ES8304222A1 true ES8304222A1 (es) 1983-02-16
ES508037A0 ES508037A0 (es) 1983-02-16

Family

ID=22810551

Family Applications (1)

Application Number Title Priority Date Filing Date
ES508037A Granted ES508037A0 (es) 1980-12-17 1981-12-16 Un procedimiento para la preparacion de un sustrato con un deposito de metal de paladio.

Country Status (12)

Country Link
JP (1) JPS57174486A (es)
AT (1) AT375963B (es)
AU (1) AU530026B2 (es)
BR (1) BR8108192A (es)
CH (1) CH647011A5 (es)
DE (1) DE3149042C2 (es)
ES (1) ES508037A0 (es)
FR (1) FR2496131A1 (es)
GB (1) GB2090869B (es)
HK (1) HK67486A (es)
IT (1) IT8149862A0 (es)
SE (1) SE8106868L (es)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2171721B (en) * 1985-01-25 1989-06-07 Omi Int Corp Palladium and palladium alloy plating
CN105780067B (zh) * 2016-02-01 2018-09-11 中国科学院生态环境研究中心 电极活性生物膜原位合成三维纳米钯催化层的方法及应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE698194C (de) * 1938-06-10 1940-11-04 Siebert G M B H G egen

Also Published As

Publication number Publication date
SE8106868L (sv) 1982-06-18
JPS57174486A (en) 1982-10-27
GB2090869B (en) 1984-02-08
AU7780481A (en) 1982-06-24
BR8108192A (pt) 1982-09-28
DE3149042C2 (de) 1985-12-05
ATA527481A (de) 1984-02-15
FR2496131A1 (fr) 1982-06-18
CH647011A5 (de) 1984-12-28
DE3149042A1 (de) 1982-07-15
IT8149862A0 (it) 1981-12-09
AU530026B2 (en) 1983-06-30
HK67486A (en) 1986-09-18
AT375963B (de) 1984-09-25
ES508037A0 (es) 1983-02-16
GB2090869A (en) 1982-07-21

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