ES8102171A1 - Un procedimiento para curar una composicion de resina de po-liester insaturado. - Google Patents

Un procedimiento para curar una composicion de resina de po-liester insaturado.

Info

Publication number
ES8102171A1
ES8102171A1 ES487552A ES487552A ES8102171A1 ES 8102171 A1 ES8102171 A1 ES 8102171A1 ES 487552 A ES487552 A ES 487552A ES 487552 A ES487552 A ES 487552A ES 8102171 A1 ES8102171 A1 ES 8102171A1
Authority
ES
Spain
Prior art keywords
aralkyl
aryl
alkyl
image
polyester resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES487552A
Other languages
English (en)
Other versions
ES487552A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Scott Bader Co Ltd
Original Assignee
Scott Bader Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Scott Bader Co Ltd filed Critical Scott Bader Co Ltd
Publication of ES8102171A1 publication Critical patent/ES8102171A1/es
Publication of ES487552A0 publication Critical patent/ES487552A0/es
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407—Processes of polymerisation
    • C08F299/0421—Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Reinforced Plastic Materials (AREA)
  • Dental Preparations (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

PROCEDIMIENTO PARA CURAR UNA COMPOSICION DE RESINA DE POLIESTER INSATURADO. LA COMPOSICION COMPRENDE UN ETER CARBONATO DE BENZOILOXIMA Y UN COLORANTE FOTOREDUCIBLE. EL PROCEDIMIENTO CONSISTE EN TOMAR ESTA COMPOSICION, INCORPORAR EN ELLA CARGAS, PIGMENTOS, RETARDADORES DE COMBUSTION, FIBRAS DE REFUERZO Y MATERIALES TIXOTROPICOS. SE SOMETE TODO ELLO A RADIACION ELECTROMAGNETICA EN UN INTERVALO DE 400 A 800 NM. DE LONGITUD DE ONDA. SE SIGUE EL EMPALIDECIMIENTO DE LA RESINA POR FOTOREDUCCION DEL COMPONENTE HASTA QUE SE OBTENGA UN PRODUCTO RESINOSO CURADO, PALIDO.
ES487552A 1979-01-11 1980-01-09 Un procedimiento para curar una composicion de resina de po-liester insaturado. Granted ES487552A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7901117 1979-01-11

Publications (2)

Publication Number Publication Date
ES8102171A1 true ES8102171A1 (es) 1980-12-16
ES487552A0 ES487552A0 (es) 1980-12-16

Family

ID=10502471

Family Applications (1)

Application Number Title Priority Date Filing Date
ES487552A Granted ES487552A0 (es) 1979-01-11 1980-01-09 Un procedimiento para curar una composicion de resina de po-liester insaturado.

Country Status (14)

Country Link
US (1) US4353787A (es)
EP (1) EP0014293B1 (es)
JP (1) JPS6015646B2 (es)
AT (1) ATE2463T1 (es)
AU (1) AU521468B2 (es)
BR (1) BR8000120A (es)
CA (1) CA1116777A (es)
DE (1) DE2964765D1 (es)
ES (1) ES487552A0 (es)
FI (1) FI800075A (es)
NO (1) NO150963C (es)
NZ (1) NZ192560A (es)
PT (1) PT70649A (es)
ZA (1) ZA80137B (es)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE26458T1 (de) * 1982-06-10 1987-04-15 Warwick Int Ltd Photohaertbare harze und ihre verwendung.
DE3660255D1 (en) * 1985-04-12 1988-07-07 Ciba Geigy Ag Oxime sulphonates containing reactive groups
JPS63146915A (ja) * 1986-07-18 1988-06-18 Nippon Shokubai Kagaku Kogyo Co Ltd 耐黄変性にすぐれた易染性熱硬化性樹脂組成物
US4743528A (en) * 1986-11-21 1988-05-10 Eastman Kodak Company Enhanced imaging composition containing an azinium activator
EP0269397A3 (en) * 1986-11-21 1988-12-07 EASTMAN KODAK COMPANY (a New Jersey corporation) Dye sensitized photographic imaging system
JPS63193025A (ja) * 1987-02-05 1988-08-10 Daiwa Shinku Kogyosho:Kk 圧力検知器
DE3710281A1 (de) * 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3710282A1 (de) * 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743454A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743455A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
US8883948B2 (en) 2008-07-01 2014-11-11 The Regents Of The University Of Colorado Methods for extensive dark curing based on visible-light initiated, controlled radical polymerization

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3351603A (en) * 1965-02-19 1967-11-07 American Cyanamid Co Acrylate colorless transparent photoactivatable cementing compositions
GB1180846A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
GB1408265A (en) 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
GB1537921A (en) 1977-02-18 1979-01-10 Ward Blenkinsop & Co Ltd Substituted oxime esters and their use as photoinitiators

Also Published As

Publication number Publication date
FI800075A (fi) 1980-07-12
NZ192560A (en) 1981-04-24
CA1116777A (en) 1982-01-19
DE2964765D1 (en) 1983-03-17
ZA80137B (en) 1981-01-28
NO794328L (no) 1980-07-14
AU521468B2 (en) 1982-04-01
JPS6015646B2 (ja) 1985-04-20
BR8000120A (pt) 1980-10-21
EP0014293A1 (en) 1980-08-20
US4353787A (en) 1982-10-12
AU5435980A (en) 1980-07-17
ES487552A0 (es) 1980-12-16
EP0014293B1 (en) 1983-02-09
ATE2463T1 (de) 1983-03-15
NO150963B (no) 1984-10-08
PT70649A (en) 1980-01-01
NO150963C (no) 1985-01-16
JPS5594919A (en) 1980-07-18

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