ES548189A0 - Procedimiento litografico para la fabricacion de dispositi- vos semiconductores - Google Patents

Procedimiento litografico para la fabricacion de dispositi- vos semiconductores

Info

Publication number
ES548189A0
ES548189A0 ES548189A ES548189A ES548189A0 ES 548189 A0 ES548189 A0 ES 548189A0 ES 548189 A ES548189 A ES 548189A ES 548189 A ES548189 A ES 548189A ES 548189 A0 ES548189 A0 ES 548189A0
Authority
ES
Spain
Prior art keywords
manufacture
semiconducting devices
lithographic procedure
lithographic
procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES548189A
Other languages
English (en)
Other versions
ES8707377A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Publication of ES548189A0 publication Critical patent/ES548189A0/es
Publication of ES8707377A1 publication Critical patent/ES8707377A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/18—Coating curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
ES548189A 1984-10-29 1985-10-24 Procedimiento litografico para la fabricacion de dispositi- vos semiconductores Expired ES8707377A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US66597084A 1984-10-29 1984-10-29

Publications (2)

Publication Number Publication Date
ES548189A0 true ES548189A0 (es) 1987-07-01
ES8707377A1 ES8707377A1 (es) 1987-07-01

Family

ID=24672289

Family Applications (1)

Application Number Title Priority Date Filing Date
ES548189A Expired ES8707377A1 (es) 1984-10-29 1985-10-24 Procedimiento litografico para la fabricacion de dispositi- vos semiconductores

Country Status (7)

Country Link
EP (1) EP0203931B1 (es)
JP (1) JPH0766191B2 (es)
KR (1) KR910005880B1 (es)
CA (1) CA1291894C (es)
DE (1) DE3569163D1 (es)
ES (1) ES8707377A1 (es)
WO (1) WO1986002744A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0171918B1 (ko) * 1994-03-25 1999-03-30 김주용 감광수지 코팅 두께 조절방법 및 조절장치
US7364644B2 (en) 2002-08-29 2008-04-29 Micron Technology, Inc. Silver selenide film stoichiometry and morphology control in sputter deposition
JP2007260895A (ja) 2006-03-28 2007-10-11 Erich Thallner マイクロ構造および／またはナノ構造の構造基板をコーティングするための装置および方法
EP1840940B8 (de) 2006-03-28 2014-11-26 Thallner, Erich, Dipl.-Ing. Vorrichtung und Verfahren zum Beschichten eines mikro- und/oder nanostrukturierten Struktursubstrats

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1216958A (en) * 1969-09-22 1970-12-23 Epec Ind Inc Method of, and apparatus for, spray coating
FR2110622A5 (es) * 1970-10-23 1972-06-02 Commissariat Energie Atomique
US4069076A (en) * 1976-11-29 1978-01-17 E. I. Du Pont De Nemours And Company Liquid lamination process
CA1152230A (en) * 1979-10-18 1983-08-16 Christopher P. Ausschnitt Coating method and apparatus
JPS57186750A (en) * 1981-05-12 1982-11-17 Nec Corp Applying method of photoresist

Also Published As

Publication number Publication date
EP0203931B1 (en) 1989-03-29
CA1291894C (en) 1991-11-12
JPS62500614A (ja) 1987-03-12
KR880700322A (ko) 1988-02-22
JPH0766191B2 (ja) 1995-07-19
EP0203931A1 (en) 1986-12-10
KR910005880B1 (ko) 1991-08-06
WO1986002744A1 (en) 1986-05-09
DE3569163D1 (en) 1989-05-03
ES8707377A1 (es) 1987-07-01

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20040916