ES523785A0 - Metodo para metalizar una superficie no metalica por chapado electrolitico - Google Patents

Metodo para metalizar una superficie no metalica por chapado electrolitico

Info

Publication number
ES523785A0
ES523785A0 ES523785A ES523785A ES523785A0 ES 523785 A0 ES523785 A0 ES 523785A0 ES 523785 A ES523785 A ES 523785A ES 523785 A ES523785 A ES 523785A ES 523785 A0 ES523785 A0 ES 523785A0
Authority
ES
Spain
Prior art keywords
metallizing
electrolytic plating
metallic surface
metallic
electrolytic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES523785A
Other languages
English (en)
Spanish (es)
Other versions
ES8404769A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kollmorgen Technologies Corp
Original Assignee
Kollmorgen Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kollmorgen Technologies Corp filed Critical Kollmorgen Technologies Corp
Publication of ES8404769A1 publication Critical patent/ES8404769A1/es
Publication of ES523785A0 publication Critical patent/ES523785A0/es
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
    • H05K3/424—Plated through-holes or plated via connections characterised by electroplating method by direct electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C25D5/56—Electroplating of non-metallic surfaces of plastics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
    • C23C18/1879—Use of metal, e.g. activation, sensitisation with noble metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1886—Multistep pretreatment
    • C23C18/1889—Multistep pretreatment with use of metal first
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/285—Sensitising or activating with tin based compound or composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/17—Post-manufacturing processes
    • H05K2203/173—Adding connections between adjacent pads or conductors, e.g. for modifying or repairing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Chemically Coating (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
ES523785A 1982-07-01 1983-07-01 Metodo para metalizar una superficie no metalica por chapado electrolitico Granted ES523785A0 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39444282A 1982-07-01 1982-07-01
US50116783A 1983-06-10 1983-06-10

Publications (2)

Publication Number Publication Date
ES8404769A1 ES8404769A1 (es) 1984-05-16
ES523785A0 true ES523785A0 (es) 1984-05-16

Family

ID=27014738

Family Applications (1)

Application Number Title Priority Date Filing Date
ES523785A Granted ES523785A0 (es) 1982-07-01 1983-07-01 Metodo para metalizar una superficie no metalica por chapado electrolitico

Country Status (15)

Country Link
KR (1) KR890002623B1 (ru)
AT (1) AT383149B (ru)
AU (1) AU564034B2 (ru)
CA (1) CA1226846A (ru)
CH (1) CH655518B (ru)
DE (1) DE3323476A1 (ru)
DK (1) DK303083A (ru)
ES (1) ES523785A0 (ru)
FR (1) FR2529582B1 (ru)
GB (1) GB2123036B (ru)
IL (1) IL69122A (ru)
IN (1) IN160555B (ru)
IT (1) IT1208659B (ru)
NL (1) NL8302344A (ru)
SE (1) SE462434B (ru)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3339946A1 (de) * 1983-11-04 1985-05-23 Klaus 6500 Mainz Eisenmenger Verfahren zum metallisieren der bohrungswandungen in leiterplatten
DE3412447A1 (de) * 1984-03-31 1985-11-28 Schering AG, 1000 Berlin und 4709 Bergkamen Verfahren zur herstellung von gedruckten schaltungen
US4891069A (en) * 1986-06-06 1990-01-02 Techno Instruments Investments 1983 Ltd. Composition for the electrolytic coating of circuit boards without an electroless metal coating
US4749449A (en) * 1987-06-05 1988-06-07 E. I. Du Pont De Nemours And Company Metallization utilizing a catalyst which is removed or deactivated from undesired surface areas
US5007990A (en) * 1987-07-10 1991-04-16 Shipley Company Inc. Electroplating process
DE3741459C1 (de) * 1987-12-08 1989-04-13 Blasberg Oberflaechentech Verfahren zur Herstellung durchkontaktierter Leiterplatten
US4810333A (en) * 1987-12-14 1989-03-07 Shipley Company Inc. Electroplating process
US4895739A (en) * 1988-02-08 1990-01-23 Shipley Company Inc. Pretreatment for electroplating process
US4873136A (en) * 1988-06-16 1989-10-10 General Electric Company Method for preparing polymer surfaces for subsequent plating thereon, and improved metal-plated plastic articles made therefrom
US5068013A (en) * 1988-08-23 1991-11-26 Shipley Company Inc. Electroplating composition and process
US5004525A (en) * 1988-08-23 1991-04-02 Shipley Company Inc. Copper electroplating composition
US4969979A (en) * 1989-05-08 1990-11-13 International Business Machines Corporation Direct electroplating of through holes
DE3928832C2 (de) * 1989-08-31 1995-04-20 Blasberg Oberflaechentech Verfahren zur Herstellung von durchkontaktierten Leiterplatten und Leiterplatten-Halbzeug
AU644602B2 (en) * 1989-08-31 1993-12-16 Blasberg-Oberflachentechnik Gmbh Plated-through printed circuit board with resist and process for producing it
US5071517A (en) * 1989-11-21 1991-12-10 Solution Technology Systems Method for directly electroplating a dielectric substrate and plated substrate so produced
US5342501A (en) * 1989-11-21 1994-08-30 Eric F. Harnden Method for electroplating metal onto a non-conductive substrate treated with basic accelerating solutions for metal plating
US4959121A (en) * 1990-01-05 1990-09-25 General Electric Company Method for treating a polyimide surface for subsequent plating thereon
US5207888A (en) * 1991-06-24 1993-05-04 Shipley Company Inc. Electroplating process and composition
US5376248A (en) * 1991-10-15 1994-12-27 Enthone-Omi, Inc. Direct metallization process
DE4138214A1 (de) * 1991-11-21 1993-05-27 Daimler Benz Ag Verfahren zur metallisierung von aluminiumnitridkeramik
US5262042A (en) * 1991-12-12 1993-11-16 Eric F. Harnden Simplified method for direct electroplating of dielectric substrates
DE4206680C1 (de) * 1992-02-28 1994-01-27 Schering Ag Verfahren zur Metallisierung von Nichtleiteroberflächen und die Verwendung von Hydroxymethansulfinsäure im Verfahren
US5262041A (en) * 1992-12-11 1993-11-16 Shipley Company Inc. Additive plating process
US5415762A (en) * 1993-08-18 1995-05-16 Shipley Company Inc. Electroplating process and composition
DE4412463C3 (de) * 1994-04-08 2000-02-10 Atotech Deutschland Gmbh Verfahren zur Herstellung einer Palladium-Kolloid-Lösung und ihre Verwendung
US5626736A (en) 1996-01-19 1997-05-06 Shipley Company, L.L.C. Electroplating process
DE19643823C2 (de) * 1996-10-30 2002-10-17 Lpw Chemie Gmbh Verfahren zur direkten Funktionsmetallisierung der Oberfläche eines Kunststoffgegenstandes
FR2946433B1 (fr) 2009-06-05 2013-07-12 Ecole Polytechnique Dgar Utilisation d'une couche de silicium amorphe et procede d'analyse
KR101460749B1 (ko) * 2013-06-12 2014-11-13 (주)제이스 우수한 방열성을 갖는 Ｍｅｔａｌ ＰＣＢ 적층 기술 개발

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2733198A (en) * 1956-01-31 Acid copper plating bath
US3095608A (en) * 1959-12-09 1963-07-02 Cabot Corp Process and apparatus for extruding and curing polymeric compositions
US3099608A (en) * 1959-12-30 1963-07-30 Ibm Method of electroplating on a dielectric base
US3414493A (en) * 1965-10-19 1968-12-03 Lea Ronal Inc Electrodeposition of copper
DE1790293B2 (de) * 1966-02-22 1973-12-13 Photocircuits Corp., Glen Cove, N.Y. (V.St.A.) Verfahren zur Herstellung von ge druckten Schaltungen Ausscheidung aus 1665314
US3682671A (en) * 1970-02-05 1972-08-08 Kollmorgen Corp Novel precious metal sensitizing solutions
FR2102630A5 (en) * 1970-08-12 1972-04-07 Commissariat Energie Atomique Insulant-metal-bond formation process - esp for metal coating of quartz tubes
FR2122456B1 (ru) * 1971-01-20 1976-07-23 Hoechst Ag
US3984290A (en) * 1973-10-01 1976-10-05 Georgy Avenirovich Kitaev Method of forming intralayer junctions in a multilayer structure
US4336114A (en) * 1981-03-26 1982-06-22 Hooker Chemicals & Plastics Corp. Electrodeposition of bright copper

Also Published As

Publication number Publication date
IT1208659B (it) 1989-07-10
NL8302344A (nl) 1984-02-01
KR840005498A (ko) 1984-11-14
DK303083D0 (da) 1983-06-30
IL69122A (en) 1987-01-30
IT8348608A0 (it) 1983-07-01
FR2529582A1 (fr) 1984-01-06
KR890002623B1 (en) 1989-07-20
ES8404769A1 (es) 1984-05-16
AT383149B (de) 1987-05-25
CA1226846A (en) 1987-09-15
DE3323476A1 (de) 1984-01-05
IL69122A0 (en) 1983-10-31
SE8303716D0 (sv) 1983-06-29
IN160555B (ru) 1987-07-18
GB2123036A (en) 1984-01-25
AU1648183A (en) 1984-01-05
DE3323476C2 (ru) 1988-10-20
SE462434B (sv) 1990-06-25
DK303083A (da) 1984-01-02
SE8303716L (sv) 1984-01-02
ATA240783A (de) 1986-10-15
AU564034B2 (en) 1987-07-30
GB8317516D0 (en) 1983-08-03
CH655518B (ru) 1986-04-30
FR2529582B1 (fr) 1989-05-19
GB2123036B (en) 1986-07-09

Similar Documents

Publication Publication Date Title
ES523785A0 (es) Metodo para metalizar una superficie no metalica por chapado electrolitico
ES551786A0 (es) Un metodo para electrodepositar un objeto en un bano de electrodeposicion catodico.
DE3584071D1 (de) Verfahren zum aufrauhen einer flaeche.
ATA905283A (de) Loesung zur entfernung von zinn oder zinnbleilegierungslot von einer kupfer- oder nickelbasis
IT1159388B (it) Procedimento per formare laminati a piu strati
ES548687A0 (es) Mejoras en un metodo para depositar por electrodeposicion catodica una composicion de resina
IT1212979B (it) Procedimento per la produzione dicarta a strati multipli
IT1151712B (it) Elemento abrasivo ottenuto per deposito elettrolitico di diamante
ES544862A0 (es) Un metodo para preparar un compuesto de morfolinol
PT78057A (en) Process for bunding high efficiency chromium electrodeposits
DE3371798D1 (en) Method for decreasing plated metal defects by treating a metallic surface
ES529034A0 (es) Un metodo para preparar nuevos compuestos de benzoilurea
BR8303459A (pt) Cuba de eletrolise para a producao de aluminio por eletrolise de alumina
IT1206526B (it) Procedimento di elettroplaccatura con cromo trivalente
ES498827A0 (es) Un metodo para la deposicion electrolitica de metales
ES534085A0 (es) Un metodo para extraer cobre de minerales o concentrados sulfurados
ES528525A0 (es) Metodo para la obtencion de una reaccion ceramica por multifase incrustada
GB8414863D0 (en) Bath for electro-depositing copper
GB8529856D0 (en) Cyanide-free copper plating process
BR8305366A (pt) Metodo para a producao de l-fenil-alanina
ES518534A0 (es) Metodo para producir un articulo resistente a la corrosion chapado electroliticamente con zinc-niquel.
ES521045A0 (es) Un metodo de revestir una superficie metalica.
IT8367131A0 (it) Procedimento di elettroplaccatura particolarmente cromatura
DE3376023D1 (en) Method for selective electroplating
ES534299A0 (es) Un metodo para recubrir por electrodeposicion catodica una superficie eletricamente conductora