ES515390A0 - Procedimiento y dispositivo para la obtencion de tiras exentas de metal durante la evaporacion de metal de una banda de material aislante. - Google Patents

Procedimiento y dispositivo para la obtencion de tiras exentas de metal durante la evaporacion de metal de una banda de material aislante.

Info

Publication number
ES515390A0
ES515390A0 ES515390A ES515390A ES515390A0 ES 515390 A0 ES515390 A0 ES 515390A0 ES 515390 A ES515390 A ES 515390A ES 515390 A ES515390 A ES 515390A ES 515390 A0 ES515390 A0 ES 515390A0
Authority
ES
Spain
Prior art keywords
band
procedure
insulating material
metal
strips during
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES515390A
Other languages
English (en)
Spanish (es)
Other versions
ES8305841A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of ES8305841A1 publication Critical patent/ES8305841A1/es
Publication of ES515390A0 publication Critical patent/ES515390A0/es
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Physical Vapour Deposition (AREA)
ES515390A 1981-09-01 1982-08-31 Procedimiento y dispositivo para la obtencion de tiras exentas de metal durante la evaporacion de metal de una banda de material aislante. Granted ES515390A0 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3134589 1981-09-01
DE19823224234 DE3224234A1 (de) 1981-09-01 1982-06-29 Verfahren zur herstellung von metallfreien streifen bei der metallbedampfung eines isolierstoffbandes und vorrichtung zur durchfuehrung des verfahrens

Publications (2)

Publication Number Publication Date
ES8305841A1 ES8305841A1 (es) 1983-05-01
ES515390A0 true ES515390A0 (es) 1983-05-01

Family

ID=25795689

Family Applications (1)

Application Number Title Priority Date Filing Date
ES515390A Granted ES515390A0 (es) 1981-09-01 1982-08-31 Procedimiento y dispositivo para la obtencion de tiras exentas de metal durante la evaporacion de metal de una banda de material aislante.

Country Status (5)

Country Link
US (1) US4478878A (enExample)
EP (1) EP0073949A3 (enExample)
DE (1) DE3224234A1 (enExample)
ES (1) ES515390A0 (enExample)
FI (1) FI823010L (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4681780A (en) * 1983-12-01 1987-07-21 Polaroid Corporation Continuously cleaned rotary coating mask
JPS6173875A (ja) * 1984-09-17 1986-04-16 Mitsubishi Heavy Ind Ltd 流路幅調整板付き真空蒸着装置
US4682565A (en) * 1984-11-19 1987-07-28 Sfe Technologies Vapor nozzle with gas barrier bars
DE3514824A1 (de) * 1985-04-24 1986-11-06 Siemens Ag Verfahren zur bildung von schmalen, metallfreien streifen in der metallschicht von kunststoffolien
DE3922187A1 (de) * 1989-07-06 1991-01-17 Leybold Ag Vorrichtung zum herstellen von metallfreien streifen bei im vakuum beschichteten folienbahnen, insbesondere fuer kondensatoren
EP0488535A3 (en) * 1990-11-08 1992-09-23 Bmc Technology Corporation Method and apparatus for manufacturing electrodes for multilayer ceramic capacitors
DE4310085A1 (de) * 1993-03-27 1994-09-29 Leybold Ag Verfahren und Vorrichtung zur Erzeugung von Mustern auf Substraten
US5512315A (en) * 1994-06-01 1996-04-30 Roederstein Electronics, Inc. Capacitor manufacturing technique
DE19527604A1 (de) * 1995-07-28 1997-01-30 Leybold Ag Verfahren und Vorrichtung zur Herstellung von metallfreien Streifen bei der Metallbedampfung
DE19912707B4 (de) * 1999-03-20 2010-01-21 Applied Materials Gmbh & Co. Kg Behandlungsanlage für flache Substrate
DE10008097A1 (de) * 2000-02-22 2001-09-20 Forschungszentrum Juelich Gmbh Markierungseinrichtung sowie Verfahren zum Auslesen einer solchen Markierungseinrichtung
US20080317974A1 (en) * 2005-08-26 2008-12-25 Fujifilm Manufacturing Europe B.V. Method and Arrangement for Generating and Controlling a Discharge Plasma
DE05425831T1 (de) 2005-11-23 2007-01-04 Galileo Vacuum Systems S.P.A. Kammer zur Metallisierung unter Vakuum mit Vorrichtungen zur partiellen Beschichtung
EP2024533A1 (en) * 2006-05-30 2009-02-18 Fuji Film Manufacturing Europe B.V. Method and apparatus for deposition using pulsed atmospheric pressure glow discharge
EP2032738A1 (en) * 2006-06-16 2009-03-11 Fuji Film Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
WO2008100139A1 (en) * 2007-02-13 2008-08-21 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
EP1975272A1 (en) 2007-03-27 2008-10-01 Galileo Vacuum Systems S.p.A. Device for vacuum deposition of a coating on a continuous material, with liquid applicator
DE102007027435A1 (de) * 2007-06-14 2008-12-18 X-Fab Semiconductor Foundries Ag Verfahren und Vorrichtung zur strukturierten Schichtabscheidung auf prozessierten Mikrosystemtechnikwafern
DE102007031457A1 (de) 2007-07-05 2009-01-08 Leybold Optics Gmbh Verfahren und Vorrichtung zur Aufbringung einer Schicht eines Trennmittels auf ein Substrat
US8702999B2 (en) * 2008-02-01 2014-04-22 Fujifilm Manufacturing Europe B.V. Method and apparatus for plasma surface treatment of a moving substrate
US8445897B2 (en) * 2008-02-08 2013-05-21 Fujifilm Manufacturing Europe B.V. Method for manufacturing a multi-layer stack structure with improved WVTR barrier property

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB836991A (en) * 1955-12-05 1960-06-09 Telephone Mfg Co Ltd Improvements in and relating to coating extended supports
DE1262732B (de) * 1962-07-04 1968-03-07 Siemens Ag Vorrichtung zum gleichzeitigen Aufdampfen von mehreren parallelen Streifen aus fluessigen oder fettartigen Stoffen mit niedrigem Dampfdruck auf insbesondere fuer die Herstellung elektrischer Kondensatoren bestimmten Baendern als Abdeckmittel fuer eine nachfolgende Metallbedampfung
DE1521588A1 (de) * 1966-12-05 1969-09-18 Lokomotivbau Elektrotech Einrichtung zum Schutz gegen Bedampfung in Vakuumschmelz- und-verdampfungsanlagen
DE2112405A1 (de) * 1971-03-15 1972-09-21 Siemens Ag Vorrichtung zum Erzeugen metallisierter Laengsstreifen auf Folien
DE2652438B2 (de) * 1976-11-17 1978-08-31 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung von metallfreien Streifen bei der Metallbedampfung eines Isolierstoffbandes und Vorrichtung zu dessen Durchführung

Also Published As

Publication number Publication date
ES8305841A1 (es) 1983-05-01
EP0073949A2 (de) 1983-03-16
FI823010A7 (fi) 1983-03-02
DE3224234C2 (enExample) 1988-01-14
FI823010L (fi) 1983-03-02
EP0073949A3 (de) 1984-01-11
FI823010A0 (fi) 1982-08-31
DE3224234A1 (de) 1983-03-10
US4478878A (en) 1984-10-23

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