ES507904A0 - Procedimiento para la obtencion de placas en relieve usando un material de grabacion fotopolimerizable. - Google Patents

Procedimiento para la obtencion de placas en relieve usando un material de grabacion fotopolimerizable.

Info

Publication number
ES507904A0
ES507904A0 ES507904A ES507904A ES507904A0 ES 507904 A0 ES507904 A0 ES 507904A0 ES 507904 A ES507904 A ES 507904A ES 507904 A ES507904 A ES 507904A ES 507904 A0 ES507904 A0 ES 507904A0
Authority
ES
Spain
Prior art keywords
photopolymerable
procedure
recording material
relief plates
obtaining relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES507904A
Other languages
English (en)
Other versions
ES8301370A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of ES8301370A1 publication Critical patent/ES8301370A1/es
Publication of ES507904A0 publication Critical patent/ES507904A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/6705—Unsaturated polymers not provided for in the groups C08G18/671, C08G18/6795, C08G18/68 or C08G18/69

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
ES507904A 1980-12-13 1981-12-11 Procedimiento para la obtencion de placas en relieve usando un material de grabacion fotopolimerizable. Granted ES507904A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803047026 DE3047026A1 (de) 1980-12-13 1980-12-13 Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials

Publications (2)

Publication Number Publication Date
ES8301370A1 ES8301370A1 (es) 1982-11-16
ES507904A0 true ES507904A0 (es) 1982-11-16

Family

ID=6119088

Family Applications (1)

Application Number Title Priority Date Filing Date
ES507904A Granted ES507904A0 (es) 1980-12-13 1981-12-11 Procedimiento para la obtencion de placas en relieve usando un material de grabacion fotopolimerizable.

Country Status (5)

Country Link
EP (1) EP0054150B1 (es)
JP (1) JPS57124345A (es)
DE (2) DE3047026A1 (es)
DK (1) DK549481A (es)
ES (1) ES507904A0 (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59111638A (ja) * 1982-12-18 1984-06-27 Toyo Tire & Rubber Co Ltd 感光性組成物
JPS59113430A (ja) * 1982-12-18 1984-06-30 Toyo Tire & Rubber Co Ltd 水溶性感光性組成物
JPS59154443A (ja) * 1983-02-22 1984-09-03 Dainippon Ink & Chem Inc 感光性組成物
DE3328285A1 (de) * 1983-08-05 1985-02-21 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von lichtgehaerteten schichten mit definierter haerte
JPH06103391B2 (ja) * 1985-09-20 1994-12-14 富士写真フイルム株式会社 感光性記録材料
JPH021859A (ja) * 1988-06-13 1990-01-08 Toyobo Co Ltd 感光性樹脂組成物
JP2682211B2 (ja) * 1990-08-09 1997-11-26 東洋紡績株式会社 感光性樹脂組成物
US5328805A (en) * 1992-08-28 1994-07-12 W. R. Grace & Co.-Conn. Aqueous developable photosensitive polyurethane-(meth)acrylate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2116591A1 (en) * 1970-04-15 1971-10-28 Grace W R & Co Polymer matrix for direct prodn of stereos

Also Published As

Publication number Publication date
DE3047026A1 (de) 1982-07-22
JPS57124345A (en) 1982-08-03
EP0054150A1 (de) 1982-06-23
DE3163528D1 (en) 1984-06-14
ES8301370A1 (es) 1982-11-16
DK549481A (da) 1982-06-14
EP0054150B1 (de) 1984-05-09

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