ES430442A1 - Photopolymerisable compositions - Google Patents
Photopolymerisable compositionsInfo
- Publication number
- ES430442A1 ES430442A1 ES430442A ES430442A ES430442A1 ES 430442 A1 ES430442 A1 ES 430442A1 ES 430442 A ES430442 A ES 430442A ES 430442 A ES430442 A ES 430442A ES 430442 A1 ES430442 A1 ES 430442A1
- Authority
- ES
- Spain
- Prior art keywords
- water
- soluble
- dispersible
- composition
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Graft Or Block Polymers (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Process for preparing a photopolymerizable composition, characterized in that it comprises mixing: (a) a polymer or copolymer soluble in water or dispersible in water, or a polymeric or copolymeric mixture in which one or more of the components is soluble in water or dispersible in Water; (b) an addition polymerizable monomer that is soluble in or compatible with a solvent or dispersant medium for (a); and (c) a photoinitiator capable of initiating polymerization of the monomer, whereby the composition can be made insoluble in water by radiation. (Machine-translation by Google Translate, not legally binding)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB45090/73A GB1489567A (en) | 1973-09-26 | 1973-09-26 | Photopolymerisable compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES430442A1 true ES430442A1 (en) | 1976-10-16 |
Family
ID=10435847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES430442A Expired ES430442A1 (en) | 1973-09-26 | 1974-09-26 | Photopolymerisable compositions |
Country Status (19)
| Country | Link |
|---|---|
| JP (1) | JPS5077104A (en) |
| AT (1) | AT344202B (en) |
| BE (1) | BE820404A (en) |
| CA (1) | CA1064755A (en) |
| DE (1) | DE2446056A1 (en) |
| DK (1) | DK504374A (en) |
| ES (1) | ES430442A1 (en) |
| FI (1) | FI277574A (en) |
| FR (1) | FR2244793B1 (en) |
| GB (1) | GB1489567A (en) |
| IE (1) | IE40031B1 (en) |
| IT (1) | IT1030620B (en) |
| LU (1) | LU71000A1 (en) |
| MC (1) | MC1037A1 (en) |
| NL (1) | NL7412653A (en) |
| NO (1) | NO743464L (en) |
| PL (1) | PL102117B1 (en) |
| SE (1) | SE403913B (en) |
| ZA (1) | ZA746059B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54147031A (en) * | 1978-05-11 | 1979-11-16 | Toray Industries | Photosensitive material |
| DE2822190A1 (en) * | 1978-05-20 | 1979-11-22 | Hoechst Ag | PHOTOPOLYMERIZABLE MIXTURE |
| DE3441787A1 (en) * | 1984-03-17 | 1985-09-19 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Photopolymerisable mixture and recording material produced from it |
| JPH0760264B2 (en) * | 1984-06-29 | 1995-06-28 | 日本合成化学工業株式会社 | Photosensitive resin composition |
| DE3447356A1 (en) * | 1984-12-24 | 1986-07-03 | Basf Ag, 6700 Ludwigshafen | LIGHT SENSITIVE RECORDING ELEMENT |
-
1973
- 1973-09-26 GB GB45090/73A patent/GB1489567A/en not_active Expired
-
1974
- 1974-09-19 IE IE1938/74A patent/IE40031B1/en unknown
- 1974-09-24 FI FI2775/74A patent/FI277574A/fi unknown
- 1974-09-24 ZA ZA00746059A patent/ZA746059B/en unknown
- 1974-09-25 NO NO743464A patent/NO743464L/no unknown
- 1974-09-25 CA CA210,077A patent/CA1064755A/en not_active Expired
- 1974-09-25 FR FR7432297A patent/FR2244793B1/fr not_active Expired
- 1974-09-25 PL PL1974174324A patent/PL102117B1/en unknown
- 1974-09-25 SE SE7412063A patent/SE403913B/en unknown
- 1974-09-25 DK DK504374A patent/DK504374A/da unknown
- 1974-09-25 NL NL7412653A patent/NL7412653A/en not_active Application Discontinuation
- 1974-09-25 IT IT27711/74A patent/IT1030620B/en active
- 1974-09-25 LU LU71000A patent/LU71000A1/xx unknown
- 1974-09-25 MC MC1125A patent/MC1037A1/en unknown
- 1974-09-26 AT AT774674A patent/AT344202B/en not_active IP Right Cessation
- 1974-09-26 DE DE19742446056 patent/DE2446056A1/en not_active Withdrawn
- 1974-09-26 JP JP49111395A patent/JPS5077104A/ja active Pending
- 1974-09-26 BE BE148956A patent/BE820404A/en unknown
- 1974-09-26 ES ES430442A patent/ES430442A1/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE403913B (en) | 1978-09-11 |
| PL102117B1 (en) | 1979-03-31 |
| MC1037A1 (en) | 1975-05-30 |
| NO743464L (en) | 1975-04-28 |
| IT1030620B (en) | 1979-04-10 |
| SE7412063L (en) | 1975-03-27 |
| IE40031B1 (en) | 1979-02-28 |
| CA1064755A (en) | 1979-10-23 |
| BE820404A (en) | 1975-03-26 |
| AU7368674A (en) | 1976-04-01 |
| LU71000A1 (en) | 1976-02-04 |
| JPS5077104A (en) | 1975-06-24 |
| DK504374A (en) | 1975-06-09 |
| NL7412653A (en) | 1975-04-01 |
| AT344202B (en) | 1978-07-10 |
| FR2244793B1 (en) | 1978-07-13 |
| GB1489567A (en) | 1977-10-19 |
| FR2244793A1 (en) | 1975-04-18 |
| IE40031L (en) | 1975-03-26 |
| FI277574A (en) | 1975-03-27 |
| ZA746059B (en) | 1976-04-28 |
| ATA774674A (en) | 1977-11-15 |
| DE2446056A1 (en) | 1975-04-03 |
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