MC1037A1 - New photopolymerizable compositions, their preparation and their applications - Google Patents

New photopolymerizable compositions, their preparation and their applications

Info

Publication number
MC1037A1
MC1037A1 MC1125A MC1125A MC1037A1 MC 1037 A1 MC1037 A1 MC 1037A1 MC 1125 A MC1125 A MC 1125A MC 1125 A MC1125 A MC 1125A MC 1037 A1 MC1037 A1 MC 1037A1
Authority
MC
Monaco
Prior art keywords
applications
preparation
photopolymerizable compositions
new photopolymerizable
new
Prior art date
Application number
MC1125A
Other languages
French (fr)
Original Assignee
Imp Chemical Ind Limited Soc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imp Chemical Ind Limited Soc filed Critical Imp Chemical Ind Limited Soc
Publication of MC1037A1 publication Critical patent/MC1037A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
MC1125A 1973-09-26 1974-09-25 New photopolymerizable compositions, their preparation and their applications MC1037A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB45090/73A GB1489567A (en) 1973-09-26 1973-09-26 Photopolymerisable compositions

Publications (1)

Publication Number Publication Date
MC1037A1 true MC1037A1 (en) 1975-05-30

Family

ID=10435847

Family Applications (1)

Application Number Title Priority Date Filing Date
MC1125A MC1037A1 (en) 1973-09-26 1974-09-25 New photopolymerizable compositions, their preparation and their applications

Country Status (19)

Country Link
JP (1) JPS5077104A (en)
AT (1) AT344202B (en)
BE (1) BE820404A (en)
CA (1) CA1064755A (en)
DE (1) DE2446056A1 (en)
DK (1) DK504374A (en)
ES (1) ES430442A1 (en)
FI (1) FI277574A (en)
FR (1) FR2244793B1 (en)
GB (1) GB1489567A (en)
IE (1) IE40031B1 (en)
IT (1) IT1030620B (en)
LU (1) LU71000A1 (en)
MC (1) MC1037A1 (en)
NL (1) NL7412653A (en)
NO (1) NO743464L (en)
PL (1) PL102117B1 (en)
SE (1) SE403913B (en)
ZA (1) ZA746059B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54147031A (en) * 1978-05-11 1979-11-16 Toray Industries Photosensitive material
DE2822190A1 (en) * 1978-05-20 1979-11-22 Hoechst Ag PHOTOPOLYMERIZABLE MIXTURE
DE3441787A1 (en) * 1984-03-17 1985-09-19 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Photopolymerisable mixture and recording material produced from it
JPH0760264B2 (en) * 1984-06-29 1995-06-28 日本合成化学工業株式会社 Photosensitive resin composition
DE3447356A1 (en) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen LIGHT SENSITIVE RECORDING ELEMENT

Also Published As

Publication number Publication date
BE820404A (en) 1975-03-26
JPS5077104A (en) 1975-06-24
DK504374A (en) 1975-06-09
ZA746059B (en) 1976-04-28
NL7412653A (en) 1975-04-01
PL102117B1 (en) 1979-03-31
GB1489567A (en) 1977-10-19
FI277574A (en) 1975-03-27
IT1030620B (en) 1979-04-10
AT344202B (en) 1978-07-10
SE7412063L (en) 1975-03-27
LU71000A1 (en) 1976-02-04
SE403913B (en) 1978-09-11
FR2244793A1 (en) 1975-04-18
DE2446056A1 (en) 1975-04-03
IE40031L (en) 1975-03-26
NO743464L (en) 1975-04-28
AU7368674A (en) 1976-04-01
ATA774674A (en) 1977-11-15
CA1064755A (en) 1979-10-23
FR2244793B1 (en) 1978-07-13
IE40031B1 (en) 1979-02-28
ES430442A1 (en) 1976-10-16

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