ES397769A1 - Mejoras introducidas en un procedimiento para la elabora- cion de un material copiativo fotopolimerizable con isoto- sensibilidad aumentada. - Google Patents

Mejoras introducidas en un procedimiento para la elabora- cion de un material copiativo fotopolimerizable con isoto- sensibilidad aumentada.

Info

Publication number
ES397769A1
ES397769A1 ES397769A ES397769A ES397769A1 ES 397769 A1 ES397769 A1 ES 397769A1 ES 397769 A ES397769 A ES 397769A ES 397769 A ES397769 A ES 397769A ES 397769 A1 ES397769 A1 ES 397769A1
Authority
ES
Spain
Prior art keywords
carbon atoms
radical
photopolymerizable copying
aryl radical
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES397769A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of ES397769A1 publication Critical patent/ES397769A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/112—Cellulosic

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
ES397769A 1970-12-09 1971-12-07 Mejoras introducidas en un procedimiento para la elabora- cion de un material copiativo fotopolimerizable con isoto- sensibilidad aumentada. Expired ES397769A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2060576A DE2060576C3 (de) 1970-12-09 1970-12-09 Lichtempfindliches Gemisch

Publications (1)

Publication Number Publication Date
ES397769A1 true ES397769A1 (es) 1975-05-01

Family

ID=5790448

Family Applications (1)

Application Number Title Priority Date Filing Date
ES397769A Expired ES397769A1 (es) 1970-12-09 1971-12-07 Mejoras introducidas en un procedimiento para la elabora- cion de un material copiativo fotopolimerizable con isoto- sensibilidad aumentada.

Country Status (14)

Country Link
US (1) US3737320A (es)
JP (1) JPS5418567B1 (es)
AT (1) AT324833B (es)
AU (1) AU451135B2 (es)
BE (1) BE776325A (es)
CA (1) CA962507A (es)
DE (1) DE2060576C3 (es)
ES (1) ES397769A1 (es)
FR (1) FR2117572A5 (es)
GB (1) GB1365730A (es)
IT (1) IT945317B (es)
NL (1) NL7116374A (es)
SE (1) SE366846B (es)
ZA (1) ZA718227B (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2128991A1 (en) * 1993-08-02 1995-02-03 Hisao Takayanagi Benzoylacetylene derivatives
AT412346B (de) * 2003-09-12 2005-01-25 Robert Liska Photopolymerisierbare mischungen mit photoinitiatoren auf basis von di-inon-derivaten
US8092984B2 (en) * 2008-09-02 2012-01-10 Gary Ganghui Teng Lithographic printing plate having specific polymeric binders

Also Published As

Publication number Publication date
AU451135B2 (en) 1974-07-25
SU437316A3 (ru) 1974-07-25
CA962507A (en) 1975-02-11
AT324833B (de) 1975-09-25
JPS5418567B1 (es) 1979-07-09
NL7116374A (es) 1972-06-13
IT945317B (it) 1973-05-10
US3737320A (en) 1973-06-05
DE2060576B2 (de) 1977-11-17
AU3668671A (en) 1973-06-14
DE2060576C3 (de) 1978-08-03
ZA718227B (en) 1972-10-25
SE366846B (es) 1974-05-06
BE776325A (fr) 1972-06-06
GB1365730A (en) 1974-09-04
FR2117572A5 (es) 1972-07-21
DE2060576A1 (de) 1972-06-15

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