ES375193A1 - Procedimiento de cobreado por reduccion quimica. - Google Patents
Procedimiento de cobreado por reduccion quimica.Info
- Publication number
- ES375193A1 ES375193A1 ES375193A ES375193A ES375193A1 ES 375193 A1 ES375193 A1 ES 375193A1 ES 375193 A ES375193 A ES 375193A ES 375193 A ES375193 A ES 375193A ES 375193 A1 ES375193 A1 ES 375193A1
- Authority
- ES
- Spain
- Prior art keywords
- copper plating
- plating bath
- electroless copper
- ions
- chemical reduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78940269A | 1969-01-06 | 1969-01-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES375193A1 true ES375193A1 (es) | 1973-08-16 |
Family
ID=25147540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES375193A Expired ES375193A1 (es) | 1969-01-06 | 1970-01-05 | Procedimiento de cobreado por reduccion quimica. |
Country Status (3)
Country | Link |
---|---|
US (1) | US3615736A (es) |
ES (1) | ES375193A1 (es) |
GB (1) | GB1286941A (es) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5627594B2 (es) * | 1975-03-14 | 1981-06-25 | ||
US4217182A (en) * | 1978-06-07 | 1980-08-12 | Litton Systems, Inc. | Semi-additive process of manufacturing a printed circuit |
US4450191A (en) * | 1982-09-02 | 1984-05-22 | Omi International Corporation | Ammonium ions used as electroless copper plating rate controller |
US4751106A (en) * | 1986-09-25 | 1988-06-14 | Shipley Company Inc. | Metal plating process |
JPH04234765A (ja) * | 1990-08-29 | 1992-08-24 | Xerox Corp | 基体、ベルトおよび静電写真像形成部材、並びにこれらの製造方法 |
JP3052515B2 (ja) * | 1991-11-28 | 2000-06-12 | 上村工業株式会社 | 無電解銅めっき浴及びめっき方法 |
JP2001073182A (ja) * | 1999-07-15 | 2001-03-21 | Boc Group Inc:The | 改良された酸性銅電気メッキ用溶液 |
GB2385863A (en) * | 2001-10-29 | 2003-09-03 | Qinetiq Ltd | High resolution patterning method |
US20060063382A1 (en) * | 2004-09-17 | 2006-03-23 | Dubin Valery M | Method to fabricate copper-cobalt interconnects |
DE102010012204B4 (de) * | 2010-03-19 | 2019-01-24 | MacDermid Enthone Inc. (n.d.Ges.d. Staates Delaware) | Verbessertes Verfahren zur Direktmetallisierung von nicht leitenden Substraten |
EP2862959A1 (en) * | 2013-10-21 | 2015-04-22 | ATOTECH Deutschland GmbH | Method of selectively treating copper in the presence of further metal |
JP6733016B1 (ja) * | 2019-07-17 | 2020-07-29 | 上村工業株式会社 | 無電解銅めっき浴 |
KR20210019752A (ko) * | 2019-08-13 | 2021-02-23 | 삼성전기주식회사 | 무전해 동도금용 조성물 및 이를 이용한 무전해 도금 방법 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3377144A (en) * | 1965-04-08 | 1968-04-09 | Paragon Die Casting Company | Speaker grill |
-
1969
- 1969-01-06 US US789402A patent/US3615736A/en not_active Expired - Lifetime
-
1970
- 1970-01-05 ES ES375193A patent/ES375193A1/es not_active Expired
- 1970-01-05 GB GB460/70A patent/GB1286941A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1286941A (en) | 1972-08-31 |
DE2000320B2 (de) | 1976-04-22 |
DE2000320A1 (de) | 1970-07-16 |
US3615736A (en) | 1971-10-26 |
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