ES371321A1 - Un metodo y aparato para tratamiento al silicio gaseoso continuo. - Google Patents
Un metodo y aparato para tratamiento al silicio gaseoso continuo.Info
- Publication number
- ES371321A1 ES371321A1 ES371321A ES371321A ES371321A1 ES 371321 A1 ES371321 A1 ES 371321A1 ES 371321 A ES371321 A ES 371321A ES 371321 A ES371321 A ES 371321A ES 371321 A1 ES371321 A1 ES 371321A1
- Authority
- ES
- Spain
- Prior art keywords
- treatment
- translation
- machine
- legally binding
- google translate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/02—Ferrous alloys, e.g. steel alloys containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
- C23C10/08—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases only one element being diffused
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical Vapour Deposition (AREA)
- Silicon Compounds (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US75964168A | 1968-09-13 | 1968-09-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES371321A1 true ES371321A1 (es) | 1971-09-01 |
Family
ID=25056412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES371321A Expired ES371321A1 (es) | 1968-09-13 | 1969-09-09 | Un metodo y aparato para tratamiento al silicio gaseoso continuo. |
Country Status (4)
Country | Link |
---|---|
BE (1) | BE738691A (es) |
DE (1) | DE1945298A1 (es) |
ES (1) | ES371321A1 (es) |
FR (1) | FR2018029A1 (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4832762A (en) * | 1984-09-28 | 1989-05-23 | Nippon Kokan Kabushiki Kaisha | Method for producing thin steel sheet of high magnetic permeability |
FR2587730A1 (fr) * | 1985-09-23 | 1987-03-27 | Rhone Poulenc Rech | Procede de siliciuration d'un substrat metallique ferreux et substrat metallique ferreux silicie |
FR2649995B1 (fr) * | 1989-07-19 | 1993-08-13 | Air Liquide | Procede de siliciuration d'aciers par depot chimique en phase gazeuse |
-
1969
- 1969-09-04 FR FR6930130A patent/FR2018029A1/fr not_active Withdrawn
- 1969-09-06 DE DE19691945298 patent/DE1945298A1/de active Pending
- 1969-09-09 ES ES371321A patent/ES371321A1/es not_active Expired
- 1969-09-10 BE BE738691D patent/BE738691A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
FR2018029A1 (en) | 1970-05-29 |
DE1945298A1 (de) | 1970-03-19 |
BE738691A (es) | 1970-03-10 |
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