ES355837A1 - Procedimiento para la obtencion de un material copiativo sensible a la luz. - Google Patents
Procedimiento para la obtencion de un material copiativo sensible a la luz.Info
- Publication number
- ES355837A1 ES355837A1 ES355837A ES355837A ES355837A1 ES 355837 A1 ES355837 A1 ES 355837A1 ES 355837 A ES355837 A ES 355837A ES 355837 A ES355837 A ES 355837A ES 355837 A1 ES355837 A1 ES 355837A1
- Authority
- ES
- Spain
- Prior art keywords
- insoluble
- water
- halogen
- azidochalcone
- materials containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- NSQOMIFJKCLCNL-UHFFFAOYSA-N 3-(2-azidophenyl)-1-phenylprop-2-en-1-one Chemical compound [N-]=[N+]=NC1=CC=CC=C1C=CC(=O)C1=CC=CC=C1 NSQOMIFJKCLCNL-UHFFFAOYSA-N 0.000 title 1
- 229910052736 halogen Inorganic materials 0.000 abstract 3
- 125000005843 halogen group Chemical group 0.000 abstract 2
- 125000001424 substituent group Chemical group 0.000 abstract 2
- JECYNCQXXKQDJN-UHFFFAOYSA-N 2-(2-methylhexan-2-yloxymethyl)oxirane Chemical compound CCCCC(C)(C)OCC1CO1 JECYNCQXXKQDJN-UHFFFAOYSA-N 0.000 abstract 1
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 125000004442 acylamino group Chemical group 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001540 azides Chemical class 0.000 abstract 1
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 abstract 1
- 125000004663 dialkyl amino group Chemical group 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 abstract 1
- 150000002576 ketones Chemical class 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE1967K0062758 DE1597614B2 (de) | 1967-07-07 | 1967-07-07 | Lichtempfindliche kopiermasse |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES355837A1 true ES355837A1 (es) | 1969-12-16 |
Family
ID=7230771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES355837A Expired ES355837A1 (es) | 1967-07-07 | 1968-07-06 | Procedimiento para la obtencion de un material copiativo sensible a la luz. |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3595656A (es) |
| AT (1) | AT283390B (es) |
| BE (1) | BE717610A (es) |
| DE (1) | DE1597614B2 (es) |
| ES (1) | ES355837A1 (es) |
| FR (1) | FR1573500A (es) |
| GB (1) | GB1223570A (es) |
| NL (1) | NL6809093A (es) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4833905A (es) * | 1971-09-02 | 1973-05-15 | ||
| JPS5140452B2 (es) * | 1973-07-23 | 1976-11-04 | ||
| AU476446B2 (en) * | 1974-04-18 | 1976-09-23 | Japan Synthetic Rubber Co., Ltd | Photosensitive composition |
| JPS5934293B2 (ja) * | 1977-04-20 | 1984-08-21 | 王子製紙株式会社 | 感光性組成物 |
| IT1138814B (it) * | 1980-07-03 | 1986-09-17 | Rca Corp | Metodo per la formazione di disegni superficiali in rilievo con ultravioletto lontano e composizione protettiva fotoosensibile per questo metodo |
| GB2092164B (en) * | 1980-12-17 | 1984-12-05 | Hitachi Ltd | Loght or radiation-sensitive polymer composition |
| JPS5872139A (ja) * | 1981-10-26 | 1983-04-30 | Tokyo Ohka Kogyo Co Ltd | 感光性材料 |
| DE3415033C2 (de) * | 1983-04-20 | 1986-04-03 | Hitachi Chemical Co., Ltd. | 4'-Azidobenzal-2-methoxyacetophenon, Verfahren zu seiner Herstellung und dieses enthaltende photoempfindliche Masse |
| DE3417607A1 (de) * | 1983-05-12 | 1984-11-15 | Hitachi Chemical Co., Ltd. | Verfahren zur herstellung feiner muster |
| JPS59222833A (ja) * | 1983-06-01 | 1984-12-14 | Hitachi Chem Co Ltd | 感光性組成物 |
| JPS6042425A (ja) * | 1983-08-17 | 1985-03-06 | Toray Ind Inc | 化学線感応性重合体組成物 |
| US4711836A (en) * | 1984-09-10 | 1987-12-08 | Olin Hunt Specialty Products, Inc. | Development of positive-working photoresist compositions |
| JPS61166542A (ja) * | 1985-01-18 | 1986-07-28 | Hitachi Chem Co Ltd | 感光性組成物 |
| JPS62102241A (ja) * | 1985-10-30 | 1987-05-12 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
| JPH03155554A (ja) * | 1989-11-14 | 1991-07-03 | Japan Synthetic Rubber Co Ltd | 放射線感応性樹脂組成物 |
| WO2004108094A2 (en) * | 2003-06-06 | 2004-12-16 | Atherogenics, Inc. | Sulfonamide-substituted chalcone derivatives and their use to treat diseases |
-
1967
- 1967-07-07 DE DE1967K0062758 patent/DE1597614B2/de active Granted
-
1968
- 1968-06-27 NL NL6809093A patent/NL6809093A/xx unknown
- 1968-07-03 US US742141A patent/US3595656A/en not_active Expired - Lifetime
- 1968-07-04 BE BE717610D patent/BE717610A/xx unknown
- 1968-07-04 AT AT641768A patent/AT283390B/de not_active IP Right Cessation
- 1968-07-05 GB GB32270/68A patent/GB1223570A/en not_active Expired
- 1968-07-06 ES ES355837A patent/ES355837A1/es not_active Expired
- 1968-07-08 FR FR1573500D patent/FR1573500A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL6809093A (es) | 1969-01-09 |
| US3595656A (en) | 1971-07-27 |
| FR1573500A (es) | 1969-07-04 |
| BE717610A (es) | 1969-01-06 |
| DE1597614B2 (de) | 1977-06-23 |
| AT283390B (de) | 1970-08-10 |
| DE1597614A1 (de) | 1970-05-06 |
| GB1223570A (en) | 1971-02-24 |
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