AT283390B - Mit einer lichtempfindlichen Kopierschicht versehenes Material - Google Patents

Mit einer lichtempfindlichen Kopierschicht versehenes Material

Info

Publication number
AT283390B
AT283390B AT641768A AT641768A AT283390B AT 283390 B AT283390 B AT 283390B AT 641768 A AT641768 A AT 641768A AT 641768 A AT641768 A AT 641768A AT 283390 B AT283390 B AT 283390B
Authority
AT
Austria
Prior art keywords
light
material provided
sensitive copying
copying layer
layer
Prior art date
Application number
AT641768A
Other languages
English (en)
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Application granted granted Critical
Publication of AT283390B publication Critical patent/AT283390B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)
AT641768A 1967-07-07 1968-07-04 Mit einer lichtempfindlichen Kopierschicht versehenes Material AT283390B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1967K0062758 DE1597614B2 (de) 1967-07-07 1967-07-07 Lichtempfindliche kopiermasse

Publications (1)

Publication Number Publication Date
AT283390B true AT283390B (de) 1970-08-10

Family

ID=7230771

Family Applications (1)

Application Number Title Priority Date Filing Date
AT641768A AT283390B (de) 1967-07-07 1968-07-04 Mit einer lichtempfindlichen Kopierschicht versehenes Material

Country Status (8)

Country Link
US (1) US3595656A (de)
AT (1) AT283390B (de)
BE (1) BE717610A (de)
DE (1) DE1597614B2 (de)
ES (1) ES355837A1 (de)
FR (1) FR1573500A (de)
GB (1) GB1223570A (de)
NL (1) NL6809093A (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4833905A (de) * 1971-09-02 1973-05-15
JPS5140452B2 (de) * 1973-07-23 1976-11-04
AU476446B2 (en) * 1974-04-18 1976-09-23 Japan Synthetic Rubber Co., Ltd Photosensitive composition
JPS5934293B2 (ja) * 1977-04-20 1984-08-21 王子製紙株式会社 感光性組成物
IT1138814B (it) * 1980-07-03 1986-09-17 Rca Corp Metodo per la formazione di disegni superficiali in rilievo con ultravioletto lontano e composizione protettiva fotoosensibile per questo metodo
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
DE3415033C2 (de) * 1983-04-20 1986-04-03 Hitachi Chemical Co., Ltd. 4'-Azidobenzal-2-methoxyacetophenon, Verfahren zu seiner Herstellung und dieses enthaltende photoempfindliche Masse
DE3417607A1 (de) * 1983-05-12 1984-11-15 Hitachi Chemical Co., Ltd. Verfahren zur herstellung feiner muster
JPS59222833A (ja) * 1983-06-01 1984-12-14 Hitachi Chem Co Ltd 感光性組成物
JPS6042425A (ja) * 1983-08-17 1985-03-06 Toray Ind Inc 化学線感応性重合体組成物
US4711836A (en) * 1984-09-10 1987-12-08 Olin Hunt Specialty Products, Inc. Development of positive-working photoresist compositions
JPS61166542A (ja) * 1985-01-18 1986-07-28 Hitachi Chem Co Ltd 感光性組成物
JPS62102241A (ja) * 1985-10-30 1987-05-12 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JPH03155554A (ja) * 1989-11-14 1991-07-03 Japan Synthetic Rubber Co Ltd 放射線感応性樹脂組成物
WO2004108094A2 (en) * 2003-06-06 2004-12-16 Atherogenics, Inc. Sulfonamide-substituted chalcone derivatives and their use to treat diseases

Also Published As

Publication number Publication date
NL6809093A (de) 1969-01-09
US3595656A (en) 1971-07-27
FR1573500A (de) 1969-07-04
BE717610A (de) 1969-01-06
DE1597614B2 (de) 1977-06-23
ES355837A1 (es) 1969-12-16
DE1597614A1 (de) 1970-05-06
GB1223570A (en) 1971-02-24

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee