ES2553450T3 - Procedimiento y dispositivo para el revestimiento en continuo de sustratos - Google Patents
Procedimiento y dispositivo para el revestimiento en continuo de sustratos Download PDFInfo
- Publication number
- ES2553450T3 ES2553450T3 ES12746037.6T ES12746037T ES2553450T3 ES 2553450 T3 ES2553450 T3 ES 2553450T3 ES 12746037 T ES12746037 T ES 12746037T ES 2553450 T3 ES2553450 T3 ES 2553450T3
- Authority
- ES
- Spain
- Prior art keywords
- substrates
- procedure
- substrate supports
- continuous coating
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Coating Apparatus (AREA)
Abstract
Procedimiento para el revestimiento en continuo de sustratos, en el que en un dispositivo de revestimiento los sustratos son transportados a través de un espacio de deposición (4) que está limitado por dos soportes de sustrato (1, 1') así como por un suelo (2) y una tapa (6), en donde el suelo (2) presenta un dispositivo (3) para guiar los soportes de sustrato (1, 1'), y los sustratos son transportados sobre los soportes de sustrato (1, 1') a través del dispositivo de revestimiento, durante el transporte se realiza el revestimiento en continuo de los sustratos, y en donde la tapa (6) está fijada a los soportes de sustrato (1, 1') y de esta manera se transporta junto con los soportes (1, 1') de sustrato mediante el dispositivo de revestimiento.
Description
Claims (1)
-
imagen1 imagen2
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011106859 | 2011-07-07 | ||
DE102011106859A DE102011106859A1 (de) | 2011-07-07 | 2011-07-07 | Verfahren und Vorrichtung zur kontinuierlichen Beschichtung von Substraten |
PCT/EP2012/063425 WO2013004851A1 (de) | 2011-07-07 | 2012-07-09 | Verfahren und vorrichtung zur kontinuierlichen beschichtung von substraten |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2553450T3 true ES2553450T3 (es) | 2015-12-09 |
Family
ID=46650497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES12746037.6T Active ES2553450T3 (es) | 2011-07-07 | 2012-07-09 | Procedimiento y dispositivo para el revestimiento en continuo de sustratos |
Country Status (6)
Country | Link |
---|---|
US (1) | US9399818B2 (es) |
EP (1) | EP2729594B1 (es) |
CN (1) | CN103764870B (es) |
DE (1) | DE102011106859A1 (es) |
ES (1) | ES2553450T3 (es) |
WO (1) | WO2013004851A1 (es) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015118042A1 (de) | 2015-10-22 | 2017-04-27 | Nexwafe Gmbh | Verfahren und Vorrichtung zum Herstellen einer Halbleiterschicht |
DE102015121636A1 (de) | 2015-12-11 | 2017-06-14 | Nexwafe Gmbh | Vorrichtung und Verfahren zum einseitigen Ätzen einer Halbleiterschicht |
DE102016117912A1 (de) | 2016-09-22 | 2018-03-22 | Nexwafe Gmbh | Verfahren zum Anordnen mehrerer Saatsubstrate an einem Trägerelement und Trägerelement mit Saatsubstraten |
DE102017106373A1 (de) | 2017-03-24 | 2018-09-27 | Nexwafe Gmbh | Prozesskammerführung, Prozesskammer und Verfahren zum Führen eines Substratträgers in eine Prozessposition |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN86102741A (zh) * | 1986-03-17 | 1987-10-07 | 克朗纳公司 | 材料的沉积 |
JP3195492B2 (ja) * | 1993-03-15 | 2001-08-06 | 株式会社神戸製鋼所 | アークイオンプレーティング装置及びアークイオンプレーティングシステム |
JP3615898B2 (ja) * | 1997-02-28 | 2005-02-02 | 芝浦メカトロニクス株式会社 | 真空処理装置 |
DE50302862D1 (de) * | 2002-05-24 | 2006-05-18 | Schott Ag | Vorrichtung für CVD-Beschichtungen |
DE102005045582B3 (de) * | 2005-09-23 | 2007-03-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur kontinuierlichen Gasphasenabscheidung unter Atmosphärendruck und deren Verwendung |
DE102009038369B4 (de) * | 2009-08-24 | 2012-05-24 | Von Ardenne Anlagentechnik Gmbh | Substrathalter für scheiben-oder plattenförmige Substrate und Vakuumbehandlungsanlage mit einer vertikalen Substrattransporteinrichtung |
-
2011
- 2011-07-07 DE DE102011106859A patent/DE102011106859A1/de not_active Ceased
-
2012
- 2012-07-09 WO PCT/EP2012/063425 patent/WO2013004851A1/de active Application Filing
- 2012-07-09 CN CN201280033552.1A patent/CN103764870B/zh active Active
- 2012-07-09 ES ES12746037.6T patent/ES2553450T3/es active Active
- 2012-07-09 US US14/131,055 patent/US9399818B2/en active Active
- 2012-07-09 EP EP12746037.6A patent/EP2729594B1/de active Active
Also Published As
Publication number | Publication date |
---|---|
CN103764870B (zh) | 2016-05-18 |
US20140212583A1 (en) | 2014-07-31 |
EP2729594A1 (de) | 2014-05-14 |
EP2729594B1 (de) | 2015-11-04 |
CN103764870A (zh) | 2014-04-30 |
WO2013004851A1 (de) | 2013-01-10 |
DE102011106859A8 (de) | 2013-03-28 |
US9399818B2 (en) | 2016-07-26 |
DE102011106859A1 (de) | 2013-01-10 |
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