ES2165618T3 - Placas virgenes para fotomascaras. - Google Patents

Placas virgenes para fotomascaras.

Info

Publication number
ES2165618T3
ES2165618T3 ES97933253T ES97933253T ES2165618T3 ES 2165618 T3 ES2165618 T3 ES 2165618T3 ES 97933253 T ES97933253 T ES 97933253T ES 97933253 T ES97933253 T ES 97933253T ES 2165618 T3 ES2165618 T3 ES 2165618T3
Authority
ES
Spain
Prior art keywords
range
photomascaras
virgin
plates
polymeric material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES97933253T
Other languages
English (en)
Inventor
Roger Harquail French
Kenneth George Sharp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of ES2165618T3 publication Critical patent/ES2165618T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609—Particulate metal or metal compound-containing
    • Y10T428/31612—As silicone, silane or siloxane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Packages (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PLACAS PARA FOTOMASCARAS DE DESPLAZADOR DE FASE EMPOTRADO, ATENUADO Y TRANSMISIVO, QUE COMPRENDEN AL MENOS UN MATERIAL POLIMERICO, PREFERENTEMENTE UN FLUORPOLIMERO AMORFO O UN FLUORPOLIMERO AMORFO AL QUE SE HA AÑADIDO UN ORGANOSILANO CON FUNCION DE FLUOR, Y ORGANOSILICATOS, O SUS COMBINACIONES, TENIENDO EL MATERIAL POLIMERICO: (A) UN INDICE DE REFRACCION (N) EN LA ESCALA DE 1,2 A 2,0, PREFERENTEMENTE EN LA ESCALA DE 1,26 A 1,8, A UNA LONGITUD DE ONDA LITOGRAFICA SELECCIONADA INFERIOR A 400 NM; Y (B) UN COEFICIENTE DE EXTINCION (K) EN LA ESCALA DE 0,04 A 0,8, Y PREFERENTEMENTE EN LA ESCALA DE 0,06 A 0,59, A LA LONGITUD DE ONDA LITOGRAFICA SELECCIONADA INFERIOR A 400 NM.
ES97933253T 1996-07-03 1997-06-30 Placas virgenes para fotomascaras. Expired - Lifetime ES2165618T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2146096P 1996-07-03 1996-07-03
US79744497A 1997-02-10 1997-02-10

Publications (1)

Publication Number Publication Date
ES2165618T3 true ES2165618T3 (es) 2002-03-16

Family

ID=26694721

Family Applications (1)

Application Number Title Priority Date Filing Date
ES97933253T Expired - Lifetime ES2165618T3 (es) 1996-07-03 1997-06-30 Placas virgenes para fotomascaras.

Country Status (11)

Country Link
US (1) US6096460A (es)
EP (1) EP0909406B1 (es)
JP (1) JP2000514205A (es)
CN (1) CN1124519C (es)
AT (1) ATE209368T1 (es)
DE (1) DE69709738T2 (es)
DK (1) DK0909406T3 (es)
ES (1) ES2165618T3 (es)
PT (1) PT909406E (es)
TW (1) TW354392B (es)
WO (1) WO1998000758A1 (es)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6268457B1 (en) * 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6824879B2 (en) * 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
WO2003044078A1 (en) * 2001-11-15 2003-05-30 Honeywell International Inc. Anti-reflective coatings for photolithography and methods of preparation thereof
WO2000077575A1 (en) * 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
JP3932805B2 (ja) * 2000-12-25 2007-06-20 株式会社日立製作所 フォトマスク及びそれを用いた電子デバイスの製造方法
US6958123B2 (en) * 2001-06-15 2005-10-25 Reflectivity, Inc Method for removing a sacrificial material with a compressed fluid
DE10227807A1 (de) * 2002-06-21 2004-01-22 Honeywell Specialty Chemicals Seelze Gmbh Silylalkylester von Anthracen- und Phenanthrencarbonsäuren
US6855463B2 (en) * 2002-08-27 2005-02-15 Photronics, Inc. Photomask having an intermediate inspection film layer
US7022436B2 (en) 2003-01-14 2006-04-04 Asml Netherlands B.V. Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects
JP4223840B2 (ja) * 2003-03-12 2009-02-12 住友化学株式会社 フォトマスク及び拡散反射板
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
TW200641517A (en) * 2005-05-19 2006-12-01 Promos Technologies Inc Levenson phase shifting mask and method for preparing the same and method for preparing a semiconductor device using the same
TWI269937B (en) * 2005-10-13 2007-01-01 Promos Technologies Inc Phase shifting mask and method for preparing the same and method for preparing a semiconductor device using the same
TWI314245B (en) * 2006-04-28 2009-09-01 Promos Technologies Inc Phase shifting mask capable of reducing the optical proximity effect and method for preparing a semiconductor device using the same
WO2007144452A1 (en) * 2006-06-13 2007-12-21 Braggone Oy Hybrid inorganic-organic polymer compositions for anti-reflective coatings
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
JP2009175747A (ja) * 2009-03-24 2009-08-06 Honeywell Internatl Inc フォトリソグラフィー用スピンオン反射防止膜
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP2011221549A (ja) * 2011-06-09 2011-11-04 Honeywell Internatl Inc フォトリソグラフィー用スピンオン反射防止膜
JP6420958B2 (ja) * 2014-03-04 2018-11-07 Hoya株式会社 インプリント用モールドブランクおよびインプリント用モールド
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4890309A (en) * 1987-02-25 1989-12-26 Massachusetts Institute Of Technology Lithography mask with a π-phase shifting attenuator
US5100503A (en) * 1990-09-14 1992-03-31 Ncr Corporation Silica-based anti-reflective planarizing layer
US5354632A (en) * 1992-04-15 1994-10-11 Intel Corporation Lithography using a phase-shifting reticle with reduced transmittance
TW505829B (en) * 1992-11-16 2002-10-11 Dupont Photomasks Inc A transmissive embedded phase shifter-photomask blank
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter
US5726247A (en) * 1996-06-14 1998-03-10 E. I. Du Pont De Nemours And Company Fluoropolymer nanocomposites

Also Published As

Publication number Publication date
CN1124519C (zh) 2003-10-15
CN1224513A (zh) 1999-07-28
TW354392B (en) 1999-03-11
WO1998000758A1 (en) 1998-01-08
ATE209368T1 (de) 2001-12-15
DK0909406T3 (da) 2002-05-21
PT909406E (pt) 2002-03-28
EP0909406A1 (en) 1999-04-21
US6096460A (en) 2000-08-01
EP0909406B1 (en) 2001-11-21
DE69709738D1 (de) 2002-02-21
JP2000514205A (ja) 2000-10-24
DE69709738T2 (de) 2002-08-08

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