ES2135397T3 - Procedimiento para fabricar placas mordentadas para estampacion grafica y aparato para su realizacion. - Google Patents

Procedimiento para fabricar placas mordentadas para estampacion grafica y aparato para su realizacion.

Info

Publication number
ES2135397T3
ES2135397T3 ES92900405T ES92900405T ES2135397T3 ES 2135397 T3 ES2135397 T3 ES 2135397T3 ES 92900405 T ES92900405 T ES 92900405T ES 92900405 T ES92900405 T ES 92900405T ES 2135397 T3 ES2135397 T3 ES 2135397T3
Authority
ES
Spain
Prior art keywords
voltage
procedure
electrolyte
metal
bitted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92900405T
Other languages
English (en)
Inventor
Omri M Behr
Marion R Behr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of ES2135397T3 publication Critical patent/ES2135397T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

SE PROPORCIONA UN APARATO Y UN PROCEDIMIENTO PARA USAR LOS MISMOS EN LA GRABACION MEDIANTE AGUA FUERTE DE UN OBJETO METALICO (22), ADECUADAMENTE UNA PLACA, PARA PREPARAR UNA PLACA DE IMPRESION METALICA. EL OBJETO SE CUBRE PARCIALMENTE MEDIANTE UNA SUPERFICIE DE CAPA RESISTIVA (14), EN LA QUE LAS PORCIONES EXPUESTAS (16) DEL CITADO METAL, SE EXPONDRAN A LA ACCION DE UNA FUERZA CORROSIVA ELECTROLITICA. EL APARATO COMPRENDE UN BAÑO (10) PARA UN ELECTROLITO ACUOSO (12), UN ELECTRODO (23), ADECUADA PERO NO CRITICAMENTE METALICO, INMERSIBLE EN EL CITADO ELECTROLITO, QUE SEVIRA COMO EL CATODO, UNA FUENTE DE VOLTAJE (32) DE CORRIENTE CONTINUA, QUE PUEDE POSTERIORMENTE ASOCIARSE CON MEDIO DE AJUSTE (38) PARA CONTROLAR EL VOLTAJE APLICADO. EL VOLTAJE DEBE AJUSTARSE PARA QUE ACTUE CON PRECISION DENTRO DE UN MARGEN DE VOLTAJES MAS BIEN ESTRECHO TAL, QUE EL VOLTAJE MINIMO SEA, AL MENOS, EL POTENCIAL DE IONIZACION DEL METAL DEL OBJETO METALICO EN EL ELECTROLITO SELECCIONADO, Y EL MAXIMO NO DEBE EXCEDER SUSTANCIALMENTE DE LA SUMA DEL VOLTAJE DE DESCOMPOSICION DEL ELECTROLITO ACUOSO Y EL SOBREVOLTAJE DEL CATODO SELECCIONADO.
ES92900405T 1990-10-31 1991-10-25 Procedimiento para fabricar placas mordentadas para estampacion grafica y aparato para su realizacion. Expired - Lifetime ES2135397T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/606,871 US5102520A (en) 1990-10-31 1990-10-31 Electrolytic etching process and apparatus

Publications (1)

Publication Number Publication Date
ES2135397T3 true ES2135397T3 (es) 1999-11-01

Family

ID=24429824

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92900405T Expired - Lifetime ES2135397T3 (es) 1990-10-31 1991-10-25 Procedimiento para fabricar placas mordentadas para estampacion grafica y aparato para su realizacion.

Country Status (7)

Country Link
US (1) US5102520A (es)
EP (1) EP0658220B1 (es)
JP (1) JP3155551B2 (es)
CA (1) CA2095227C (es)
DE (1) DE69131356T2 (es)
ES (1) ES2135397T3 (es)
WO (1) WO1992007978A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5368817A (en) * 1992-07-08 1994-11-29 Toppan Printing, Co., Ltd. Dampening water controller
ES2085237B1 (es) * 1994-04-06 1997-01-16 Univ Madrid Autonoma Procedimiento para grabado de dibujos y perforado de precision en hojas de metal y celula electroquimica para su realizacion.
WO2005009605A1 (ja) * 2003-07-24 2005-02-03 Ryoichi Aogaki 磁気障壁により形成されたマイクロリアクタ
WO2013102220A2 (en) 2011-12-30 2013-07-04 Scrutiny, Inc. Frame (forced recuperation, aggregation and movement of exergy)

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1047995A (en) * 1910-03-09 1912-12-24 Edward G Schwuchow Process of etching plates by electricity.
US984011A (en) * 1910-06-06 1911-02-14 Bastian & Lapointe Process of etching by electrolysis on relief or intaglio.
US2110487A (en) * 1935-03-25 1938-03-08 George F Johnstone Electrical etching machine
US2074221A (en) * 1935-09-09 1937-03-16 Louis E Holland Method of etching plates
US2394190A (en) * 1942-12-07 1946-02-05 Albert R Kreck Electrolytic etching of zinc plates
US2536912A (en) * 1944-07-12 1951-01-02 Ibm Electrolysis etching device
US3331760A (en) * 1962-01-16 1967-07-18 Gen Dynamics Corp Electrolytic milling
US3635805A (en) * 1968-02-29 1972-01-18 Atomic Energy Commission Israe Working of metal bodies
US3843501A (en) * 1972-07-14 1974-10-22 Ici Ltd Method of forming extruder screw
JPS5313177B2 (es) * 1973-06-20 1978-05-08
JPS5540120B2 (es) * 1974-11-30 1980-10-15
US4098659A (en) * 1977-07-13 1978-07-04 The United States Of America As Represented By The Secretary Of The Air Force Electrochemical milling process to prevent localized heating
BR7900616A (pt) * 1979-01-31 1980-09-09 Duratex Sa Processo para gravacao de chapas metalicas para uso como moldes de produtos texturados
US4247377A (en) * 1979-02-21 1981-01-27 United Technologies Corporation Method for electrolytic etching
US4369099A (en) * 1981-01-08 1983-01-18 Bell Telephone Laboratories, Incorporated Photoelectrochemical etching of semiconductors
US4560464A (en) * 1981-03-17 1985-12-24 Sidney Lieber Stick-on-mask for use with coulometric measuring instruments
US4629539A (en) * 1982-07-08 1986-12-16 Tdk Corporation Metal layer patterning method
US4486279A (en) * 1983-05-12 1984-12-04 Westinghouse Electric Corp. Apparatus and method for making a laminated core
US4729940A (en) * 1986-05-16 1988-03-08 Cbs Inc. Method of manufacturing master for optical information carrier
EP0253420A1 (de) * 1986-06-23 1988-01-20 Stiftung Hasler Werke Anordnung und Verfahren zum elektrochemischen Aetzen von Silizium

Also Published As

Publication number Publication date
DE69131356T2 (de) 1999-11-18
EP0658220B1 (en) 1999-06-16
EP0658220A1 (en) 1995-06-21
US5102520A (en) 1992-04-07
WO1992007978A1 (en) 1992-05-14
JPH06502690A (ja) 1994-03-24
CA2095227C (en) 2000-09-05
JP3155551B2 (ja) 2001-04-09
DE69131356D1 (de) 1999-07-22
EP0658220A4 (en) 1993-07-23
CA2095227A1 (en) 1992-05-01

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