ES2116668T3 - Procedimiento para el tratamiento de piezas con plasma. - Google Patents

Procedimiento para el tratamiento de piezas con plasma.

Info

Publication number
ES2116668T3
ES2116668T3 ES95119817T ES95119817T ES2116668T3 ES 2116668 T3 ES2116668 T3 ES 2116668T3 ES 95119817 T ES95119817 T ES 95119817T ES 95119817 T ES95119817 T ES 95119817T ES 2116668 T3 ES2116668 T3 ES 2116668T3
Authority
ES
Spain
Prior art keywords
plasma
treatment
workpieces
electrons
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES95119817T
Other languages
English (en)
Inventor
Jorg Dr Vetter
Siegfried Maxam
Manfred Schmidt-Mauer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Metaplas GmbH
Original Assignee
Metaplas Ionon Oberflaechenveredelungstechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metaplas Ionon Oberflaechenveredelungstechnik GmbH filed Critical Metaplas Ionon Oberflaechenveredelungstechnik GmbH
Application granted granted Critical
Publication of ES2116668T3 publication Critical patent/ES2116668T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Cleaning In General (AREA)

Abstract

EL OBJETIVO DE LA INVENCION ES UN PROCEDIMIENTO PARA TRATAMIENTO DE PLASMA DE PIEZAS DE TRABAJO POR MEDIO DE IONES Y ELECTRONES, EN PARTICULAR A PARTIR DE RECUBRIMIENTO DEL PLASMA BAJO VACIO SEGUN PROCEDIMIENTO PVD, DONDE A TRAVES DEL BOMBARDEO CAMBIANTE CON IONES Y ELECTRONES SE CALIENTA O SE PURIFICA LA PIEZA 2 DE TRABAJO. PARA PERMITIR UNA GUIA DE PROCESO SENCILLA Y CONTROLADA DE FORMA EXACTA INDIVIDUAL, DE MODO QUE CON ELLO SE OBTIENE UNA APLICACION DE AHORRO DE ENERGIA EN LA FASE DE CALENTAMIENTO Y PURIFICACION DE IONES, SE PROPONE QUE EL BOMBARDEO DE IONES Y ELECTRONES SE REALICE DE FORMA PREFERENTE A PARTIR DE UNA FUENTE 4, 5 DE CORRIENTE CONTINUA, ADAPTADA AL BOMBARDEO RESPECTIVO, DE FORMA PROPIA, INDEPENDIENTE DE LOS PROCESOS DE RECUBRIMIENTO, DISPONIENDOSE DE FORMA ALTERNADA DE UNA RELACION 6 DE IMPULSOS AJUSTABLE CON UN POLO POSITIVO O NEGATIVO QUE SE UNEN CON UN SOPORTE 3 DE PIEZA DE TRABAJO.
ES95119817T 1995-01-06 1995-12-15 Procedimiento para el tratamiento de piezas con plasma. Expired - Lifetime ES2116668T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19500262A DE19500262C1 (de) 1995-01-06 1995-01-06 Verfahren zur Plasmabehandlung von Werkstücken

Publications (1)

Publication Number Publication Date
ES2116668T3 true ES2116668T3 (es) 1998-07-16

Family

ID=7751068

Family Applications (1)

Application Number Title Priority Date Filing Date
ES95119817T Expired - Lifetime ES2116668T3 (es) 1995-01-06 1995-12-15 Procedimiento para el tratamiento de piezas con plasma.

Country Status (5)

Country Link
EP (1) EP0725161B1 (es)
AT (1) ATE165122T1 (es)
DE (2) DE19500262C1 (es)
DK (1) DK0725161T3 (es)
ES (1) ES2116668T3 (es)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19546826C1 (de) * 1995-12-15 1997-04-03 Fraunhofer Ges Forschung Verfahren und Einrichtung zur Vorbehandlung von Substraten
DE19703338C2 (de) * 1996-12-27 1998-11-12 Ardenne Anlagentech Gmbh Verfahren zur Vorwärmung von Werkstücken bei der Vakuumbeschichtung
GB2323855B (en) * 1997-04-01 2002-06-05 Ion Coat Ltd Method and apparatus for depositing a coating on a conductive substrate
DE19826259A1 (de) 1997-06-16 1998-12-17 Bosch Gmbh Robert Verfahren und Einrichtung zum Vakuumbeschichten eines Substrates
EP1135540B1 (de) * 1998-10-21 2002-03-13 Siemens Aktiengesellschaft Verfahren und vorrichtung zur reinigung eines erzeugnisses

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD268715A1 (de) * 1988-02-09 1989-06-07 Robotron Elektronik Einrichtung zum vorbehandeln von substraten
DE4034842A1 (de) * 1990-11-02 1992-05-07 Thyssen Edelstahlwerke Ag Verfahren zur plasmachemischen reinigung fuer eine anschliessende pvd oder pecvd beschichtung
DE4035131C2 (de) * 1990-11-05 1995-09-21 Balzers Hochvakuum Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer
WO1994004716A1 (en) * 1992-08-14 1994-03-03 Hughes Aircraft Company Surface preparation and deposition method for titanium nitride onto carbonaceous materials

Also Published As

Publication number Publication date
DE19500262C1 (de) 1995-09-28
ATE165122T1 (de) 1998-05-15
DK0725161T3 (da) 1999-02-08
EP0725161B1 (de) 1998-04-15
EP0725161A1 (de) 1996-08-07
DE59501907D1 (de) 1998-05-20

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