ES2019303B3 - Procedimiento para recubrimiento de cilindros de impresion mediante la aplicacion de una capa de registro fotorreticular - Google Patents

Procedimiento para recubrimiento de cilindros de impresion mediante la aplicacion de una capa de registro fotorreticular

Info

Publication number
ES2019303B3
ES2019303B3 ES87101295T ES87101295T ES2019303B3 ES 2019303 B3 ES2019303 B3 ES 2019303B3 ES 87101295 T ES87101295 T ES 87101295T ES 87101295 T ES87101295 T ES 87101295T ES 2019303 B3 ES2019303 B3 ES 2019303B3
Authority
ES
Spain
Prior art keywords
printing cylinders
printing
coated
photorreticular
procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES87101295T
Other languages
English (en)
Inventor
Helmut Bach
Horst Koch
Peter Ullemeyer
Gerd Dick
Heuvelen Jan Hendrik Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Application granted granted Critical
Publication of ES2019303B3 publication Critical patent/ES2019303B3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G03F5/20—Screening processes; Screens therefor using screens for gravure printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/18—Coating curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Peptides Or Proteins (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Pens And Brushes (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paper (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
ES87101295T 1986-02-01 1987-01-30 Procedimiento para recubrimiento de cilindros de impresion mediante la aplicacion de una capa de registro fotorreticular Expired - Lifetime ES2019303B3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863603087 DE3603087A1 (de) 1986-02-01 1986-02-01 Verfahren zum beschichten von druckzylindern durch aufbringen einer photovernetzbaren aufzeichnungsschicht

Publications (1)

Publication Number Publication Date
ES2019303B3 true ES2019303B3 (es) 1991-06-16

Family

ID=6293145

Family Applications (1)

Application Number Title Priority Date Filing Date
ES87101295T Expired - Lifetime ES2019303B3 (es) 1986-02-01 1987-01-30 Procedimiento para recubrimiento de cilindros de impresion mediante la aplicacion de una capa de registro fotorreticular

Country Status (8)

Country Link
EP (1) EP0231902B1 (es)
JP (1) JPS62186267A (es)
AT (1) ATE59908T1 (es)
CA (1) CA1329505C (es)
DE (2) DE3603087A1 (es)
DK (1) DK168717B1 (es)
ES (1) ES2019303B3 (es)
FI (1) FI88216C (es)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0487260A1 (en) * 1990-11-19 1992-05-27 Canon Kabushiki Kaisha Printing method
FR2735717B1 (fr) * 1995-06-22 1997-08-08 Photomeca Egg Procede de fabrication de plaques photopolymeres par double irradiation par le dessous
JP2001188354A (ja) * 1999-12-28 2001-07-10 Asahi Kasei Corp 感光性樹脂凸版の製造方法、及びその製造装置
DE10112761A1 (de) 2000-04-13 2001-10-18 Heidelberger Druckmasch Ag Verfahren zum Gebrauch einer Druckplatte
DE102004050277A1 (de) * 2004-10-14 2006-04-27 Basf Drucksysteme Gmbh Verfahren und Vorrichtung zur Herstellung von fotopolymerisierbaren, zylindrischen, endlos-nahtlosen Flexodruckelementen

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE408744A (es) * 1935-04-01
US3663222A (en) * 1968-06-06 1972-05-16 Asahi Chemical Ind Process for preparing steric block with liquid photopolymerizable composition
DE1772662B1 (de) * 1968-06-15 1971-10-14 Asahi Chemical Ind Verfahren zur photographischen Herstellung einer Reliefplatte,die ein photopolymerisates raeumliches Bild traegt
DE2542815C2 (de) * 1974-09-26 1983-07-14 Asahi Kasei Kogyo K.K., Osaka Verfahren zur Herstellung von Druckformen auf fotomechanischem Wege
DE2722896C3 (de) * 1977-05-20 1986-01-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zur Kantenverbindung lichthärtbarer thermoplastischer elastomerer Druckplatten
ATE2161T1 (de) * 1978-07-10 1983-01-15 Akzo N.V. Verfahren und apparat zur herstellung von reliefdruckformen.

Also Published As

Publication number Publication date
CA1329505C (en) 1994-05-17
DE3767172D1 (de) 1991-02-14
ATE59908T1 (de) 1991-01-15
DK49787D0 (da) 1987-01-30
DK49787A (da) 1987-08-02
JPS62186267A (ja) 1987-08-14
EP0231902A3 (en) 1988-08-31
EP0231902B1 (de) 1991-01-09
FI88216B (fi) 1992-12-31
FI870422A0 (fi) 1987-01-30
DK168717B1 (da) 1994-05-24
FI88216C (fi) 1993-04-13
EP0231902A2 (de) 1987-08-12
FI870422A (fi) 1987-08-02
DE3603087A1 (de) 1987-08-06

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