EP4239197B1 - Vakuumpumpe - Google Patents

Vakuumpumpe

Info

Publication number
EP4239197B1
EP4239197B1 EP23154594.8A EP23154594A EP4239197B1 EP 4239197 B1 EP4239197 B1 EP 4239197B1 EP 23154594 A EP23154594 A EP 23154594A EP 4239197 B1 EP4239197 B1 EP 4239197B1
Authority
EP
European Patent Office
Prior art keywords
rotor
gas outlet
roots
pair
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP23154594.8A
Other languages
English (en)
French (fr)
Other versions
EP4239197A1 (de
Inventor
Tetsuro Sugiura
Masashi Obuchi
Atsushi Shiokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2022018854A external-priority patent/JP7860745B2/ja
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of EP4239197A1 publication Critical patent/EP4239197A1/de
Application granted granted Critical
Publication of EP4239197B1 publication Critical patent/EP4239197B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/126—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially from the rotor body extending elements, not necessarily co-operating with corresponding recesses in the other rotor, e.g. lobes, Roots type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2240/00—Components
    • F04C2240/10—Stators
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2240/00—Components
    • F04C2240/20—Rotors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2240/00—Components
    • F04C2240/30—Casings or housings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2240/00—Components
    • F04C2240/60—Shafts
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05B—INDEXING SCHEME RELATING TO WIND, SPRING, WEIGHT, INERTIA OR LIKE MOTORS, TO MACHINES OR ENGINES FOR LIQUIDS COVERED BY SUBCLASSES F03B, F03D AND F03G
    • F05B2240/00—Components
    • F05B2240/10—Stators
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05B—INDEXING SCHEME RELATING TO WIND, SPRING, WEIGHT, INERTIA OR LIKE MOTORS, TO MACHINES OR ENGINES FOR LIQUIDS COVERED BY SUBCLASSES F03B, F03D AND F03G
    • F05B2240/00—Components
    • F05B2240/20—Rotors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05B—INDEXING SCHEME RELATING TO WIND, SPRING, WEIGHT, INERTIA OR LIKE MOTORS, TO MACHINES OR ENGINES FOR LIQUIDS COVERED BY SUBCLASSES F03B, F03D AND F03G
    • F05B2240/00—Components
    • F05B2240/60—Shafts

Definitions

  • the present invention relates to a vacuum pump, and more particularly to a vacuum pump suitable for use in evacuating a process gas used in manufacturing of semiconductor devices, liquid crystal panels, LEDs, solar cells, or the like.
  • a process gas is introduced into a process chamber to perform a certain type of process, such as etching process or CVD process.
  • the process gas that has been introduced into the process chamber is exhausted by a vacuum pump.
  • the vacuum pump used in these manufacturing processes that require high cleanliness is so-called dry vacuum pump that does not use oil in its gas flow passage.
  • dry vacuum pump is a positive-displacement vacuum pump having a pair of Roots rotors in a rotor chamber which are rotated in opposite directions to deliver the gas, such as shown in JP 2010-10132 A .
  • US 2021 140 430 A1 shows a multi-stage rotary piston pump comprising rotary piston pairs provided in respective rotary chambers each having an inlet and an outlet.
  • a process gas may contain particles of by-products. Such particles flow into the vacuum pump along with the process gas. Most of the particles are discharged from the vacuum pump along with the process gas, but some of the particles remain in the rotor chamber and gradually accumulate in the rotor chamber. The particles may be deposited on an inner wall of the rotor chamber and on outer surfaces of the Roots rotors, thus hindering the rotation of the Roots rotors.
  • the present invention provides a vacuum pump as set forth in the claims that can discharge particles contained in gas from a rotor chamber well.
  • a vacuum pump comprising: a pump casing having at least one rotor chamber therein; at least one pair of Roots rotors disposed in the rotor chamber; and at least one pair of rotation shafts supporting the at least one pair of Roots rotors, wherein the pump casing has a gas inlet and a gas outlet communicating with the rotor chamber, and a connection between an inner wall forming the rotor chamber and an inner wall forming the gas outlet is located on or located more outwardly than a rotor center line extending through a center of rotation and a bottom dead center of each Roots rotor.
  • a width of the gas outlet is larger than a width of the gas inlet.
  • the at least one pair of Roots rotors comprises at least one pair of two-lobe Roots rotors, and an angle of a straight line extending from the center of rotation to the connection with respect to the rotor center line is in a range of 0 to 35 degrees.
  • the at least one pair of Roots rotors comprises at least one pair of three-lobe Roots rotor, and an angle of a straight line extending from the center of rotation to the connection with respect to the rotor center line is in a range of 0 to 45 degrees.
  • the at least one pair of Roots rotors includes a pair of first Roots rotors and a pair of second Roots rotors located downstream of the pair of first Roots rotors in a gas transfer direction
  • the at least one rotor chamber includes a first rotor chamber in which the pair of first Roots rotors are located and a second rotor chamber in which the pair of second Roots rotors are located
  • the pump casing has a first gas inlet and a first gas outlet communicating with the first rotor chamber and a second gas inlet and a second gas outlet communicating with the second rotor chamber
  • a first connection between an inner wall forming the first rotor chamber and an inner wall forming the first gas outlet is located more outwardly than a first rotor center line extending through a center of rotation and a bottom dead center of each first Roots rotor
  • a second connection between an inner wall forming the second rotor chamber and an inner wall forming the second gas outlet is located on or
  • the width of the gas outlet communicating with the rotor chamber is large, so that the particles contained in the gas are less likely to remain in the rotor chamber.
  • the particles are discharged from the rotor chamber together with the gas, and an amount of particles deposited in the rotor chamber can be reduced.
  • FIG. 1 is a cross-sectional view showing an embodiment of a vacuum pump apparatus.
  • the vacuum pump apparatus of the embodiment described below is a positive-displacement vacuum pump apparatus.
  • the vacuum pump apparatus shown in FIG. 1 is a so-called dry vacuum pump apparatus that does not use oil in its flow passages for a gas. Since a vaporized oil does not flow to an upstream side, the dry vacuum pump apparatus can be suitably used for a semiconductor-device manufacturing equipment that requires high cleanliness.
  • the vacuum pump apparatus has a vacuum pump 1 and an electric motor 2 that drives the vacuum pump 1.
  • the vacuum pump 1 has a pump casing 6 having a rotor chamber 5 therein, a pair of Roots rotors 8 located in the rotor chamber 5, and a pair of rotation shafts 9 supporting the pair of Roots rotors 8.
  • Each Roots rotor 8 and each rotary shaft 9 may be an integral structure. Although only one Roots rotor 8 and only one rotation shaft 9 are depicted in FIG. 1 , the pair of Roots rotors 8 are arranged in the rotor chamber 5 and are secured to the pair of rotation shafts 9, respectively.
  • the electric motor 2 is coupled to one of the pair of rotation shafts 9. In one embodiment, a pair of electric motors 2 may be coupled to the pair of rotation shafts 9, respectively.
  • Roots rotors 8 of the present embodiment are single-stage pump rotors, in one embodiment the Roots rotors 8 may be multistage pump rotors.
  • the pump casing 6 has a gas inlet 12 and a gas outlet 13 communicating with the rotor chamber 5.
  • the gas inlet 12 is coupled to a chamber (not shown) filled with gas to be delivered.
  • the gas inlet 12 may be coupled to a process chamber of a semiconductor-device manufacturing equipment, and the vacuum pump 1 may be used for evacuating a process gas that has been introduced into the process chamber.
  • the vacuum pump 1 further includes a gear housing 16 located outside a side wall 6A of the pump casing 6. Inside the gear housing 16, a pair of gears 20 that mesh with each other are arranged. In FIG. 1 , only one gear 20 is depicted. These gears 20 are fixed to the rotation shafts 9, respectively.
  • the electric motor 2 is driven by a not-shown motor driver, and one rotation shaft 9 to which the electric motor 2 is coupled rotates the other rotation shaft 9 to which the electric motor 2 is not coupled in an opposite direction via the gears 20.
  • the rotation shafts 9 are rotatably supported by bearings 17 held on the side wall 6A of the pump casing 6 and bearings 18 held on other side wall 6B of the pump casing 6.
  • the electric motor 2 has a motor housing 14 located outside the side wall 6B of the pump casing 6, and a motor rotor 2A and a motor stator 2B disposed in the motor housing 14.
  • a pair of electric motors 2 which are coupled to the pair of rotation shafts 9, respectively, may be provided.
  • the pair of electric motors 2 are synchronously rotated in opposite directions by a not-shown motor driver, so that the pair of rotation shafts 9 and the pair of Roots rotors 8 are synchronously rotated in opposite directions.
  • the role of the gears 20 is to prevent loss of the synchronous rotation of the Roots rotors 8 due to a sudden external cause.
  • FIG. 2 is a cross-sectional view taken along a line A-A of FIG. 1 .
  • each Roots rotor 8 in this embodiment is a two-lobe Roots rotor.
  • the gas inlet 12 is located in one side of the pump casing 6, and the gas outlet 13 is located in the opposite side of the pump casing 6.
  • the pair of Roots rotors 8 are located between the gas inlet 12 and the gas outlet 13.
  • the Roots rotors 8 are in non-contact with an inner wall 22 of the pump casing 6 forming the rotor chamber 5, and the two Roots rotors 8 are also in non-contact with each other.
  • These Roots rotors 8 rotate in the opposite directions in the rotor chamber 5 as indicated by arrows.
  • the gas inlet 12 and the gas outlet 13 communicate with the rotor chamber 5.
  • An inner wall 23 forming the gas outlet 13 is coupled to the inner wall 22 forming the rotor chamber 5.
  • a connection 25 between the inner wall 22 forming the rotor chamber 5 and the inner wall 23 forming the gas outlet 13 is located more outwardly than a rotor center line CL.
  • the rotor center line CL is a straight line extending through a center of rotation RC and a bottom dead center LP of each Roots rotor 8.
  • the bottom dead center LP of the Roots rotor 8 corresponds to the lowest end of the rotating Roots rotor 8.
  • "located more outwardly than a rotor center line CL" means being located across the rotor center line CL from a center point CP of the rotor chamber 5.
  • a width W2 of the gas outlet 13 is larger than a width W1 of the gas inlet 12.
  • the width W2 of the gas outlet 13 is 1.1 to 2.0 times, preferably 1.7 times, the width W1 of the gas inlet 12.
  • An example of the gas handled by the vacuum pump 1 in this embodiment is process gas used in semiconductor-device manufacturing equipment, such as CVD equipment or etching equipment.
  • This type of process gas contains particles of by-products.
  • the width W2 of the gas outlet 13 is larger than the width W1 of the gas inlet 12, so the particles are less likely to stay in the rotor chamber 5. As a result, the particles are less likely to be deposited in the rotor chamber 5. Therefore, this embodiment can prevent a failure of the rotations of the Roots rotors 8 (e.g., rotation stoppage) due to deposition of the particles in the rotor chamber 5.
  • each of the Roots rotors 8 is a two-lobe Roots rotor.
  • the enclosed space In order to deliver the gas from the gas inlet 12 to the gas outlet 13, the enclosed space must be formed between the outer surface of each Roots rotor 8 and the inner wall 22 forming the rotor chamber 5.
  • the connection 25 between the inner wall 22 forming the rotor chamber 5 and the inner wall 23 forming the gas outlet 13 is closer to the gas outlet 13 than the gas inlet 12.
  • An angle ⁇ of a straight line NL extending from the center of rotation RC to the connection 25 with respect to the rotor center line CL is in a range of 0 to 35 degrees.
  • the connection 25 may be located on the rotor center line CL.
  • the pumping performance of the vacuum pump 1 is not substantially reduced because, as mentioned above, the enclosed space is formed between the outer surface of the Roots rotor 8 and the inner wall 22 forming the rotor chamber 5.
  • Arrangements of a connection and a rotor center line associated with the other Roots rotor 8 are also the same, and therefore their redundant descriptions and the illustration of their reference numerals are omitted.
  • connection 25 between the inner wall 22 forming the rotor chamber 5 and the inner wall 23 forming the gas outlet 13 may have an arc-shaped cross-section.
  • connection 25 between the inner wall 22 forming the rotor chamber 5 and the inner wall 23 forming the gas outlet 13 may have a beveled cross-section. According to the configurations shown in FIGS. 3 and 4 , gas turbulence is less likely to occur, and the particles can be smoothly delivered to the gas outlet 13.
  • the inner wall 23 forming the gas outlet 13 is parallel to the rotor center line CL, and the width of the gas outlet 13 is constant.
  • the inner wall 23 forming the gas outlet 13 may be inclined outwardly with a distance from the center point CP of the rotor chamber 5.
  • the width of the gas outlet 13 may gradually increase with a distance from the center point CP of the rotor chamber 5. This configuration allows the gas containing particles to pass smoothly through the gas outlet 13.
  • the Roots rotors 8 may be three-lobe Roots rotors, as shown in FIG. 6 .
  • the connection 25 between the inner wall 22 forming the rotor chamber 5 and the inner wall 23 forming the gas outlet 13 is also located on or located more outwardly than the rotor center line CL extending through the center of rotation RC and the bottom dead center LP of each Roots rotor 8.
  • Configurations of the embodiment shown in FIG. 6 which will not be particularly described, are the same as those of the embodiments described with reference to FIG. 2 , and their redundant descriptions are omitted.
  • an enclosed space must be formed between the outer surface of each Roots rotor 8 and the inner wall 22 forming the rotor chamber 5.
  • an angle ⁇ of the straight line NL extending from the center of rotation RC to the connection 25 with respect to the rotor center line CL is in a range of 0 to 45 degrees.
  • the Roots rotors 8 may be four or more lobe Roots rotors.
  • the connection 25 between the inner wall 22 forming the rotor chamber 5 and the inner wall 23 forming the gas outlet 13 is located on or located more outwardly than the rotor center line CL which extends through the center of rotation RC and the bottom dead center LP of each Roots rotor 8. Since the width of the gas outlet 13 is larger than the width of the gas inlet 12, particles are less likely to stay in the rotor chamber 5 and as a result, the particles are less likely to be deposited in the rotor chamber 5.
  • FIG. 7 shows a cross-sectional view of another embodiment of the vacuum pump 1.
  • This embodiment of the vacuum pump 1 is a multi-stage vacuum pump.
  • the descriptions of the embodiments with reference to FIGS. 1 through 6 can be applied to configurations and operations of this embodiment, and their redundant descriptions will be omitted.
  • the vacuum pump 1 has a pump casing 6 having a plurality of rotor chambers 5A to 5E therein, pairs of Roots rotors 8A to 8E disposed in the rotor chambers 5A to 5E, respectively, and a pair of rotation shafts 9 supporting the pairs of Roots rotors 8A to 8E.
  • the Roots rotors 8A to 8E and the rotation shaft 9 may be an integral structure. Although only one set of Roots rotors 8A to 8E and the rotation shaft 9 are depicted in FIG. 1 , the pairs of Roots rotors 8A to 8E are located in the rotor chambers 5A to 5E, respectively, and are supported by the pair of rotation shafts 9.
  • the electric motor 2 is coupled to one of the pair of rotation shafts 9. In one embodiment, a pair of electric motors 2 may be coupled to the pair of rotation shafts 9, respectively.
  • the Roots rotors 8A to 8E and the rotor chambers 5A to 5E are arranged along a gas transfer direction. Specifically, the Roots rotor 8A and rotor chamber 5A are located most upstream in the gas transfer direction in the pump casing 6.
  • the Roots rotor 8B and the rotor chamber 5B are located downstream of the Roots rotor 8A and the rotor chamber 5A
  • the Roots rotor 8C and the rotor chamber 5C are located downstream of the Roots rotor 8B and the rotor chamber 5B
  • the Roots rotor 8D and the rotor chamber 5D are located downstream of the Roots rotor 8C and the rotor chamber 5C
  • the Roots rotor 8E and the rotor chamber 5E are located downstream of the Roots rotor 8D and the rotor chamber 5D.
  • the Roots rotor 8E and the rotor chamber 5E are located most downstream in the gas transfer direction in the pump casing 6.
  • the pump casing 6 has a gas inlet 12A and a gas outlet 13A communicating with the rotor chamber 5A, a gas inlet 12B and a gas outlet 13B communicating with the rotor chamber 5B, a gas inlet 12C and a gas outlet 13C communicating with the rotor chamber 5C, a gas inlet 12D and a gas outlet 13D communicating with the rotor chamber 5D, and a gas inlet 12E and a gas outlet 13E communicating with the rotor chamber 5E.
  • the gas outlet 13A comminates with the gas inlet 12B via a channel not shown
  • the gas outlet 13B comminates with the gas inlet 12C via a channel not shown
  • the gas outlet 13C comminates with the gas inlet 12D via a channel not shown
  • the gas outlet 13D comminates with the gas inlet 12E via a channel not shown.
  • FIG. 8 is a cross-sectional view taken along a line B-B of FIG. 7 .
  • the Roots rotors 8A to 8E are three-lobe Roots rotors.
  • a connection 25A between an inner wall 22A forming the rotor chamber 5A and an inner wall 23A forming the gas outlet 13A is located more outwardly than a rotor center line CL1 extending through a center of rotation RC1 and a bottom dead center LP1 of the Roots rotor 8A.
  • An angle ⁇ 1 of a straight line NL1 extending from the center of rotation RC1 of the Roots rotor 8A to the connection 25A with respect to the rotor center line CL1 is in a range of 0 to 45 degrees.
  • a width W4 of the gas outlet 13A is larger than a width W3 of the gas inlet 12A.
  • FIG. 9 is a cross-sectional view taken along a line C-C of FIG. 7 .
  • a connection 25E between an inner wall 22E forming the rotor chamber 5E and an inner wall 23E forming the gas outlet 13E is located more outwardly than a rotor center line CL2 extending through a center of rotation RC2 and a bottom dead center LP2 of the Roots rotor 8E.
  • the connection 25E may be located on the rotor center line CL2.
  • a connection between an inner wall forming the rotor chamber 5B and an inner wall forming the gas outlet 13B, a connection between an inner wall forming the rotor chamber 5C and an inner wall forming the gas outlet 13C, and a connection between an inner wall forming the rotor chamber 5D and an inner wall forming the gas outlet 13D are also located more outwardly than corresponding rotor center lines or are located on the corresponding rotor center lines.
  • the widths of the gas outlets 13A to 13E are larger than the widths of the gas inlets 12A to 12E, respectively, so that the particles are less likely to stay in the rotor chambers 5A to 5E and as a result, the particles are less likely to be deposited in the rotor chambers 5A to 5E.
  • the width W4 of the gas outlet 13A shown in FIG. 8 is larger than the width W6 of the gas outlet 13E shown in FIG. 9 .
  • the particles can be discharged from the pump casing 6 through the rotor chambers 5A to 5E sequentially.
  • a relationship between the widths of the gas outlets 13A to 13E is not limited as long as the width of the gas outlet 13A is larger than the width of the gas outlet 13E.
  • the widths of the gas outlets 13A, 13B, and 13C may be the same and larger than the widths of the gas outlets 13D and 13E.
  • the widths of the gas outlets 13A, 13B, 13C, 13D, 13E may gradually decrease according to the gas transfer direction in the pump casing 6.
  • the vacuum pump 1 shown in FIG. 7 is a five-stage vacuum pump, while the number of stages of the Roots rotors 8 is not limited particularly.
  • the vacuum pump 1 may be a two-stage vacuum pump with two pairs of Roots rotors, or a multi-stage vacuum pump with six or more pairs of Roots rotors.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)

Claims (9)

  1. Vakuumpumpe (1), die Folgendes aufweist:
    ein Pumpengehäuse (6) mit mindestens einer Rotorkammer (5) darin;
    mindestens ein Paar von Roots-Rotoren (8), die in der Rotorkammer (5) angeordnet sind; und
    mindestens ein Paar von Rotationswellen (9), die das mindestens eine Paar von Roots-Rotoren (8) tragen;
    wobei das Pumpengehäuse (6) einen Gaseinlass (12) und einen Gasauslass (13) aufweist, die mit der Rotorkammer (6) in Verbindung stehen;
    wobei eine Verbindung (25) zwischen einer Innenwand (22), welche die Rotorkammer (5) bildet, und einer Innenwand (23), die den Gasauslass (13) bildet, weiter außen angeordnet ist als eine Rotormittellinie (CL), die durch einen Rotationsmittelpunkt (RC) und einen unteren Totpunkt (LP) jedes Roots-Rotors (8) verläuft.
  2. Vakuumpumpe (1) nach Anspruch 1, wobei eine Breite des Gasauslasses (13) größer ist als eine Breite des Gaseinlasses (12).
  3. Vakuumpumpe (1) nach Anspruch 1 oder 2, wobei das mindestens eine Paar von Roots-Rotoren (8) mindestens ein Paar von zweiflügeligen Roots-Rotoren aufweist, und wobei ein Winkel (α) einer geraden Linie (NL), die sich vom Rotationsmittelpunkt (RC) zu der Verbindung (25) erstreckt, in Bezug auf die Rotormittellinie (CL) in einem Bereich von 0 bis 35 Grad liegt.
  4. Vakuumpumpe (1) nach Anspruch 1 oder 2, wobei das mindestens eine Paar von Roots-Rotoren (8) mindestens ein Paar von dreiflügeligen Roots-Rotoren aufweist und ein Winkel (α) einer geraden Linie (NL), die sich vom Rotationsmittelpunkt (RC) zu der Verbindung (25) erstreckt, in Bezug auf die Rotormittellinie (CL) in einem Bereich von 0 bis 45 Grad liegt.
  5. Vakuumpumpe (1) nach einem der Ansprüche 1 bis 4,
    wobei das mindestens eine Paar von Roots-Rotoren (8) ein Paar von ersten Roots-Rotoren (8A) und ein Paar von zweiten Roots-Rotoren (8E) aufweist, die in Gasförderrichtung stromabwärts des Paars von ersten Roots-Rotoren (8A) angeordnet sind,
    wobei die mindestens eine Rotorkammer (5) eine erste Rotorkammer (5A), in der das Paar von ersten Roots-Rotoren (8A) angeordnet ist, und eine zweite Rotorkammer (SE) aufweist, in der das Paar von zweiten Roots-Rotoren (8E) angeordnet ist,
    wobei das Pumpengehäuse (6) einen ersten Gaseinlass (12A) und einen ersten Gasauslass (13A) aufweist, die mit der ersten Rotorkammer (5A) in Verbindung sind, sowie einen zweiten Gaseinlass (12E) und einen zweiten Gasauslass (13E), die mit der zweiten Rotorkammer (5E) in Verbindung sind, wobei eine erste Verbindung (25A) zwischen einer Innenwand (22A), welche die erste Rotorkammer (5A) bildet, und einer Innenwand (23A), die den ersten Gasauslass (13A) bildet, weiter außen angeordnet ist als eine erste Rotormittellinie (CL1), die durch einen Rotationsmittelpunkt (RC1) und einen unteren Totpunkt (LP1) jedes ersten Roots-Rotors (8A) verläuft,
    wobei eine zweite Verbindung (25E) zwischen einer Innenwand (22E), welche die zweite Rotorkammer (5E) bildet, und einer Innenwand (23E), die den zweiten Gasauslass (13E) bildet, auf einer zweiten Rotormittellinie (CL2) liegt oder weiter außen als diese liegt, die durch einen Rotationsmittelpunkt (RC2) und einen unteren Totpunkt (LP2) jedes zweiten Roots-Rotors (8E) verläuft, und
    wobei die Breite des ersten Gasauslasses (13A) größer ist als die Breite des zweiten Gasauslasses (13E).
  6. Vakuumpumpe (1) nach einem der Ansprüche 1 bis 4, wobei die den Gasauslass (13) bildende Innenwand (23) weiter außen als die Rotormittellinie (CL) liegt.
  7. Vakuumpumpe (1) nach einem der Ansprüche 1 bis 4, wobei eine Breite (W2) des Gasauslasses (13) größer ist als eine Distanz zwischen den Rotationsmittelpunkten (RC) der Roots-Rotoren (8).
  8. Vakuumpumpe (1) nach einem der Ansprüche 1 bis 4, 6 oder 7, wobei die Innenwand (23), die den Gasauslass (13) bildet, parallel zur Rotormittellinie (CL) verläuft und die Breite des Gasauslasses (13) konstant ist.
  9. Vakuumpumpe (1) nach einem der Ansprüche 1 bis 4, 6 oder 7, wobei die Innenwand (23), die den Gasauslass (13) bildet, mit Abstand vom Mittelpunkt (CP) der Rotorkammer (5) nach außen geneigt ist.
EP23154594.8A 2022-02-09 2023-02-02 Vakuumpumpe Active EP4239197B1 (de)

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JP2022018854A JP7860745B2 (ja) 2022-02-09 真空ポンプ

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EP4239197B1 true EP4239197B1 (de) 2025-10-22

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KR (1) KR20230120576A (de)
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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2180188B1 (de) * 2008-10-24 2016-09-07 Edwards Limited Verbesserungen bei und in Zusammenhang mit Drehkolbenpumpen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5891390A (ja) * 1981-11-24 1983-05-31 Tokuji Kariya バキユ−ム機械
DE3603818A1 (de) * 1986-02-07 1987-08-13 Messer Griesheim Gmbh Schnellgestroemter axial-hochleistungs co(pfeil abwaerts)2(pfeil abwaerts)-laser
DE102013110091B3 (de) * 2013-09-13 2015-02-12 Pfeiffer Vacuum Gmbh Wälzkolbenpumpe mit zwei Rotoren
DE202017003212U1 (de) * 2017-06-17 2018-09-18 Leybold Gmbh Mehrstufige Wälzkolbenpumpe

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2180188B1 (de) * 2008-10-24 2016-09-07 Edwards Limited Verbesserungen bei und in Zusammenhang mit Drehkolbenpumpen

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TW202346713A (zh) 2023-12-01
EP4239197A1 (de) 2023-09-06
KR20230120576A (ko) 2023-08-17
CN116576110A (zh) 2023-08-11

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