Classifications

• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
  • G01H11/00—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties
  • G01H11/06—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties by electric means
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
  • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
  • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
  • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
  • B06B1/0292—Electrostatic transducers, e.g. electret-type
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
  • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
  • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
  • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
  • B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
  • B06B1/0607—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using multiple elements
  • B06B1/0622—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using multiple elements on one surface
  • B06B1/0629—Square array
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
  • A61B5/00—Measuring for diagnostic purposes; Identification of persons
  • A61B5/0093—Detecting, measuring or recording by applying one single type of energy and measuring its conversion into another type of energy
  • A61B5/0095—Detecting, measuring or recording by applying one single type of energy and measuring its conversion into another type of energy by applying light and detecting acoustic waves, i.e. photoacoustic measurements
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
  • A61B8/00—Diagnosis using ultrasonic, sonic or infrasonic waves
  • A61B8/06—Measuring blood flow
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
  • A61B8/00—Diagnosis using ultrasonic, sonic or infrasonic waves
  • A61B8/44—Constructional features of the ultrasonic, sonic or infrasonic diagnostic device
  • A61B8/4483—Constructional features of the ultrasonic, sonic or infrasonic diagnostic device characterised by features of the ultrasound transducer
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
  • A61B8/00—Diagnosis using ultrasonic, sonic or infrasonic waves
  • A61B8/48—Diagnostic techniques
  • A61B8/485—Diagnostic techniques involving measuring strain or elastic properties
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
  • A61B8/00—Diagnosis using ultrasonic, sonic or infrasonic waves
  • A61B8/52—Devices using data or image processing specially adapted for diagnosis using ultrasonic, sonic or infrasonic waves
  • A61B8/5269—Devices using data or image processing specially adapted for diagnosis using ultrasonic, sonic or infrasonic waves involving detection or reduction of artifacts
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
  • A61N7/00—Ultrasound therapy
  • A61N2007/0043—Ultrasound therapy intra-cavitary
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
  • A61N7/00—Ultrasound therapy
  • A61N7/02—Localised ultrasound hyperthermia
  • A61N7/022—Localised ultrasound hyperthermia intracavitary

Definitions

• Micromachined ultrasonic transducers offer great potential in many fields, including but not limited to medical imaging, air-coupled imaging, distance monitoring, fingerprint monitoring, non-destructive defect monitoring, and diagnosis. In many of these applications, there are more than one MUT acting in concert. For example, for higher end medical ultrasound imaging, it is reasonable to find systems with 1024, 2048, or 4096 MUTs.
• the MUTs are designed to transmit energy into the acoustic medium to which they are attached.
• the MUTs are represented by the movable diaphragms 101a, 101b, 101c which are formed in or on top of the substrate 100 by cavities 120a, 120b, and 120c.
• the diaphragms 101a, 101b, 101c are coupled acoustically to the semi-infinite acoustic medium 200 at an interface 110.
• the acoustic medium 200 can be any substance, or a plurality of substances; common media include air, water, tissue, electrolytic gel, metal, silicone rubbers used as matching layers to the body, etc.
• the diaphragms lOla-lOlc are excited into motion, primarily in the z- direction.
• the excitation is generally created by a piezoelectric effect (for piezoelectric MUTs (pMUTs)) or a capacitive effect (for capacitive MUTs (cMUTs)).
• pMUTs piezoelectric MUTs
• cMUTs capacitive MUTs
• the motion of the diaphragm creates pressure waves that transmit into the acoustic medium 200.
• the diaphragm motion also creates unwanted waves outside the acoustic medium 200.
• the most common unwanted waves are elastic compression waves that travel within and through the substrate 100, and interfacial waves that travel along the interface 110 between the substrate 100 and the acoustic medium 200, as well as other interfaces attached to the substrate 100.
• the MUT array 210 comprises a substrate 100 and a plurality of MUTs 101.
• the plurality of MUTs 101 are affixed to a surface of the substrate. Each MUT comprises a moveable diaphragm as shown in Fig. 1A. In some embodiments, each of the MUTs 101 is a pMUT. In some embodiments, each of the MUTs 101 is a cMUT.
• the MUTs 101 may be arranged in a two-dimensional array 210 arranged in orthogonal directions. That is, the MUTs 101 are be formed into a two-dimensional MxN array 210 with N columns and M rows of MUTs 101. The number of columns (N) and the number of rows (M) may be the same or different.
• the array 210 may be curved, e.g., to provide a wider angle of an object being imaged.
• the array may offer different packing such as hexagonal packing, rather than the standard square packing displayed in Fig. IB.
• the array may asymmetrical, e.g., as described in U.S. Patent No. 10,656,007, the entire contents of which are incorporated herein by reference.
• Fig. 2 provides an example of this cross-talk in a MUT array formed from a silicon substrate 100 coupled to a water acoustic medium 200.
• the diagonal ripples 220 represent traveling pressure waves.
• the two dashed lines 230 represent the speed of sound of the water acoustic medium (approximately 1,480 m/s). Ripples and high amplitude data 240 below these lines 230 typically represents good acoustic data.
• the data 250 above the two dashed lines 230 represent various forms of cross-talk.
• Fig. 3 Taking spatial and temporal Fourier transforms of the data in Fig. 2 yields the f-k plot in Fig. 3.
• Fig. 3 we can see that the cross-talk acoustic energy, circled with a dashed line 300, is distributed around 2,000 to 6,000 m/s.
• the longitudinal speed of sound in silicon is approximately 8,800 m/s, while the interfacial wave speed for Rayleigh and Shear waves is between 5,000 and 5,500 m/s. This suggests that the cross-talk energy may be due to a combination of interfacial and bulk waves.
• a MUT array comprising a substrate and a plurality of MUTs.
• the plurality of MUTs are affixed to a surface of the substrate.
• Each MUT comprises a moveable diaphragm.
• the substrate comprises a trench at least partially around a perimeter of the diaphragm of one or more MUTs of the plurality of MUTs.
• each MUT in the plurality of MUTs is a pMUT.
• each MUT in the plurality of MUTs is a cMUT
• the trench runs from the surface of the substrate to at least 10%, at least 50%, or at least 90% the thickness of the substrate. In some embodiments, the trench runs the entire thickness of the substrate.
• the trench runs from below the surface of the substrate to at least 10%, at least 50%, or at least 90% the thickness of the substrate.
• the trench runs from the surface opposite 110 up through the substrate at least 10%, at least 50%, or at least 90% of the thickness of the substrate.
• the trench has a constant width between 1 pm and 40 pm. In some embodiments, the trench has a variable width between 1 pm and 40 pm.
• the trench has a constant distance from the perimeter of the diaphragm between 1 pm and 40 pm. In some embodiments, the trench has a variable distance from the perimeter of the diaphragm between 1 pm and 40 pm.
• the trench is around at least 50%, 60%, 70%, 80%, or 90% of the perimeter of the diaphragm. In some embodiments, the trench is around the entire perimeter of the diaphragm.
• the trench is at least partially around a perimeter of the diaphragm of at least 10%, at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, or at least 90% of the MUTs of the plurality of MUTs. In some embodiments, the trench is at least partially around a perimeter of the diaphragm of each MUT of the plurality of MUTs.
• the trench is at least partially filled with an acoustic attenuation material.
• the plurality of MUTs are arranged in a plurality of columns and a plurality of rows.
• the trench runs along a row of MUTs.
• each row of MUTs has a trench running therealong.
• the trench runs along a column of MUTs.
• each column of MUTs has a trench running therealong.
• each row of MUTs has a first trench running therealong and each column of MUTs has a second trench running therealong.
• the trench is at least partially around a perimeter of the diaphragm of a single MUT of the plurality of MUTs.
• each MUT of the plurality of MUTs is at least partially surrounded by a trench.
• the MUT array further comprises at least a second trench at least partially around the perimeter of the diaphragm of one or more MUTs of the plurality of MUTs.
• the second trench is at least partially around the perimeter of the diaphragm of a single MUT of the plurality of MUTs.
• each MUT of the plurality of MUTs is at least partially surrounded by a first trench and a second trench.
• the trench is disposed between an adjacent pair of MUTs.
• the substrate comprises a plurality of trenches at least partially around the perimeter of the diaphragm of one or more MUTs of the plurality of MUTs. In some embodiments, the substrate comprises one trench per MUT of the plurality of MUTs. In some embodiments, the substrate comprises one trench per adjacent pair of MUTs of the plurality of MUTs. In some embodiments, the substrate comprises fewer than one trench per MUT of the plurality of MUTs. In some embodiments, the substrate comprises fewer than one trench per adjacent pair of MUTs of the plurality of MUTs. In some embodiments, the substrate comprises more than one trench per MUT of the plurality of MUTs. In some embodiments, the substrate comprises more than one trench per adjacent pair of MUTs of the plurality of MUTs.
• the MUT array is configured for medical imaging.
• Fig. 1A is a schematic diagram showing a cross-section of a generalized MUT array (lOla-lOlc) attached to an acoustic medium 200, in accordance with embodiments.
• Fig. IB shows a top view of a MUT array 210, in accordance with embodiments.
• Fig. 1C is a bock diagram of an imaging device 105, in accordance with embodiments.
• Fig. ID shows a top view of a MUT, in accordance with embodiments.
• Fig. IE shows a cross-sectional view of a MUT, taken along a direction 4-4 in Fig. ID, in accordance with embodiments.
• Fig. 2 is a graph showing amplitude of motion of a MUT array with 128 elements in the azimuth direction, spanning approximately 22 mm, in accordance with embodiments.
• the center two MUTs were actuated, and the other 126 MUTs were monitored for response.
• the grey level indicates positive (towards white) or negative (towards black) diaphragm deflection.
• the two fired elements were eliminated from the plot so that the cross-talk ripples could be visualized.
• the dashed lines 230 approximately represent the imaging cone, defined by wave with a 1,480 m/s velocity.
• Fig. 3 is a graph showing a Fourier transform in space and time (also referred to as an f-k plot). of the data from Fig. 2, representing the data in spatial and frequency domains, in accordance with embodiments.
• the amplitude is plotted in dB relative to the maximum amplitude of the Fourier data, with white data having a higher amplitude black blue data.
• the data 300 circled in between 2 and 4 MHz and 0.5 and 1.5 psec is undesired cross-talk.
• Fig. 4 is an ultrasound image taken with a MUT array similar to that of Figs. 2 and 3, in accordance with embodiments.
• the “spotlight” effect is highlighted by the two arrows 420, while the “ghosting” artifacts are circled 430.
• Figs. 5A and 5B are exemplary schematic diagrams showing (a) layout and (b) cross- section views of a generalized MUT array (lOla-lOlc) with diaphragm-side cross-talk trenches 103, in accordance with embodiments.
• FIGs. 6A and 6B are exemplary schematic diagrams showing (a) layout and (b) cross- section views of a generalized MUT array (lOla-lOlc) with buried cross-talk trenches 104, in accordance with embodiments.
• Figs. 7A and 7B are exemplary schematic diagrams showing (a) layout and (b) cross- section views of a generalized MUT array (lOla-lOlc) with cavity-side cross-talk trenches 105, in accordance with embodiments.
• Figs. 8A and 8B are exemplary schematic diagrams showing (a) layout and (b) cross- section views of a generalized MUT array (lOla-lOlc) with both diaphragm-side 103 and cavity-side 105 cross-talk trenches, in accordance with embodiments.
• FIGs. 9A to 9D are cross-sectional views of a capacitive MUT with buried cavity with (a) diaphragm-side cross-talk trenches 103, (b) buried cross-talk trenches 104, (c) cavity side cross talk trenches 105, and (d) both cavity side 105 and diaphragm side 103 cross talk trenches, in accordance with embodiments.
• Fig. 10 is a graph showing a simulated attenuation of cross-talk trenches 103 versus trench depth for multiple substrate thicknesses, in accordance with embodiments.
• the y-axis is the maximum velocity of the element adjacent to the element being actuated, divided by the maximum velocity of the actuated element, in dB.
• FIGs. 11 A and 11B show a comparison of f-k and images of MUT arrays (b) with and (a) without cross-talk trenches (75 pm deep in 150 pm silicon substrate), in accordance with embodiments.
• Figs. 12A and 12B show Azimuthal response at 3.50 MHz, 3dB shift for 50 pm and 25 pm deep cavity-side trenches, respectively, at a variety of stand-offs and widths, in accordance with embodiments.
• MUT micromachined ultrasound transducer
• a MUT array comprising a substrate and a plurality of MUTs.
• the plurality of MUTs are affixed to a surface of the substrate.
• Each MUT comprises a moveable diaphragm.
• the substrate comprises a trench at least partially around a perimeter of the diaphragm of one or more MUTs of the plurality of MUTs.
• each MUT in the plurality of MUTs a pMUT
• each MUT in the plurality of MUTs a cMUT
• the trench runs from the surface of the substrate to at least 10%, at least 50%, or at least 90% the thickness of the substrate. In some embodiments, the trench runs the entire thickness of the substrate.
• the trench runs from an opposite surface of the substrate to at least 10%, at least 50%, or at least 90% the thickness of the substrate.
• the trench runs from below the surface of the substrate to at least 10%, at least 50%, or at least 90% the thickness of the substrate.
• the trench has a constant width between 1 pm and 40 pm. In some embodiments, the trench has a variable width between 1 pm and 40 pm.
• the trench has a constant distance from the perimeter of the diaphragm between 1 pm and 40 pm. In some embodiments, the trench has a variable distance from the perimeter of the diaphragm between 1 pm and 40 pm.
• the trench is around at least 50%, 70%, or 90% of the perimeter of the diaphragm. In some embodiments, the trench is around the entire perimeter of the diaphragm.
• the trench is at least partially around a perimeter of the diaphragm of at least 10%, at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, or at least 90% of the MUTs of the plurality of MUTs. In some embodiments, the trench is at least partially around a perimeter of the diaphragm of each MUT of the plurality of MUTs.
• the trench is at least partially filled with an acoustic attenuation material.
• the MUT array is configured for medical imaging.
• MUT micromachined ultrasound transducer
• MUT micromachined ultrasound transducer
• pMUT piezoelectric micromachined ultrasound transducer
• cMUT capacitive micromachine ultrasonic transducer
• Fig. 1C is a block diagram of an imaging device 105 with selectively alterable channels 106, 108, controlled by a controller 109, and having imaging computations performed on a computing device 110 according to principles described herein.
• the imaging device 105 may be used to generate an image of internal tissue, bones, blood flow, or organs of human or animal bodies. Accordingly, the imaging device 105 transmits a signal into the body and receives a reflected signal from the body part being imaged.
• imaging devices may include either pMUT or cMUT, which may be referred to as transceivers or imagers, which may be based on photo-acoustic or ultrasonic effects.
• the imaging device 105 can be used to image other objects as well.
• the imaging device 105 can be used in medical imaging; flow measurements in pipes, speaker, and microphone arrays; lithotripsy; localized tissue heating for therapeutic; and highly intensive focused ultrasound (HIFU) surgery.
• HIFU highly intensive focused ultrasound
• the imaging device 105 may be used to get an image of internal organs of an animal as well. Moreover, in addition to imaging internal organs, the imaging device 105 may also be used to determine direction and velocity of blood flow in arteries and veins as in Doppler mode imaging and may also be used to measure tissue stiffness. [062] The imaging device 105 may be used to perform different types of imaging. For example, the imaging device 105 may be used to perform one dimensional imaging, also known as A-Scan, two dimensional imaging, also known as B scan, three dimensional imaging, also known as C scan, and Doppler imaging. The imaging device 105 may be switched to different imaging modes and electronically configured under program control.
• the imaging device 105 includes an array of pMUT or cMUT transducers 210, each transducer 210 including an array of transducer elements (i.e., MUTs)
• the MUTs 101 operate to 1) generate the pressure waves that are passed through the body or other mass and 2) receive reflected waves off the object within the body, or other mass, to be imaged.
• the imaging device 105 may be configured to simultaneously transmit and receive ultrasonic waveforms. For example, certain MUTs 101 may send pressure waves toward the target object being imaged while other MUTs 101 receive the pressure waves reflected from the target object and develop electrical charges in response to the received waves.
• Fig. ID shows a top view of an exemplary MUT 400 (in this example, a pMUT).
• the MUT 400 may be substantially similar to the MUT 101 described herein.
• the MUT may include: a membrane layer 406 suspended from a substrate 402 and disposed over a cavity 404; a bottom electrode (O) 408 disposed on the membrane layer (or, shortly membrane) 406; a piezoelectric layer 410 disposed on the bottom electrode (O) 408; and a top electrode (X) 412 disposed on the piezoelectric layer 410.
• MUTs whether cMUTs or pMUTs, can be efficiently formed on a substrate leveraging various semiconductor wafer manufacturing operations.
• Semiconductor wafers may come in 6 inch, 8 inch, and 12 inch sizes and are capable of housing hundreds of transducer arrays. These semiconductor wafers start as a silicon substrate on which various processing steps are performed.
• An example of such an operation is the formation of SiCh layers, also known as insulating oxides.
• Various other steps such as the addition of metal layers to serve as interconnects and bond pads are performed to allow connection to other electronics.
• Yet another example of a machine operation is the etching of cavities (e.g., cavity 404 in Fig. IE) in the substrate.
• a trench 103 is formed within the substrate 100 that roughly surrounds each MUT 101.
• FIGs. 5A and 5B show an exemplary schematic diagram showing a generalized MUT array (lOla-lOlc) with diaphragm-side cross talk trenches 103.
• Fig. 5B shows a cross-sectional view of the MUT array in Fig. 5A, taken along line A- A’.
• the MUT array may be substantially similar to the array depicted in Figs. 1A- 1C with the addition of one or more trenches 103.
• the MUT array 210 comprises a substrate 100 and a plurality of MUTs lOla-lOlc.
• the plurality of MUTs 101a- 101c are affixed to a surface of the substrate 100.
• Each MUT 101 a- 101c comprises a moveable diaphragm.
• the substrate 100 comprises a trench 103 at least partially around a perimeter of the diaphragm lOla-lOlc of the plurality of MUTs.
• the trench 103 introduces an impedance mismatch between the substrate 100 and whatever material is within the cross-talk trenches 103. This impedance mismatch disrupts the cross-talk waves through attenuation, reflection, and scattering.
• the location of the cross-talk trenches 103 will impact the amount of attenuation provided by the trenches.
• the velocity data from Fig. 3 suggests that interfacial waves at the interface 110 account for some of the cross-talk energy.
• Interfacial waves such as Rayleigh waves, typically affect the interface region and the material within some distance of the interface characterized by the wavelength of the travelling wave.
• a trench 103 attached to the surface of the substrate 100 and intersecting the interface 110 will be optimal compared to a buried cross-talk trench 104 that is not near the interface 110, such as those depicted in Figs. 6A and 6B.
• Figs. 7A and 7B are exemplary schematic diagrams showing (a) layout and (b) cross- section views of a generalized MUT array (lOla-lOlc) with cavity-side cross-talk trenches 105.
• the substrate 100 comprises a cavity-side trench 105 at least partially around a perimeter of the cavity 120a- 120c of the plurality of MUTs.
• the trench 105 introduces an impedance mismatch between the substrate 100 and whatever material is within the cross-talk trenches 105. This impedance mismatch disrupts the cross-talk waves through attenuation, reflection, and scattering.
• the cavity-side trenches 105 are effective in reducing cross-talk velocity by increasing elastic wave pathlength.
• Figs. 8A and 8B are exemplary schematic diagrams showing (a) layout and (b) cross- section views of a generalized MUT array (lOla-lOlc) with both diaphragm-side 103 and cavity-side 105 cross-talk trenches.
• the substrate 100 comprises both diaphragm-side trenches 103 and cavity-side trenches 105.
• the combination of diaphragm-side trenches 103 and cavity-side trenches 105 can reduce cross-talk effects (e.g., by lowering velocity and/or lowering amplitude of the cross-talk effects) beyond that of either trench type alone.
• the substrate 100 comprises diaphragm-side trenches 103, buried trenches 104, and cavity-side trenches 105.
• Figs. 9A to 9D are cross-sectional views of a capacitive MUT with buried cavity with (a) diaphragm-side cross-talk trenches 103, (b) buried cross-talk trenches 104, (c) cavity side cross talk trenches 105, and (d) both cavity side 105 and diaphragm side 103 cross talk trenches.
• the MUT array 210 comprises a substrate 100 and a plurality of MUTs lOla-lOlc. The plurality of MUTs lOla-lOlc are affixed to a surface of the substrate 100.
• Each MUT 101 a- 101c comprises a moveable diaphragm formed in or on top of the substrate 100 by buried cavities 130a, 130b, and 130c.
• the substrate 100 comprises a trench 103, 104, and/or 105 at least partially around a perimeter of the diaphragm 101 a- 101c of the plurality of MUTs.
• the trench 103, 104, and/or 105 introduces an impedance mismatch between the substrate 100 and whatever material is within the cross-talk trenches 103, 104, and/or 105. This impedance mismatch disrupts the cross-talk waves through attenuation, reflection, and scattering.
• a trench 103, 104, or 105 is formed via deep reactive ion etching (DRIE), plasma etching, wet etching, or other etching techniques which will be apparent to one of ordinary skill in the art based on the teachings here.
• DRIE deep reactive ion etching
• plasma etching wet etching, or other etching techniques which will be apparent to one of ordinary skill in the art based on the teachings here.
• a trench 103, 104, or 105 has a constant distance from the perimeter of the diaphragm or cavity between 1 pm and 40 pm (e.g., between 10 pm and 40 pm).
• the trench 103, 104, or 105 has a variable distance from the perimeter of the diaphragm or cavity between 1 pm and 40 pm (e.g., between 10 pm and 40 pm).
• the distance of trench 103, 104, or 105 from the perimeter of the diaphragm or cavity can be as close (e.g., atomically close) or as far as desired.
• a trench 103, 104, or 105 is around at least 50%, 70%, or 90% of the perimeter of the diaphragm or cavity. In some embodiments, a trench 103, 104, or 105 is around the entire perimeter of the diaphragm or cavity.
• a trench 103, 104, or 105 is at least partially around a perimeter of the diaphragm or cavity of at least 10%, at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, or at least 90% of the MUTs of the plurality of MUTs. In some embodiments, a trench 103, 104, or 105 is at least partially around a perimeter of the diaphragm or cavity of each MUT of the plurality of MUTs.
• a trench 103, 104, or 105 is at least partially around a perimeter of the diaphragm or cavity on a first lateral side of the MUT.
• a second trench 103, 104, or 105 is at least partially around a perimeter of the diaphragm or cavity on a second lateral side of the MUT.
• the MUT has trenches 103, 104, or 105 on both lateral sides thereof.
• the trenches 103, 104, or 105 are symmetrically disposed around the perimeter of the diaphragm or cavity.
• the trenches 103, 104, or 105 are asymmetrically disposed around the perimeter of the diaphragm or cavity.
• the MUT has a trench 103, 104, or 105 on a single lateral side thereof.
• the depth of the cross-talk trenches 103, 104, or 105 will impact the attenuation, as illustrated in Fig. 10.
• Fig. 10 is a graph showing a simulated attenuation of cross-talk trenches
• the y-axis is the maximum velocity of the element adjacent to the element being actuated, divided by the maximum velocity of the actuated element, in dB.
• simulations show that deeper cross-talk trenches 103 are more effective than shallow trenches. This is because both interfacial and longitudinal waves have a vertical spatial extent. Trenches with a greater depth result in a larger proportion of the cross-talk waves disrupted by the trench.
• a trench 103, 104, or 105 runs from the surface (diaphragm-side or cavity-side) of the substrate to at least 10%, at least 50%, or at least 90% the thickness of the substrate. In some embodiments, the trench runs the entire thickness (e.g., 100%) of the substrate. In some embodiments, the trench runs from the surface (diaphragm-side or cavity- side) of the substrate to about 1% the thickness of the substrate.
• a trench 103, 104, or 105 runs from below the surface (diaphragm-side or cavity-side) of the substrate to at least 10%, at least 50%, or at least 90% the thickness of the substrate.
• the trench lateral width will also affect the attenuating properties of the cross talk trenches 103, 104, or 105, particularly if the trenches are filled with a high attenuation material. Larger lateral dimensions and/or greater number of trenches produces better cross-talk attenuation. In most common MUT arrays, the lateral width of the cross-talk trenches 103 and
• a trench 103, 104, or 105 has a constant width between 1 pm and 40 pm. In some embodiments, a trench 103, 104, or 105 has a constant width between 1 pm and 100 pm. In some embodiments, a trench 103, 104, or 105 has a constant width between 5 pm and 10 pm.
• the width of trench 103, 104, or 105 can be as thin (e.g., atomically thin) or as large as desired.
• a trench 103, 104, or 105 has a variable width between 1 pm and 40 pm. In some embodiments, a trench 103, 104, or 105 has a variable width between 1 pm and 100 pm. In some embodiments, a trench 103, 104, or 105 has a variable width between 5 pm and 10 pm.
• the width of trench 103, 104, or 105 can be as thin (e.g., atomically thin) or as large as desired.
• a trench 103, 104, or 105 is at least partially filled with an acoustic attenuation material. Alternatively, or in combination, in some embodiments a trench 103, 104, or 105 is at least partially filled with an acoustic attenuation material. [084] In some embodiments, there is one trench 103, 104, or 105 per MUT. In some embodiments, there is one trench 103, 104, or 105 per adjacent pair of MUTs. In some embodiments, trenches 103, 104, or 105 can intersect and run between MUTs as one continuous trench. In some embodiments, there is fewer than one trench 103, 104, or 105 per pair of MUTs. In some embodiments, there is more than one trench 103, 104, or 105 per MUT.
• each MUT has a first proximal trench on a first lateral side of the MUT and a second proximal trench on a second lateral side of the MUT, such that each adjacent pair of MUTs has at least two trenches between them.
• the proximal trench on the first lateral side of a first MUT and the proximal trench on the second lateral side of a second MUT may be disposed in the substrate between the first and second MUTs.
• a central trench may be disposed between the proximal trenches, for a total of at least three trenches between the adjacent first and second MUTs.
• the proximal and central trenches are formed in the same surface (diaphragm-side or cavity-side) of the substrate. In some embodiments, the proximal and central trenches are formed in different surfaces of the substrate. For example, the proximal trenches 103 may be formed in the diaphragm-side and the central trench 105 may be formed in the cavity-side as shown in Figs. 8B and 9D. In at least some instances, the combination of proximal diaphragm-side trenches 103 and central cavity-side trenches 105 can reduce cross-talk effects (e.g., by lowering velocity and/or lowering amplitude of the cross-talk effects) beyond that of either trench type alone.
• cross-talk effects e.g., by lowering velocity and/or lowering amplitude of the cross-talk effects
• all trenches 103, 104, or 105 of the MUT array have the same dimensions.
• one or more of the trenches 103, 104, or 105 has different dimensions.
• the central trench 105 shown in Figs. 8B and 9D may be wider than the proximal trenches 103.
• FIG. 11A shows f-k and images of an MUT array lOla-lOlc without cross-talk trenches.
• Fig. 11B shows f-k and images of an MUT array 101 a- 101c with cross-talk trenches 103 (75 pm deep in 150 pm silicon substrate).
• the cross-talk trenches 103 effectively reduce the cross-talk energy and remove the “spotlight” 420 and ghosting 430 artifacts associated with cross-talk.
• a substrate e.g., substrate 402 or 100
• substrate 402 or 100 typically single crystal silicon
• buried cross-talk trenches 104 may be patterned and etched in the substrate to generate a “handle” wafer.
• Another silicon “device” wafer may be thermally oxidize and then fusion bonded to the “handle” to form the buried trenches 104 therebetween (e.g., as shown in Figs. 6A and 6B).
• the “device” wafer may be ground and polished to the desired diaphragm thickness.
• the insulating layer can then be deposited over the substrate.
• the insulating layer is typically some form of Si02, about 0.1 pm to 3 pm thick. It is commonly deposited via thermal oxidation, PECVD deposition, or other technique.
• a first metal layer 408 (also referred to as Ml or metal 1) can then be deposited.
• Ml metal 1
• SRO may be used for structured film growth, on top of Pt for a diffusion barrier and conduction, on top of Ti as an adhesive layer (for Pt to Si02).
• these layers are thin, less than 200 nm, with some films 10 to 40 nm. Stress, manufacturing, and cost issues will usually limit this stack to less than 1 pm.
• the conductor (Pt) is typically thicker than the structuring layer (SRO) and adhesion layer (Ti).
• Other common structuring layers, rather than SRO include (La0.5Sr0.5)CoO3, (La0.5Sr0.5)MnO3, LaNi03, Ru02, Ir02, BaPb03, to name a few.
• Pt can be replaced with other conductive materials such as Cu, Cr, Ni, Ag, Al, Mo, W, and NiCr. These other materials usually have disadvantages such as poor diffusion barrier, brittleness, or adverse adhesion, and Pt is the most common conductor used.
• the adhesion layer, Ti can be replaced with any common adhesion layers such as TiW, TiN, Cr, Ni, Cr, etc.
• a piezoelectric material 410 can then be deposited.
• suitable piezoelectric materials include: PZT, KNN, PZT-N, PMN-Pt, AIN, Sc- AIN, ZnO, PVDF, and LiNi03.
• the thicknesses of the piezoelectric layer may vary between 100 nm and 5 pm or possibly more.
• a second metal layer 412 (also referred to as M2 or metal 2) can then be deposited.
• This second metal layer 412 may be similar to the first metal layer 408 and may serve similar purposes.
• M2 the same stack as Ml may be used, but in reverse: Ti for adhesion on top of Pt to prevent diffusion on top of SRO for structure.
• M2412 may then be patterned and etched, stopping on the piezoelectric layer. Etches can be made in many ways herein, for example, via RIE (reactive ion etching), ion mill, wet chemical etching, isotropic gas etching, etc.
• the photoresistor used to pattern M2 may be stripped, via wet and/or dry etching.
• any number of ways of etching may be used, and the photoresist is typically stripped after most pattern and etch steps.
• the piezoelectric layer may then be similarly patterned and etched, stopping at the first metal layer or Ml 408. Typically, wet, RIE, and/or ion mill etches are used.
• the first metal layer or Ml 408 may then be similarly patterned and etched, stopping on the dielectric insulating layer.
• An H2 barrier H2 diffusion into the piezoelectric layer can limit its lifetime. To prevent this, an H2 barrier can be used. 40 nm of ALD (atomic layer deposition) aluminum oxide (A1203) may be used to accomplish this. Other suitable materials may include SiC, diamond-like carbon, etc.
• ALD atomic layer deposition
• Al oxide A1203
• a redistribution layer This layer can provide connectivity between Ml and M2 and other connections (e.g., wirebonds, bump bonds, etc.).
• An RDL can be formed by first adding a dielectric such as oxide, etching vias in the dielectric, depositing a conductor (typically Al), and finally patterning the conductor. Additionally, one might add a passivation layer (typically oxide + nitride) to prevent physical scratches, accidental shorting, and/or moisture ingress.
• the diaphragm-side trenches 103 may be patterned and etched (e.g., as shown in Figs. 5A, 5B, 8A, and 8B).
• the dielectric layer may be etched via RIE or wet etching.
• the substrate 100 is typically silicon, and may be etched typically via DRIE (deep reactive ion etching).
• a silicon on insulator (SOI) substrate is used.
• SOI silicon on insulator
• BOX buried oxide
• the diaphragm is then composed of the “device” layer (layer above the BOX), and the “handle” layer under the BOX layer.
• the cavity in the device layer may stop on the BOX and may be etched out of the Handle layer.
• the trench etch may include two extra steps: (1) etching the BOX (typically via dry RIE etching, or in some cases, via wet etching) after the device layer is etched via DRIE, and (2) etching the handle layer via DRIE to the desired depth.
• the insulator BOX in this case, is typically a silicon dioxide thermally grown, which is called a “buried oxide”, which is where the term “BOX” comes from.
• a silicon SOI wafer with single crystal silicon handle and device layers with an oxide BOX may typically be used.
• the device layer may be 5 pm, but typically varies between 100 nm and 100 pm, while the handle layer thickness typically varies between 100 pm and 1000 pm.
• the BOX is typically between 100 nm and 5 pm, but 1 pm may be used, in many cases.
• the backside of the wafer or handle can be thinned via grinding and optionally polished at this point.
• the handle layer is thinned from 500 pm to 300 pm thick. Common thicknesses typically vary between 50 pm and 1000 pm.
• the cavity-side trenches 105 may be patterned and etched (e.g., as shown in Figs. 7A to 8B).
• the backside of the substrate 100 may be etched typically via DRIE (deep reactive ion etching).
• the cavity may be patterned on the backside of the wafer or Handle, and the cavity may be etched.
• the wafer/handle is composed of silicon, and the etch is accomplished with DRIE.
• the etch can be timed.
• the cavity may be etched at the same time as the cavity-side trench 105.
• the etch may stop selectively on the BOX.
• the cavity can be etched via other techniques such as KOH, TMAH, HNA, and RIE.
• the wafer can be considered complete after photoresist strip.
• a substrate e.g., substrate 402 or 100
• typically single crystal silicon is provided.
• the substrate may then be thermally oxidized.
• the cavities 130a, 130b, 130c may be patterned and etched in the oxide to generate a “handle” wafer. This is typically accomplished through a plasma etch of the oxide or a wet etch (e.g., HF).
• the buried cross-talk trenches 104 may be patterned and etched in the oxide of the “handle” wafer. This is typically accomplished through a plasma etch of the oxide or a wet etch (e.g., HF).
• a silicon “device” wafer may then be fusion bonded to the patterned oxide “handle” wafer.
• the “device” wafer may be patterned and etched (e.g., via DRIE) to correspond to the buried trenches 104 in the “handle” wafer prior to fusion bonding, such that fusion bonding of the “handle” and the “device” wafers forms the buried trenches 104 (e.g., as shown in Fig. 9B).
• the “device” wafer may be ground and polished to the desired diaphragm thickness.
• the diaphragm-side trenches 103 may be patterned and etched (e.g., as shown in Fig. 9A and 9D) into the diaphragm side of the ground and polished wafer.
• the cavity-side trenches 105 may be patterned and etched (e.g., as shown in Fig. 9C and 9D) into the cavity side of the ground and polished wafer.
• Example 1 Cavity-side trench Azimuthal responses
• Test pMUT wafers were fabricated with variable depth (25 pm, 37.5 pm, and 50 pm on a 75 pm thick pMUT) and standoff distance (10 pm, 15 pm, 20 pm, and 25 pm) of the trench from the cavity, and width of the of the trench (5 pm and 10 pm).
• the Azimuthal response of the pMUTs at various frequencies was measured.
• Figs. 12A and 12B show Azimuthal response at 3.50 MHz, 3dB shift for 50 pm and 25 pm deep cavity-side trenches, respectively, at a variety of stand-offs and widths.
• a 20-05W is a trench 20 pm from the cavity, and 5 pm width.
• the spotlight angle for a 50 pm deep cavity-side trench appears to push further out with increasing trench standoff distance.
• the spotlight angle for a 25 pm deep cavity-side trench does not have a linear correlation with trench standoff distance, but the general trend is that increasing standoff distance results in narrower spotlight angle.
• Cross-talk dip occurred at 3.5 MHz, particularly in 20-10W (20 pm standoff, 10 pm width) at 25 pm depth at about +/- 28 degrees.

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