EP4050973A4 - Dispositif de génération de plasma et procédé de traitement par plasma - Google Patents

Dispositif de génération de plasma et procédé de traitement par plasma Download PDF

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Publication number
EP4050973A4
EP4050973A4 EP19950060.4A EP19950060A EP4050973A4 EP 4050973 A4 EP4050973 A4 EP 4050973A4 EP 19950060 A EP19950060 A EP 19950060A EP 4050973 A4 EP4050973 A4 EP 4050973A4
Authority
EP
European Patent Office
Prior art keywords
plasma
processing method
generation device
plasma processing
plasma generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP19950060.4A
Other languages
German (de)
English (en)
Other versions
EP4050973A1 (fr
Inventor
Takuya Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Corp
Original Assignee
Fuji Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Corp filed Critical Fuji Corp
Publication of EP4050973A1 publication Critical patent/EP4050973A1/fr
Publication of EP4050973A4 publication Critical patent/EP4050973A4/fr
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
EP19950060.4A 2019-10-22 2019-10-22 Dispositif de génération de plasma et procédé de traitement par plasma Pending EP4050973A4 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/041419 WO2021079420A1 (fr) 2019-10-22 2019-10-22 Dispositif de génération de plasma et procédé de traitement par plasma

Publications (2)

Publication Number Publication Date
EP4050973A1 EP4050973A1 (fr) 2022-08-31
EP4050973A4 true EP4050973A4 (fr) 2022-11-09

Family

ID=75619936

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19950060.4A Pending EP4050973A4 (fr) 2019-10-22 2019-10-22 Dispositif de génération de plasma et procédé de traitement par plasma

Country Status (4)

Country Link
EP (1) EP4050973A4 (fr)
JP (1) JP7133724B2 (fr)
CN (1) CN114586473A (fr)
WO (1) WO2021079420A1 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017056185A1 (fr) * 2015-09-29 2017-04-06 富士機械製造株式会社 Dispositif de génération de plasma
EP3197245A1 (fr) * 2014-09-16 2017-07-26 Fuji Machine Mfg. Co., Ltd. Dispositif d'irradiation de gaz plasma
DE102016125699A1 (de) * 2016-12-23 2018-06-28 Plasmatreat Gmbh Düsenanordnung, Vorrichtung zur Erzeugung eines atmosphärischen Plasmastrahls, Verwendung derselben, Verfahren zur Plasmabehandlung eines Stoffs oder einer Kunststofffolie, plasmabehandelter Vliesstoff und Verwendung desselben
EP3432691A1 (fr) * 2016-03-14 2019-01-23 Fuji Corporation Générateur de plasma
WO2019150447A1 (fr) * 2018-01-30 2019-08-08 株式会社Ｆｕｊｉ Machine de traitement au plasma

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS3621622Y1 (fr) * 1959-02-03 1961-08-21
DE29911974U1 (de) 1999-07-09 2000-11-23 Agrodyn Hochspannungstechnik G Plasmadüse
JP2005302681A (ja) 2003-05-14 2005-10-27 Sekisui Chem Co Ltd プラズマ処理装置
JP2015144078A (ja) 2014-01-31 2015-08-06 富士機械製造株式会社 大気圧プラズマ発生装置
US10980101B2 (en) * 2015-06-02 2021-04-13 Fuji Corporation Plasma generating device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3197245A1 (fr) * 2014-09-16 2017-07-26 Fuji Machine Mfg. Co., Ltd. Dispositif d'irradiation de gaz plasma
WO2017056185A1 (fr) * 2015-09-29 2017-04-06 富士機械製造株式会社 Dispositif de génération de plasma
EP3432691A1 (fr) * 2016-03-14 2019-01-23 Fuji Corporation Générateur de plasma
DE102016125699A1 (de) * 2016-12-23 2018-06-28 Plasmatreat Gmbh Düsenanordnung, Vorrichtung zur Erzeugung eines atmosphärischen Plasmastrahls, Verwendung derselben, Verfahren zur Plasmabehandlung eines Stoffs oder einer Kunststofffolie, plasmabehandelter Vliesstoff und Verwendung desselben
WO2019150447A1 (fr) * 2018-01-30 2019-08-08 株式会社Ｆｕｊｉ Machine de traitement au plasma

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2021079420A1 *

Also Published As

Publication number Publication date
JPWO2021079420A1 (fr) 2021-04-29
CN114586473A (zh) 2022-06-03
WO2021079420A1 (fr) 2021-04-29
JP7133724B2 (ja) 2022-09-08
EP4050973A1 (fr) 2022-08-31

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