EP3956629A4 - MEASURING SYSTEM AND METHOD OF DIFFRACTING LIGHT - Google Patents

MEASURING SYSTEM AND METHOD OF DIFFRACTING LIGHT Download PDF

Info

Publication number
EP3956629A4
EP3956629A4 EP20791522.4A EP20791522A EP3956629A4 EP 3956629 A4 EP3956629 A4 EP 3956629A4 EP 20791522 A EP20791522 A EP 20791522A EP 3956629 A4 EP3956629 A4 EP 3956629A4
Authority
EP
European Patent Office
Prior art keywords
measurement system
diffracting light
diffracting
light
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20791522.4A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP3956629A1 (en
Inventor
Jinxin FU
Yifei Wang
Ian Matthew Mcmackin
Rutger MEYER TIMMERMAN THIJSSEN
Ludovic Godet
Joseph C. Olson
Morgan Evans
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US16/539,930 external-priority patent/US10801890B1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of EP3956629A1 publication Critical patent/EP3956629A1/en
Publication of EP3956629A4 publication Critical patent/EP3956629A4/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02041—Interferometers characterised by particular imaging or detection techniques
    • G01B9/02048—Rough and fine measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0237—Adjustable, e.g. focussing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9511—Optical elements other than lenses, e.g. mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Geometry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
EP20791522.4A 2019-04-15 2020-04-06 MEASURING SYSTEM AND METHOD OF DIFFRACTING LIGHT Pending EP3956629A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962834219P 2019-04-15 2019-04-15
US16/539,930 US10801890B1 (en) 2018-12-17 2019-08-13 Measurement system and a method of diffracting light
PCT/US2020/026829 WO2020214444A1 (en) 2019-04-15 2020-04-06 Measurement system and a method of diffracting light

Publications (2)

Publication Number Publication Date
EP3956629A1 EP3956629A1 (en) 2022-02-23
EP3956629A4 true EP3956629A4 (en) 2023-01-04

Family

ID=72838385

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20791522.4A Pending EP3956629A4 (en) 2019-04-15 2020-04-06 MEASURING SYSTEM AND METHOD OF DIFFRACTING LIGHT

Country Status (6)

Country Link
EP (1) EP3956629A4 (zh)
JP (1) JP2022529608A (zh)
KR (1) KR20210140774A (zh)
CN (2) CN117387912A (zh)
TW (1) TW202045893A (zh)
WO (1) WO2020214444A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210072123A (ko) * 2018-11-07 2021-06-16 어플라이드 머티어리얼스, 인코포레이티드 도파관 계측을 위한 방법들 및 장치

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003035521A (ja) * 2001-07-23 2003-02-07 Mitsutoyo Corp 格子周期計測装置及び格子周期計測方法
US20130301042A1 (en) * 2010-12-27 2013-11-14 Hitachi High-Technologies Corporation Defect inspection method and defect inspection apparatus
US9068917B1 (en) * 2006-03-14 2015-06-30 Kla-Tencor Technologies Corp. Systems and methods for inspection of a specimen

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6487019B2 (en) * 2000-03-27 2002-11-26 Chromaplex, Inc. Optical diffraction grating structure with reduced polarization sensitivity
US6577786B1 (en) * 2000-06-02 2003-06-10 Digital Lightwave, Inc. Device and method for optical performance monitoring in an optical communications network
WO2002014846A2 (en) * 2000-08-10 2002-02-21 Kla-Tencor Corporation Multiple beam inspection apparatus and method
US6809809B2 (en) * 2000-11-15 2004-10-26 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
EP1347271B1 (en) * 2002-03-18 2012-01-11 Mitutoyo Corporation Optical displacement sensing device with reduced sensitivity to misalignment
US20040263959A1 (en) * 2003-06-30 2004-12-30 Dixon Arthur E. Scanning beam optical imaging system for macroscopic imaging of an object
JP5032396B2 (ja) * 2008-05-20 2012-09-26 信越化学工業株式会社 薄膜欠陥検査用標準基板、その製造方法、および薄膜欠陥検査方法
US8629407B2 (en) * 2011-04-13 2014-01-14 Taiwan Semiconductor Manufacturing Company, Ltd. Contamination inspection
CN103940796A (zh) * 2014-04-22 2014-07-23 浙江大学 新型多角度多模式快速切换环状光学照明显微成像系统
CN104280215B (zh) * 2014-10-11 2017-02-15 哈尔滨工程大学 一种y波导的双通道光学性能双向多对轴角度自动测试装置
FR3029633A1 (fr) * 2014-12-09 2016-06-10 Bioaxial Procede et dispositif de mesure optique
US9612212B1 (en) * 2015-11-30 2017-04-04 Samsung Electronics Co., Ltd. Ellipsometer and method of inspecting pattern asymmetry using the same
JP6732543B2 (ja) * 2016-06-02 2020-07-29 Dmg森精機株式会社 変位検出装置
CN109186945A (zh) * 2018-09-12 2019-01-11 武汉理工大学 大口径光栅衍射效率光谱及其均匀性的测量装置和方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003035521A (ja) * 2001-07-23 2003-02-07 Mitsutoyo Corp 格子周期計測装置及び格子周期計測方法
US9068917B1 (en) * 2006-03-14 2015-06-30 Kla-Tencor Technologies Corp. Systems and methods for inspection of a specimen
US20130301042A1 (en) * 2010-12-27 2013-11-14 Hitachi High-Technologies Corporation Defect inspection method and defect inspection apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2020214444A1 *

Also Published As

Publication number Publication date
EP3956629A1 (en) 2022-02-23
CN113677952A (zh) 2021-11-19
TW202045893A (zh) 2020-12-16
WO2020214444A1 (en) 2020-10-22
JP2022529608A (ja) 2022-06-23
KR20210140774A (ko) 2021-11-23
CN117387912A (zh) 2024-01-12

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