EP3956629A1 - Measurement system and a method of diffracting light - Google Patents
Measurement system and a method of diffracting lightInfo
- Publication number
- EP3956629A1 EP3956629A1 EP20791522.4A EP20791522A EP3956629A1 EP 3956629 A1 EP3956629 A1 EP 3956629A1 EP 20791522 A EP20791522 A EP 20791522A EP 3956629 A1 EP3956629 A1 EP 3956629A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- arm
- detector
- focusing lens
- optical
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005259 measurement Methods 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 29
- 230000003287 optical effect Effects 0.000 claims abstract description 79
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 238000006073 displacement reaction Methods 0.000 claims abstract description 12
- 238000012360 testing method Methods 0.000 claims abstract description 6
- 239000011295 pitch Substances 0.000 abstract description 20
- 239000002245 particle Substances 0.000 description 4
- 230000003190 augmentative effect Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02041—Interferometers characterised by particular imaging or detection techniques
- G01B9/02048—Rough and fine measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0237—Adjustable, e.g. focussing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
- G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9511—Optical elements other than lenses, e.g. mirrors
Definitions
- Embodiments of the present disclosure relate an apparatus and a method and, more specifically, to a measurement system and a method of diffracting light. Description of the Related Art
- Virtual reality is generally considered to be a computer generated simulated environment in which a user has an apparent physical presence.
- a virtual reality experience can be generated in 3D and viewed with a head-mounted display (HMD), such as glasses or other wearable display devices that have near-eye display panels as lenses to display a virtual reality environment that replaces an actual environment.
- HMD head-mounted display
- Augmented reality enables an experience in which a user can still see through the display lenses of the glasses or other HMD device to view the surrounding environment, yet also see images of virtual objects that are generated for display and appear as part of the environment.
- Augmented reality can include any type of input, such as audio and haptic inputs, as well as virtual images, graphics, and video that enhances or augments the environment that the user experiences.
- a virtual image is overlaid on an ambient environment, with the overlaying performed by optical devices.
- fabricated optical devices tend to have non-uniform properties, such as grating pitches and grating orientations.
- as-deposited optical devices can inherit nonuniformities of their substrate, such as local warping or deformations of the substrate.
- deposition occurs on a substrate disposed on an uneven supporting surface, such as imperfections or particles present on the supporting surface, the substrate can be tilted and the deposited optical device can inherit these distortions as well.
- a measurement system including a stage, an optical arm coupled to an arm actuator configured to scan the optical arm and rotate the optical arm about an axis, and a detector arm.
- the stage has a substrate support surface.
- the stage is coupled to a stage actuator configured to move the stage in a scanning path and rotate the stage about the axis.
- the optical arm includes a laser positioned adjacent to a beam splitter positioned in a light path adjacent to an optical detector, the laser operable to project light beams to the beam splitter that are deflected at a beam angle q along the light path to the stage.
- the detector arm includes a detector actuator configured to scan the detector arm and rotate the detector arm about the axis, a first focusing lens, and a detector.
- a measurement system including a stage, an optical arm coupled to an arm actuator configured to scan the optical arm and rotate the optical arm about an axis, a primary detector arm, and a secondary detector arm.
- the stage has a substrate support surface.
- the stage is coupled to a stage actuator configured to move the stage in a scanning path and rotate the stage about the axis.
- the optical arm includes a laser positioned adjacent to a beam splitter positioned in a light path adjacent to an optical detector, the laser operable to project light beams to the beam splitter that are deflected at a beam angle q along the light path to the stage.
- Each of the detector arms include a detector actuator configured to scan the detector arm, a first focusing lens, and a detector.
- the measurement system and method of measurement measures local nonuniformities of regions of the optical device, such as grating pitches and grating orientations.
- the local nonuniformity values are useful to assess the performance of the optical device.
- FIGs. 1A-1C illustrate schematic views of configurations of a measurement system, according to some embodiments.
- FIGs. 2A-2C illustrate schematic views of a beam position detector, according to some embodiments.
- FIG. 3 illustrates a schematic cross-sectional view of a first zone, according to one embodiment.
- FIGs.4A-4D illustrate schematic views of measurement systems including one or more detector arms, according to some embodiments.
- FIG. 5 is a flow chart of method operations for diffracting light, according to one embodiment.
- identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. It is contemplated that elements and features of one embodiment may be beneficially incorporated in other embodiments without further recitation. DETAILED DESCRIPTION
- FIG. 1A illustrates a schematic view of a first configuration 100A of a measurement system 101, according to one embodiment.
- the measurement system 101 includes a stage 102, an optical arm 104A, and one or more detector arms 150.
- the measurement system 101 is configured to diffract light created by the optical arm 104.
- the light created by the optical arm 104 is directed at a substrate disposed over the stage 102, and the diffracted light is incident on the one or more detector arms 150.
- the measurement system 101 can be utilized to measure the pitch P and the orientation angle j of the gratings 109 for each of the regions 107 of each of the optical devices 105.
- the substrate 103 can be a single crystal wafer of any size, such as having a radius from about 150 mm to about 450 mm.
- the light beam 126A from the optical arm 104A is scattered from the region 107 into the initial R 0 beam 450, which is described in more detail below.
- the optical arm 104, the detector arm 150, and the stage 102 are coupled to a controller 130.
- the controller 130 facilitates the control and automation of the method for measuring the pitch P and the orientation angle j of gratings 109 described herein.
- the controller may include a central processing unit (CPU) (not shown), memory (not shown), and support circuits (or I/O) (not shown).
- the CPU may be one of any form of computer processors that are used in industrial settings for controlling various processes and hardware (e.g., motors and other hardware) and monitor the processes (e.g., transfer device position and scan time).
- the memory (not shown) is connected to the CPU, and may be a readily available memory, such as random access memory (RAM). Software instructions and data can be coded and stored within the memory for instructing the CPU.
- the support circuits (not shown) are also connected to the CPU for supporting the processor in a conventional manner.
- the support circuits may include conventional cache, power supplies, clock circuits, input/output circuitry, subsystems, and the like.
- a program (or computer instructions) readable by the controller determines which tasks are performable on the substrate 103.
- the program may be software readable by the controller and may include code to monitor and control, for example, substrate position and optical arm position.
- the optical arm 104A includes a white light source 114A, a first beam splitter 116A, a second beam splitter 118A, a laser 120, detector 122, and a spectrometer 124.
- the white light source 114 can be a fiber coupled light source.
- the first beam splitter 116A is positioned in a light path 126A adjacent to the white light source 114.
- the white light source 114 is operable to project white light at a beam angle q along the light path 126A to the substrate 103, according to one embodiment.
- the laser 120 can be a fiber coupled light source.
- the laser 120 is positioned adjacent to the first beam splitter 116A.
- the laser 120 is operable to project light beams having a wavelength to the first beam splitter 116A such that the light beams are deflected at the beam angle q along the light path 126A to the substrate 103.
- the second beam splitter 118A is positioned in the light path 126A adjacent to the first beam splitter 116A.
- the second beam splitter 118A is operable to deflect light beams reflected by the substrate 103 to the detector 122.
- the plurality of beam splitters 136 are positioned adjacent to each other in a light path 126C adjacent to the beam position detector 132.
- the laser 134a is configured to project light beams having a first wavelength to the beam splitter 136a such that the light beams of the first wavelength are deflected at the beam angle q along the light path 126C to the substrate 103.
- the laser 134b is configured to project light beams having a second wavelength to the beam splitter 136b such that the light beams of the second wavelength are deflected at the beam angle q along the light path 126C to the substrate 103.
- the beam position detector 132 is operable to determine beam positions of the light beams reflected by the substrate 103 to the beam position detector 132.
- FIG.2A illustrates the beam position detector 132 as a position sensitive detector 201A, i.e., a lateral sensor, according to one embodiment.
- FIG. 2B illustrates the beam position detector 132 as a quadrant sensor 201B, according to one embodiment.
- FIG. 2C illustrates the beam position detector 132 as an image sensor array 201C, such as a charge-coupled device (CCD) array or a complementary metal–oxide– semiconductor (CMOS) array, according to some embodiments.
- CCD charge-coupled device
- CMOS complementary metal–oxide– semiconductor
- FIG.4A illustrates a schematic view of the detector arm 150, according to one embodiment.
- the detector arm 150 incudes a detector 410, a detector arm actuator 152, and a first focusing lens 401.
- the detector arm actuator 152 is configured to rotate the detector arm 150 about the z-axis and scan the detector arm 150 in a z-direction.
- the light from the light path 126 reflects from the region 107 of the substrate 103.
- the light is reflected into an initial R 0 beam 450, which is focused by the first focusing lens 401 into the first R 0 beam 411.
- the first R 0 beam 411 is incident on the detector 410.
- the detector 410 is any optical apparatus used in the art to detect light, such as a CCD array or a CMOS array.
- the measurement system 101 can be calibrated with a known substrate 103, and the detector arm 150 can be positioned such that the first R 0 beam 411 is incident on the optical center 401c of the first focusing lens 401. Any of the measurement systems 101 described above and below can be calibrated with a known substrate 103, as described herein. Due to local distortions in the region 107, the initial R 0 beam 450 for the reference region 107 is no longer incident on the optical center 401c of the focusing lens 401.
- the substrate 103 can be tilted on the support surface 106 due to the presence of particles on the support surface, and the particles disposed between the substrate 103 and the support surface cause local and/or global distortions, such as raised region 107 height or an incline of the region to the support surface (shown as a tilted substrate 103t in FIGs. 4A-4D).
- FIG.4B illustrates a schematic view of the detector arm 150, according to one embodiment.
- the detector arm 150 further includes a second focusing lens 402 and a third focusing lens 403.
- the initial R 0 beam 450t is incident at an angle of Dq 1 on the first focusing lens 401, and the first focusing lens focuses the initial R 0 beam into a first R 0 beam 411t.
- the first R 0 beam 411t is incident on the second focusing lens 402, and the first focusing lens focuses the first R 0 beam into a second R 0 beam 412t.
- D 2 f 3 *f 1 *tan(Dq 1 )/f 2 .
- the second delta distance D 2 can be used to obtain local distortion information through the first angle Dq 1 , as is described in further detail below.
- the second delta distance D 2 is greater than the first delta distance D 1 , which allows for a detector 410 with a lower resolution to be used, as the detector is only limited by the size of the second delta distance D 2 .
- the resolution of the detector 410 is less than about D 2 , according to one embodiment.
- three focusing lenses 401, 402, 403 are included in the detector arm 150 as described above, it is contemplated that any number of focusing lenses could be used, and the lenses can be configured similarly as described above, in order to create even larger delta distances to be measured by the detector 410.
- FIG.4C illustrates a schematic view of the measurement system 101 with a primary detector arm 150 and a secondary detector arm 150’, according to one embodiment.
- the reflected R 1 beam 450t’ is incident on a third focusing spot on the first focusing lens 401’ a third delta distance D 3 from the optical center 401c’ of the first focusing lens, and the first focusing lens focuses the reflected R 1 beam into a first R 1 beam 411t’, according to one embodiment.
- the third delta distance D 3 and the second angle Dq 2 can be used to obtain local distortion information, as is described in further detail below.
- the resolution of the detector 410’ is less than about D 3 , according to one embodiment.
- FIG.4D illustrates a schematic view of the measurement system 101 with a primary detector arm 150 and a secondary detector arm 150’, according to one embodiment.
- the primary detector arm 150 is substantially similar to the detector arm described above in FIG. 4B.
- the secondary detector arm 150’ includes a first focusing lens 401’, a second focusing lens 402’, a third focusing lens 403’, a detector 410’, and a detector actuator 152’.
- the secondary detector arm 150’ is located behind the optical arm 104, and the optical arm is at least partially transparent to the reflected R 1 beam 450’, according to one embodiment.
- the reflected R 1 beam 450t’ is incident on a third focusing spot on the first focusing lens 401’ a third delta distance D 3 from the optical center 401c’ of the first focusing lens, and the first focusing lens focuses the reflected R 1 beam into a first R 1 beam 411t’, according to one embodiment.
- the first R 1 beam 411t’ is incident on the second focusing lens 402’, and the first focusing lens focuses the first R 1 beam into a second R 1 beam 412t’.
- the second R 1 beam 412t’ is incident on a fourth focusing spot a fourth delta distance D 4 from the optical center 403c’ of the third focusing lens 403’, and the third focusing lens focuses the second R 1 beam into a third R 1 beam 413t’ to a portion of the detector 410’ that is about the fourth delta distance D 4 away from the focused third R 1 beam of the known substrate.
- the fourth delta distance D 4 can be used to obtain local distortion information similarly to the second delta distance D2.
- the fourth delta distance D 4 is greater than the third delta distance D 3 , which allows for a detector 410’ with a lower resolution to be used, as the detector is only limited by the size of the fourth delta distance D 4 .
- the two delta distances D 2 , D 4 allow for an even more detailed measurement of the local distortion of the region 107.
- the third delta distance D 3 is greater than the first delta distance D 3 , according to one embodiment.
- the resolution of the detector 410’ is less than about D 4 , according to one embodiment.
- the focal length of the first focusing lens 401 of the primary detector arm 150 is different than the focal length of the second focusing lens 402 of the primary detector arm, and the focal length of the second focusing lens of the primary detector arm is different than the focal length of the third focusing lens 403 of the primary detector arm, according to one embodiment.
- FIGs. 4C-4D illustrate measurement systems 101 with two detector arms 150, 150’ with the same number of focusing lenses, it is to be understood that any odd number of lenses can be used in each detector arm.
- the primary detector arm 150 could have one focusing lens and the secondary detector arm 150’ could have three focusing lenses, or vice versa.
- the primary detector arm 150 has five focusing lenses and the secondary detector arm 150’ has three focusing lenses.
- the method 500 begins at operation 540, where light beams having a wavelength l are projected to a first region 107 of a first substrate 103 at a fixed beam angle q 0 and a maximum orientation angle j max .
- the method 500 can utilize any of the configurations 100A, 100B, 100C and any of the detector arm 150 configurations in FIGS.1A-C and 4A-D of the measurement system 101.
- a displacement angle Dq is obtained.
- the test grating pitch P t-grating is determined at the maximum orientation angle j max .
- the change in the measured pitch DP is given by
- an apparatus and a method are included that is configured to measure local nonuniformity of optical devices.
- Reflected laser light is detected by a detector arm.
- the detector arm includes one or more focusing lenses, and the one or more focusing lenses focus the light onto a detector, such as a camera.
- the displacement of the reflected light compared to a test substrate is used to calculate the local nonuniformity present.
- the substrate can be scanned such that nonuniformity of different regions of the substrate can be measured.
- the measurement system and method allow for measurement of nonuniform properties of optical devices on the substrate, such as grating pitches and grating orientations. In addition, the measurement system and method can determine local warping or deformations in the underlying substrate.
- defects of the underlying support surface such as imperfections of particles, can be located in order to determine whether the substrate and optical devices have acceptable characteristics.
- the measurements can be performed on substrates or optical devices of varying size and shape.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Geometry (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US201962834219P | 2019-04-15 | 2019-04-15 | |
US16/539,930 US10801890B1 (en) | 2018-12-17 | 2019-08-13 | Measurement system and a method of diffracting light |
PCT/US2020/026829 WO2020214444A1 (en) | 2019-04-15 | 2020-04-06 | Measurement system and a method of diffracting light |
Publications (2)
Publication Number | Publication Date |
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EP3956629A1 true EP3956629A1 (en) | 2022-02-23 |
EP3956629A4 EP3956629A4 (en) | 2023-01-04 |
Family
ID=72838385
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP20791522.4A Pending EP3956629A4 (en) | 2019-04-15 | 2020-04-06 | Measurement system and a method of diffracting light |
Country Status (6)
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EP (1) | EP3956629A4 (en) |
JP (1) | JP2022529608A (en) |
KR (1) | KR20210140774A (en) |
CN (2) | CN117387912A (en) |
TW (1) | TW202045893A (en) |
WO (1) | WO2020214444A1 (en) |
Families Citing this family (1)
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CN112997058A (en) * | 2018-11-07 | 2021-06-18 | 应用材料公司 | Method and apparatus for waveguide metrology |
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US6487019B2 (en) * | 2000-03-27 | 2002-11-26 | Chromaplex, Inc. | Optical diffraction grating structure with reduced polarization sensitivity |
US6577786B1 (en) * | 2000-06-02 | 2003-06-10 | Digital Lightwave, Inc. | Device and method for optical performance monitoring in an optical communications network |
JP4810053B2 (en) * | 2000-08-10 | 2011-11-09 | ケーエルエー−テンカー・コーポレーション | Multiple beam inspection apparatus and method |
US6809809B2 (en) * | 2000-11-15 | 2004-10-26 | Real Time Metrology, Inc. | Optical method and apparatus for inspecting large area planar objects |
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JP6732543B2 (en) * | 2016-06-02 | 2020-07-29 | Dmg森精機株式会社 | Displacement detection device |
CN109186945A (en) * | 2018-09-12 | 2019-01-11 | 武汉理工大学 | The measuring device and method of heavy-caliber optical grating diffraction efficiency spectrum and its uniformity |
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2020
- 2020-04-06 KR KR1020217036259A patent/KR20210140774A/en unknown
- 2020-04-06 CN CN202311318201.1A patent/CN117387912A/en active Pending
- 2020-04-06 CN CN202080027552.5A patent/CN113677952A/en active Pending
- 2020-04-06 JP JP2021560248A patent/JP2022529608A/en active Pending
- 2020-04-06 EP EP20791522.4A patent/EP3956629A4/en active Pending
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- 2020-04-14 TW TW109112439A patent/TW202045893A/en unknown
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KR20210140774A (en) | 2021-11-23 |
JP2022529608A (en) | 2022-06-23 |
CN117387912A (en) | 2024-01-12 |
EP3956629A4 (en) | 2023-01-04 |
WO2020214444A1 (en) | 2020-10-22 |
CN113677952A (en) | 2021-11-19 |
TW202045893A (en) | 2020-12-16 |
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