Classifications

• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
  • C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
  • C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
  • C07F15/0086—Platinum compounds
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
  • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
  • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
  • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
  • Y02E60/30—Hydrogen technology
  • Y02E60/50—Fuel cells

Definitions

• Trimethylplatinum (IV) iodide (MesPtl) processes for its production and its use are known.
• Trimethylplatinum (IV) iodide is used, for example, as a starting material for the production of various platinum (IV) complexes, e.g. B. of (cyclopentadienyl) trimethylplatinum (IV) and its derivatives.
• the latter are used, among other things, as platinum precursors in atomic layer deposition (ALD), metal organic chemical vapor deposition (MOCVD) or metal organic chemical vapor phase epitaxy (MOVPE) for the deposition of platinum layers or Platinum-containing layers are used.
• ALD atomic layer deposition
• MOCVD metal organic chemical vapor deposition
• MOVPE metal organic chemical vapor phase epitaxy
• Methyl lithium (MeLi) in a diethyl ether / tetrahydrofuran mixture and subsequent addition of a saturated potassium iodide solution e.g. L. D. Boardman and R. A. Newmark, Magnetic Resonance in Chemistry 1992, 30, 481-489.
• the respective methylation reagent ie the Grignard reagent - and optionally also iodomethane - or methyllithium, is usually used in a relatively large excess, based on the amount of Pt metal used.
• molar ratios Pt-metal: MeMgl of 1: 4.2 and 1: 5 molar ratios Pt-metal: MeMgl: Mel of 1: 4.6: 3.2 and 1: 7: 4.5 and 1 : 11: 8.4 and a Pt metal: MeLi molar ratio of at least 1: 8, e.g. B. 1: 8.2.
• This is disadvantageous from an (atomic) economic and ecological point of view, especially since with regard to product purity, in particular already visually recognizable from the product color, and / or the yield is unsatisfactory Results are achieved.
• MeMgl is 1: 5). According to a regulation by Hel’man and Gorushkina, trimethylplatinum (IV) iodide is obtained in the form of orange crystals with a yield of approx. 70% using MeMgl and Mel (Doklady Akad. Nauk, S.S.S.R. 1947,
• trimethylplatinum (IV) iodide is obtained in very different colors.
• this platinum (IV) compound is known, among other things, as a white one (T. G. Appleton et al., J. Organomet.
• the invention is therefore based on the object of overcoming these and other disadvantages of the prior art and of providing a method with which simply, inexpensively and reproducibly trimethylplatinum iodide in high purity, in particular essentially free from impurities Magnesium, sodium and potassium salts and elemental iodine, and can be produced in good yields, including space-time yields.
• the purity of the trimethylplatinum (IV) iodide should meet the requirements placed on catalysts, precatalysts and starting materials for the production of precursors for chemical vapor deposition processes.
• the process should also be distinguished by the fact that it can also be carried out on an industrial scale - with comparable yield and purity of the trimethylplatinum (IV) iodide - and the formation of by-products that are difficult or impossible to separate is reduced or avoided.
• the invention further relates to trimethylplatinum (IV) iodide, obtainable or obtained by the claimed process, and its use.
• a method for the production of platinum (IV) compounds is to be provided, by means of which these compounds can be produced simply, inexpensively and reproducibly in high purity and good yields, including space-time yields. It should be possible to prepare the platinum (IV) compounds using the trimethylplatinum (IV) iodide obtainable or obtained by the claimed process.
• the invention also relates to a substrate which is based on at least one surface has at least one platinum layer or a layer which contains platinum. It should be possible to produce the respective layer using a platinum (IV) compound obtainable or obtained by the claimed process.
• the invention also relates to a method for producing an electronic component or an electrode for a fuel cell using a platinum (IV) compound, obtained or obtainable by the method claimed here.
• the object is achieved by a process for the production of trimethylplatinum (IV) iodide, comprising a reaction of at least one platinum compound, which is selected from the group consisting of platinum (II) compounds and platinum (IV) compounds, with - at least one methyl Grignard compound according to the general formula MeMgX, where X are independently selected from the group consisting of CI, Br and I, and
• iodomethane in an aprotic-polar solvent SA comprising an ether SE and a halogenated hydrocarbon SH, a molar ratio of Pt metal: MeMgX: iodomethane being between 1: 4: 4 and 1: 6: 6.
• a molar ratio of Pt metal: MeMgX: iodomethane being between 1: 4: 4 and 1: 6: 6.
• Trimethylplatinum (IV) iodide includes all solvent-free empirical formulas of this platinum (IV) compound, in particular MesPtl and those of the oligomers [Me3Ptl] 2 and [Me3Ptl] 4.
• the “at least one platinum compound” can also be a mixture which comprises at least two platinum compounds selected from the group consisting of platinum (II) compounds and platinum (IV) compounds.
• the order in which a reaction container is charged with the starting materials, namely the at least one platinum compound, the methyl Grignard compound according to the general formula MeMgX and the iodomethane can be freely selected. This order has no influence on the success of the reaction, in particular not on the purity and yield of the trimethylplatinum (IV) iodide obtained or obtainable in solution or as a solid by this process.
• reaction vessel and reaction vessel are used synonymously in connection with the present invention and are not restricted to a volume, a material quality, an equipment or a shape.
• Suitable reaction vessels are, for. B. glass flasks, enamelled reactors, stirred tank reactors, pressure vessels, tubular reactors, microreactors and flow reactors.
• the process described herein for the preparation of trimethylplatinum (IV) iodide can be carried out as a batch process or as a continuous process.
• the aprotic polar solvent SA can also be a solvent mixture which contains more than one ether SE and / or more than one halogenated hydrocarbon SH.
• One embodiment of the method provides that the at least one ether SE and the at least one halogenated hydrocarbon SH are miscible with one another.
• the aprotic-polar solvent SA can comprise further aprotic-polar solvents which are miscible with the at least one ether SE and the at least one halogenated hydrocarbon SH.
• two solvents are referred to as miscible if they are miscible at least during the respective reaction, that is to say they are not present as two phases.
• Trimethylplatinum (IV) iodide has no or almost no contamination from salts that occur during its production.
• the content of magnesium salts and potassium and / or sodium salts has been shown to be relatively low.
• Contamination by elemental iodine can usually already be recognized optically, namely with increasing iodine content on the basis of the characteristic yellow, orange, red or brown color.
• Trimethylplatinum (IV) iodide isolated by means of the process claimed here is, however, in the form of an off-white or white, usually at least partially crystalline powder or in the form of off-white or white crystals, so that trace amounts of iodine impurities are present at most.
• Trimethylplatinum (IV) idodine obtained or obtainable by means of the process described here is therefore referred to as “essentially free from contamination by elemental iodine”.
• the claimed method also differs from the methods disclosed in the prior art in the choice of solvent.
• the aprotic-polar solvent SA is provided, which comprises the ether SE and the halogenated hydrocarbon SH.
• a volume ratio of ether SE: halogenated hydrocarbon SH can be, for example, between 0.5: 1 and 1: 5, advantageously between 0.75: 1 and 1: 4, in particular between 0.85: 1 and 1: 3.
• a quantitative or almost complete separation of the salt load can therefore be achieved by means of a work step that can be carried out simply and quickly, namely by filtration and / or by centrifugation and / or by decanting.
• the filtrate, centrifugate or decantate can advantageously without any particular preparative effort, in particular without ok
• trimethylplatinum (IV) iodide can be produced in a simple, inexpensive and reproducible manner.
• the target compound is obtained in very high purity, in particular essentially free of impurities from magnesium, sodium and potassium salts and elemental iodine, and in good to very good yields, including space-time yields.
• the formation of by-products that are difficult or impossible to separate, in particular of elemental iodine, is advantageously reduced or avoided entirely.
• Accruing salt loads e.g. B. in the form of NaCl, KCl, MgC or Mg, are advantageously completely or almost quantitatively separable due to the choice of solvent mixture.
• the purity of the trimethylplatinum (IV) iodide obtained or obtainable in this way therefore meets the requirements made of catalysts, precatalysts and starting materials for the production of precursors for chemical vapor deposition processes.
• the process described here can also be carried out on an industrial scale, with trimethylplatinum (IV) iodide being obtainable or being obtained in comparable yields, including space-time yields, and purities.
• the expression “essentially free from contamination by magnesium salts” relates to a magnesium content of the isolated product trimethylplatinum (IV) iodide of ⁇ 500 ppm, ideally ⁇ 300 ppm.
• the phrase "substantially free of potassium salt contamination” refers to a potassium content of ⁇ 100 ppm, ideally ⁇ 50 ppm; The same applies to the expression “essentially free from contamination by sodium salts”.
• the expression “essentially free from contamination by elemental iodine” is used in connection with the present invention for isolated trimethylplatinum (IV) iodide, which is in particular as an off-white or white, possibly at least partially crystalline, powder or in the form of off-white or white crystals are present.
• At least one platinum compound is a platinum (II) salt or a platinum (IV) salt, with platinum (II) or platinum (IV) in the cation or in Anion is included.
• At least one platinum compound is advantageously a platinum (IV) salt, platinum (IV) being contained in the cation or in the anion.
• At least one platinum halide or at least one halidoplatinate is provided.
• at least one platinum compound is provided which is selected from the group consisting of PtX 2 , [(C 2 H 4 ) PtX 2 ] 2, M [(C 2 H 4 ) PtX 3 ], M 2 [ PtX 4 ], PtX 4 , M 2 [PtX 6 ], their derivatives and isomers, and mixtures thereof.
• X are each independently selected from the group consisting of F, CI, Br and I, advantageously CI, Br and I, in particular CI and Br.
• M are independently selected from the group consisting of alkali metals, advantageously lithium, sodium or Potassium, especially sodium or potassium, alkaline earth metals, advantageously magnesium, calcium, strontium or barium, especially magnesium or calcium, and silver.
• alkali metals advantageously lithium, sodium or Potassium, especially sodium or potassium
• alkaline earth metals advantageously magnesium, calcium, strontium or barium, especially magnesium or calcium, and silver.
• platinum chloride or one chloridoplatinate is provided.
• At least one platinum compound is provided which is selected from the group consisting of PtCl 2 , [(C 2 H 4 ) PtCl 2 ] 2 , K [(C 2 H 4 ) PtCl 3 ], Na 2 [ PtCl 4 ], K 2 [PtCl 4 ], PtCL, Na 2 [PtCl 6 ] and K 2 [PtCl 6 ], their derivatives and isomers, and mixtures thereof.
• at least one platinum compound is provided which is selected from the group consisting of PtCl, Na 2 [PtCl 6 ] and K 2 [PtCl 6 ], their derivatives and isomers, and Mixtures thereof.
• at least one platinum compound is provided which is selected from the group consisting of Na2 [PtCl6] and K2 [PtCl6], their derivatives and isomers, and mixtures thereof.
• the at least one methyl Grignard compound comprises or is MeMgl.
• MeMgl can depend on the choice of the other reaction conditions, such as the choice of the platinum compound or platinum compounds, the choice of the solvent SA, the platinum concentration, the reaction temperature and / or the reaction pressure, the batch size, the intended volume ratio Ether SE: Halocarbon SH, be advantageous in order to be able to control the course of the reaction, in particular the exotherm, even better.
• the aprotic polar solvent SA is chemically inert.
• inert solvent means a solvent which is chemically non-reactive under the respective process conditions.
• the inert solvent therefore does not react under the respective reaction conditions, including the purification and / or isolation steps, with a potential reaction partner, in particular not with a starting material and / or an intermediate and / or a product and / or a by-product, and not with a other solvent, air or water.
• the aprotic-polar solvent SA has a boiling temperature TA, the boiling temperature TA being between 30.degree. C. and 140.degree.
• the boiling temperature TA is advantageously between 31 ° C and 120 ° C, in particular between 32 ° C and 110 ° C or between 33 ° C and 99 ° C.
• the solvent SA can thus be removed quantitatively, for example, by simply applying a reduced pressure to the respective reaction vessel, if necessary at a slightly elevated temperature of the respective reaction mixture.
• the halocarbon SH is selected from the group consisting of haloalkanes and aromatic halocarbons.
• the halohydrocarbon SH is advantageously a chlorohydrocarbon or a bromohydrocarbon.
• halogenated hydrocarbon SH is selected from the group consisting of dichloromethane, 1,1-dichloroethane, 1,2-dichloroethane, dibromomethane, 1,1-dibromoethane, 1,2-dibromoethane, chlorobenzene, and their isomers, and mixtures thereof.
• ether SE is selected from the group consisting of tetrahydrofuran, methyltetrahydrofuran, 1,4-dioxane, diethyl ether, methyl-fe / t-butyl ether, di- n-propyl ether, di / isopropyl ether, cyclopentyl methyl ether, and their isomers, and mixtures thereof.
• all of the aforementioned solvents are solvents customarily used in the chemical industry.
• these solvents have boiling temperatures ⁇ 140 ° C, sometimes ⁇ 110 ° C or ⁇ 100 ° C. This means that quantitative removal of these solvents is possible, for example, by simply applying a reduced pressure to the respective reaction vessel, possibly at a slightly elevated temperature of the respective reaction mixture.
• the molar ratio of Pt metal: MeMgX: iodomethane is between 1: 4.05: 4.05 and 1: 5.9: 5.9 or between 1: 4.1: 4.1 and 1: 5.5: 5.5 or exactly 1: 5: 5.
• a molar ratio MeMgX: iodomethane is between 1: 1.5 and 1.5: 1 or between 1: 1, 4 and 1.4: 1, advantageously between 1: 1.3 and 1, 3: 1 or between 1: 1.2 and 1, 2: 1, in particular between 1:
• the implementation comprises the following steps:
• the implementation comprises the following steps: i) providing the at least one platinum compound, in particular as a suspension or as a solid, ii) adding the iodomethane and iii) adding the at least one methyl Grignard compound according to the general formula MeMgX.
• a reaction of the at least one methyl Grignard compound with the at least one platinum compound usually takes place during and / or after step iii).
• step i) a suspension of the at least one platinum compound in the halogenated hydrocarbon SH, for example dichloromethane, or a halogenated hydrocarbon or mixture of halogenated hydrocarbons is provided.
• the ether SE for example diethyl ether, or an ether or ether mixture miscible therewith.
• the halogenated hydrocarbon SH can also be a solvent mixture, that is to say contain several halogenated hydrocarbons.
• the ether SE can also be a mixture of several ethers.
• the at least one platinum compound can be provided in a solvent mixture which comprises one or more halogenated hydrocarbons and one or more ethers.
• the solvent mixture is miscible or identical with the aprotic-polar solvent SA.
• the at least one platinum compound is provided as a suspension in an aprotic-polar solvent which is miscible with the aprotic-polar solvent SA.
• Iodomethane can be added as a solution in the ether SE, for example di-n-propyl ether, or an ether or ether mixture which is miscible therewith.
• the iodomethane can be added to the halogenated hydrocarbon SH, for example dibromomethane, or a halogenated hydrocarbon or halogenated hydrocarbon mixture which is miscible therewith.
• the halogenated hydrocarbon SH can also be a mixture of several halogenated hydrocarbons.
• the ether SE can also be a mixture of several ethers.
• the iodomethane is added in the aprotic-polar solvent SA or in an aprotic-polar solvent or solvent mixture which is miscible with the aprotic-polar solvent SA.
• the iodomethane can be added in bulk, ie as a liquid.
• the methyl Grignard compound is usually added as a solution in the ether or ether mixture SE or an ether or ether mixture miscible therewith.
• concentration of the Grignard solution used i.e. H. the molar concentration of the methyl Grignard compound in the respective ether or ether mixture SE or a miscible ether or ether mixture is advantageously chosen taking into account the other reaction conditions, such as the choice of the platinum compound or platinum compounds, the choice of other aprotic-polar ones used Solvents or solvent mixtures, in particular the halogenated hydrocarbon or the halogenated hydrocarbon mixture SH, the reaction temperature and / or the reaction pressure, the platinum concentration, the batch size, the intended volume ratio ether SE: halogenated hydrocarbon SH.
• the respective reaction container can also be charged in a different order with the starting materials, namely the at least one platinum compound, the methyl Grignard compound according to the general formula MeMgX and the iodomethane.
• the at least one methyl Grignard compound according to the general formula MeMgX is added as a solution in the ether or ether mixture SE or an ether or ether mixture miscible therewith.
• the iodomethane is added as a solution in the ether SE, for example methyl-fe / t-butyl ether, or an ether or ether mixture miscible therewith.
• the iodomethane in the halogenated hydrocarbon SH, for example chlorobenzene, or in a halogenated hydrocarbon or halogenated hydrocarbon mixture which is miscible therewith.
• the halogenated hydrocarbon SH can also be a solvent mixture of several halogenated hydrocarbons.
• the ether SE can also be a mixture of several ethers.
• the iodomethane is added in the aprotic-polar solvent SA or in an aprotic-polar solvent or solvent mixture which is miscible with the aprotic-polar solvent SA.
• the iodomethane can be added in bulk, ie as a liquid.
• the iodomethane and the at least one methyl Grignard compound according to the general formula MeMgX are added in a single step.
• the methyl Grignard compound can first be generated in situ in the ether or ether mixture SE or an ether or ether mixture miscible therewith using a corresponding excess of iodomethane.
• the methyl Grignard compound can be used as a prefabricated and / or stored, optionally commercially available solution in the ether or ether mixture SE or an ether or ether mixture miscible therewith, this solution - before adding the solution of the at least one methyl Grignard compound -
• the intended amount of iodomethane is added.
• the methyl Grignard compound and the iodomethane are added separately from one another, but at the same time.
• the expression “generated in situ” means that the starting materials which are required for the synthesis of a compound to be prepared in this way are in a suitable stoichiometry in a solvent or Solvent mixture are reacted and the resulting product is not isolated. Rather, the solution or the suspension which comprises the compound generated in situ is generally used further directly, ie without isolation and / or further purification.
• a further embodiment of the method provides that the at least one methyl Grignard compound according to the general formula MeMgX is presented in step i) and the at least one platinum compound, in particular in the form of a suspension or in bulk, i.e. H. as a solid, is added in step ii).
• the methyl Grignard compound can first be generated in situ in the ether or ether mixture SE or an ether or ether mixture miscible therewith using a corresponding excess of iodomethane.
• the methyl Grignard compound can be used as a ready-made and / or stored, optionally commercially available solution in the ether or ether mixture SE or an ether or ether mixture miscible therewith, this solution - before adding the solution of the at least one methyl Grignard compound - The intended amount of iodomethane is added.
• the methyl Grignard compound and the iodomethane are added separately from one another, but at the same time.
• the iodomethane can be added, in particular in portions, before and / or during and / or after the addition of the at least one platinum compound.
• the at least one platinum compound is provided or added using a metering device, in particular as a solid via a funnel or as a suspension by dropping or injecting.
• a shut-off valve and / or a shut-off valve can be provided in a feed line of the reaction container.
• the addition or the introduction of the at least one methyl Grignard compound according to the general formula MeMgX and / or the iodomethane using a Dosing device takes place.
• the addition can take place, for example, by dropping or injecting.
• a shut-off valve and / or a shut-off valve can be provided in a feed line of the reaction container.
• a variant of the method is provided in which the reaction of the at least one platinum compound with the iodomethane and the methyl Grignard compound according to the general formula MeMgX is carried out in the aprotic-polar solvent SA at a temperature Tu.
• the temperature Tu is between -10.degree. C. and 140.degree. C., advantageously between -5.degree. C. to 120.degree. C., in particular between 0.degree. C. and 110.degree. C. or between 0.5.degree. C. and 100.degree. It when the reaction is carried out at a temperature Tu between 1 ° C and 99 ° C is particularly favorable.
• the temperature Tu is between 10 ° C. and 50 ° C., in particular between 15 ° C. and 45 ° C., e.g. B. 20 ° C, 25 ° C, 30 ° C, 35 ° C or 40 ° C.
• a temperature Tc during the addition and / or after the addition of the iodomethane and / or the at least one methyl Grignard compound according to the general formula MeMgX to the at least one platinum compound is between -10 ° C and 120 ° C, advantageously between -5 ° C and 110 ° C, in particular between 0 ° C and 100 ° C. It is particularly favorable if the temperature Tc during the addition and / or after the addition of the iodomethane and / or the at least one methyl Grignard compound is between 0.5 ° C and 99 ° C, advantageously between 1 ° C and 90 ° C, in particular between 2 ° C and 80 ° C.
• the temperature Tc during the addition and / or after the addition of the iodomethane and / or the at least one methyl Grignard compound according to the general formula MeMgX is between 10 ° C and 50 ° C, in particular between 15 ° C and 45 ° C, e.g. B. 20 ° C, 25 ° C, 30 ° C, 35 ° C or 40 ° C.
• the aforementioned temperature ranges are also provided according to a further variant of the method if - as described above - the charging of the respective reaction vessel, ie the addition, is carried out with the starting materials, ie the at least one platinum compound, the iodomethane and the at least one methyl Grignard compound, in a different order.
• the at least one methyl Grignard compound according to the general formula MeMgX is initially introduced in step i) and the at least one platinum compound, in particular in the form of a suspension or in bulk, ie as a solid, is added in step ii).
• the temperature Tu and the temperature Tc are regulated and / or controlled using a heat transfer medium W.
• a cryostat can be used, for example, which contains the heat carrier W, which ideally can function both as a coolant and as a heating medium.
• the reaction of the at least one platinum compound with the iodomethane and the methyl Grignard compound according to the general formula MeMgX in the aprotic polar solvent SA can be carried out at least in a preselected temperature range or in several preselected temperature ranges.
• the concentration of the Grignard solution, the choice of the solvent SA, the platinum concentration, the reaction pressure, the batch size, des provided volume ratio ether SE: halogenated hydrocarbon SH, - for even better control of the course of the reaction or the exothermicity it may be advantageous to create a temperature program.
• a lower temperature or a lower temperature can be used during a first phase of the reaction of the at least one platinum compound with the iodomethane and the methyl Grignard compound.
• Temperature range can be selected as in a second phase of the reaction of the at least one platinum compound with the iodomethane and the methyl Grignard compound.
• Temperature ranges can be provided.
• the choice of the other reaction conditions such as. B. the choice of platinum compound or platinum compounds, the concentration of the Grignard solution, the choice of the solvent SA, the platinum concentration, the reaction pressure, the batch size, the intended volume ratio ether SE: halogenated hydrocarbon SH, it can occur during the Adding and / or after adding one of the starting materials, it may be advantageous to increase the temperature Tc using the heat transfer medium W. This can, if necessary, ensure that the implementation is quantitative.
• the duration of the increase in the temperature Tc using the heat transfer medium W can be, for example, between 10 minutes and 24 hours.
• Another embodiment of the process for producing trimethylplatinum (IV) iodide provides that the reaction takes place under an inert gas atmosphere.
• a step is carried out which comprises quenching of unreacted methyl Grignard compound according to the general formula MeMgX.
• quenchers are selected from the group consisting of haloalkanes, ketones, alcohols, water, mineral acids and organic acids, in particular carboxylic acids.
• the quencher is advantageously selected from the group consisting of acetone, 1-bromo-2-chloroethane, 1-bromo-2- fluoroethane and iodomethane.
• the quencher comprises or is acetone and / or iodomethane. If, for example, based on the methyl Grignard compound MeMgX, an excess of iodomethane is used, the use of a further, in particular above-mentioned, quencher can be partially or completely dispensed with.
• trimethylplatinum (IV) iodide is produced according to the process described here, after the reaction of the at least one platinum compound with the iodomethane and the at least one methyl Grignard compound according to the general formula MeMgX, only the desired target compound trimethylplatinum (IV) - iodide, the solvent SA and defined, easily separable by-products, such as such.
• the suspension, which comprises the target compound trimethylplatinum (IV) iodide in solution can be reacted directly with one or more further reactants, e.g. B. with cyclopentadienyl sodium.
• the isolation comprises a filtration step.
• filtration steps can also be provided, optionally also one or more filtrations over a cleaning medium, such as, for. B. activated carbon or silica, e.g. B. Celite ®.
• the trimethylplatinum (IV) iodide can, for example, by means of a simple filtration, optionally with a filter aid, e.g. B. Celite ® , and / or by centrifugation and / or decanting, followed by removal of all volatile constituents, such as solvents and unreacted iodomethane, can be isolated as a solid. It is particularly advantageous that in particular magnesium salts, such as. B.
• Mgl2 and MgC sodium and potassium salts, including possibly small amounts of unreacted, suspended platinum (II) and / or platinum (IV) salts, simply and approximately quantitatively, preferably quantitatively, by a filtration step and / or by Allow centrifugation and / or decanting to be removed.
• the isolation of the trimethylplatinum (IV) iodide as a solution or as a solid can include further process steps, such as. B. reducing the volume of the mother liquor, ie concentrating, e.g. B. by means of "bulb-to-bulb", the addition of a solvent and / or a solvent exchange in order to achieve a precipitation of the product from the mother liquor and / or to remove impurities and / or starting materials, washing, e.g. B. with dilute hydrochloric acid, water and / or acetone, and drying the product.
• the aforementioned steps can each be provided in different sequences and frequencies.
• the filtrate, centrifugate or decantate can be subjected to the uncomplicated and quick purification and / or isolation steps that may be provided, without any particular preparative effort, in particular without ensuring an inert gas atmosphere.
• the purification and / or isolation of the target compound trimethylplatinum (IV) iodide is relatively simple and inexpensive.
• the end product can still contain residues of solvents or salts obtained as by-products.
• Trimethylplatinum (IV) iodide isolated as a solid has a purity of at least 97%, advantageously more than 97%, in particular more than 98% or 99%.
• the reproducible yield is, in particular, depending on the choice of platinum compound or platinum compounds, the methyl Grignard compound and the solvent mixture - also in the case of upscaling towards an industrial scale - usually> 90%.
• the object is also achieved by a solution comprising trimethylplatinum (IV) iodide and an aprotic polar solvent SA, comprising an ether SE and a halogenated hydrocarbon SH, obtained or obtainable by a process for the production of trimethylplatinum (IV) iodide according to a of the embodiments described above.
• the aprotic polar solvent SA can also be a solvent mixture which contains more than one ether SE and / or more than one halogenated hydrocarbon SH.
• One embodiment of the solution claimed here provides that the at least one ether SE and the at least one halogenated hydrocarbon SH are miscible with one another.
• the aprotic-polar solvent SA can comprise further aprotic-polar solvents which are miscible with the at least one ether SE and the at least one halogenated hydrocarbon SH.
• two solvents are referred to as miscible if they are miscible at least during the respective production and storage of the solution claimed here, that is not present as two phases.
• the aprotic polar solvent SA is chemically inert.
• inert solvent has already been defined above.
• the aprotic polar solvent SA has a boiling temperature TA, the boiling temperature TA being between 30.degree. C. and 140.degree.
• the boiling temperature TA is advantageously between 31 ° C and 120 ° C, in particular between 32 ° C and 110 ° C or between 33 ° C and 99 ° C.
• the solvent SA can thus be removed quantitatively, for example, by simply applying a negative pressure to the respective storage or reaction vessel, if necessary at a slightly elevated temperature of the respective solution or the respective reaction mixture.
• the halohydrocarbon SH is selected from the group consisting of haloalkanes and aromatic halohydrocarbons.
• the halohydrocarbon SH is advantageously a chlorohydrocarbon or a bromohydrocarbon.
• the halogenated hydrocarbon SH is selected from the group consisting of dichloromethane, 1,1-dichloroethane, 1,2-dichloroethane, dibromomethane, 1,1-dibromoethane, 1,2-dibromoethane, chlorobenzene, and their isomers, and mixtures thereof.
• the ether SE is selected from the group consisting of tetrahydrofuran, methyltetrahydrofuran, 1,4-dioxane, diethyl ether, methyl fe / t-butyl ether, di-n-propyl ether, di / sopropyl ether, Cyclopentyl methyl ether, and its isomers, and mixtures thereof.
• all of the aforementioned solvents are solvents customarily used in the chemical industry.
• these solvents have boiling temperatures ⁇ 140 ° C, sometimes ⁇ 110 ° C or ⁇ 100 ° C.
• there is a quantitative removal of these solvents for example, by simply applying a negative pressure to the respective storage or reaction vessel, possibly at a slightly elevated temperature of the respective solution or the respective reaction mixture.
• the claimed solutions comprising trimethylplatinum (IV) iodide and the aprotic-polar solvent SA, are distinguished in particular by the fact that they can be produced in a simple, inexpensive and reproducible manner by means of the method described above.
• the solutions have a very high purity, and in particular they are essentially free from contamination by magnesium, sodium and potassium salts and elemental iodine.
• the above definitions apply to the expressions “essentially free from contamination by magnesium salts”, “essentially free from contamination by potassium salts”, “essentially free from contamination by sodium salts” and “essentially free from contamination by elemental iodine”.
• the yields of the compound trimethylplatinum (IV) iodide in solution are good to very good.
• the object is achieved by trimethylplatinum (IV) iodide, obtained or obtainable by a method for producing trimethylplatinum (IV) iodide according to one of the exemplary embodiments described above.
• the magnesium content is ⁇ 500 ppm, advantageously ⁇ 300 pm.
• the potassium content is ⁇ 100 ppm, advantageously ⁇ 50 ppm.
• Another variant of trimethylplatinum (IV) iodide provides that the sodium content is ⁇ 100 ppm, advantageously ⁇ 50 ppm.
• trimethylplatinum (IV) iodide obtained or obtainable by a process according to one of the exemplary embodiments described above, in particular as an off-white or white, optionally at least partially crystalline, powder or in the form of off-white or white crystals before.
• the claimed trimethylplatinum (IV) iodide is distinguished in particular by the fact that it can be produced in a simple, inexpensive and reproducible manner.
• the platinum (IV) compound is obtained by means of the process described above in a very high purity, in particular essentially free of impurities from magnesium, potassium or sodium salts and elemental iodine, and in good to very good yields, including space-time Yields obtained.
• the formation of by-products that are difficult or impossible to separate, in particular of elemental iodine is advantageously reduced or avoided entirely.
• Accruing salt loads e.g. B. in the form of NaCl, KCl, MgC or Mg, are advantageously quantitatively or almost quantitatively separable due to the choice of solvent mixture.
• the purity of the trimethylplatinum (IV) iodide obtained or obtainable in the form of a solid therefore meets the requirements placed on catalysts, precatalysts and starting materials for the production of precursors for chemical vapor deposition processes.
• the process described above can also be carried out on an industrial scale, with comparable yields, including space-time yields, and purities of the target compound being achieved.
• trimethylplatinum (IV) iodide in each case obtained or obtainable by a process for the production of trimethylplatinum (IV) iodide according to one of the exemplary embodiments described above, as a starting material for the production of platinum (IV) compounds.
• trimethylplatinum (IV) iodide each obtained or obtainable by a process for the production of trimethylplatinum (IV) iodide according to one of the exemplary embodiments described above, comprising the steps: a) providing the trimethylplatinum (IV) iodide or the solution, comprising trimethylplatinum (IV) iodide and the aprotic polar solvent SA, and b) synthesis of the platinum (IV) compound using the trimethylplatinum (IV) iodide present as a solid or in solution as starting material.
• the process described herein for the preparation of platinum (IV) compounds can be carried out as a batch process or as a continuous process.
• the provision of the trimethylplatinum (IV) iodide, in particular the solution comprising trimethylplatinum (IV) iodide and the aprotic-polar solvent SA in step a) an in s / fu production of trimethylplatinum (IV) iodide by a process for the production of trimethylplatinum (IV) iodide according to one of the embodiments described above.
• aprotic polar solvent SA can also be a solvent mixture which contains more than one ether SE and / or more than one halogenated hydrocarbon SH.
• An embodiment of the claimed use of trimethylplatinum (IV) iodide or a solution comprising trimethylplatinum (IV) iodide and the aprotic-polar solvent SA, or the method using trimethylplatinum (IV) iodide or the aforementioned solution for Production of platinum (IV) compounds provides that the at least one ether SE and the at least one halogenated hydrocarbon SH are miscible with one another.
• the aprotic-polar solvent SA can comprise further aprotic-polar solvents which are miscible with the at least one ether SE and the at least one halogenated hydrocarbon SH.
• aprotic-polar solvent SA is chemically inert.
• inert solvent has already been defined above.
• the aprotic-polar solvent SA has a boiling temperature TA, the boiling temperature TA between
• the boiling temperature TA is advantageously between
• the solvent SA can be used before and / or during and / or after the preparation of the respective platinum (IV) compound, for example by simply applying a negative pressure to the respective storage or reaction vessel, possibly at a slightly elevated temperature of the respective solution or the respective reaction mixture , be removed quantitatively.
• the solvent SA functions as a solvent during the process for producing the respective platinum (IV) compound or is at least a miscible component of the solvent used for this purpose.
• the halohydrocarbon SH is selected from the group consisting of haloalkanes and aromatic halohydrocarbons.
• the halohydrocarbon SH is advantageously a chlorohydrocarbon or a bromohydrocarbon.
• the halogenated hydrocarbon SH is selected from the group consisting of dichloromethane, 1,1-dichloroethane, 1,2-dichloroethane, dibromomethane, 1,1-dibromoethane, 1,2-dibromoethane, chlorobenzene, and their isomers, and mixtures thereof.
• ether SE is selected from the group consisting of tetrahydrofuran, methyltetrahydrofuran, 1,4-dioxane, diethyl ether, methyl-fe / t -butyl ether, di-n-propyl ether, di / sopropyl ether, cyclopentyl methyl ether, and their isomers, and Mixtures thereof.
• all of the aforementioned solvents are solvents customarily used in the chemical industry. In addition, these solvents have boiling temperatures ⁇ 140 ° C, sometimes ⁇ 110 ° C or ⁇ 100 ° C.
• a quantitative removal of these solvents before and / or during and / or after the preparation of the respective platinum (IV) compound for example by simply applying a negative pressure to the respective storage or reaction vessel, possibly at a slightly elevated temperature of the respective solution or the respective reaction mixture, possible.
• platinum (IV) compounds obtainable or obtained in this way are particularly suitable for use as precursors in chemical vapor deposition processes for the production of high-purity platinum layers or layers containing platinum.
• the abovementioned platinum (IV) compounds - using the trimethylplatinum (IV) iodide obtained or obtainable by the process described above - can easily be prepared on an industrial scale in very high purity and good to very good yields.
• the object is achieved by platinum (IV) compounds, obtained or obtainable by a method for producing platinum (IV) compounds according to one of the exemplary embodiments described above.
• trimethylplatinum (IV) iodide as a solid or a solution comprising trimethylplatinum (IV) iodide and an aprotic polar solvent SA comprising an ether SE and a halogenated hydrocarbon SH, each obtained or obtainable according to a Process for the preparation of trimethylplatinum (IV) iodide according to one of the embodiments described above.
• the platinum (IV) compounds obtained or obtainable in this way are, for example, (cyclopentadienyl) trimethylplatinum (IV) and its derivatives, such as. B. (methylcyclopentadienyl) trimethylplatinum (IV), (ethylcyclopentadienyl) trimethylplatinum (IV), (/ so-propyl-cyclopentadienyl) trimethylplatinum (IV) and ⁇ tert-butyl-cyclopentadienyl) trimethylplatinum (IV).
• the platinum (IV) compounds obtainable or obtained in this way are particularly suitable for use as precursors in chemical vapor deposition processes for producing high-purity platinum layers or layers containing platinum.
• the abovementioned platinum (IV) compounds - using the trimethylplatinum (IV) iodide obtained or obtainable by the process described above - can easily be prepared on an industrial scale in very high purity and good to very good yields.
• the object is achieved through the use ⁇ a solution comprising trimethylplatinum (IV) iodide and an aprotic polar solvent SA comprising an ether SE and a halogenated hydrocarbon SH, or
• trimethylplatinum (IV) iodide each obtained or obtainable by a process for the production of trimethylplatinum (IV) iodide according to one of the embodiments described above, as a catalyst or precatalyst-containing solution or as a catalyst or as a precatalyst in a chemical reaction.
• trimethylplatinum (IV) iodide each obtained or obtainable by a process for the production of trimethylplatinum (IV) iodide according to one of the exemplary embodiments described above, comprising the steps: a) providing the trimethylplatinum (IV) iodide or the solution, comprising trimethylplatinum (IV) iodide and the aprotic polar solvent SA, and b) carrying out the chemical reaction using the trimethylplatinum (IV) iodide present as a solid or in solution as a catalyst or as a precatalyst.
• the process described herein for carrying out a chemical reaction can be carried out as a batch process or a continuous process.
• the provision of the trimethylplatinum (IV) iodide comprises in particular the solution comprising trimethylplatinum (IV) iodide and the aprotic-polar solvent SA, in step a) an in s / fu production of trimethylplatinum (IV) iodide according to a process for the production of trimethylplatinum (IV) iodide one of the embodiments described above.
• the expression “in s / fu production” has already been defined above.
• the aprotic polar solvent SA can also be a solvent mixture which contains more than one ether SE and / or more than one halogenated hydrocarbon SH.
• An embodiment of the claimed use of trimethylplatinum (IV) iodide or a solution comprising trimethylplatinum (IV) iodide and the aprotic-polar solvent SA, or the method for carrying out a chemical reaction using trimethylplatinum (IV) iodide or the aforementioned solution provides that the at least one ether SE and the at least one halogenated hydrocarbon SH are miscible with one another.
• the aprotic-polar solvent SA can comprise further aprotic-polar solvents which are miscible with the at least one ether SE and the at least one halogenated hydrocarbon SH.
• two solvents are referred to as miscible if they are miscible at least during the respective production and storage of the solution used here, that is, they are not present as two phases.
• the aprotic-polar solvent SA is chemically inert.
• inert solvent has already been defined above.
• the aprotic-polar solvent SA has a boiling temperature TA, the boiling temperature TA between
• the boiling temperature TA is advantageously between
• the solvent SA can be removed quantitatively before and / or during and / or after the chemical reaction is carried out, for example by simply applying a negative pressure to the respective storage or reaction vessel, possibly at a slightly elevated temperature of the respective solution or the respective reaction mixture.
• the solvent SA functions as a solvent during the chemical reaction to be carried out with platinum catalysis or is at least a miscible component of the solvent used for this purpose. According to another embodiment of the aforementioned use or the
• the halocarbon SH is selected from the group consisting of haloalkanes and aromatic halocarbons.
• the halohydrocarbon SH is advantageously a chlorohydrocarbon or a bromohydrocarbon.
• the halogenated hydrocarbon SH is selected from the group consisting of dichloromethane, 1,1-dichloroethane, 1,2-dichloroethane, dibromomethane, 1,1-dibromoethane, 1,2-dibromoethane, chlorobenzene, and their isomers, and mixtures thereof.
• ether SE is selected from the group consisting of tetrahydrofuran, methyltetrahydrofuran, 1,4-dioxane, diethyl ether, methyl-fe / t-butyl ether, di-n-propyl ether, Di / sopropyl ether,
• Solvents are possible, for example, by simply applying a reduced pressure to the respective storage or reaction vessel, if necessary at a slightly elevated temperature of the respective solution or of the respective reaction mixture.
• trimethylplatinum (IV) iodide or the process for carrying out a chemical reaction using trimethylplatinum (IV) iodide as a catalyst or precatalyst, after the trimethylplatinum (IV) iodide has been made available (cf. Step a)) a monomerization of the trimethylplatinum (IV) iodide.
• the term “monomerization” means the provision of monomeric, soluble and catalytically active MesPtl.
• the monomerization is usually carried out by thermal decomposition of the usually as an oligomer, for. B. obtained as a dimer or tetramer, trimethylplatinum (IV) iodide present.
• the chemical reaction is an addition reaction at a carbon-carbon double bond
• the trimethylplatinum (IV) iodide is used as a precatalyst.
• the addition reaction is a hydrosilylation of a carbon-carbon double bond.
• trimethylplatinum (IV) iodide can be used, in each case obtained or as a solution comprising trimethylplatinum (IV) iodide and the aprotic polar solvent SA obtainable by a process for the preparation of trimethylplatinum (IV) iodide according to one of the embodiments described above. Due to its very high purity, the trimethylplatinum (IV) iodide which can be obtained or obtained in this way is suitable for use as a precatalyst or catalyst in a large number of platinum-catalyzed reactions.
• the trimethylplatinum (IV) iodide is essentially free from contamination by magnesium, sodium and potassium salts and elemental iodine, as set out above.
• magnesium salt contamination substantially free of magnesium salt contamination
• potassium salt contamination substantially free of sodium salt contamination
• essentially free of contamination by elementary iodine the definitions given above apply. It is particularly advantageous that trimethylplatinum iodide can be prepared relatively inexpensively, simply and quickly in good to very good yields, including space-time yields, by means of the process described above - even on an industrial scale.
• trimethylplatinum (IV) iodide claimed here or the method described here for carrying out a chemical reaction using trimethylplatinum (IV) iodide is thus obtained or obtainable by a method for producing trimethylplatinum (IV) iodide according to one of the embodiments described above, at least with regard to the provision (cf. step a)) of the trimethylplatinum (IV) iodide or the solution comprising trimethylplatinum (IV) iodide and the aprotic polar solvent SA, simply, quickly and comparatively inexpensively feasible.
• the object is achieved by the use of a platinum (IV) compound, obtained or obtainable by a method for producing platinum (IV) compounds according to one of the embodiments described above, as a precursor compound for producing a platinum layer or a layer containing platinum, in particular on at least one surface of a substrate.
• the aforementioned use is a process for producing i. at least one platinum layer or ii. at least one platinum-containing layer on at least one surface of a substrate using a platinum (IV) compound, obtained or obtainable by a method for producing platinum (IV) compounds according to one of the exemplary embodiments described above, comprising the steps: a) Providing the platinum (IV) compound, and b) deposition i. the at least one platinum layer or ii. the at least one platinum-containing layer on the at least one surface of the substrate using the platinum (IV) compound as a precursor compound.
• step a) one or more platinum (IV) compounds can be provided.
• one or more platinum (IV) compounds can be provided independently of one another as a solid or as a solution comprising one or more platinum (IV) compounds.
• the platinum (IV) compounds used are particularly suitable as precursor compounds for producing high-quality platinum layers or layers containing platinum on a surface of a substrate. This is due in particular to their production by a method according to one of the previously described embodiments, namely using trimethylplatinum (IV) iodide, obtained or obtainable by a method for producing trimethylplatinum (IV) iodide according to one of the embodiments described above . This is because trimethylplatinum (IV) iodide obtained or obtainable in this way is essentially free from contamination by magnesium, sodium and potassium salts and elemental iodine, which are disadvantageous for the coating process and thus for the performance of the coated substrates.
• the platinum (IV) compound provided in step a) is selected from the group consisting of (methylcyclopentadienyl ) trimethylplatinum (IV), (ethylcyclopentadienyl) trimethylplatinum (IV), (/ so-propyl-cyclopentadienyl) trimethylplatinum (IV) and ⁇ tert-butylcyclopentadienyl) trimethylplatinum (IV).
• the platinum layer or the platinum-containing layer is deposited in step b) by means of a gas phase deposition process.
• the platinum layer or the platinum-containing layer is deposited by means of an ALD method or an MOCVD method, in particular a MO VPE method.
• the substrate can, for example, comprise one or more base metals or be made from one or more base metals. As an alternative or in addition, the substrate can comprise one or more non-metallic materials or consist entirely of one or more non-metallic materials.
• a substrate for. B. corundum foils or thin metallic foils can be used.
• the substrate can itself be part of a component.
• a platinum (IV) compound as a precursor compound for producing a platinum layer or a platinum-containing layer or in one embodiment of the method for producing a platinum layer or a platinum-containing layer on a surface of a substrate, the substrate is a wafer.
• the wafer can be silicon, silicon carbide, germanium, gallium arsenide, indium phosphide, a glass such as e.g. B. S1O 2 , and / or a plastic, such as. B. silicone, comprise or consist entirely of one or more of these materials.
• the wafer can have one or more wafer layers, each with a surface. The production of a platinum layer or a layer containing platinum can be provided on the surface of one or more wafer layers.
• the substrates obtained or obtainable by means of the use claimed here or the method described here, comprising a platinum layer or a platinum-containing layer, are particularly good for the production of an electronic component, in particular an electronic semiconductor component, due to the very high purity of the platinum layer or the platinum-containing one , or an electrode for a fuel cell can be used.
• the platinum layer or the platinum-containing layer functions as a catalytic layer.
• a substrate which, on at least one surface, has at least i. a platinum layer or ii. comprises a platinum-containing layer, the platinum layer or the platinum-containing layer being produced using a platinum (IV) compound, obtained or obtainable by a method for producing platinum (IV) compounds according to one of the exemplary embodiments described above.
• the substrate can, for example, comprise one or more base metals or be made from one or more base metals.
• the substrate can comprise one or more non-metallic materials or can consist entirely of them consist of one or more non-metallic materials.
• a substrate for. B. corundum foils or thin metallic foils can be used.
• the substrate can itself be part of a component.
• the substrate is a wafer.
• the wafer can be silicon, silicon carbide, germanium, gallium arsenide, indium phosphide, a glass such as e.g. B. S1O 2 , and / or a plastic, such as. B. silicone, comprise or consist entirely of one or more of these materials.
• the wafer can have one or more wafer layers, each with a surface.
• One or more surfaces can have a platinum layer or a platinum-containing layer. Due to the very high purity of the at least one platinum layer or layer containing platinum on at least one surface of the substrate claimed here, it is particularly suitable for the production of an electronic component, in particular an electronic semiconductor component, or an electrode for a fuel cell. In the latter case, the at least one platinum layer or layer containing platinum functions as a catalytic layer.
• the object is also achieved by a method for producing an electronic component, in particular an electronic semiconductor component, or an electrode for a fuel cell using a platinum (IV) compound, obtained or obtainable by a method for producing platinum (IV) compounds according to one of the exemplary embodiments described above, comprising the steps: a) providing the platinum (IV) compound, b) deposition i. at least one platinum layer or ii. at least one platinum-containing layer on at least one surface of a substrate and c) Completion of the electronic component, in particular the electronic semiconductor component, or the electrode for the fuel cell.
• step a) one or more platinum (IV) compounds can be provided.
• one or more platinum (IV) compounds can be provided independently of one another as a solid or as a solution comprising one or more platinum (IV) compounds.
• the substrate can, for example, comprise one or more base metals or be made from one or more base metals.
• the substrate can comprise one or more non-metallic materials or consist entirely of one or more non-metallic materials.
• a substrate for. B. corundum foils or thin metallic foils can be used.
• the substrate can itself be part of a component.
• the substrate is a wafer.
• the wafer can be silicon, silicon carbide, germanium, gallium arsenide, indium phosphide, a glass such as e.g. B. S1O 2 , and / or a plastic, such as. B. silicone, comprise or consist entirely of one or more of these materials.
• the wafer can have one or more wafer layers, each with a surface. The deposition of one or more platinum layers or one or more platinum-containing layers on one or more surfaces of the wafer can be provided.
• the platinum (IV) compounds used here are particularly suitable as precursor compounds for the production of electronic semiconductor components and electrodes for fuel cells. This is due in particular to their production by a process according to one of the embodiments described above, namely using trimethylplatinum (IV) iodide, obtained or obtainable by a process for producing trimethylplatinum (IV) iodide according to one of the embodiments described above . Because trimethylplatinum (IV) iodide obtained or obtainable in this way is im Essentially free from contamination by magnesium, sodium and potassium salts and elemental iodine, which are disadvantageous for the coating process and thus for the performance of the coated substrates.
• platinum (IV) compounds to be made available according to step a) can be prepared particularly simply and comparatively inexpensively by a method for producing such compounds according to one of the embodiments described above, which enables their use on an industrial scale.
• Trimethylplatinum (IV) iodide obtained or obtainable by a process for the preparation of trimethylplatinum (IV) iodide according to one of the embodiments described above, a defined platinum (IV) compound is provided.
• Trimethylplatinum (IV) iodide can be prepared by means of the claimed process in a simple, inexpensive and reproducible manner in very high purity and good to very good yields, including space-time yields.
• the claimed process is characterized in that it can also be carried out on an industrial scale - with a comparable yield, including space-time yield, and purity of the target compound.
• trimethylplatinum (IV) iodide and the trimethylplatinum (IV) iodide which can be prepared with it can be assessed as satisfactory from an ecological and economic point of view. Due to its very high purity, trimethylplatinum (IV) iodide obtained or obtainable in this way is particularly suitable for use as a starting material for the production of high-purity platinum (IV) precursor compounds, which are intended to act for the deposition of platinum layers or layers containing platinum, and as a precatalyst and catalyst suitable. Substrates obtained or obtainable using the abovementioned platinum (IV) precursor compounds are particularly good for the production of electronic devices because of the high-purity platinum layers or layers containing platinum Components, in particular electronic semiconductor components, and electrodes can be used for fuel cells.
• the invention relates to a process for the production of trimethylplatinum (IV) iodide and trimethylplatinum (IV) iodide obtainable or obtained by this process and its use as a starting material for the production of high-purity platinum (IV) compounds, as a precatalyst and as a catalyst.
• the invention also relates to the aforementioned platinum (IV) compounds and their use as precursors for the deposition of platinum layers and platinum-containing layers on a surface of a substrate.
• the invention relates to a substrate which has a platinum layer or a layer containing platinum on a surface and a method for producing an electronic component, in particular one electronic semiconductor component, or an electrode for a fuel cell using a platinum (IV) compound, obtained or obtainable using trimethylplatinum (IV) iodide, which is obtainable by means of the method described here.
• a platinum (IV) compound obtained or obtainable using trimethylplatinum (IV) iodide, which is obtainable by means of the method described here.
• trimethylplatinum (IV) iodide obtained or obtainable by a process for the preparation of trimethylplatinum (IV) iodide according to one of the embodiments described above, a defined platinum (IV) compound is provided.
• Trimethylplatinum (IV) iodide can be produced in a simple, inexpensive and reproducible manner in a very high purity and good to very good yields, including space-time yields, by means of the claimed process.
• the process described here - with a comparable yield, including space-time yield, and purity of the target compound - can also be carried out on an industrial scale.
• the claimed process for the production of trimethylplatinum (IV) iodide and the trimethylplatinum (IV) iodide which can be prepared with it can be assessed as satisfactory from an ecological and economic point of view.
• trimethylplatinum (IV) iodide obtained or obtainable in this way is particularly suitable for use as a starting material for the production of high-purity platinum (IV) precursor compounds, which are intended to be used for the deposition of platinum layers or layers containing platinum, and as a precatalyst and catalyst suitable.

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