EP3792072A1 - Embossing method for embossing micro- or nanostructures - Google Patents
Embossing method for embossing micro- or nanostructures Download PDFInfo
- Publication number
- EP3792072A1 EP3792072A1 EP20020436.0A EP20020436A EP3792072A1 EP 3792072 A1 EP3792072 A1 EP 3792072A1 EP 20020436 A EP20020436 A EP 20020436A EP 3792072 A1 EP3792072 A1 EP 3792072A1
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- EP
- European Patent Office
- Prior art keywords
- embossing
- lacquer layer
- lacquer
- film web
- structures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/324—Reliefs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/328—Diffraction gratings; Holograms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/355—Security threads
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/425—Marking by deformation, e.g. embossing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
- B44B5/02—Dies; Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
- B44B5/02—Dies; Accessories
- B44B5/024—Work piece loading or discharging arrangements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
- B44B5/02—Dies; Accessories
- B44B5/026—Dies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
- B44C1/16—Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like
- B44C1/165—Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like for decalcomanias; sheet material therefor
- B44C1/17—Dry transfer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
- B44C1/24—Pressing or stamping ornamental designs on surfaces
Definitions
- the invention relates to a method for embossing structures with dimensions in the range of micrometers or nanometers in a lacquer layer composed of a lacquer, the lacquer layer being applied to one side of a film web and being curable by means of ultraviolet radiation.
- the film web is first pressed with the side on which the not yet hardened lacquer layer is located by an impression roller against an embossing cylinder, on the surface of which the structures to be embossed are located in the micro or nanometer range.
- the structures are formed in the micro or nanometer range in the lacquer layer.
- the lacquer layer is then cured by ultraviolet radiation from a source of ultraviolet radiation.
- the structures in the micrometer or nanometer range are thus embossed into an unevenly distributed lacquer layer, and even after the embossing and subsequent hardening of the lacquer layer by means of UV radiation, an unevenly thick and in the horizontal direction, based in each case on the film web, unevenly distributed lacquer layer with embossed structures in the micrometer or nanometer range results.
- a method for producing a security element which consists of two components. Both components must be arranged in exact register or register to one another, an adjustable stretching roller being provided for maintaining or setting this register.
- the second components of the security element are preferably produced by an embossing unit.
- WO 2011/020727 A1 discloses a method of producing an optically variable image in which an epoxy paint can be heated for application to a web, thereby reducing its viscosity. The viscosity of the lacquer will have changed or increased again by cooling down by the time the stamping process takes place.
- the object of the invention is to enable a higher speed of the film web with a constant number of air bubbles in the embossed lacquer layer or an equal or higher velocity of the film web with a reduced number of air bubbles in the embossed lacquer layer, so-called "air bubble-free" embossing.
- the invention relates to a method according to the preamble of the main claim, wherein according to the invention the lacquer of the lacquer layer in the area of the embossing cylinder and / or in the lacquer part has a low viscosity for rapid embossing without air bubbles.
- the viscosity of the paint can be reduced by heating the paint.
- a certain lacquer can be embossed without air bubbles at a temperature of the lacquer of 20 ° C with a speed of the film web of 20 m / min and at a temperature of the lacquer of 60 ° C with a speed the film web of 45 m / min.
- a heating of the lacquer thus particularly preferably leads to a speed of the film web that is more than twice as high and thus to an increase in the profitability of the embossing process.
- the method according to the invention for air bubble-free embossing by reducing the viscosity or heating the lacquer can be carried out independently of the direction in which the film web is fed to the embossing cylinder, i.e. both when the film web is fed from above or at least obliquely from above to the embossing cylinder as well as with a feed of the film web known from the prior art from below or at least obliquely from below to the embossing cylinder.
- the width of the lacquer layer after the embossing process can be influenced by the speed of the film web, the viscosity or temperature of the lacquer of the lacquer layer, the amount of lacquer applied to the film web and the impression roller pressure.
- the air bubble-free embossing only has a very small range of variation for a change in the parameters of temperature and speed of the film web, ie even small changes in these parameters have a great influence on the width of the lacquer layer after embossing.
- the width of the lacquer before the embossing is 620 mm and should be 720 mm after the embossing.
- a change in the web speed by 1 m / min already has a significant influence on the width of the lacquer layer after embossing. If the web speed is clearly too low, around 5 m / min to 10 m / min, the lacquer is squeezed beyond the edge of the film web; a speed that is slightly too high, around 3 m / min, leads to air bubbles.
- the width of the lacquer layer can be kept constant at a predetermined value after the embossing. If the width of the lacquer layer increases beyond a specified value after embossing, the web speed must be increased and vice versa.
- a film web consists for example of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polypropylene (PP) or polycarbonate (PC) with a thickness for security threads or security films of preferably 8 ⁇ m to 36 ⁇ m, for banknotes made of polymer or for composite banknotes up to 100 ⁇ m or for card bodies up to 200 ⁇ m.
- PET polyethylene terephthalate
- PEN polyethylene naphthalate
- PP polypropylene
- PC polycarbonate
- the thickness of the lacquer layer is preferably 0.5 ⁇ m to 20 ⁇ m, particularly preferably 4 ⁇ m to 15 ⁇ m and very particularly preferably 4 ⁇ m to 8 ⁇ m.
- the lacquer layer is preferably applied to the film web by means of a flexographic printing process.
- the film web is deflected by a deflecting roller and guided onto the embossing cylinder, the deflecting roller being arranged in front of the impression roller in the conveying direction.
- the film web can be guided away from the embossing cylinder again by a second deflection roller.
- the first and, if necessary, the second deflection roller ensures that the lacquer layer wraps around the embossing cylinder over a larger circumferential surface.
- From above in the context of this invention means that the film is fed vertically or at least almost vertically from above or in the direction of the weight force or almost in the direction of the weight force onto the embossing cylinder. At least from obliquely above in the context of this invention means that the film is fed at an angle in a range from more than horizontal to almost vertical from above onto the embossing cylinder, the film in particular not being fed horizontally onto the embossing cylinder.
- Such structures with dimensions in the range of micrometers or nanometers are used in particular to increase the protection against forgery of documents of value, in particular banknotes, shares, bonds, certificates, vouchers, checks, high-quality admission tickets, but also other papers at risk of forgery, such as passports and other identification documents, as well Cards, such as credit or debit cards, and also product security elements such as labels, seals, packaging and the like.
- the structures with dimensions in the range of micrometers or nanometers are, for example, diffractive structures, micromirrors, matt structures or moth-eye structures.
- the preamble of the invention is explained on the basis of the following exemplary embodiments and the supplementary figures.
- the exemplary embodiments represent embodiments to which the invention is not intended to be restricted in any way.
- the representations in the figures are highly schematic for better understanding and do not reflect the real conditions.
- the proportions shown in the figures do not correspond to the conditions present in reality and serve exclusively to improve the clarity.
- the embodiments described in the following exemplary embodiments are reduced to the essential core information for better understanding. In the practical implementation, much more complex patterns or images can be used.
- Fig. 1 shows a side view of an embossing method known from the prior art.
- a lacquer layer 6 is located on a film web 5, the film web being fed in the direction of movement 7 obliquely from below onto an embossing device.
- the embossing device consists of an embossing cylinder 1, in the surface of which structures to be embossed with dimensions in the range of micrometers or nanometers are introduced, a roller-shaped impression roller 2, a source 4 for ultraviolet radiation and two deflection rollers 3.
- the film web 5 is through the first deflection roller 3 deflected in such a way that the lacquer layer 6 comes into contact with the embossing cylinder.
- part of the not yet hardened lacquer layer builds up and forms the irregularly shaped lacquer wedge 8. Then the film web 5 including lacquer layer 6 is pressed against the embossing cylinder 1 by the impression roller 2 and the structures with dimensions in Area of micrometers or nanometers molded into the lacquer layer 6. The lacquer layer 6 is then cured by electromagnetic radiation in the ultraviolet wavelength range of the source 4 and guided away from the embossing cylinder 1 via a second deflection roller 3 and fed to subsequent processing steps.
- Fig. 2 shows a side view of another embossing process in which, in contrast to the embossing process from Fig. 1 the film web 5 is fed obliquely from above to the embossing device.
- the film web 5 is deflected by the first deflection roller 3 in such a way that the lacquer layer 6 comes into contact with the embossing cylinder.
- part of the not yet hardened lacquer layer builds up and forms the above-described and particularly advantageously uniformly shaped lacquer wedge 9.
- the film web 5 including lacquer layer 6 is pressed against the embossing cylinder 1 by the impression roller 2 and the structures are molded into the lacquer layer 6 with dimensions in the range of micrometers or nanometers.
- the lacquer layer 6 is then cured by electromagnetic radiation in the ultraviolet wavelength range of the source 4 and guided away from the embossing cylinder 1 via a second deflection roller 3 and fed to subsequent processing steps.
Abstract
Die Erfindung betrifft ein Verfahren zum Prägen von Strukturen mit Abmessungen im Bereich von Mikro- oder Nanometern in eine Lackschicht aus einem Lack, wobei die Lackschicht auf eine Seite einer Folienbahn aufgebracht ist und mittels ultravioletter Strahlung härtbar ist. Die Folienbahn wird in Beförderungsrichtung zuerst mit der Seite, auf der sich die noch nicht gehärtete Lackschicht befindet, durch einen Presseur an einen Prägezylinder gepresst, auf dessen Oberfläche sich die zu prägenden Strukturen im Mikro- oder Nanometerbereich befinden. Hierbei formen sich die Strukturen im Mikro- oder Nanometerbereich in die Lackschicht ab. Anschließend wird die Lackschicht durch eine ultraviolette Strahlung einer Quelle für ultraviolette Strahlung gehärtet.Erfindungsgemäß weist für ein luftblasenfreies Prägen der Lack der Lackschicht im Bereich des Prägezylinders und/oder an der Stelle, an der in Beförderungsrichtung die Lackschicht den Prägezylinder berührt und sich ein Teil des Lacks der noch nicht gehärteten Lackschicht aufstaut, eine geringe Viskosität auf.The invention relates to a method for embossing structures with dimensions in the range of micrometers or nanometers in a lacquer layer composed of a lacquer, the lacquer layer being applied to one side of a film web and being curable by means of ultraviolet radiation. In the direction of conveyance, the film web is first pressed with the side on which the not yet hardened lacquer layer is located by an impression roller against an embossing cylinder, on the surface of which the structures to be embossed are located in the micro or nanometer range. The structures are formed in the micro or nanometer range in the lacquer layer. The lacquer layer is then cured by ultraviolet radiation from a source of ultraviolet radiation. According to the invention, for air bubble-free embossing, the lacquer layer in the area of the embossing cylinder and / or at the point where the lacquer layer touches the embossing cylinder and part of the Lacquer builds up on the not yet hardened lacquer layer, a low viscosity.
Description
Die Erfindung betrifft ein Verfahren zum Prägen von Strukturen mit Abmessungen im Bereich von Mikro- oder Nanometern in eine Lackschicht aus einem Lack, wobei die Lackschicht auf eine Seite einer Folienbahn aufgebracht ist und mittels ultravioletter Strahlung härtbar ist. Die Folienbahn wird in Beförderungsrichtung zuerst mit der Seite, auf der sich die noch nicht gehärtete Lackschicht befindet, durch einen Presseur an einen Prägezylinder gepresst, auf dessen Oberfläche sich die zu prägenden Strukturen im Mikro- oder Nanometerbereich befinden. Hierbei formen sich die Strukturen im Mikro- oder Nanometerbereich in die Lackschicht ab. Anschließend wird die Lackschicht durch eine ultraviolette Strahlung einer Quelle für ultraviolette Strahlung gehärtet.The invention relates to a method for embossing structures with dimensions in the range of micrometers or nanometers in a lacquer layer composed of a lacquer, the lacquer layer being applied to one side of a film web and being curable by means of ultraviolet radiation. In the direction of conveyance, the film web is first pressed with the side on which the not yet hardened lacquer layer is located by an impression roller against an embossing cylinder, on the surface of which the structures to be embossed are located in the micro or nanometer range. The structures are formed in the micro or nanometer range in the lacquer layer. The lacquer layer is then cured by ultraviolet radiation from a source of ultraviolet radiation.
Ein derartiges Verfahren wird bereits seit vielen Jahren verwendet, wobei die Folienbahn von unten oder mindestens von schräg unten zum Prägezylinder geführt wird. Ein Teil des Lacks der noch nicht gehärteten Lackschicht staut sich in Beförderungsrichtung unmittelbar vor der Stelle auf, an der die Lackschicht den Prägezylinder berührt, und bildet einen sogenannten "Lackkeil". Dieser Lackkeil ist jedoch bei dem aus dem Stand der Technik bekannten Verfahren ungleichmäßig verteilt, wobei sich sowohl die Dicke des Keils als auch seine Verteilung in Richtung der Drehachse des Prägezylinders ständig und unvorhersehbar ändert. Die geometrische Form und Verteilung des Lackkeils ist somit stochastisch, wodurch sich besonders nachteilhaft eine ungleichmäßige Verteilung der Lackschicht auf der Folienbahn ergibt. Die Strukturen im Mikro- oder Nanometerbereich werden somit in eine ungleichmäßig verteilte Lackschicht eingeprägt, wobei sich auch nach dem Verprägen und anschließenden Härten der Lackschicht mittels UV-Strahlung eine ungleichmäßig dicke und in horizontaler Richtung, bezogen jeweils auf die Folienbahn, ungleichmäßig verteilte Lackschicht mit eingeprägten Strukturen im Mikro- oder Nanometerbereich ergibt.Such a method has been used for many years, with the film web being guided to the embossing cylinder from below or at least at an angle from below. Part of the lacquer of the not yet hardened lacquer layer builds up in the direction of conveyance immediately in front of the point at which the lacquer layer touches the embossing cylinder and forms a so-called "lacquer wedge". However, this lacquer wedge is unevenly distributed in the method known from the prior art, with both the thickness of the wedge and its distribution in the direction of the axis of rotation of the embossing cylinder changing constantly and unpredictably. The geometric shape and distribution of the lacquer wedge is therefore stochastic, which is particularly disadvantageous in that the lacquer layer is distributed unevenly on the film web. The structures in the micrometer or nanometer range are thus embossed into an unevenly distributed lacquer layer, and even after the embossing and subsequent hardening of the lacquer layer by means of UV radiation, an unevenly thick and in the horizontal direction, based in each case on the film web, unevenly distributed lacquer layer with embossed structures in the micrometer or nanometer range results.
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Aufgabe der Erfindung ist es, eine höhere Geschwindigkeit der Folienbahn bei gleichbleibender Anzahl der Luftblasen in der geprägten Lackschicht oder eine gleiche oder ebenfalls höhere Geschwindigkeit der Folienbahn bei reduzierter Anzahl der Luftblasen in der geprägten Lackschicht zu ermöglichen, ein sogenanntes "luftblasenfreies" Prägen.The object of the invention is to enable a higher speed of the film web with a constant number of air bubbles in the embossed lacquer layer or an equal or higher velocity of the film web with a reduced number of air bubbles in the embossed lacquer layer, so-called "air bubble-free" embossing.
Die Erfindung betrifft ein Verfahren nach dem Oberbegriff des Hauptanspruchs, wobei erfindungsgemäß für ein schnelles luftblasenfreies Prägen der Lack der Lackschicht im Bereich des Prägezylinders und/oder im Lacckeil eine geringe Viskosität aufweist. Eine Verringerung der Viskosität des Lacks kann durch Erwärmen des Lackes erreicht werden. Beispielsweise kann ein bestimmter Lack luftblasenfrei bei einer Temperatur des Lacks von 20°C mit einer Geschwindigkeit der Folienbahn von 20 m/min geprägt werden und bei einer Temperatur des Lacks von 60°C mit einer Geschwindigkeit der Folienbahn von 45 m/min. Eine Erwärmung des Lacks führt also besonders bevorzugt zu einer mehr als doppelt so großen Geschwindigkeit der Folienbahn und damit zu einer Erhöhung der Wirtschaftlichkeit des Prägevorgangs.The invention relates to a method according to the preamble of the main claim, wherein according to the invention the lacquer of the lacquer layer in the area of the embossing cylinder and / or in the lacquer part has a low viscosity for rapid embossing without air bubbles. The viscosity of the paint can be reduced by heating the paint. For example, a certain lacquer can be embossed without air bubbles at a temperature of the lacquer of 20 ° C with a speed of the film web of 20 m / min and at a temperature of the lacquer of 60 ° C with a speed the film web of 45 m / min. A heating of the lacquer thus particularly preferably leads to a speed of the film web that is more than twice as high and thus to an increase in the profitability of the embossing process.
Das erfindungsgemäße Verfahren zum luftblasenfreien Prägen durch eine Reduzierung der Viskosität bzw. eine Erwärmung des Lacks kann unabhängig von der Richtung der Zuführung der Folienbahn zum Prägezylinder erfolgen, also sowohl bei einer erfindungsgemäßen Zuführung der Folienbahn von oben oder mindestens von schräg oben zum Prägezylinder als auch bei einer aus dem Stand der Technik bekannten Zuführung der Folienbahn von unten oder mindestens von schräg unten zum Prägezylinder.The method according to the invention for air bubble-free embossing by reducing the viscosity or heating the lacquer can be carried out independently of the direction in which the film web is fed to the embossing cylinder, i.e. both when the film web is fed from above or at least obliquely from above to the embossing cylinder as well as with a feed of the film web known from the prior art from below or at least obliquely from below to the embossing cylinder.
Ein Einfluss auf diese Breite der Lackschicht nach dem Prägevorgang kann durch die Geschwindigkeit der Folienbahn, die Viskosität bzw. Temperatur des Lacks der Lackschicht, die auf die Folienbahn aufgetragene Lackmenge und den Presseurdruck genommen werden.The width of the lacquer layer after the embossing process can be influenced by the speed of the film web, the viscosity or temperature of the lacquer of the lacquer layer, the amount of lacquer applied to the film web and the impression roller pressure.
Das luftblasenfreie Prägen hat jedoch nur eine sehr kleine Variationsbreite für eine Änderung der Parameter Temperatur und Geschwindigkeit der Folienbahn, d.h. bereits kleine Änderungen dieser Parameter haben einen großen Einfluss auf die Breite der Lackschicht nach dem Prägen. Beispielsweise beträgt die Breite des Lacks vor der Prägung 620 mm und soll nach der Prägung 720 mm betragen. Bereits eine Änderung der Bahngeschwindigkeit um 1 m/min hat einen deutlichen Einfluss auf die Breite der Lackschicht nach dem Prägen. Eine deutlich zu niedrige Bahngeschwindigkeit um 5 m/min bis 10 m/min führt dazu, dass der Lack über den Rand der Folienbahn hinaus gequetscht wird, eine geringfügig zu hohe Geschwindigkeit um ca. 3 m/min führt zu Luftblasen.The air bubble-free embossing, however, only has a very small range of variation for a change in the parameters of temperature and speed of the film web, ie even small changes in these parameters have a great influence on the width of the lacquer layer after embossing. For example, the width of the lacquer before the embossing is 620 mm and should be 720 mm after the embossing. A change in the web speed by 1 m / min already has a significant influence on the width of the lacquer layer after embossing. If the web speed is clearly too low, around 5 m / min to 10 m / min, the lacquer is squeezed beyond the edge of the film web; a speed that is slightly too high, around 3 m / min, leads to air bubbles.
Dies bedeutet insbesondere auch, dass über eine Änderung der Geschwindigkeit der Folienbahn die Breite der Lackschicht nach dem Prägen konstant auf einem vorgegebenen Wert gehalten werden kann. Nimmt die Breite der Lackschicht nach dem Prägen über einen vorgegebenen Wert hinaus zu, muss die Bahngeschwindigkeit erhöht werden und umgekehrt.This also means in particular that by changing the speed of the film web, the width of the lacquer layer can be kept constant at a predetermined value after the embossing. If the width of the lacquer layer increases beyond a specified value after embossing, the web speed must be increased and vice versa.
Eine Folienbahn besteht beispielsweise aus Polyethylenterephthalat (PET), Polyethylennaphthalat (PEN), Polypropylen (PP) oder Polycarbonat (PC) mit einer Dicke für Sicherheitsfäden oder Sicherheitsfolien von bevorzugt 8 µm bis 36 µm, für Banknoten aus Polymer oder für Folienverbundbanknoten bis 100 µm oder für Kartenkörper bis 200 µm.A film web consists for example of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polypropylene (PP) or polycarbonate (PC) with a thickness for security threads or security films of preferably 8 µm to 36 µm, for banknotes made of polymer or for composite banknotes up to 100 µm or for card bodies up to 200 µm.
Die Dicke der Lackschicht beträgt bevorzugt 0,5 µm bis 20 µm, besonders bevorzugt 4 µm bis 15 µm und ganz besonders bevorzugt von 4 µm bis 8 µm. Die Lackschicht wird bevorzugt mittels eines Flexodruckverfahrens auf die Folienbahn aufgebracht.The thickness of the lacquer layer is preferably 0.5 μm to 20 μm, particularly preferably 4 μm to 15 μm and very particularly preferably 4 μm to 8 μm. The lacquer layer is preferably applied to the film web by means of a flexographic printing process.
Gemäß einer bevorzugten Ausführungsform ist vorgesehen, dass die Folienbahn durch eine Umlenkwalze umgelenkt und auf den Prägezylinder geführt wird, wobei die Umlenkwalze in Beförderungsrichtung vor dem Presseur angeordnet wird. Durch eine zweite Umlenkwalze kann die Folienbahn wieder vom Prägezylinder weggeführt werden. Durch die erste und gegebenenfalls zweite Umlenkwalze wird erreicht, dass die Lackschicht den Prägezylinder über eine größere Umfangfläche umschlingt.According to a preferred embodiment it is provided that the film web is deflected by a deflecting roller and guided onto the embossing cylinder, the deflecting roller being arranged in front of the impression roller in the conveying direction. The film web can be guided away from the embossing cylinder again by a second deflection roller. The first and, if necessary, the second deflection roller ensures that the lacquer layer wraps around the embossing cylinder over a larger circumferential surface.
Von oben im Sinne dieser Erfindung bedeutet, dass die Folie senkrecht oder mindestens nahezu senkrecht von oben bzw. in Richtung der Gewichtskraft oder nahezu in Richtung der Gewichtskraft auf den Prägezylinder zugeführt wird. Mindestens von schräg oben im Sinne dieser Erfindung bedeutet, dass die Folie mit einem Winkel in einem Bereich von mehr als waagrecht bis nahezu senkrecht von oben auf den Prägezylinder zugeführt wird, wobei die Folie insbesondere nicht waagrecht auf den Prägezylinder zugeführt wird.From above in the context of this invention means that the film is fed vertically or at least almost vertically from above or in the direction of the weight force or almost in the direction of the weight force onto the embossing cylinder. At least from obliquely above in the context of this invention means that the film is fed at an angle in a range from more than horizontal to almost vertical from above onto the embossing cylinder, the film in particular not being fed horizontally onto the embossing cylinder.
Derartige Strukturen mit Abmessungen im Bereich von Mikro- oder Nanometern werden insbesondere zur Erhöhung des Fälschungsschutzes von Wertdokumenten verwendet, insbesondere Banknoten, Aktien, Anleihen, Urkunden, Gutscheine, Schecks, hochwertige Eintrittskarten, aber auch andere fälschungsgefährdete Papiere, wie Pässe und sonstige Ausweisdokumente, sowie Karten, wie beispielsweise Kredit- oder Debitkarten, und auch Produktsicherungselemente, wie Etiketten, Siegel, Verpackungen und dergleichen. Die Strukturen mit Abmessungen im Bereich von Mikro- oder Nanometern sind beispielsweise diffraktive Strukturen, Mikrospiegel, Mattstrukturen oder Mottenaugenstrukturen.Such structures with dimensions in the range of micrometers or nanometers are used in particular to increase the protection against forgery of documents of value, in particular banknotes, shares, bonds, certificates, vouchers, checks, high-quality admission tickets, but also other papers at risk of forgery, such as passports and other identification documents, as well Cards, such as credit or debit cards, and also product security elements such as labels, seals, packaging and the like. The structures with dimensions in the range of micrometers or nanometers are, for example, diffractive structures, micromirrors, matt structures or moth-eye structures.
Es versteht sich, dass die vorstehend genannten und die nachfolgend noch zu erläuternden Merkmale nicht nur in den angegebenen Kombinationen, sondern auch in anderen Kombinationen einsetzbar sind, ohne den Rahmen der vorliegenden Erfindung zu verlassen, soweit dies von dem Schutzumfang der Ansprüche erfasst ist.It goes without saying that the features mentioned above and those yet to be explained below can be used not only in the specified combinations, but also in other combinations without departing from the scope of the present invention, insofar as this is covered by the scope of protection of the claims.
Anhand der nachfolgenden Ausführungsbeispiele und der ergänzenden Figuren wird der Oberbegriff der Erfindung erläutert. Die Ausführungsbeispiele stellen Ausführungsformen dar, auf die die Erfindung in keinerlei Weise beschränkt sein soll. Des Weiteren sind die Darstellungen in den Figuren des besseren Verständnisses wegen stark schematisiert und spiegeln nicht die realen Gegebenheiten wieder. Insbesondere entsprechen die in den Figuren gezeigten Proportionen nicht den in der Realität vorliegenden Verhältnissen und dienen ausschließlich zur Verbesserung der Anschaulichkeit. Des Weiteren sind die in den folgenden Ausführungsbeispielen beschriebenen Ausführungsformen der besseren Verständlichkeit wegen auf die wesentlichen Kerninformationen reduziert. Bei der praktischen Umsetzung können wesentlich komplexere Muster oder Bilder zur Anwendung kommen.The preamble of the invention is explained on the basis of the following exemplary embodiments and the supplementary figures. The exemplary embodiments represent embodiments to which the invention is not intended to be restricted in any way. Furthermore, the representations in the figures are highly schematic for better understanding and do not reflect the real conditions. In particular, the proportions shown in the figures do not correspond to the conditions present in reality and serve exclusively to improve the clarity. Furthermore, the embodiments described in the following exemplary embodiments are reduced to the essential core information for better understanding. In the practical implementation, much more complex patterns or images can be used.
Im Einzelnen zeigen schematisch:
- Fig. 1
- in Seitenansicht ein Prägeverfahren nach dem Stand der Technik,
- Fig. 2
- in Seitenansicht ein weiteres Prägeverfahren.
- Fig. 1
- a side view of an embossing process according to the state of the art,
- Fig. 2
- a side view of another embossing process.
Claims (2)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102015015407.9A DE102015015407A1 (en) | 2015-11-27 | 2015-11-27 | Embossing process for embossing micro- or nanostructures |
EP16798626.4A EP3380334B1 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing microstructures or nanostructures |
PCT/EP2016/001922 WO2017088964A2 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing microstructures or nanostructures |
Related Parent Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP16798626.4A Division EP3380334B1 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing microstructures or nanostructures |
EP16798626.4A Division-Into EP3380334B1 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing microstructures or nanostructures |
Publications (1)
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EP3792072A1 true EP3792072A1 (en) | 2021-03-17 |
Family
ID=57389366
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP20020437.8A Pending EP3792073A1 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing micro- or nanostructures |
EP16798626.4A Active EP3380334B1 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing microstructures or nanostructures |
EP20020436.0A Pending EP3792072A1 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing micro- or nanostructures |
Family Applications Before (2)
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EP20020437.8A Pending EP3792073A1 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing micro- or nanostructures |
EP16798626.4A Active EP3380334B1 (en) | 2015-11-27 | 2016-11-18 | Embossing method for embossing microstructures or nanostructures |
Country Status (4)
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EP (3) | EP3792073A1 (en) |
CN (2) | CN108472981B (en) |
DE (1) | DE102015015407A1 (en) |
WO (1) | WO2017088964A2 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1720079A1 (en) * | 2005-05-06 | 2006-11-08 | Neopack, Sl | Coloured composition comprising a hologram and preparation process |
WO2011020727A1 (en) | 2009-08-21 | 2011-02-24 | Basf Se | Apparatus and method for a sub microscopic and optically variable image carrying device |
EP2865625A1 (en) | 2013-10-25 | 2015-04-29 | Giesecke & Devrient GmbH | Method and device for producing a safety element |
WO2015172189A1 (en) * | 2014-05-15 | 2015-11-19 | Innovia Security Pty Ltd | In line manufacturing of documents with security elements |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19802585A1 (en) * | 1997-08-04 | 1999-03-25 | Hsm Gmbh | Method and device for producing a surface structure, in particular a holographic surface structure, on a substrate |
CA2244324A1 (en) * | 1997-08-04 | 1999-02-04 | Hsm Holographic Systems Munchen Gmbh | A method and an apparatus for fabricating a surface structure, particularly a holographic surface structure, on a substrate |
EP1362682A1 (en) | 2002-05-13 | 2003-11-19 | ZBD Displays Ltd, | Method and apparatus for liquid crystal alignment |
EP1580015A1 (en) * | 2004-03-24 | 2005-09-28 | Kba-Giori S.A. | Process and apparatus for providing identity marks on security documents |
CA2663468C (en) * | 2006-09-15 | 2016-06-28 | Securency International Pty Ltd | Radiation curable embossed ink security devices for security documents |
WO2010042999A1 (en) * | 2008-10-17 | 2010-04-22 | Securency International Pty Ltd | Registration method and apparatus for embossed and printed features |
KR20100113918A (en) * | 2009-04-14 | 2010-10-22 | 이용근 | The embossment pattern formation ways of industrial art object paper or industrial art object it used embossment pattern |
DE102011009135A1 (en) * | 2011-01-21 | 2012-07-26 | Heidelberger Druckmaschinen Ag | Offset printing machine has control unit that controls measuring beams striking measuring region of recording material based on thickness of printing, where measuring beam reflective coatings of recording material is covered by printing |
JP6203253B2 (en) * | 2012-06-14 | 2017-09-27 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | Security element and hologram manufacturing method |
-
2015
- 2015-11-27 DE DE102015015407.9A patent/DE102015015407A1/en not_active Withdrawn
-
2016
- 2016-11-18 EP EP20020437.8A patent/EP3792073A1/en active Pending
- 2016-11-18 EP EP16798626.4A patent/EP3380334B1/en active Active
- 2016-11-18 WO PCT/EP2016/001922 patent/WO2017088964A2/en active Application Filing
- 2016-11-18 CN CN201680079437.6A patent/CN108472981B/en active Active
- 2016-11-18 EP EP20020436.0A patent/EP3792072A1/en active Pending
- 2016-11-18 CN CN202010122837.9A patent/CN111497492B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1720079A1 (en) * | 2005-05-06 | 2006-11-08 | Neopack, Sl | Coloured composition comprising a hologram and preparation process |
WO2011020727A1 (en) | 2009-08-21 | 2011-02-24 | Basf Se | Apparatus and method for a sub microscopic and optically variable image carrying device |
EP2865625A1 (en) | 2013-10-25 | 2015-04-29 | Giesecke & Devrient GmbH | Method and device for producing a safety element |
WO2015172189A1 (en) * | 2014-05-15 | 2015-11-19 | Innovia Security Pty Ltd | In line manufacturing of documents with security elements |
Also Published As
Publication number | Publication date |
---|---|
DE102015015407A1 (en) | 2017-06-01 |
CN108472981A (en) | 2018-08-31 |
CN111497492B (en) | 2022-03-08 |
CN111497492A (en) | 2020-08-07 |
EP3380334A2 (en) | 2018-10-03 |
EP3380334B1 (en) | 2022-07-27 |
CN108472981B (en) | 2020-05-19 |
WO2017088964A2 (en) | 2017-06-01 |
WO2017088964A3 (en) | 2017-07-20 |
EP3792073A1 (en) | 2021-03-17 |
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