EP3783445B1 - Mécanisme régulateur d'horlogerie à haut facteur de qualité et à lubrification minimale - Google Patents

Mécanisme régulateur d'horlogerie à haut facteur de qualité et à lubrification minimale Download PDF

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Publication number
EP3783445B1
EP3783445B1 EP19193107.0A EP19193107A EP3783445B1 EP 3783445 B1 EP3783445 B1 EP 3783445B1 EP 19193107 A EP19193107 A EP 19193107A EP 3783445 B1 EP3783445 B1 EP 3783445B1
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EP
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Prior art keywords
silicon
sic
silicon carbide
carbide
ppm
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EP19193107.0A
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German (de)
English (en)
French (fr)
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EP3783445A1 (fr
Inventor
Sylvain Huot-Marchand
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ETA SA Manufacture Horlogere Suisse
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ETA SA Manufacture Horlogere Suisse
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Priority to EP19193107.0A priority Critical patent/EP3783445B1/fr
Priority to TW109120813A priority patent/TWI746020B/zh
Priority to KR1020200085526A priority patent/KR20210024415A/ko
Priority to JP2020124265A priority patent/JP7063953B2/ja
Priority to CN202010849257.XA priority patent/CN112415881B/zh
Priority to US16/999,584 priority patent/US11640139B2/en
Publication of EP3783445A1 publication Critical patent/EP3783445A1/fr
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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/063—Balance construction
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B13/00—Gearwork
    • G04B13/02—Wheels; Pinions; Spindles; Pivots
    • G04B13/021—Wheels; Pinions; Spindles; Pivots elastic fitting with a spindle, axis or shaft
    • G04B13/022—Wheels; Pinions; Spindles; Pivots elastic fitting with a spindle, axis or shaft with parts made of hard material, e.g. silicon, diamond, sapphire, quartz and the like
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/045—Oscillators acting by spring tension with oscillating blade springs
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C22C29/02—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides
    • C22C29/06—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds
    • C22C29/065—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds based on SiC
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/06—Free escapements
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/06—Free escapements
    • G04B15/08—Lever escapements
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/10—Oscillators with torsion strips or springs acting in the same manner as torsion strips, e.g. weight oscillating in a horizontal plane
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/20—Compensation of mechanisms for stabilising frequency
    • G04B17/28—Compensation of mechanisms for stabilising frequency for the effect of imbalance of the weights, e.g. tourbillon
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/32—Component parts or constructional details, e.g. collet, stud, virole or piton
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B18/00—Mechanisms for setting frequency
    • G04B18/02—Regulator or adjustment devices; Indexing devices, e.g. raquettes
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/004—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor characterised by the material used
    • G04B31/012—Metallic bearings
    • G04B31/0123—Metallic bearings with metallic ball bearings and metallic roller bearings
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/02—Shock-damping bearings
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/06—Manufacture or mounting processes

Definitions

  • the invention relates to a timepiece regulating mechanism, comprising, arranged to be arranged on a plate, a resonator mechanism with a quality factor greater than 1000, and an escapement mechanism which is intended to be subjected to a torque of motor means comprising a movement, said resonator mechanism comprising an inertial element arranged to oscillate with respect to said plate, said inertial element being subjected to the action of elastic return means intended to be fixed directly or indirectly to said plate, and said inertial element being arranged to cooperate indirectly with an escape wheel set that said escape mechanism comprises, said regulating mechanism comprising at least a pair of components comprising a first component and a second component respectively comprising a first friction surface and a second surface friction which are arranged to cooperate in contact with each other.
  • the invention also relates to a timepiece movement comprising such a regulating mechanism.
  • the invention also relates to a watch comprising such a movement and/or such a regulating mechanism.
  • the invention also relates to a method for making such an escapement mechanism.
  • the invention relates to the field of horological mechanisms comprising permanently moving components, and more particularly to the field of escapement mechanisms.
  • Watch manufacturers have always strived to increase the reliability of movements, by reducing the frequency of maintenance, while ensuring the precise running of watch movements.
  • an operation without lubrication of the escapement mechanisms is sought, by attempting to define couples of materials in friction having a low and stable coefficient of friction as well as low wear, and having excellent resistance over time.
  • the Swiss lever escapement mechanism has a low energy efficiency (about 30%). This low efficiency stems from the fact that the movements of the escapement are jerky, that there are drops or lost paths to accommodate machining errors, and also from the fact that several components transmit their movement to each other via inclined planes that rub against each other.
  • At least one inertial element, a guide means and an elastic return means are required.
  • a spiral spring acts as an elastic return element for the inertial element that constitutes a balance.
  • a new generation of mechanical resonators comprises, in connection with the inertial element, at least two flexible elements which ensure the two functions of guidance in pivoting and of elastic return means.
  • These new resonators allow higher oscillation frequencies, of the order of 10 Hz, even 50 Hz or more, and much higher quality factors, often greater than 1000, and in particular of the order of 2000, than those of the resonators traditional mechanics with balance wheel and hairspring, generally around 280.
  • the energy to be supplied to the resonator at each half-wave is therefore much lower, for example 20 times lower.
  • Silicon oxide (silica) is known for its propensity to adsorb water. This hygroscopic character is also used to dry the air in certain packaging to prevent the goods transported there from being altered by humidity (for example in the form of silica-gel sachets).
  • adhesion phenomena may occur. These surface phenomena can become preponderant if the size of the exhaust components is small. These surface effects (friction and adhesion) in fact become more important than the volume effects (inertia, mass) as the size of the parts decreases. This ultimately results in potentially harmful sticking.
  • the tests carried out have in fact shown a significant loss of yield when the relative humidity increases. Adhesion forces depend on different surface tensions and liquid volume, not on the force applied by one component on another. The influence of these stickings can lead to the movement stopping when the escapement torque is low and the humidity is high, which risks leading to loss of power reserve.
  • the energy exchanged between such a new resonator and the escapement is very low, and is only slightly greater than the energy necessary to detach from the surfaces in contact and to break a meniscus of lubricant.
  • the energy exchanged between the resonator mechanism and the escapement is of the order of three times to ten times the contact break energy. This circumstance naturally makes self-starting difficult after an unexpected stop, for example following a shock.
  • micro-machinable material in particular in silicon and/or silicon oxide
  • this coating must be resistant to abrasion in order to guarantee long-term operation.
  • Self-assembled monolayers or surface-grafting film-forming lubricants may be insufficiently resistant, and reveal the surface of micro-machinable material, in particular silicon and silicon oxide, to wear, again making the mechanism sensitive to humidity.
  • An epilame deposit has the disadvantage of aging over time, which is why it is important to look for materials with the least possible wear, for the contact surfaces of the components in friction such as plate pin, sting , fork with horns, anchor pallet, escape-wheel tooth, etoqueau, and the like.
  • WO2009/049591 in the name of DAMASKO describes a method of manufacturing mechanical functional elements of movements, in particular functional elements for oscillating movement systems, the material or starting material of which is chosen from a group comprising a wide variety of compounds, including nitride of silicon.
  • the document EP3327515A1 in the name of ETA Manufacture Horlogère Suisse describes a timepiece regulator, comprising a free escapement mechanism with anchor, and a resonator of quality factor Q comprising an inertial element comprising a pin cooperating with a fork of the anchor, subjected to the return of two flexible blades fixed to the plate, defining a virtual pivot around a main axis, the anchor pivoting around a secondary axis, and the resonator lift angle ⁇ , during which the pin is in contact with the fork, is less than 10 °, and the ratio IB /IA between the inertia IB of the inertial element with respect to the main axis, and the inertia IA of the anchor with respect to the secondary axis, is greater than 2Q. ⁇ 2 /(0.1. ⁇ . ⁇ 2 ), ⁇ being the angle of lift of the anchor corresponding to the maximum angular travel of the fork.
  • the document EP3182213A1 in the name of AUDEMARS PIGUET describes a mechanism for adjusting an average speed in a clock movement, which comprises an escapement wheel and a mechanical oscillator, several blades of which are elastically flexible in an oscillation plane and carry and recall a balance wheel so that this balance wheel either oscillating angularly in the plane of oscillation.
  • An anchor comprises two rigid vanes which are rigidly integral with the balance wheel and arranged to cooperate alternately with a toothing of the escape wheel when the balance wheel oscillates angularly.
  • the document EP 2 472 340 A1 discloses a first timepiece component comprising a silicon carbide coating and cooperating with a second component having a silicon contact surface.
  • the invention proposes to provide a solution to the problem of intermittent contact components sticking in a watch movement, comprising a new resonator with flexible guides and virtual pivot, with a quality factor greater than 1000, associated with a mechanism of 'exhaust.
  • the invention relates more particularly to the use of silicon carbide, or derived materials comprising essentially silicon carbide, as a high-performance tribological material in the escapement.
  • the invention relates to a regulator mechanism for a watch, comprising a resonator mechanism with flexible guides and virtual pivot, with a quality factor greater than 1000, and comprising an escapement mechanism, with improved tribology, according to claim 1.
  • the invention also relates to a method for producing such a regulating mechanism, characterized in that each pair consisting of a first friction surface and a second antagonistic friction surface is produced by producing a silicon carbide component with a substrate to constitute said first friction surface and/or the second friction surface, either by sintering, or else by massive production.
  • the invention relates to the use of silicon carbide as a material allowing the operation with minimum lubrication of a watch regulator mechanism comprising a resonator mechanism with flexible guides and virtual pivot with a high quality factor greater than 1000, associated to an escape mechanism.
  • the regulating mechanism 300 then preferably comprises a lubricant with a surface tension of less than 50 mN/m, and more particularly less than 40 mN/m, and more particularly still less than or equal to 36 mN/m; the surface tension of the watch lubricant used is then significantly lower than that of water, which is 72 mN/m, ie between approximately half and two thirds.
  • the invention is more particularly described for dry operation, but those skilled in the art will have no difficulty in extrapolating it to a lubricated mechanism.
  • solid a component whose smallest dimension is greater than 0.10 mm
  • a “thin layer” has its smallest dimension. less than 10 micrometers, and preferably less than 1 micrometer.
  • many horological components include areas whose smallest dimension is less than 0.10 mm, such as arms or escape wheel teeth, or the like; the watchmaking components used in the specific case of high quality factor resonators generally come from a wafer with a thickness greater than 0.10 mm, or from an assembly of several thinner wafers (wafer bonding) to produce a wafer resulting in thickness greater than 0.10 mm.
  • experimentation makes it possible to establish that the friction of silicon carbide against silicon or silicon oxide has properties that are particularly desired in a timepiece mechanism, and most particularly in the case of an escapement mechanism.
  • Such a friction couple has a low coefficient of friction, less than 0.17, over a wide force-speed range (1 mN - 200 mN and 1 cm/s - 10 cm/s).
  • the parameter S determines the dependence of the torque on the pressure, and is therefore particularly useful to take into account in the case of dry friction in the escapement where the contact forces and pressures vary greatly, as well as in the interface between the escapement and the resonator.
  • the silicon carbide/Si or silicon carbide/SiO 2 couples have a low dependence of the coefficient of friction as a function of the normal force applied. This results in a very low S-parameter. This behavior is particularly useful in the escapement since the normal force varies greatly, typically from 0 to 200 mN during contact and impacts. During contact losses and contacting, the silicon carbide enables a low friction coefficient of less than 0.2 to be maintained, a value which is usually considered to be the critical operating threshold of the escapement.
  • regulators with a high quality factor they are of the same order of magnitude, and can even be preponderant in certain cases.
  • the underlying mechanisms and the strategies for reducing friction or adhesion are different, and can even turn out to be antagonistic in certain configurations.
  • silicon carbide resists wear well, which guarantees good resistance over time.
  • the invention thus relates to a timepiece regulating mechanism 300, comprising, arranged to be arranged on a plate 1, a resonator mechanism 100 with virtual pivot and flexible guidance, with a quality factor Q greater than 1000, and a mechanism escapement 200 which is intended to be subjected to a torque of motor means 400 that a movement 500 comprises, in particular for the equipment of a watch 1000.
  • the regulator mechanism 300 illustrated in figures 3 and 4 has an exhaust power of the order of 0.7 microwatt, which is about twenty times lower than in the case of a traditional regulator.
  • the resonator mechanism 100 comprises at least one inertial element 2 arranged to oscillate with respect to the plate 1. This inertial element 2 is subjected to the action of elastic return means 3 intended to be fixed directly or indirectly to the plate 1. And this inertial element 2 is arranged to cooperate indirectly with an escapement wheel set 4 that comprises the escapement mechanism 200.
  • the figures show, in a non-limiting way, a plate pin 6 secured to an inertial mass 2, and arranged to cooperate with an anchor 7, which is in turn arranged to cooperate with such an escape wheel set 4 here constituted by an escape wheel.
  • This resonator mechanism 100 is here a rotary resonator with virtual pivot, around a main axis DP, with flexible guidance comprising at least two flexible blades 5, and comprising such a plate pin 6 secured to the inertial element 2.
  • the escapement mechanism 200 comprises an anchor 7 pivoting around a secondary axis DS and comprising an anchor fork 8 arranged to cooperate with the plate pin 6.
  • This escapement mechanism 200 is a free escapement mechanism, in the operating cycle of which the resonator mechanism 100 has at least one phase of freedom where the plate pin 6 is at a distance from the pallet fork 8.
  • This regulating mechanism 300 is a mechanism with improved tribology, according to the observations set out above, and is designed to minimize the phenomena of sticking between the surfaces of the components with variable and/or discontinuous contact.
  • this resonator 100 has a quality factor greater than 1000, more particularly greater than 1800, more particularly still greater than 2500.
  • the technology of resonators with virtual pivot, and in particular with flexible blades does not yet allow large amplitudes of oscillation of the inertial mass.
  • the amplitude of oscillation of the resonator 100 is less than 180°, more particularly less than 90°, more particularly still less than 40°.
  • the oscillation frequency of resonator 100 is greater than 8 Hz, more particularly greater than or equal to 10 Hz, more particularly still greater than or equal to 15 Hz.
  • this regulator mechanism 300 comprises, at the level of the resonator mechanism 100 and/or of the escapement mechanism 200 and/or between the resonator mechanism 100 and the escapement mechanism 200, at least a couple of components, comprising a first component 22 and a second component 32, which respectively comprise a first surface friction 20 and a second friction surface 30 which are arranged to cooperate in contact with each other.
  • this first component 22 and this second component 32 are taken from: plate peg 6, anchor 7, anchor sting, anchor fork 8 with its lugs 26, anchor pallet 72, 81, 82, escape wheel tooth 4, stoker 36 fixed to the plate, and the like.
  • all the pairs of components with variable and/or discontinuous contact of such a regulating mechanism comprise antagonistic surfaces according to the characteristics of the invention, of which at least one component 22 or 32 comprises silicon carbide or its equivalent, that is to say a material comprising at least 90% by mass of silicon carbide SiC and at least one other material, taken from a list given below.
  • the invention relates more particularly to the case of resonator mechanisms in which the energy to be transmitted during each pulse is less than 200 nJ.
  • the invention relates more particularly to the case of resonator mechanisms in which both the energy to be transmitted during each pulse is less than 200 nJ, and the quality factor is greater than 1000.
  • the first friction surface 20 is the surface of a component which comprises silicon carbide which is either stoichiometric silicon carbide SiC, or else non-stoichiometric silicon carbide Si x C y H z , with x equal to 1, including between 0.8 and 5.0, and z between 0.00 and 0.70, or even a so-called equivalent material, that is to say comprising at least 90% by mass of silicon carbide SiC and at least one other material, taken from the following list, the proportions of which are displayed by mass: alpha-SiC 6H, beta-SiC 3C, SiC 4H, fluorinated SiC, silicon carbonitride SiCN, aluminum 400 to 2000 ppm, iron less than 3000 ppm, boron and/or boron carbide B 4 C and/or polyphenyl boron and/ or decaborane B 10 H 14 and/or carborane B 10 H 12 C 2 , the total of materials containing boron being between 0.04% and 0.14%
  • impurities are often harmful for contact problems, and it is preferable to limit them to the lowest possible value, especially with regard to iron, which risks reacting with humidity to form disturbing oxides, which it is better to limit below 400 ppm.
  • the other impurities should be limited, preferably below 100 ppm. Boron is advantageous only when it is made stable by a bond with another element, then boron alone is preferably avoided.
  • amorphous silicon a-Si is understood to mean silicon deposited by PECVD process in a thin layer, from 50 nm to 10 micrometers, of amorphous structure; it can also be hydrogenated or doped N-type or P-type.
  • polycrystalline silicon p-Si is understood here to mean silicon deposited by the LPCVD process, composed of grains of microcrystalline silicon, the size of the grains being from 10 to 2000 nm; it can also be N-type or P-type doped.
  • the modulus of elasticity E is close to 160 GPa.
  • porous silicon means a material with a pore size of 2 nm to 10 micrometers, produced using a complex manufacturing process based on anodization (HF electrolyte and electric current).
  • At least one of these first or second friction surfaces 20, 30 is constituted either by the surface of a solid element made of solid silicon carbide, preferably but not limitatively in the stoichiometric formulation SiC, or else by the surface of a thin layer 21, 31, of silicon carbide in the stoichiometric formulation SiC, or according to a non-stoichiometric composition Si x C y H z , with x equal to 1, including between 0.8 and 5.0, and z between 0.00 and 0.70. More particularly, z is between 0.04 and 0.70.
  • the second friction surface 30 can be either the surface of a solid component, or the surface of a thin layer .
  • a particularly interesting and close application of the invention is the cooperation of SiC lifts, in contact with Si+SiO 2 wheels.
  • Another advantageous application relates to the so-called "solid silicon carbide” application, with wheels in SiC, for example cut or laser, or the like, which are in friction against a one-piece anchor in Si+SiO 2 , or against a conventional anchor equipped with lifts in Si + SiO 2
  • An advantageous application relates to an oxidized Si wheel, and solid SiC pallets, or even oxidized Si pallets covered with silicon carbide.
  • the friction surface 20, 30, which is the surface of a component which comprises silicon carbide is the surface of a component which comprises silicon carbide SiC, or still is made of silicon carbide SiC.
  • first friction surface 20 and the second friction surface 30 are the surfaces of components 22 and 32 which each comprise silicon carbide or its equivalent as defined above. More particularly still, the first friction surface 20 and the second friction surface 30 are the surfaces of components which each comprise silicon carbide SiC, or even consist of silicon carbide SiC.
  • the friction surface 20, 30, which is the surface of a component which comprises silicon carbide, is a surface of a layer of silicon carbide with a thickness of less than 2 micrometers. More particularly, the friction surfaces 20, 30 are each the surface of a layer of silicon carbide with a thickness of less than 2 micrometers.
  • the friction surface 20, 30, which is the surface of a component which comprises silicon carbide, is a surface of a layer of silicon carbide with a thickness greater than 0.5 micrometers. More particularly, the friction surfaces 20, 30 are each the surface of a layer of silicon carbide with a thickness greater than 0.5 micrometers.
  • the thickness of such a layer of silicon carbide is between 50 and 2000 nm. More particularly, this so-called thin layer of silicon carbide has a thickness of between 50 nanometers and 500 nanometers.
  • the friction surface 20, 30, which is the surface of a component which comprises silicon carbide, is the surface of a layer of silicon carbide, which layer covers a substrate consisting of quartz or silicon or a silicon oxide, or a mixture of silicon and silicon oxide. More particularly, the friction surfaces 20, 30 are each the surface of a layer of silicon carbide, which layer covers a substrate made of quartz or of silicon or of a silicon oxide, or of a mixture of silicon and silicon oxide.
  • the friction surface 30, 20, antagonistic to that 20, 30, which is the surface of a component which comprises silicon carbide is the surface of a component which comprises at least one material based on of silicon taken from a group comprising silicon Si, silicon dioxide SiO 2 , amorphous silicon a-Si, polycrystalline silicon p-Si, porous silicon, and is a surface of a layer consisting exclusively of one or several silicon-based materials taken from said group.
  • the friction surfaces 20, 30 are each the surface of a component which comprises at least one silicon-based material taken from a group comprising silicon Si, silicon dioxide SiO 2 , amorphous silicon a- Si, polycrystalline silicon p-Si, porous silicon, and is a surface of a layer consisting exclusively of one or more silicon-based materials taken from said group.
  • the SiC/Si pair gives particularly interesting results, the friction torque is substantially constant, and this without requiring any lubrication. However, there are still friction losses, and the choice of fluid oil lubrication can make it possible to reduce these friction losses, the sticking phenomena inherent in the presence of oil being able to be counteracted by a relatively low surface tension. .
  • the friction surface 20, 30, which is the surface of a component which comprises silicon carbide, has a roughness greater than or equal to 5 nanometers Ra, and more particularly greater than or equal to 9 nanometers Ra, plus particularly still greater than or equal to 25 nanometers Ra, at least at the level of at least one contact surface. More particularly, this friction surface 20, 30 has a roughness greater than or equal to 5 nanometers Ra at each contact surface. More particularly again, these friction surfaces 20, 30 each have a roughness greater than or equal to 5 nanometers Ra at each contact surface.
  • one of the two friction surfaces 20, 30 is smooth so as to avoid excessive friction (interpenetration of roughness for example).
  • the rough surface should be in relative displacement with a smooth surface so as to avoid wear.
  • the surface roughness of the counterpart should preferably be low to limit wear, and its roughness is advantageously less than that of the contact surface, and more particularly but not limitatively less than 5 nanometers Ra.
  • one of the surfaces is the surface of a component which comprises a first screened relief, in relief, for example in the form of a juxtaposition of pyramids, or the like
  • the antagonistic surface is the surface of a component which comprises a second screened relief, which may or may not be similar to the first screened relief, but which differs from it by a relative inclination of its screen direction with that of the first screened relief, so as to prevent any embedding of one into the other.
  • a silicon carbide component is produced with a substrate to constitute the base of one of the first or second friction surfaces 20, 30, either by sintering, or else by massive elaboration.
  • LPCVD chemical vapor deposition low sub-atmospheric pressure
  • PECVD plasma-enhanced chemical vapor deposition
  • CVD atmospheric pressure chemical vapor deposition
  • ALD atomic thin film deposition
  • sputtering implantation ionic, and the like.
  • the Si/C ratio of between 0.8 and 1.2 is chosen. More specifically, the Si/C value of 1 is stoichiometric
  • a hydrogen concentration of between 2 and 30% of H is chosen.
  • a non-limiting Si substrate is chosen.
  • underlayer it is possible to choose, in a non-limiting manner, SiO 2 , typically in a thickness of between 50 and 2000 nm, or poly-Si, SiC, or the like.
  • the thickness of a layer of silicon carbide is preferably between 50 and 2000 nm.
  • the layer of silicon carbide adhere well to the substrate, and that the moduli of elasticity of the materials are not too far apart.
  • the nature of the underlying materials is of lesser importance. If the layer of silicon carbide exceeds a thickness close to 200 nm, to prevent wear from causing the silicon to appear too quickly, quickly oxidized to silicon oxide harmful to adhesion, the friction is determined by the very first peripheral nanometers of this layer of silicon carbide.
  • One-piece SiC pallets can be made by the same techniques as those used for the manufacture of polycrystalline ruby lifts, known to those skilled in the art.
  • Silicon carbide also has the advantage of easy implementation, particularly by PECVD conformal coating, in particular on silicon or silicon oxide. This deposition process is widely known and widespread in the silicon industry.
  • the present invention allows silicon carbide to be used in different forms: PECVD, CVD, sputtering, solid, sintered, and others.
  • the invention makes it possible to solve the sticking problem which hitherto hampered the development and industrialization of regulating mechanisms for watches with a quality factor greater than 1000, and it is understood that other horological problems can also find an improvement.
  • the contact between the peg and the fork of the anchor in a traditional mechanism is also prone to sticking. More generally, this solution is applicable in all cases where the energies involved are low.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Lubricants (AREA)
EP19193107.0A 2019-08-22 2019-08-22 Mécanisme régulateur d'horlogerie à haut facteur de qualité et à lubrification minimale Active EP3783445B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP19193107.0A EP3783445B1 (fr) 2019-08-22 2019-08-22 Mécanisme régulateur d'horlogerie à haut facteur de qualité et à lubrification minimale
TW109120813A TWI746020B (zh) 2019-08-22 2020-06-19 手錶、鐘錶機芯、鐘錶擺輪機構、和用於生產擺輪機構之方法
KR1020200085526A KR20210024415A (ko) 2019-08-22 2020-07-10 고품질 인자 및 최소 윤활을 갖춘 시계 조절기 기구
JP2020124265A JP7063953B2 (ja) 2019-08-22 2020-07-21 高品質係数および最小限の注油を有する時計調整器機構
CN202010849257.XA CN112415881B (zh) 2019-08-22 2020-08-21 具有高品质因数和最小润滑的钟表调速器机构
US16/999,584 US11640139B2 (en) 2019-08-22 2020-08-21 Horological regulator mechanism with high quality factor and minimal lubrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP19193107.0A EP3783445B1 (fr) 2019-08-22 2019-08-22 Mécanisme régulateur d'horlogerie à haut facteur de qualité et à lubrification minimale

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EP3783445A1 EP3783445A1 (fr) 2021-02-24
EP3783445B1 true EP3783445B1 (fr) 2023-06-14

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EP (1) EP3783445B1 (zh)
JP (1) JP7063953B2 (zh)
KR (1) KR20210024415A (zh)
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TW (1) TWI746020B (zh)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3865954A1 (fr) * 2020-02-12 2021-08-18 Nivarox-FAR S.A. Procédé de fabrication d'un dispositif à lames flexibles monobloc en silicium, pour l'horlogerie
EP4113220A1 (fr) * 2021-07-02 2023-01-04 Comadur SA Procédé de traitement de surface d'une pierre, notamment pour l'horlogerie
EP4303666A1 (fr) * 2022-07-06 2024-01-10 Association Suisse pour la Recherche Horlogère Composant horloger comprenant un substrat en silicium cristallin et ayant une résistance à la rupture améliorée

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4346049A (en) 1978-05-01 1982-08-24 Kennecott Corporation Sintered alpha silicon carbide ceramic body having equiaxed microstructure
JPS60186467A (ja) 1984-03-01 1985-09-21 イビデン株式会社 炭化珪素質焼結体の製造方法
JPS60246263A (ja) 1984-05-18 1985-12-05 日産自動車株式会社 炭化珪素質焼結体
US4853299A (en) * 1985-09-06 1989-08-01 Kabushiki Kaisha Toshiba Silicon carbide sintered body and method of manufacturing the same
FR2715398B1 (fr) 1994-01-27 1996-04-12 Ceramiques Composites Procédé de fabrication de matériaux céramiques de carbure de silicium, essentiellement de forme alpha et matériaux céramiques obtenus notamment par ledit procédé.
FR2731715B1 (fr) * 1995-03-17 1997-05-16 Suisse Electronique Microtech Piece de micro-mecanique et procede de realisation
US6755566B2 (en) * 2001-02-15 2004-06-29 Konrad Damasko Clockwork
US6716800B2 (en) 2002-04-12 2004-04-06 John Crane Inc. Composite body of silicon carbide and binderless carbon, process for producing such composite body, and article of manufacturing utilizing such composite body for tribological applications
ATE416401T1 (de) * 2005-06-28 2008-12-15 Eta Sa Mft Horlogere Suisse Verstärktes mikromechanisches teil
DE102008029429A1 (de) 2007-10-18 2009-04-23 Konrad Damasko Verfahren zum Herstellen von mechanischen Funktionselementen für Uhrwerke sowie nach diesem Verfahren hergestelltes Funktionselement
CH702930A2 (fr) 2010-04-01 2011-10-14 Patek Philippe Sa Geneve Echappement d'horlogerie à protection contre les chocs.
EP2472340B1 (fr) * 2011-01-03 2021-03-03 Patek Philippe SA Genève Composant horloger et son procédé de fabrication
JP6210535B2 (ja) * 2013-07-25 2017-10-11 セイコーインスツル株式会社 脱進機、時計用ムーブメントおよび時計
EP2942147B1 (fr) 2014-05-08 2018-11-21 Nivarox-FAR S.A. Mécanisme d'échappement d'horlogerie sans lubrification
CH709665A2 (fr) 2014-05-16 2015-11-30 Nivarox Sa Mécanisme d'horlogerie à couple de contact sans lubrification.
EP2952971B1 (fr) 2014-06-05 2016-10-12 Nivarox-FAR S.A. Ancre pour mécanisme d'échappement d'un mouvement de montre
ES2698115T3 (es) * 2015-12-16 2019-01-31 Sa De La Manufacture Dhorlogerie Audemars Piguet & Cie Mecanismo de regulación de una velocidad media en un movimiento de relojería y movimiento de relojería
CH713150A2 (fr) 2016-11-23 2018-05-31 Eta Sa Mft Horlogere Suisse Mécanisme régulateur à résonateur rotatif à guidage flexible entretenu par un échappement libre à ancre.
EP3489763B1 (fr) * 2017-11-22 2021-06-16 Nivarox-FAR S.A. Ancre pour echappement d'un mouvement horloger

Also Published As

Publication number Publication date
EP3783445A1 (fr) 2021-02-24
CN112415881A (zh) 2021-02-26
JP7063953B2 (ja) 2022-05-09
KR20210024415A (ko) 2021-03-05
TWI746020B (zh) 2021-11-11
CN112415881B (zh) 2022-12-02
TW202109219A (zh) 2021-03-01
US11640139B2 (en) 2023-05-02
JP2021032882A (ja) 2021-03-01
US20210055695A1 (en) 2021-02-25

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