EP3671310A1 - Appareil de manipulation optique pour piéger ou déplacer des micro ou des nanoparticules - Google Patents

Appareil de manipulation optique pour piéger ou déplacer des micro ou des nanoparticules Download PDF

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Publication number
EP3671310A1
EP3671310A1 EP18213584.8A EP18213584A EP3671310A1 EP 3671310 A1 EP3671310 A1 EP 3671310A1 EP 18213584 A EP18213584 A EP 18213584A EP 3671310 A1 EP3671310 A1 EP 3671310A1
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EP
European Patent Office
Prior art keywords
jet
sub
electromagnetic wave
axis
beams
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Application number
EP18213584.8A
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German (de)
English (en)
Inventor
Laurent Blonde
Valter Drazic
Oksana SHRAMKOVA
Mitra DAMGHANIAN
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Thomson Licensing SAS
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Thomson Licensing SAS
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Priority to EP18213584.8A priority Critical patent/EP3671310A1/fr
Priority to EP19816721.5A priority patent/EP3899632B1/fr
Priority to US17/415,561 priority patent/US20220059250A1/en
Priority to PCT/EP2019/084526 priority patent/WO2020126708A1/fr
Priority to CN201980090828.1A priority patent/CN113366365A/zh
Publication of EP3671310A1 publication Critical patent/EP3671310A1/fr
Withdrawn legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J7/00—Micromanipulators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/32—Micromanipulators structurally combined with microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/56—Optics using evanescent waves, i.e. inhomogeneous waves
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0043—Inhomogeneous or irregular arrays, e.g. varying shape, size, height
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection

Definitions

  • the present disclosure relates to the field of optics and photonics, and more specifically to an optical manipulation device for trapping or moving micro or nanoparticles.
  • the disclosure can be of interest in any field where neutral particles have to be trapped and/or manipulated as for instance in atomic physic, nonlinear physics, biology and medicine, etc.
  • nanojets photonic condensed optical beams, or photonic "nanojets"
  • the structured field of nanojets may induce specific optical forces providing the possibility for micro or nanoparticles manipulation along the nanojet EM (for "ElectroMagnetic") field trajectories.
  • optical manipulation devices like optical tweezers
  • optical tweezers are a powerful non-invasive tool in biological and medical application
  • the study of micro or nanoparticles manipulation based on the nanojet has stimulated researchers' interest.
  • photonic hook asymmetric dielectric system creating a curved photonic jet
  • a particular aspect of the present disclosure relates to an optical manipulation apparatus (e.g. an optical tweezer) for trapping or moving micro or nanoparticles.
  • optical manipulation apparatus comprises a device intended to be in contact with a dielectric host medium having a first refractive index n 1 and in which the micro- or nano-particles are trapped or moved by a focused electromagnetic beam radiated by the device when an incoming electromagnetic wave illuminates at least one face of the device, named illumination face.
  • Such device comprises at least:
  • the present disclosure proposes a new and inventive solution for trapping or moving micro or nanoparticles.
  • the resulting focused electromagnetic beam (or resulting jet beam) is generated in a direction that is tilted in respect of the direction of propagation of the incoming electromagnetic wave.
  • the electromagnetic field lines of the outgoing focused electromagnetic beam present a curvature allowing the micro or nanoparticles to be trapped or moved, even around or behind objects present in the vicinity of the radiating face of the device from which the focused electromagnetic beam comes out of the device. This allows for a more flexible manipulation of the micro- or nano-particles.
  • n 3 ⁇ n 1 n 2 , W 1 W 2 and H 1 ⁇ H A , with H A a height, along the Z-axis and relative to the illumination face, of the intersection point of the first and second jet beams.
  • n 3 ⁇ n 1 n 2 , W 2 ⁇ W 1 and H 1 ⁇ H A with H A the height, along the Z-axis and relative to the illumination face, of an intersection point of the first and second jet beams.
  • n 3 > n 1 n 2 , W 2 ⁇ W 1 and H 1 is targeted to be equal to H A - ⁇ /2, with H A the height, along the Z-axis and relative to the illumination face, of an intersection point of the first and second jet beams.
  • the device is configured for having the focused electromagnetic beam tilted in respect of the direction of propagation of the incoming electromagnetic wave e.g. when the incoming electromagnetic wave presents a normal incidence relative to the illumination face of the device.
  • ⁇ B 1 and ⁇ B 2 are targeted to be respectively equal to 90 ° ⁇ ⁇ TIR 1 + ⁇ 1 2 and to 90 ° ⁇ ⁇ TIR 2 + ⁇ 2 2 , where angles ⁇ 1 and ⁇ 2 are respectively the base angles of the first and second contact areas relative to the X-axis, and where ⁇ TIR 1 and ⁇ TIR 2 are respectively limit angles of refraction associated with the first and third contact areas.
  • the device is configured for having the focused electromagnetic beam tilted in respect of the direction of propagation of the incoming electromagnetic wave e.g. when the first and second parts have nonvertical contact areas relative to the illumination face.
  • the equivalent wavelength in vacuum, ⁇ , of the incoming electromagnetic wave belongs to the visible light spectrum.
  • the equivalent wavelength in vacuum of the incoming electromagnetic wave belongs to the range going from 390nm to 700nm.
  • At least one of the first and second materials belongs to the group comprising: glass, plastic, a polymer material, oxides and nitrides.
  • the present disclosure relates to a technique for generating optical forces through jet beams which field lines exhibit curvatures allowing micro or nanoparticles to be trapped or moved e.g. around obstacles. This is achieved through the use of a device comprising two or more parts of dielectric materials with different refractive indexes. The refractive indexes of the constitutive parts are higher than the surrounding host medium in which the micro- or nano-particles are trapped or moved.
  • the constitutive parts are configured in such a way that at least two of the jet beams, originating from different contact areas (associated with different parts) of the device, recombine and contribute to the formation of a focused electromagnetic beam which direction of propagation is deflected in respect of a direction of propagation of an incoming electromagnetic wave illuminating the device.
  • Figure 1 illustrates the cross-section view, in the XZ-plane, of a device 100 comprising a first part 101 and a second part 102 according to an embodiment of the present disclosure.
  • the device 100 is intended to be in contact with a dielectric host medium 103 having a first refractive index n 1 and in which the micro or nanoparticles are intended to be trapped or moved by a focused electromagnetic beam radiated by the device 100 when an incoming electromagnetic wave IEM illuminates at least one face of the device 100, named illumination face 100i. More particularly:
  • the first and second materials belong to the group comprising glass, plastic, a polymer material, oxides and nitrides.
  • the first 101 and second 102 parts are located side by side along the X-axis with W 1 + W 2 greater than the equivalent wavelength in vacuum, ⁇ , of the incoming electromagnetic wave IEM.
  • Each of the 101 and second 102 parts extend along the Z-axis (the Z-axis is orthogonal to X-axis and thus to the illumination face 100i in the chosen coordinate system) from the illumination face 100i up to another face of the device 100, named radiating face 100r, opposite to the illumination face 100i.
  • the first 101 and second 102 parts have respectively a first height H1 and a second height H2 along the Z-axis.
  • H1 H2.
  • the first height H1 and the second height H2 can be different. Indeed, simulations show that the technical effects (i.e. having the electromagnetic field lines of the outgoing focused electromagnetic beam presenting a curvature) is achieved as long as we have
  • the direction of propagation of the incoming electromagnetic wave IEM is orthogonal to the illumination face 100i (i.e. the direction of propagation of the incoming electromagnetic wave IEM is parallel to the Z-axis). However in other embodiments, the direction of propagation of the incoming electromagnetic wave IEM is tilted relative to the Z-axis as discussed below in relation with figures 11a and 11b .
  • the first 101 and second 102 parts have vertical edges parallel to the Z-axis.
  • the radiating 100r and illumination 100i faces are orthogonal to the Z-axis, which corresponds to a base angle of 90°.
  • some prismatic structures can also be used for the device 100 as discussed below in relation with figure 12 .
  • Variation of the base angle value provides additional degree of freedom in the control of the jet beams radiation.
  • the device 100 thus comprises:
  • the incoming electromagnetic wave IEM when the incoming electromagnetic wave IEM presents an oblique angle of incidence (i.e. the angle of incidence of the incoming electromagnetic wave IEM relative to a normal of the illumination face 100i), the incoming electromagnetic wave IEM always illuminates the illumination face 100i, but also at least another lateral face of the device 100.
  • the first 100e1, second 100e2 and third 100e3 contact areas contribute to the radiation of the first NJ1, second NJ2 and third NJ3 jet beams respectively.
  • jet beams result from the superposition of many contributions resulting from the diffraction or refraction of the incoming electromagnetic wave IEM by the different faces or contact areas (e.g. between parts) of the device 100.
  • the first 100e1 contact area contributes to the radiation of the first jet beam NJ1
  • the second 100e2 contact area contributes to the radiation of the second jet beam NJ2
  • the third 100e3 contact area contributes to the radiation of the third jet beam NJ3.
  • the three jet beams, NJ1, NJ2 and NJ3 can intersect in different hot spots (a hot spot corresponding to a point of highest EM power in the considered jet), or focused points, which locations are referenced as points A, B and C.
  • the materials and size of the first 101 and second 102 parts can be optimized in order to manage the position of the jet hot spots, EM power, direction and angle of deviation of the three jet beams NJ1, NJ2 and NJ3.
  • the device 100 behaves as if it was radiating a focused electromagnetic beam resulting from the combination of at least two beams among said first NJ1, second NJ2 and third NJ3 jet beams.
  • the device 100 can thus be configured for having a direction of propagation of the focused electromagnetic beam being tilted in respect of a direction of propagation of the incoming electromagnetic wave as a function of at least part of:
  • the beam-forming phenomenon appears on a contact area between two materials of different refractive indexes, and is associated with this contact area (e.g. contact area 100e1, 100e2 or 100e3 of the device 100 of figure 1 ) and the illumination face 100i.
  • the jet beam radiation angle can be derived in relation to the Snell's law.
  • the focal length of the microlens can be characterized as the function of the width and index ratio of the materials inside and outside the lens.
  • the second jet beam NJ2 associated to the second contact area 101e2 is refracted at the angle ⁇ B 2 into the medium with higher refractive index.
  • the third jet beam NJ3 associated to the third contact area 101e3 is refracted at the angle ⁇ B 3 with : ⁇ B 3 ⁇ 90 ⁇ ⁇ TIR 3 2 .
  • ⁇ TIR 3 sin ⁇ 1 n 1 n 3 is the corresponding limit angle of refraction.
  • the length and intensity of the three jet beams NJ1, NJ2 and NJ3, are different.
  • the maximal intensity and minimal length correspond to the beam with highest ratio between the refractive indexes. So, it is the first jet beam NJ1 refracted at the angle ⁇ B 1 when n 2 > n 3 > n 1 .
  • the point A of intersection of the first NJ1 and second NJ2 jet beams has the coordinates ( W A , H A ) in the XoZ coordinate system of figure 1 . More particularly, based on the previous equations one can get: W A ⁇ tan ⁇ B 2 ⁇ H A , H A ⁇ W 1 tan ⁇ B 1 + tan ⁇ B 2
  • ⁇ B 4 as the angle of deviation of the focal point A from the axis of symmetry 101as of the first part 101 with width W1
  • the first NJ1 and third NJ3 jet beams intersect at point B with the coordinates ( W B , H B ), where: W B ⁇ tan ⁇ B 3 ⁇ H B ⁇ W 2 , H B ⁇ W 1 + W 2 tan ⁇ B 1 + tan ⁇ B 3
  • ⁇ B 5 as the angle of deviation of the focal point B from the axis of a symmetry of the device 100 (i.e. the Z-axis in figure 1 ) with width W1+W2, one gets: tan ⁇ B 5 ⁇ W 2 tan ⁇ B 1 ⁇ W 1 tan ⁇ B 3 W 1 + W 2
  • the second NJ2 and third NJ3 jet beams intersect only if n 3 is above a critical value, i.e. if n 3 ⁇ n 1 n 2 .
  • the coordinates of the point C are determined as: W C ⁇ tan ⁇ B 3 ⁇ H C ⁇ W 2 , H C ⁇ W 2 tan ⁇ B 3 ⁇ tan ⁇ B 2
  • ⁇ B 6 as the angle of deviation of the focal point C from the axis of symmetry 102as of the second part 102 with width W2, one gets: tan ⁇ B 6 ⁇ tan ⁇ B 2 + tan ⁇ B 3 2
  • the simulations show that the curvature of the electromagnetic field lines of the outgoing focused electromagnetic beam is achieved by changing the height H of the device 100.
  • Figure 4d presents the schematic distribution of the jet beams exited in the system.
  • the curvature of the electromagnetic field lines of the outgoing focused electromagnetic beam takes place if H 1 ⁇ H A and if the focal point A for the first NJ1 and the second NJ2 jet beams is close to the radiating surface 100r of the device 100, or even within the device 100 (see Figure 4d ).
  • the curvature of the electromagnetic field lines of the outgoing focused electromagnetic beam is caused by an interplay of the second NJ2 and third NJ3 jet beams, which are longer but less intensive than the first NJ1 jet beam.
  • the angle of deviation of the generated focused electromagnetic beam is close to the angle ⁇ B 6 of deviation of the focal point C from the axis of symmetry 102as of the second part 102 with width W2 (red dash-dot line in Figure 4d ).
  • the power density of the hot spots as a function of n 3 is presented in Figure 5c .
  • H A the Z coordinate of the intersection point of the first NJ1 and second NJ2 jet beams (i.e. the height, along the Z-axis and relative to the illumination face 100i, of the intersection point of the first NJ1 and second NJ2 jet beams).
  • n 3 > n 1 n 2 we have two additional jet beams (e.g. as in the configuration of Figure 8a ).
  • the angle of deviation of the third jet beam NJ3 (beam number 3 in Figure 8a ) associated to the third contact area 100e3 is equal to ⁇ B 6 (see Figure 8b ).
  • the central jet beam (beam number 4 in Figure 8a ) is directed along the Z-axis (normal to the radiating face 100r of the device).
  • the power density in the hot spots of the jet beams number 2-4 in Figure 8a and the position of the corresponding jet beams' hot spots versus the width W 2 of the second part 102 are presented in Figure 8b to 8e .
  • the device 100 is configured such that n 3 ⁇ n 1 n 2 , and W2>W1, independently of the heights H1 and H2 of the first 101 and second 102 parts of the device 100 (as long as the condition
  • Such parameters allow obtaining a tilt of the direction of the generated focused electromagnetic beam (that results from a combination of at least two beams among the first NJ1, second NJ2 and third NJ3 jet beams) in respect of the direction of propagation of the incoming electromagnetic wave IEM.
  • the device 100 is configured such that n 3 ⁇ n 1 n 2 , W2 ⁇ W1, and H 1 ⁇ H A (still with
  • Such parameters allow obtaining a tilt of the direction of the generated focused electromagnetic beam (that results from a combination of at least two beams among the first NJ1, second NJ2 and third NJ3 jet beams) in respect of the direction of propagation of the incoming electromagnetic wave IEM.
  • the device 100 is configured such that n 3 > n 1 n 2 , W2 ⁇ W1, and H 1 is targeted to be equal to H A - ⁇ /2 (still with
  • Such parameters allow obtaining a tilt of the direction of the generated focused electromagnetic beam (that results from a combination of at least two beams among the first NJ1, second NJ2 and third NJ3 jet beams) in respect of the direction of propagation of the incoming electromagnetic wave IEM.
  • the tilt angle ⁇ of deviation of the generated focused electromagnetic beam from the normal incidence is equal to 14.49° and remains constant for all wavelengths of incident wave in the theoretical hypothesis of non-dispersive materials.
  • the angle ⁇ is approximately equal to 17.54°. The dispersion of the system rises with the height H.
  • the device 100' of figure 12 i.e. with nonvertical edges (i.e. edges not parallel to the Z-axis) whereas the radiating 100r and illumination 100i faces both remain orthogonal to the Z-axis.
  • ⁇ j (with j equal to 1, 2 or 3) as the base angles for a double-material system.
  • the device 100' may correspond to a double-material prismatic device in contact with a dielectric host medium 103, with a refractive index n1 ⁇ n3 ⁇ n2.
  • the corresponding jet beam radiation angle can be determined using the approximate formula: ⁇ Bj ⁇ 90 ° ⁇ ⁇ ° TIRj 2 where the angles ⁇ * TIRj are the critical angles of refraction from the nonvertical edges, or contact areas 100'e1, 100'e2 and 100'e3.
  • Figures 15a to 15d give the height H A and the deviation angle ⁇ B 6 as obtained based on equations (5) and (10).
  • ⁇ B 6 22°
  • decreasing or increasing the base angle ⁇ 2 leads to the changing of both parameters H A and ⁇ B 6 as can be seen in Figure 15b and 15c .
  • optical forces acting on an arbitrary micro- or nano-particles can be calculated in an approximation of the particle by an electric dipole; this method applies for Rayleigh particles (particle much smaller than the incident wavelength) as detailed for instance in the article by P. Chaumet and M. Nieto-Vesperinas: "Time-averaged total force on a dipolar sphere in an electromagnetic field," Opt. Lett. 25, 1065-1067 (2000 ).
  • the streamlines and arrows show the trajectories and directions of the optical forces obtained using the dipolar approximation. It is possible to see that in a case of double material device 100 we can transport the particles along the curved trajectory.
  • the simulations correspond to an obstacle 1800 made of glass with a refractive index 1.8 and a thickness equal to ⁇ /8 placed at the distance 5 ⁇ /8 in the case of Figures 18a to 18d , and made of metal (perfect electric conductor) with the same thickness ⁇ /8 placed at the distance 3 ⁇ /8 in the case of Figures 19a to 19d .
  • the presence of the obstacle 1800 leads to the disruption of the jet beams and to valuable changing in the trajectory.
  • the particles can move along the curved trajectory around the obstacle. This effect was obtained for both type of obstacles 1800 (i.e. glass and metal). Moreover, in a case of conducting obstacles 1800 we can get trapping locations near the obstacle (white circle referred 1900 in Figure 19c ).
  • such double-material device 100, 100' can be used as an elementary part of an optical manipulation apparatus (e.g. an optical tweezer) 1700 for trapping or moving micro or nanoparticles in the dielectric host medium 103.
  • an optical manipulation apparatus e.g. an optical tweezer
  • the equivalent wavelength in vacuum, ⁇ of the incoming electromagnetic wave IEM belongs to the visible light spectrum (e.g. to the range going from 390nm to 700nm).
  • such optical manipulation apparatus 1700 can also comprise an optical source for radiating the incoming electromagnetic wave IEM that illuminates the illumination face 100i of the device 100, 100' (in any of its embodiments discussed above). In that case, the optical manipulation apparatus 1700 can generate the tilted focused electromagnetic beam independently of the use of an external source for generating the incoming electromagnetic wave IEM.

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  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
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  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
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EP18213584.8A 2018-12-18 2018-12-18 Appareil de manipulation optique pour piéger ou déplacer des micro ou des nanoparticules Withdrawn EP3671310A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP18213584.8A EP3671310A1 (fr) 2018-12-18 2018-12-18 Appareil de manipulation optique pour piéger ou déplacer des micro ou des nanoparticules
EP19816721.5A EP3899632B1 (fr) 2018-12-18 2019-12-10 Appareil de manipulation optique pour piéger ou déplacer des micro ou des nanoparticules
US17/415,561 US20220059250A1 (en) 2018-12-18 2019-12-10 Optical manipulation apparatus
PCT/EP2019/084526 WO2020126708A1 (fr) 2018-12-18 2019-12-10 Appareil de manipulation optique
CN201980090828.1A CN113366365A (zh) 2018-12-18 2019-12-10 光学操纵设备

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WO2020126708A1 (fr) 2020-06-25

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